uniformity

Industry

CPC
H01J2237/3323

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3323uniformity

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 12,249,493
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device
- Patent number 12,173,400
- Issue date Dec 24, 2024
- ASM IP Holding B.V.
- JaeMin Roh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scanning ion beam deposition and etch
- Patent number 12,176,178
- Issue date Dec 24, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition process apparatus and method of optimizin...
- Patent number 12,165,935
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Hung Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 12,148,597
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch uniformity improvement for single turn internal coil PVD chamber
- Patent number 12,136,544
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Anthony Chih-Tung Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing device and method for manufacturing same
- Patent number 12,136,540
- Issue date Nov 5, 2024
- LG Display Co., Ltd.
- Young Gon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve wafer edge uniformity
- Patent number 12,125,683
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Mingle Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic processing chamber baffle
- Patent number 12,119,209
- Issue date Oct 15, 2024
- Applied Materials, Inc.
- Udit S. Kotagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Movement systems for sputter coating of non-flat substrates
- Patent number 12,080,527
- Issue date Sep 3, 2024
- SOLERAS ADVANCED COATINGS BV
- Wilmert De Bosscher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck heater and manufacturing method therefor
- Patent number 12,040,209
- Issue date Jul 16, 2024
- MiCo Ceramics Ltd.
- Chul Ho Jung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device using plasma-enhanced...
- Patent number 12,027,364
- Issue date Jul 2, 2024
- Taiwan Carbon Nano Technology Corporation
- Tsung-Fu Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flim forming method of carbon-containing film by microwave plasma
- Patent number 12,018,375
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Ryota Ifuku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modular high-frequency source
- Patent number 12,002,654
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 11,967,505
- Issue date Apr 23, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Plasma generating device, substrate processing apparatus, and metho...
- Patent number 11,967,490
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Akihiro Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Faceplate with edge flow control
- Patent number 11,810,764
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Fang Ruan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition radial and edge profile tunability through independent c...
- Patent number 11,791,136
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Sanjeev Baluja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing device
- Patent number 11,767,589
- Issue date Sep 26, 2023
- ASM IP Holding B.V.
- JaeMin Roh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device, substrate processing apparatus, and metho...
- Patent number 11,749,510
- Issue date Sep 5, 2023
- Kokusai Electric Corporation
- Akihiro Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,664,199
- Issue date May 30, 2023
- ASM IP Holding B.V.
- JaeMin Roh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scanning ion beam etch
- Patent number 11,646,171
- Issue date May 9, 2023
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 11,637,015
- Issue date Apr 25, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Targeted heat control systems
- Patent number 11,600,470
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Venkata Sharat Chandra Parimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus including an off-axis lift-and-rotation unit a...
- Patent number 11,598,005
- Issue date Mar 7, 2023
- SanDisk Technologies LLC
- Shoichi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 11,594,401
- Issue date Feb 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 11,581,165
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Corrosion resistant ground shield of processing chamber
- Patent number 11,562,890
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-zone plasma-enhanced chemical vapor deposition apparatus and...
- Patent number 11,551,961
- Issue date Jan 10, 2023
- SanDisk Technologies LLC
- Shoichi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating device, substrate processing apparatus, and metho...
- Patent number 11,551,914
- Issue date Jan 10, 2023
- Kokusai Electric Corporation
- Akihiro Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250079134
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Tatsuya KUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS TO IMPROVE PROCESS NON-UNIFORMITY FOR SEMICONDUCTOR DIREC...
- Publication number 20250069859
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Edric H. TONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING CHAMBERS
- Publication number 20250062165
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Hung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAMINATE MANUFACTURING APPARATUS AND SELF-ASSEMBLED MONOLAYER FORMA...
- Publication number 20250011933
- Publication date Jan 9, 2025
- TORAY ENGINEERING CO., LTD.
- Naoto SUGANUMA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE
- Publication number 20250014878
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Andreas SCHMID
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250006462
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Morihito INAGAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR CLAMPING A SUBSTRATE ON A MONO-POLAR ELECTROSTATIC CH...
- Publication number 20240404861
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- SUSHIM KOSHTI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA DEPOSITION WITH ELECTROSTATIC CLAMPING
- Publication number 20240387226
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Aaron Blake MILLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND FILM FORMING APPARATUS
- Publication number 20240321551
- Publication date Sep 26, 2024
- Sony Semiconductor Solutions Corporation
- Kiyotaka TABUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20240282554
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Thai Cheng CHUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING IMPROVEMENT
- Publication number 20240266146
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Christopher S. OLSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...
- Publication number 20240249923
- Publication date Jul 25, 2024
- Kokusai Electric Corporation
- Akihiro SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW POWER PLASMA SYSTEM MONITOR METHOD
- Publication number 20240242946
- Publication date Jul 18, 2024
- SKY TECH INC.
- JING-CHENG LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ASSISTED FILM REMOVAL FOR WAFER FABRICATION
- Publication number 20240242939
- Publication date Jul 18, 2024
- Micron Technology, Inc.
- Chao Lin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240234105
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STABLE GROUND ANODE FOR THIN FILM PROCESSING
- Publication number 20240194464
- Publication date Jun 13, 2024
- INTEVAC, INC.
- Samuel D. Harkness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240194445
- Publication date Jun 13, 2024
- PSK INC.
- Chi Young LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL PART AND PROCESS CHAMBER HAVING THE SAME
- Publication number 20240186116
- Publication date Jun 6, 2024
- POINT ENGINEERING CO., LTD.
- Bum Mo AHN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER LINER FOR SUBSTRATE PROCESSING APPARATUS
- Publication number 20240150898
- Publication date May 9, 2024
- ASM IP HOLDING B.V.
- Yoshiyuki Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240136160
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240071748
- Publication date Feb 29, 2024
- ASM IP HOLDING B.V.
- SangHeon Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING DEVICE AND METHOD FOR MEASURING PARAMETERS OF A PIEZOELEC...
- Publication number 20240053301
- Publication date Feb 15, 2024
- Evatec AG
- Peter HORN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and a Method of Controlling Thickness Variation in a Mate...
- Publication number 20240014018
- Publication date Jan 11, 2024
- SPTS TECHNOLOGIES LIMITED
- Tony WILBY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE
- Publication number 20230399740
- Publication date Dec 14, 2023
- ASM IP HOLDING B.V.
- JaeMin Roh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...
- Publication number 20230272530
- Publication date Aug 31, 2023
- Applied Materials, Inc.
- Suhail ANWAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...
- Publication number 20230260785
- Publication date Aug 17, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...
- Publication number 20230238222
- Publication date Jul 27, 2023
- Kokusai Electric Corporation
- Akihiro SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20230230817
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INCREASING PLASMA UNIFORMITY IN A RECEPTACLE
- Publication number 20230223238
- Publication date Jul 13, 2023
- LAM RESEARCH CORPORATION
- Tongtong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230197408
- Publication date Jun 22, 2023
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for manufacturing semiconductor wafer with wafer chuck havin...

