Treatment with inorganic or organometallic reagents after imagewise removal

Industry

CPC
G03F7/405

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/405Treatment with inorganic or organometallic reagents after imagewise removal

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Method composition and methods thereof
- Patent number 12,211,698
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Siao-Shan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of antireflective surfaces
- Patent number 12,122,668
- Issue date Oct 22, 2024
- Brookhaven Science Associates, LLC
- Charles T. Black
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Extreme ultraviolet photolithography method with infiltration for e...
- Patent number 12,111,576
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Christine Y Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film vibration device and fabrication method thereof, and cleaning...
- Patent number 11,969,771
- Issue date Apr 30, 2024
- GUANGDONG UNIVERSITY OF TECHNOLOGY
- Yun Chen
- B08 - CLEANING
Information Patent Grant
Method for manufacturing a horology component
- Patent number 11,960,205
- Issue date Apr 16, 2024
- Rolex S.A.
- Florian Calame
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,921,428
- Issue date Mar 5, 2024
- Kioxia Corporation
- Yoshihiro Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a horology component
- Patent number 11,803,121
- Issue date Oct 31, 2023
- Rolex S.A.
- Florian Calame
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
- Patent number 11,796,916
- Issue date Oct 24, 2023
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of manufacturing fine pattern and method of manufacturing di...
- Patent number 11,718,082
- Issue date Aug 8, 2023
- Merck Patent GmbH
- Hirokazu Ikeda
- B32 - LAYERED PRODUCTS
Information Patent Grant
Extreme ultraviolet photolithography method with infiltration for e...
- Patent number 11,487,207
- Issue date Nov 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Christine Y Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photographic color image using black and while emulsion
- Patent number 11,467,483
- Issue date Oct 11, 2022
- Penumbra Foundation
- Eric Rosenthal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Formation of antireflective surfaces
- Patent number 11,390,518
- Issue date Jul 19, 2022
- Brookhaven Science Associates, LLC
- Charles T. Black
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Pattern forming material and pattern forming method
- Patent number 11,320,736
- Issue date May 3, 2022
- Kioxia Corporation
- Ryosuke Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and semiconductor manu...
- Patent number 11,217,431
- Issue date Jan 4, 2022
- Kioxia Corporation
- Ryuichi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and composition for improving LWR in patterning step using n...
- Patent number 11,187,985
- Issue date Nov 30, 2021
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making three dimensional structures using photolithograp...
- Patent number 11,143,959
- Issue date Oct 12, 2021
- Mercene Labs AB
- Carl Fredrik Carlborg
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Water-soluble diacetylene, photolithography composition comprising...
- Patent number 11,131,925
- Issue date Sep 28, 2021
- Industry-University Cooperation Foundation Hanyang University
- Jongman Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of using a surfactant-containing shrinkage material to preve...
- Patent number 11,086,221
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Chao Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqueous solution for resist pattern coating and pattern forming met...
- Patent number 11,009,795
- Issue date May 18, 2021
- NISSAN CHEMICAL CORPORATION
- Tokio Nishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
- Patent number 11,003,074
- Issue date May 11, 2021
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous processing method for flexographic printing plates
- Patent number 10,935,887
- Issue date Mar 2, 2021
- MIRACLON CORPORATION
- Donald L. Swihart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of sequential infiltration synthesis treatment of infiltrate...
- Patent number 10,928,731
- Issue date Feb 23, 2021
- ASM IP Holding B.V.
- Krzysztof Kachel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-adaptive halogen treatment to improve photoresist pattern and...
- Patent number 10,921,707
- Issue date Feb 16, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post development treatment method and material for shrinking critic...
- Patent number 10,915,027
- Issue date Feb 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet (EUV) lithography patterning methods utilizing...
- Patent number 10,901,317
- Issue date Jan 26, 2021
- International Business Machines Corporation
- Benjamin D. Briggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of antireflective surfaces
- Patent number 10,882,739
- Issue date Jan 5, 2021
- Brookhaven Science Associates, LLC
- Charles T. Black
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Pattern formation method and pattern formation material
- Patent number 10,877,374
- Issue date Dec 29, 2020
- TOSHIBA MEMORY CORPORATION
- Koji Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material composition and methods thereof
- Patent number 10,863,630
- Issue date Dec 8, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a chemical guiding structure on a substrate and...
- Patent number 10,845,705
- Issue date Nov 24, 2020
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Raluca Tiron
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Chemically amplified positive resist composition and pattern formin...
- Patent number 10,815,572
- Issue date Oct 27, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
AQUEOUS ACID DEVELOPMENT OR TREATMENT OF ORGANOMETALLIC PHOTORESIST
- Publication number 20250053092
