treatment by exposure to a plasma

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H01L21/0234

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/0234treatment by exposure to a plasma

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Cyclic spin-on coating process for forming dielectric material
- Patent number 12,170,199
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Je-Ming Kuo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Chuck assembly, planarization process, apparatus and method of manu...
- Patent number 12,165,903
- Issue date Dec 10, 2024
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 12,165,882
- Issue date Dec 10, 2024
- Yuta Akasu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photovoltaic cell
- Patent number 12,166,143
- Issue date Dec 10, 2024
- STMicroelectronics S.r.l.
- Cosimo Gerardi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus, and me...
- Patent number 12,165,848
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Kenichi Oyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tuning threshold voltage through meta stable plasma treatment
- Patent number 12,148,620
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxide layer for oxidation resistance and method forming same
- Patent number 12,148,652
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and semiconductor devices
- Patent number 12,148,656
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsiao-Min Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sequential plasma and thermal treatment
- Patent number 12,142,475
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Seam removal in high aspect ratio gap-fill
- Patent number 12,142,480
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Qinghua Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor phase deposition of organic films
- Patent number 12,138,654
- Issue date Nov 12, 2024
- ASM IP Holding B.V.
- Viljami J. Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF pulsing assisted low-k film deposition with high mechanical stre...
- Patent number 12,125,675
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Ruitong Xiong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light treating member, substrate treating apparatus including the s...
- Patent number 12,125,720
- Issue date Oct 22, 2024
- Semes Co., Ltd.
- Oh Jin Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of modulating stress of dielectric layers
- Patent number 12,125,911
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method for forming the same
- Patent number 12,119,345
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chia-Ho Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single precursor low-k film deposition and UV cure for advanced tec...
- Patent number 12,119,223
- Issue date Oct 15, 2024
- Applied Materials, Inc.
- Bo Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sacrificial protection layer for environmentally sensitive surfaces...
- Patent number 12,119,218
- Issue date Oct 15, 2024
- Lam Research Corporation
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Highly etch selective amorphous carbon film
- Patent number 12,112,949
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for metal oxide post-treatment
- Patent number 12,110,589
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of post-deposition treatment for silicon oxide film
- Patent number 12,100,588
- Issue date Sep 24, 2024
- ASM IP Holding B.V.
- Toshiya Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chucking process
- Patent number 12,100,609
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment process to densify oxide layers
- Patent number 12,094,709
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Jung Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure
- Patent number 12,087,834
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch stop layer
- Patent number 12,087,572
- Issue date Sep 10, 2024
- Lam Research Corporation
- Bart J. van Schravendijk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuitry, memory arrays comprising strings of memory ce...
- Patent number 12,087,632
- Issue date Sep 10, 2024
- Micron Technology, Inc.
- Corey Staller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidative conversion in atomic layer deposition processes
- Patent number 12,087,574
- Issue date Sep 10, 2024
- Lam Research Corporation
- Douglas Walter Agnew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 12,082,421
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yu Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,080,553
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint method, method of manufacturing semiconductor device, and i...
- Patent number 12,072,622
- Issue date Aug 27, 2024
- Kioxia Corporation
- Hirokazu Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuitry, method used in the fabrication of a vertical...
- Patent number 12,057,493
- Issue date Aug 6, 2024
- Micron Technology, Inc.
- Masihhur R. Laskar
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION
- Publication number 20240420952
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Bhaskar Soman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DENSIFIED SEAM-FREE SILICON-CONTAINING MATERIAL GAP FILL PROCESSES
- Publication number 20240420950
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Xiang Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVING MECHANICAL STRENGTH OF LOW DIELEC...
- Publication number 20240420953
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Rui Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT PROCESS TO DENSIFY OXIDE LAYERS
- Publication number 20240404823
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Jung Chan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...
- Publication number 20240395541
- Publication date Nov 28, 2024
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICES
- Publication number 20240395609
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Min CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON OXIDE LAYER FOR OXIDATION RESISTANCE AND METHOD FORMING SAME
- Publication number 20240387238
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE HAVING CRYSTALLINE SEMICOND...
- Publication number 20240387169
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Chieh Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MODULATING STRESS OF DIELECTRIC LAYERS
- Publication number 20240387729
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT
- Publication number 20240387178
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARI...
- Publication number 20240387187
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Chun Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20240379349
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20240371630
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Hsuan Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE
- Publication number 20240371871
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIA-HO CHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240363349
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240363707
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wen HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240365561
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yu CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INORGANIC/HYBRID STRESS FILMS
- Publication number 20240363340
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Charlotte Cutler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR APPARATUS, POWER CONVERTER AND MANUFACTURING METHOD F...
- Publication number 20240355874
- Publication date Oct 24, 2024
- Mitsubishi Electric Corporation
- Atsufumi INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Circuitry, Method Used In The Fabrication Of A Vertical...
- Publication number 20240355909
- Publication date Oct 24, 2024
- Micron Technology, Inc.
- Masihhur R. Laskar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, ESTIMATION METHOD OF SUBSTRATE PROC...
- Publication number 20240355617
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Hiroshi Nakamura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MEMORY DEVICE WITH LOW DENSITY THERMAL BARRIER
- Publication number 20240347418
- Publication date Oct 17, 2024
- Micron Technology, Inc.
- Pengyuan Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEGMENTED FORMATION OF GATE INTERFACE
- Publication number 20240339318
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING DIELECTRIC FILMS WITH INCREASED STABILITY
- Publication number 20240332005
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Wenhui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOFT ASHING PROCESS FOR FORMING PROTECTIVE LAYER ON CONDUCTIVE CAP...
- Publication number 20240321582
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Guan-Xuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20240321571
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Daisuke OBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...
- Publication number 20240304438
- Publication date Sep 12, 2024
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING DIELECTRIC MATERIAL LAYER USING PLASMA
- Publication number 20240304441
- Publication date Sep 12, 2024
- ASM IP HOLDING B.V.
- Yoshio Susa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING THIN FILM AND APPARATUS FOR PROCESSING SUBSTRATE...
- Publication number 20240290586
- Publication date Aug 29, 2024
- WONIK IPS CO., LTD.
- Jae Hun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WARPAGE-REDUCING SEMICONDUCTOR STRUCTURE AND FABRICATING METHOD OF...
- Publication number 20240290731
- Publication date Aug 29, 2024
- UNITED MICROELECTRONICS CORP.
- Da-Jun Lin
- H01 - BASIC ELECTRIC ELEMENTS

