treatment by exposure to a plasma

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H01L21/02315

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/02315treatment by exposure to a plasma

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Patents Grantslast 30 patents

Information Patent Grant
High electron mobility transistor and method of manufacturing the same
- Patent number 12,199,174
- Issue date Jan 14, 2025
- Samsung Electronics Co., Ltd.
- Junhyuk Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with multi-layer etch stop structure
- Patent number 12,198,979
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Cheng Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a metal pad and a protective layer for...
- Patent number 12,183,697
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Fan Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 12,176,419
- Issue date Dec 24, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Takashi Hamochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacture
- Patent number 12,154,784
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Yang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of SiOCN thin films
- Patent number 12,142,479
- Issue date Nov 12, 2024
- ASM IP Holding B.V.
- Varun Sharma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing blocking layers on metal surfaces
- Patent number 12,131,900
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Electrostatic chucking process
- Patent number 12,100,609
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxidative conversion in atomic layer deposition processes
- Patent number 12,087,574
- Issue date Sep 10, 2024
- Lam Research Corporation
- Douglas Walter Agnew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,068,136
- Issue date Aug 20, 2024
- Kokusai Electric Corporation
- Tsuyoshi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for conditioning a plasma processing chamber
- Patent number 12,060,636
- Issue date Aug 13, 2024
- Lam Research Corporation
- Chiara Helena Catherina Giammanco MacPherson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for filling a gap and related systems and devices
- Patent number 12,027,365
- Issue date Jul 2, 2024
- ASM IP Holding B.V.
- Zecheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor structure and semiconductor structure
- Patent number 12,014,950
- Issue date Jun 18, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shang Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 11,972,945
- Issue date Apr 30, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Kenichi Okazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a source/drain
- Patent number 11,929,401
- Issue date Mar 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for selective deposition of silicon nitride layer and struct...
- Patent number 11,901,175
- Issue date Feb 13, 2024
- ASM IP Holding B.V.
- Eric James Shero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical semiconductor device and method for fabricating the same
- Patent number 11,903,209
- Issue date Feb 13, 2024
- SK hynix Inc.
- Hye-Hyeon Byeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 11,881,382
- Issue date Jan 23, 2024
- Semes Co., Ltd.
- Jun Pyo Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced ignition in inductively coupled plasmas for workpiece proc...
- Patent number 11,848,204
- Issue date Dec 19, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device with multi-layer etch stop...
- Patent number 11,848,231
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Cheng Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective passivation and selective deposition
- Patent number 11,830,732
- Issue date Nov 28, 2023
- ASM IP Holding B.V.
- Jan Willem Hub Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD based oxide-metal multi structure for 3D NAND memory devices
- Patent number 11,817,320
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective removal of ruthenium-containing materials
- Patent number 11,798,813
- Issue date Oct 24, 2023
- Applied Materials, Inc.
- Baiwei Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,728,166
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Prevention of metal pad corrosion due to exposure to halogen
- Patent number 11,670,608
- Issue date Jun 6, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Fan Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to reduce breakdown failure in a MIM capacitor
- Patent number 11,594,593
- Issue date Feb 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsing-Lien Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for enhancing selectivity in SAM-based selective deposition
- Patent number 11,515,155
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Chang Ke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface pretreatment process to improve quality of oxide films prod...
- Patent number 11,495,437
- Issue date Nov 8, 2022
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for manufacturing same
- Patent number 11,462,403
- Issue date Oct 4, 2022
- SJ Semiconductor (Jiangyin) Corporation
- Jiashan Yin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Formation of SiOCN Thin Films
- Publication number 20250029832
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Varun Sharma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING EQUIPMENT PART AND METHOD FOR MAKING THE SAME
- Publication number 20240420951
- Publication date Dec 19, 2024
- FENG CHIA UNIVERSITY
- Chang-Ho YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20240395908
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shahaji B. MORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE
- Publication number 20240395536
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Yang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED INTERCONNECTION STRUCTURE AND MANUFACTURING METHOD THE...
- Publication number 20240387250
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Fang CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240371631
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING AN INSULATING LAYER PATTERN, PRECURSORS USED IN...
- Publication number 20240347462
- Publication date Oct 17, 2024
- DONGJIN SEMICHEM CO., LTD.
- Ha Kyung YUN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REDUCING INCUBATION PERIOD OF SILICON NITRIDE LAYER DEPO...
- Publication number 20240318311
- Publication date Sep 26, 2024
- ASM IP HOLDING B.V.
- Agung Setiadi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEM AND METHODS TO CO-STRIKE PLASMA TO ENHANCE TUNGST...
- Publication number 20240274407
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Peiqi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR TITANIUM-CONTAINING FILM REMOVAL
- Publication number 20240258116
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM DEPOSITION METHOD
- Publication number 20240258104
- Publication date Aug 1, 2024
- Jusung Engineering Co., Ltd.
- Yoon Jeong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a Source/Drain
- Publication number 20240213330
- Publication date Jun 27, 2024
- Taiwan Semiconductor Manfacturing Co., Ltd.
- Chien-Wei Lee
- C30 - CRYSTAL GROWTH
Information Patent Application
OXIDATION CONFORMALITY IMPROVEMENT WITH IN-SITU INTEGRATED PROCESSING
- Publication number 20240177990
- Publication date May 30, 2024
- Applied Materials, Inc.
- Hansel LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240155839
- Publication date May 9, 2024
- SK HYNIX INC.
- Hye-Hyeon BYEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Isolation Regions For Isolating Transistors and the Methods Forming...
- Publication number 20240120236
- Publication date Apr 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Jung Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240105448
- Publication date Mar 28, 2024
- Kokusai Electric Corporation
- Motomu DEGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS
- Publication number 20240087885
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...
- Publication number 20240071754
- Publication date Feb 29, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD OF WAFER
- Publication number 20240071753
- Publication date Feb 29, 2024
- Disco Corporation
- Shunsuke TERANISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
- Publication number 20240047197
- Publication date Feb 8, 2024
- ASM IP HOLDING B.V.
- Jan Willem Hub Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC ESD PROTECTION DEVICE
- Publication number 20240021701
- Publication date Jan 18, 2024
- STMicroelectronics (Tours) SAS
- Aurelie ARNAUD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF METAL OXIDES USING SILANES AS AN INHIBITOR
- Publication number 20230386831
- Publication date Nov 30, 2023
- LAM RESEARCH CORPORATION
- Kashish SHARMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20230369039
- Publication date Nov 16, 2023
- Samsung Electronics Co., Ltd.
- Eunhyea KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREVENTION OF METAL PAD CORROSION DUE TO EXPOSURE TO HALOGEN
- Publication number 20230317651
- Publication date Oct 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Fan Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE TANTALUM NITRIDE DEPOSITION FOR BARRIER APPLICATIONS
- Publication number 20230197438
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Aaron Dangerfield
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF SILICON NITRIDE WITH ENHANCED SELECTIVITY
- Publication number 20230187202
- Publication date Jun 15, 2023
- Entegris, Inc.
- Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO REDUCE BREAKDOWN FAILURE IN A MIM CAPACITOR
- Publication number 20230187478
- Publication date Jun 15, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsing-Lien Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices and Methods of Manufacture
- Publication number 20230178361
- Publication date Jun 8, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Yang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF A THIN FILM NANOCRYSTALLINE DIAMOND ON A SUBSTRATE
- Publication number 20230102356
- Publication date Mar 30, 2023
- THE BOARD OF REGENTS FOR THE OKLAHOMA AGRICULTURAL AND MECHANICAL COLLEGES
- Nirmal Govindaraju
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

