treatment by exposure to a liquid

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H01L21/02307

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/02307treatment by exposure to a liquid

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Sacrificial protection layer for environmentally sensitive surfaces...
- Patent number 12,119,218
- Issue date Oct 15, 2024
- Lam Research Corporation
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molecular doping
- Patent number 11,978,633
- Issue date May 7, 2024
- Consiglio Nazionale Delle Ricerche
- Rosaria Anna Puglisi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface modification layer for conductive feature formation
- Patent number 11,942,362
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle standby device, liquid processing apparatus and operation me...
- Patent number 11,862,485
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Satoshi Shimmura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structure for semiconductor device and methods of fabr...
- Patent number 11,610,841
- Issue date Mar 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ta Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface modification layer for conductive feature formation
- Patent number 11,600,521
- Issue date Mar 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid supply device and fluid supply method
- Patent number 11,569,101
- Issue date Jan 31, 2023
- Fujikin Incorporated
- Toshihide Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin protection member forming apparatus
- Patent number 11,443,951
- Issue date Sep 13, 2022
- Disco Corporation
- Yoshinobu Saito
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Process for fabricating silicon nanostructures
- Patent number 11,355,584
- Issue date Jun 7, 2022
- Advanced Silicon Group Technologies, LLC
- Brent A. Buchine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,282,718
- Issue date Mar 22, 2022
- SCREEN Holdings Co., Ltd.
- Takeshi Yoshida
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Protective member forming apparatus
- Patent number 10,916,459
- Issue date Feb 9, 2021
- Disco Corporation
- Shinichi Namioka
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Material composition and process for substrate modification
- Patent number 10,802,402
- Issue date Oct 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Han Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structure for semiconductor device and methods of fabr...
- Patent number 10,777,504
- Issue date Sep 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Ta Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 10,714,352
- Issue date Jul 14, 2020
- Semes Co., Ltd.
- Min Jung Park
- F26 - DRYING
Information Patent Grant
Surface modification layer for conductive feature formation
- Patent number 10,699,944
- Issue date Jun 30, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution deposition method for forming metal oxide or metal hydroxi...
- Patent number 10,689,775
- Issue date Jun 23, 2020
- Seoul Semiconductor Co., Ltd.
- Jacob J. Richardson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for fabricating silicon nanostructures
- Patent number 10,692,971
- Issue date Jun 23, 2020
- Advanced Silicon Group, Inc.
- Brent A. Buchine
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,615,026
- Issue date Apr 7, 2020
- SCREEN Holdings Co., Ltd.
- Shota Iwahata
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Manufacturing method of gallium nitride substrate
- Patent number 10,600,645
- Issue date Mar 24, 2020
- Samsung Electronics Co., Ltd.
- Mi Hyun Kim
- B08 - CLEANING
Information Patent Grant
Multiple barrier layer encapsulation stack
- Patent number 10,580,638
- Issue date Mar 3, 2020
- Sage Electrochromics, Inc.
- Avanti M. Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus
- Patent number 10,573,546
- Issue date Feb 25, 2020
- SCREEN Holdings Co., Ltd.
- Yukihiko Inagaki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Covalent chemical surface modification of surfaces with available s...
- Patent number 10,519,035
- Issue date Dec 31, 2019
- Rhode Island Council on Postsecondary Education
- Jason R. Dwyer
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Interconnect structure for semiconductor device and methods of fabr...
- Patent number 10,515,896
- Issue date Dec 24, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ta Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arrays of elevationally-extending strings of memory cells and metho...
- Patent number 10,504,917
- Issue date Dec 10, 2019
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a bonded SOI wafer
- Patent number 10,460,983
- Issue date Oct 29, 2019
- SHIN-ETSU HANDOTAI CO.,LTD.
- Taishi Wakabayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming oxide layer
- Patent number 10,453,677
- Issue date Oct 22, 2019
- United Microelectronics Corp.
- Cheng-Hsu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for wetting pretreatment for through resist m...
- Patent number 10,301,738
- Issue date May 28, 2019
- Novellus Systems, Inc.
- Bryan L. Buckalew
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Binary metal oxide based interlayer for high mobility channels
- Patent number 10,283,610
- Issue date May 7, 2019
- International Business Machines Corporation
- Vijay Narayanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Binary metal oxide based interlayer for high mobility channels
- Patent number 10,217,834
- Issue date Feb 26, 2019
- International Business Machines Corporation
- Vijay Narayanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of thin film dielectrics using surface blockin...
- Patent number 10,219,373
- Issue date Feb 26, 2019