treatment by exposure to a plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Cyclic spin-on coating process for forming dielectric material

Chuck assembly, planarization process, apparatus and method of manu...

Semiconductor device manufacturing method

Photovoltaic cell

Substrate processing method, substrate processing apparatus, and me...

Tuning threshold voltage through meta stable plasma treatment

Silicon oxide layer for oxidation resistance and method forming same

Method of manufacturing semiconductor device and semiconductor devices

Sequential plasma and thermal treatment

Seam removal in high aspect ratio gap-fill

Vapor phase deposition of organic films

RF pulsing assisted low-k film deposition with high mechanical stre...

Light treating member, substrate treating apparatus including the s...

Method of modulating stress of dielectric layers

Semiconductor structure and method for forming the same

Single precursor low-k film deposition and UV cure for advanced tec...

Sacrificial protection layer for environmentally sensitive surfaces...

Highly etch selective amorphous carbon film

Methods for metal oxide post-treatment

Method of post-deposition treatment for silicon oxide film

Electrostatic chucking process

Plasma treatment process to densify oxide layers

Semiconductor structure

Etch stop layer

Integrated circuitry, memory arrays comprising strings of memory ce...

Oxidative conversion in atomic layer deposition processes

Semiconductor device and method for manufacturing the same

Semiconductor device and method of manufacture

Imprint method, method of manufacturing semiconductor device, and i...

Integrated circuitry, method used in the fabrication of a vertical...

Patents Applicationslast 30 patents

NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION

DENSIFIED SEAM-FREE SILICON-CONTAINING MATERIAL GAP FILL PROCESSES

SYSTEMS AND METHODS FOR IMPROVING MECHANICAL STRENGTH OF LOW DIELEC...

PLASMA TREATMENT PROCESS TO DENSIFY OXIDE LAYERS

FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICES

SILICON OXIDE LAYER FOR OXIDATION RESISTANCE AND METHOD FORMING SAME

METHOD FOR FORMING SEMICONDUCTOR DEVICE HAVING CRYSTALLINE SEMICOND...

METHOD OF MODULATING STRESS OF DIELECTRIC LAYERS

TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT

METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARI...

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

SEMICONDUCTOR DEVICE STRUCTURE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR STRUCTURE

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

INORGANIC/HYBRID STRESS FILMS

SEMICONDUCTOR APPARATUS, POWER CONVERTER AND MANUFACTURING METHOD F...

Integrated Circuitry, Method Used In The Fabrication Of A Vertical...

SUBSTRATE PROCESSING APPARATUS, ESTIMATION METHOD OF SUBSTRATE PROC...

MEMORY DEVICE WITH LOW DENSITY THERMAL BARRIER

SEGMENTED FORMATION OF GATE INTERFACE

METHODS FOR DEPOSITING DIELECTRIC FILMS WITH INCREASED STABILITY

SOFT ASHING PROCESS FOR FORMING PROTECTIVE LAYER ON CONDUCTIVE CAP...

INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM

COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...

METHOD OF FORMING DIELECTRIC MATERIAL LAYER USING PLASMA

METHOD FOR FORMING THIN FILM AND APPARATUS FOR PROCESSING SUBSTRATE...

WARPAGE-REDUCING SEMICONDUCTOR STRUCTURE AND FABRICATING METHOD OF...