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Nizan Kenane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMATION OF ANTIREFLECTIVE SURFACES
- Publication number 20250033955
- Publication date Jan 30, 2025
- Brookhaven Science Associates, LLC
- Charles T. Black
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD FOR SUPPRESSING COLLAPSE OF THREE-DIMENSIONAL STRUCTURE
- Publication number 20240199913
- Publication date Jun 20, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Fusayo SAEKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOGRAPHIC COLOR IMAGE USING BLACK AND WHITE EMULSION
- Publication number 20240126159
- Publication date Apr 18, 2024
- Penumbra Foundation
- Eric Rosenthal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM VIBRATION DEVICE AND FABRICATION METHOD THEREOF, AND CLEANING...
- Publication number 20230364657
- Publication date Nov 16, 2023
- Guangdong University of Technology
- Yun CHEN
- B08 - CLEANING
Information Patent Application
Photoresist and Method
- Publication number 20230154750
- Publication date May 18, 2023
- Taiwan Semiconductor Manufacturing CO.,LTD.
- Chih-Cheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Photolithography Method with Infiltration for E...
- Publication number 20230055135
- Publication date Feb 23, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Christine Y. Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPER AND METHODS OF USE
- Publication number 20230056958
- Publication date Feb 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzu-Yang LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMATION OF ANTIREFLECTIVE SURFACES
- Publication number 20220402754
- Publication date Dec 22, 2022
- Brookhaven Science Associates. LLC
- Charles T. BLACK
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
FABRICATION OF BLAZED DIFFRACTIVE OPTICS BY THROUGH-MASK OXIDATION
- Publication number 20220299685
- Publication date Sep 22, 2022
- PAUL SCHERRER INSTITUT
- Christian David
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD
- Publication number 20220221792
- Publication date Jul 14, 2022
- KIOXIA Corporation
- Ryosuke YAMAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS
- Publication number 20220206395
- Publication date Jun 30, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED M...
- Publication number 20220187712
- Publication date Jun 16, 2022
- BASF SE
- Szilard Csihony
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220181171
- Publication date Jun 9, 2022
- KIOXIA Corporation
- Yoshihiro UOZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION COMPRISING AN AMMONIA-ACTIVATED SILOXANE FOR AVOIDING P...
- Publication number 20220169956
- Publication date Jun 2, 2022
- BASF SE
- Chi Yueh Kao
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...
- Publication number 20210232047
- Publication date Jul 29, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF MANUFACTURING FINE PATTERN AND METHOD OF MANUFACTURING DI...
- Publication number 20210187930
- Publication date Jun 24, 2021
- Merck Patent GmbH
- Hirokazu IKEDA
- B32 - LAYERED PRODUCTS
Information Patent Application
CHEMICAL LIQUID, KIT, PATTERN FORMING METHOD, CHEMICAL LIQUID MANUF...
- Publication number 20210132503
- Publication date May 6, 2021
- FUJIFILM CORPORATION
- Tadashi OOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN-ON METAL OXIDE MATERIALS OF HIGH ETCH RESISTANCE USEFUL IN IMA...
- Publication number 20210109451
- Publication date Apr 15, 2021
- Merck Patent GmbH
- Huirong YAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Formation of Antireflective Surfaces
- Publication number 20210094821
- Publication date Apr 1, 2021
- Brookhaven Science Associates. LLC
- Charles T. BLACK
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
REDUCED FLOW RATE PROCESSING SYSTEM FOR FLEXOGRAPHIC PRINTING PLATE
- Publication number 20210096467
- Publication date Apr 1, 2021
- MIRACLON CORPORATION
- David Aviel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Using A Surfactant-Containing Shrinkage Material to Preve...
- Publication number 20200365645
- Publication date Nov 19, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Chao Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Composition and Methods Thereof
- Publication number 20200335349
- Publication date Oct 22, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Siao-Shan WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AQUEOUS PROCESSING METHOD FOR FLEXOGRAPHIC PRINTING PLATES
- Publication number 20200241422
- Publication date Jul 30, 2020
- MIRACLON CORPORATION
- Donald L. Swihart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING A HOROLOGY COMPONENT
- Publication number 20200201173
- Publication date Jun 25, 2020
- ROLEX S.A
- Florian Calame
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING A HOROLOGY COMPONENT
- Publication number 20200201172
- Publication date Jun 25, 2020
- ROLEX S.A
- Florian Calame
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FUNCTIONALIZED SOLID PARTICLES FOR SEQUESTERING METAL IONS
- Publication number 20200156961
- Publication date May 21, 2020
- International Business Machines Corporation
- Magi Mettry
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
MATERIAL COMPOSITION AND METHODS THEREOF
- Publication number 20200146154
- Publication date May 7, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Siao-Shan WANG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR PERFORMING A PHOTOLITHOGRAPHY PROCESS
- Publication number 20200135452
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Han KO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMING CONDUCTIVE VIAS USING A LIGHT GUIDE
- Publication number 20200004154
- Publication date Jan 2, 2020
- International Business Machines Corporation
- Gerald Bartley
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Treatment with inorganic or organometallic reagents after imagewise removal

