treatment to change the surface groups of the insulating layer

Industry

CPC
H01L21/02359

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02359treatment to change the surface groups of the insulating layer

Industries

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor-on-insulator (SOI) substrate and method for forming
- Patent number 12,062,539
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
- Patent number 12,033,852
- Issue date Jul 9, 2024
- Kokusai Electric Corporation
- Takayuki Waseda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 12,027,368
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Tien Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making high-voltage thick gate oxide
- Patent number 11,967,520
- Issue date Apr 23, 2024
- Hua Hong Semiconductor (Wuxi) Limited
- Junwen Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,887,861
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Jaewon Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of processing substrate and manufacturing semiconductor dev...
- Patent number 11,848,203
- Issue date Dec 19, 2023
- Kokusai Electric Corporation
- Takayuki Waseda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Isolation features and methods of fabricating the same
- Patent number 11,843,028
- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- I-Wen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,728,406
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- De-Wei Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET and gate-all-around FET with insulator having hydrophobic si...
- Patent number 11,721,739
- Issue date Aug 8, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Han Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor-on-insulator (SOI) substrate and method for forming
- Patent number 11,705,328
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 11,705,331
- Issue date Jul 18, 2023
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Interconnect structure for semiconductor device and methods of fabr...
- Patent number 11,610,841
- Issue date Mar 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ta Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flash memory containing air gaps
- Patent number 11,456,307
- Issue date Sep 27, 2022
- Semiconductor Manufacturing International (Shanghai) Corporation
- Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,417,518
- Issue date Aug 16, 2022
- Kokusai Electric Corporation
- Takayuki Waseda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure formation
- Patent number 11,404,267
- Issue date Aug 2, 2022
- Micron Technology, Inc.
- Santanu Sarkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for microwave treatment of dielectric films
- Patent number 11,343,884
- Issue date May 24, 2022
- Applied Materials, Inc.
- Iftikhar Ahmad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor-on-insulator (SOI) substrate and method for forming
- Patent number 11,289,330
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation features and methods of fabricating the same
- Patent number 11,239,309
- Issue date Feb 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- I-Wen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide semiconductor field effect transistor and method of man...
- Patent number 11,222,959
- Issue date Jan 11, 2022
- HRL Laboratories, LLC
- Jeong-Sun Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 11,211,246
- Issue date Dec 28, 2021
- JSR Corporation
- Hiroyuki Komatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
FinFET and gate-all-around FET with selective high-k oxide deposition
- Patent number 11,177,361
- Issue date Nov 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsung-Han Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 11,127,597
- Issue date Sep 21, 2021
- Tokyo Electron Limited
- Reiko Sasahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective deposition for BEOL dielectric etch
- Patent number 11,087,973
- Issue date Aug 10, 2021
- Tokyo Electron Limited
- Yannick Feurprier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aromatic amino siloxane functionalized materials for use in capping...
- Patent number 11,031,237
- Issue date Jun 8, 2021
- Merck Patent GmbH
- Sachin Bobade
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 10,950,438
- Issue date Mar 16, 2021
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 10,868,137
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- De-Wei Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structure for semiconductor device and methods of fabr...
- Patent number 10,777,504
- Issue date Sep 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Ta Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming FinFET and gate-all-around FET with selective hi...
- Patent number 10,672,879
- Issue date Jun 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsung-Han Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method of glass substrate having pit on surface t...
- Patent number 10,644,033
- Issue date May 5, 2020
- BOE Technology Group Co., Ltd.
- Donghui Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic electroluminescent display device
- Patent number 10,637,009
- Issue date Apr 28, 2020
- SAKAI DISPLAY PRODUCTS CORPORATION
- Katsuhiko Kishimoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20240395550
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Tien SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR-ON-INSULATOR (SOI) SUBSTRATE AND METHOD FOR FORMING
- Publication number 20240355618
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240258101
- Publication date Aug 1, 2024
- ASM IP HOLDING B.V.
- JiHye Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20240234133
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240112907
- Publication date Apr 4, 2024
- Kokusai Electric Corporation
- Shoma MIYATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS UNIFORMITY BY WAFER BACK SIDE DOPING
- Publication number 20240112904
- Publication date Apr 4, 2024
- SKYWORKS GLOBAL PTE. LTD.
- Kezia Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, MET...
- Publication number 20240071752
- Publication date Feb 29, 2024
- Kokusai Electric Corporation
- Takayuki WASEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20240047209
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Tien SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20230387219
- Publication date Nov 30, 2023
- RENESAS ELECTRONICS CORPORATION
- Futoshi KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURE TO REDUCE CURRENT L...
- Publication number 20230387312
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Yu YEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20230352563
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- De-Wei Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION
- Publication number 20230335612
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Han TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR-ON-INSULATOR (SOI) SUBSTRATE AND METHOD FOR FORMING
- Publication number 20230307231
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230097581
- Publication date Mar 30, 2023
- Kokusai Electric Corporation
- Yasutoshi TSUBOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230058808
- Publication date Feb 23, 2023
- Kokusai Electric Corporation
- Motomu DEGAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20220344153
- Publication date Oct 27, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Tien SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20220277955
- Publication date Sep 1, 2022
- Kokusai Electric Corporation
- Takayuki WASEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR-ON-INSULATOR (SOI) SUBSTRATE AND METHOD FOR FORMING
- Publication number 20220216053
- Publication date Jul 7, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MAKING HIGH-VOLTAGE THICK GATE OXIDE
- Publication number 20220189820
- Publication date Jun 16, 2022
- Hua Hong Semiconductor (Wuxi) Limited
- Junwen LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION
- Publication number 20220069098
- Publication date Mar 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Han TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Isolation Features and Methods of Fabricating the Same
- Publication number 20210273049
- Publication date Sep 2, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- I-Wen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20210202245
- Publication date Jul 1, 2021
- Kokusai Electric Corporation
- Takayuki WASEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR STRUCTURE FORMATION
- Publication number 20210202246
- Publication date Jul 1, 2021
- Micron Technology, Inc.
- Santanu Sarkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE
- Publication number 20210166935
- Publication date Jun 3, 2021
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Semiconductor Device and Method
- Publication number 20210134984
- Publication date May 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- De-Wei Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR-ON-INSULATOR (SOI) SUBSTRATE AND METHOD FOR FORMING
- Publication number 20210098253
- Publication date Apr 1, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20210035801
- Publication date Feb 4, 2021
- Kokusai Electric Corporation
- Takayuki WASEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION
- Publication number 20200303511
- Publication date Sep 24, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Han TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AROMATIC AMINO SILOXANE FUNCTIONALIZED MATERIALS FOR USE IN CAPPING...
- Publication number 20200273701
- Publication date Aug 27, 2020
- Merck Patent GmbH
- Sachin BOBADE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERCONNECT STRUCTURE FOR SEMICONDUCTOR DEVICE AND METHODS OF FABR...
- Publication number 20200161240
- Publication date May 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ta YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