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SACRIFICIAL PROTECTION LAYER FOR ENVIRONMENTALLY SENSITIVE SURFACES...
- Publication number 20240429040
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR PRODUCING A LOW-DEFECT INTERFACE
- Publication number 20240321574
- Publication date Sep 26, 2024
- ROBERT BOSCH GmbH
- Mirjam Henn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20240234133
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION
- Publication number 20240194522
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREPARING DIELECTRIC LAYER ON SURFACE OF WAFER, WAFER ST...
- Publication number 20240162161
- Publication date May 16, 2024
- CHIPMORE TECHNOLOGY CORPORATION LIMITED
- Guanmeng XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SACRIFICIAL PROTECTION LAYER FOR ENVIRONMENTALLY SENSITIVE SURFACES...
- Publication number 20240030023
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20230369039
- Publication date Nov 16, 2023
- Samsung Electronics Co., Ltd.
- Eunhyea KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFAC...
- Publication number 20230223251
- Publication date Jul 13, 2023
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Modification Layer for Conductive Feature Formation
- Publication number 20230207384
- Publication date Jun 29, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR DRYING SUBSTRATE
- Publication number 20230010670
- Publication date Jan 12, 2023
- Samsung Electronics Co., Ltd.
- Sangjine Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR FABRICATING SILICON NANOSTRUCTURES
- Publication number 20220254883
- Publication date Aug 11, 2022
- Advanced Silicon Group Technologies, LLC
- Brent A. Buchine
- B82 - NANO-TECHNOLOGY
Information Patent Application
MOLECULAR DOPING
- Publication number 20220216057
- Publication date Jul 7, 2022
- Consiglio Nazionale Delle Ricerche
- Rosaria Anna PUGLISI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOZZLE STANDBY DEVICE, LIQUID PROCESSING APPARATUS AND OPERATION ME...
- Publication number 20220084844
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Satoshi Shimmura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIN PROTECTION MEMBER FORMING APPARATUS
- Publication number 20210134598
- Publication date May 6, 2021
- Disco Corporation
- Yoshinobu SAITO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FLUID SUPPLY DEVICE AND FLUID SUPPLY METHOD
- Publication number 20210125840
- Publication date Apr 29, 2021
- Fujikin Incorporated
- Toshihide YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Modification Layer for Conductive Feature Formation
- Publication number 20200328110
- Publication date Oct 15, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR FABRICATING SILICON NANOSTRUCTURES
- Publication number 20200273950
- Publication date Aug 27, 2020
- Advanced Silicon Group, Inc.
- Brent A. Buchine
- B82 - NANO-TECHNOLOGY
Information Patent Application
INTERCONNECT STRUCTURE FOR SEMICONDUCTOR DEVICE AND METHODS OF FABR...
- Publication number 20200161240
- Publication date May 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ta YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Surface Modification Layer for Conductive Feature Formation
- Publication number 20200105587
- Publication date Apr 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE MEMBER FORMING APPARATUS
- Publication number 20200043754
- Publication date Feb 6, 2020
- Disco Corporation
- Shinichi NAMIOKA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MATERIAL COMPOSITION AND PROCESS FOR SUBSTRATE MODIFICATION
- Publication number 20190206680
- Publication date Jul 4, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Han LAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERCONNECT STRUCTURE FOR SEMICONDUCTOR DEVICE AND METHODS OF FABR...
- Publication number 20190067197
- Publication date Feb 28, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ta YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOLUTION DEPOSITION METHOD FOR FORMING METAL OXIDE OR METAL HYDROXI...
- Publication number 20190048488
- Publication date Feb 14, 2019
- SEOUL SEMICONDUCTOR CO., LTD.
- Jacob J. Richardson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING OXIDE LAYER
- Publication number 20180366323
- Publication date Dec 20, 2018
- UNITED MICROELECTRONICS CORP.
- Cheng-Hsu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR FABRICATING SILICON NANOSTRUCTURES
- Publication number 20180350908
- Publication date Dec 6, 2018
- Advanced Silicon Group, Inc.
- Brent A. Buchine
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
BINARY METAL OXIDE BASED INTERLAYER FOR HIGH MOBILITY CHANNELS
- Publication number 20180175156
- Publication date Jun 21, 2018
- International Business Machines Corporation
- Vijay Narayanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR FABRICATING SILICON NANOSTRUCTURES
- Publication number 20180090568
- Publication date Mar 29, 2018
- Advanced Silicon Group, Inc.
- Brent A. Buchine
- B82 - NANO-TECHNOLOGY
Information Patent Application
BINARY METAL OXIDE BASED INTERLAYER FOR HIGH MOBILITY CHANNELS
- Publication number 20180040709
- Publication date Feb 8, 2018
- International Business Machines Corporation
- Vijay Narayanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BINARY METAL OXIDE BASED INTERLAYER FOR HIGH MOBILITY CHANNELS
- Publication number 20180040710
- Publication date Feb 8, 2018
- International Business Machines Corporation
- Vijay Narayanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BINARY METAL OXIDE BASED INTERLAYER FOR HIGH MOBILITY CHANNELS
- Publication number 20180040708
- Publication date Feb 8, 2018
- International Business Machines Corporation
- Vijay Narayanan
- H01 - BASIC ELECTRIC ELEMENTS