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method composition and methods thereof

Formation of antireflective surfaces

Extreme ultraviolet photolithography method with infiltration for e...

Film vibration device and fabrication method thereof, and cleaning...

Method for manufacturing a horology component

Substrate processing method and substrate processing apparatus

Method for manufacturing a horology component

Pattern formation methods and photoresist pattern overcoat composit...

Method of manufacturing fine pattern and method of manufacturing di...

Extreme ultraviolet photolithography method with infiltration for e...

Photographic color image using black and while emulsion

Formation of antireflective surfaces

Pattern forming material and pattern forming method

Method of manufacturing semiconductor device and semiconductor manu...

Method and composition for improving LWR in patterning step using n...

Method for making three dimensional structures using photolithograp...

Water-soluble diacetylene, photolithography composition comprising...

Method of using a surfactant-containing shrinkage material to preve...

Aqueous solution for resist pattern coating and pattern forming met...

Pattern formation methods and photoresist pattern overcoat composit...

Aqueous processing method for flexographic printing plates

Method of sequential infiltration synthesis treatment of infiltrate...

Self-adaptive halogen treatment to improve photoresist pattern and...

Post development treatment method and material for shrinking critic...

Extreme ultraviolet (EUV) lithography patterning methods utilizing...

Formation of antireflective surfaces

Pattern formation method and pattern formation material

Material composition and methods thereof

Method for forming a chemical guiding structure on a substrate and...

Chemically amplified positive resist composition and pattern formin...

Patents Applicationslast 30 patents

AQUEOUS ACID DEVELOPMENT OR TREATMENT OF ORGANOMETALLIC PHOTORESIST

FORMATION OF ANTIREFLECTIVE SURFACES

METHOD FOR SUPPRESSING COLLAPSE OF THREE-DIMENSIONAL STRUCTURE

PHOTOGRAPHIC COLOR IMAGE USING BLACK AND WHITE EMULSION

FILM VIBRATION DEVICE AND FABRICATION METHOD THEREOF, AND CLEANING...

Photoresist and Method

Extreme Ultraviolet Photolithography Method with Infiltration for E...

PHOTORESIST DEVELOPER AND METHODS OF USE

FORMATION OF ANTIREFLECTIVE SURFACES

FABRICATION OF BLAZED DIFFRACTIVE OPTICS BY THROUGH-MASK OXIDATION

PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD

COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS

COMPOSITION FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED M...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

COMPOSITION COMPRISING AN AMMONIA-ACTIVATED SILOXANE FOR AVOIDING P...

PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...

METHOD OF MANUFACTURING FINE PATTERN AND METHOD OF MANUFACTURING DI...

CHEMICAL LIQUID, KIT, PATTERN FORMING METHOD, CHEMICAL LIQUID MANUF...

SPIN-ON METAL OXIDE MATERIALS OF HIGH ETCH RESISTANCE USEFUL IN IMA...

Formation of Antireflective Surfaces

REDUCED FLOW RATE PROCESSING SYSTEM FOR FLEXOGRAPHIC PRINTING PLATE

Method of Using A Surfactant-Containing Shrinkage Material to Preve...

Method Composition and Methods Thereof

AQUEOUS PROCESSING METHOD FOR FLEXOGRAPHIC PRINTING PLATES

METHOD FOR MANUFACTURING A HOROLOGY COMPONENT

METHOD FOR MANUFACTURING A HOROLOGY COMPONENT

FUNCTIONALIZED SOLID PARTICLES FOR SEQUESTERING METAL IONS

MATERIAL COMPOSITION AND METHODS THEREOF

METHOD FOR PERFORMING A PHOTOLITHOGRAPHY PROCESS

FORMING CONDUCTIVE VIAS USING A LIGHT GUIDE