treatment by exposure to a plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

High electron mobility transistor and method of manufacturing the same

Semiconductor device with multi-layer etch stop structure

Semiconductor device having a metal pad and a protective layer for...

Method for fabricating semiconductor device

Semiconductor devices and methods of manufacture

Formation of SiOCN thin films

Methods for depositing blocking layers on metal surfaces

Integrated epitaxy and preclean system

Electrostatic chucking process

Oxidative conversion in atomic layer deposition processes

Substrate processing apparatus, method of manufacturing semiconduct...

Method for conditioning a plasma processing chamber

Methods for filling a gap and related systems and devices

Method for forming semiconductor structure and semiconductor structure

Method for manufacturing semiconductor device

Method of forming a source/drain

Method for selective deposition of silicon nitride layer and struct...

Vertical semiconductor device and method for fabricating the same

Apparatus and method for treating substrate

Enhanced ignition in inductively coupled plasmas for workpiece proc...

Method for forming semiconductor device with multi-layer etch stop...

Selective passivation and selective deposition

CVD based oxide-metal multi structure for 3D NAND memory devices

Selective removal of ruthenium-containing materials

Substrate processing method and substrate processing apparatus

Prevention of metal pad corrosion due to exposure to halogen

Method to reduce breakdown failure in a MIM capacitor

Methods for enhancing selectivity in SAM-based selective deposition

Surface pretreatment process to improve quality of oxide films prod...

Semiconductor structure and method for manufacturing same

Patents Applicationslast 30 patents

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

Formation of SiOCN Thin Films

SEMICONDUCTOR PROCESSING EQUIPMENT PART AND METHOD FOR MAKING THE SAME

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE

SELF-ALIGNED INTERCONNECTION STRUCTURE AND MANUFACTURING METHOD THE...

FILM FORMING METHOD AND FILM FORMING APPARATUS

METHOD FOR FORMING AN INSULATING LAYER PATTERN, PRECURSORS USED IN...

METHOD FOR REDUCING INCUBATION PERIOD OF SILICON NITRIDE LAYER DEPO...

PROCESSING SYSTEM AND METHODS TO CO-STRIKE PLASMA TO ENHANCE TUNGST...

SYSTEMS AND METHODS FOR TITANIUM-CONTAINING FILM REMOVAL

THIN FILM DEPOSITION METHOD

Method of Forming a Source/Drain

OXIDATION CONFORMALITY IMPROVEMENT WITH IN-SITU INTEGRATED PROCESSING

VERTICAL SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

Isolation Regions For Isolating Transistors and the Methods Forming...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS

Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...

PROCESSING METHOD OF WAFER

SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION

ELECTRONIC ESD PROTECTION DEVICE

SELECTIVE DEPOSITION OF METAL OXIDES USING SILANES AS AN INHIBITOR

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PREVENTION OF METAL PAD CORROSION DUE TO EXPOSURE TO HALOGEN

SELECTIVE TANTALUM NITRIDE DEPOSITION FOR BARRIER APPLICATIONS

DEPOSITION OF SILICON NITRIDE WITH ENHANCED SELECTIVITY

METHOD TO REDUCE BREAKDOWN FAILURE IN A MIM CAPACITOR

Semiconductor Devices and Methods of Manufacture

DEPOSITION OF A THIN FILM NANOCRYSTALLINE DIAMOND ON A SUBSTRATE