treatment by exposure to a liquid

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Sacrificial protection layer for environmentally sensitive surfaces...

Molecular doping

Surface modification layer for conductive feature formation

Nozzle standby device, liquid processing apparatus and operation me...

Interconnect structure for semiconductor device and methods of fabr...

Surface modification layer for conductive feature formation

Fluid supply device and fluid supply method

Resin protection member forming apparatus

Process for fabricating silicon nanostructures

Substrate processing apparatus and substrate processing method

Protective member forming apparatus

Material composition and process for substrate modification

Interconnect structure for semiconductor device and methods of fabr...

Apparatus and method for treating substrate

Surface modification layer for conductive feature formation

Solution deposition method for forming metal oxide or metal hydroxi...

Process for fabricating silicon nanostructures

Substrate processing method and substrate processing apparatus

Manufacturing method of gallium nitride substrate

Multiple barrier layer encapsulation stack

Substrate treating apparatus

Covalent chemical surface modification of surfaces with available s...

Interconnect structure for semiconductor device and methods of fabr...

Arrays of elevationally-extending strings of memory cells and metho...

Method for manufacturing a bonded SOI wafer

Method of forming oxide layer

Methods and apparatus for wetting pretreatment for through resist m...

Binary metal oxide based interlayer for high mobility channels

Binary metal oxide based interlayer for high mobility channels

Selective deposition of thin film dielectrics using surface blockin...

Patents Applicationslast 30 patents

SACRIFICIAL PROTECTION LAYER FOR ENVIRONMENTALLY SENSITIVE SURFACES...

METHOD AND DEVICE FOR PRODUCING A LOW-DEFECT INTERFACE

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

SURFACE MODIFICATION LAYER FOR CONDUCTIVE FEATURE FORMATION

METHOD FOR PREPARING DIELECTRIC LAYER ON SURFACE OF WAFER, WAFER ST...

SACRIFICIAL PROTECTION LAYER FOR ENVIRONMENTALLY SENSITIVE SURFACES...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFAC...

Surface Modification Layer for Conductive Feature Formation

APPARATUS AND METHOD FOR DRYING SUBSTRATE

PROCESS FOR FABRICATING SILICON NANOSTRUCTURES

MOLECULAR DOPING

NOZZLE STANDBY DEVICE, LIQUID PROCESSING APPARATUS AND OPERATION ME...

RESIN PROTECTION MEMBER FORMING APPARATUS

FLUID SUPPLY DEVICE AND FLUID SUPPLY METHOD

Surface Modification Layer for Conductive Feature Formation

PROCESS FOR FABRICATING SILICON NANOSTRUCTURES

INTERCONNECT STRUCTURE FOR SEMICONDUCTOR DEVICE AND METHODS OF FABR...

Surface Modification Layer for Conductive Feature Formation

PROTECTIVE MEMBER FORMING APPARATUS

MATERIAL COMPOSITION AND PROCESS FOR SUBSTRATE MODIFICATION

INTERCONNECT STRUCTURE FOR SEMICONDUCTOR DEVICE AND METHODS OF FABR...

SOLUTION DEPOSITION METHOD FOR FORMING METAL OXIDE OR METAL HYDROXI...

METHOD OF FORMING OXIDE LAYER

PROCESS FOR FABRICATING SILICON NANOSTRUCTURES

BINARY METAL OXIDE BASED INTERLAYER FOR HIGH MOBILITY CHANNELS

PROCESS FOR FABRICATING SILICON NANOSTRUCTURES

BINARY METAL OXIDE BASED INTERLAYER FOR HIGH MOBILITY CHANNELS

BINARY METAL OXIDE BASED INTERLAYER FOR HIGH MOBILITY CHANNELS

BINARY METAL OXIDE BASED INTERLAYER FOR HIGH MOBILITY CHANNELS