treatment to change the surface groups of the insulating layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor-on-insulator (SOI) substrate and method for forming

Method of processing substrate, method of manufacturing semiconduct...

Method for fabricating semiconductor device

Method for making high-voltage thick gate oxide

Substrate processing method and substrate processing apparatus

Methods of processing substrate and manufacturing semiconductor dev...

Isolation features and methods of fabricating the same

Semiconductor device and method

FinFET and gate-all-around FET with insulator having hydrophobic si...

Semiconductor-on-insulator (SOI) substrate and method for forming

Method and composition for selectively modifying base material surface

Interconnect structure for semiconductor device and methods of fabr...

Flash memory containing air gaps

Method of manufacturing semiconductor device, substrate processing...

Semiconductor structure formation

Method and apparatus for microwave treatment of dielectric films

Semiconductor-on-insulator (SOI) substrate and method for forming

Isolation features and methods of fabricating the same

Metal oxide semiconductor field effect transistor and method of man...

Method and composition for selectively modifying base material surface

FinFET and gate-all-around FET with selective high-k oxide deposition

Etching method

Method of selective deposition for BEOL dielectric etch

Aromatic amino siloxane functionalized materials for use in capping...

Method and composition for selectively modifying base material surface

Semiconductor device and method

Interconnect structure for semiconductor device and methods of fabr...

Method for forming FinFET and gate-all-around FET with selective hi...

Surface treatment method of glass substrate having pit on surface t...

Organic electroluminescent display device

Patents Applicationslast 30 patents

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

SEMICONDUCTOR-ON-INSULATOR (SOI) SUBSTRATE AND METHOD FOR FORMING

SUBSTRATE PROCESSING METHOD

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

PLASMA PROCESS UNIFORMITY BY WAFER BACK SIDE DOPING

METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, MET...

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE HAVING ISOLATION STRUCTURE TO REDUCE CURRENT L...

Semiconductor Device and Method

FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION

SEMICONDUCTOR-ON-INSULATOR (SOI) SUBSTRATE AND METHOD FOR FORMING

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

SEMICONDUCTOR-ON-INSULATOR (SOI) SUBSTRATE AND METHOD FOR FORMING

METHOD FOR MAKING HIGH-VOLTAGE THICK GATE OXIDE

FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION

Isolation Features and Methods of Fabricating the Same

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

SEMICONDUCTOR STRUCTURE FORMATION

METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE

Semiconductor Device and Method

SEMICONDUCTOR-ON-INSULATOR (SOI) SUBSTRATE AND METHOD FOR FORMING

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION

AROMATIC AMINO SILOXANE FUNCTIONALIZED MATERIALS FOR USE IN CAPPING...

INTERCONNECT STRUCTURE FOR SEMICONDUCTOR DEVICE AND METHODS OF FABR...