Substrate processing device

Scanning ion beam deposition and etch

Physical vapor deposition process apparatus and method of optimizin...

Multi-zone gas distribution systems and methods

Etch uniformity improvement for single turn internal coil PVD chamber

Substrate processing device and method for manufacturing same

Method to improve wafer edge uniformity

Dynamic processing chamber baffle

Movement systems for sputter coating of non-flat substrates

Electrostatic chuck heater and manufacturing method therefor

Method for manufacturing semiconductor device using plasma-enhanced...

Flim forming method of carbon-containing film by microwave plasma

Modular high-frequency source

Method for manufacturing sputtering target, method for forming oxid...

Plasma generating device, substrate processing apparatus, and metho...

Faceplate with edge flow control

Deposition radial and edge profile tunability through independent c...

Substrate processing device

Plasma generating device, substrate processing apparatus, and metho...

Substrate processing apparatus and substrate processing method

Scanning ion beam etch

Method for manufacturing sputtering target, method for forming oxid...

Targeted heat control systems

Deposition apparatus including an off-axis lift-and-rotation unit a...

Method for manufacturing semiconductor wafer with wafer chuck havin...

Multi-zone gas distribution systems and methods

Corrosion resistant ground shield of processing chamber

Multi-zone plasma-enhanced chemical vapor deposition apparatus and...

Plasma generating device, substrate processing apparatus, and metho...

Patents Applicationslast 30 patents

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

APPARATUS TO IMPROVE PROCESS NON-UNIFORMITY FOR SEMICONDUCTOR DIREC...

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING CHAMBERS

LAMINATE MANUFACTURING APPARATUS AND SELF-ASSEMBLED MONOLAYER FORMA...

WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE

SUBSTRATE PROCESSING METHOD

APPARATUS FOR CLAMPING A SUBSTRATE ON A MONO-POLAR ELECTROSTATIC CH...

REMOTE PLASMA DEPOSITION WITH ELECTROSTATIC CLAMPING

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND FILM FORMING APPARATUS

MODULAR HIGH-FREQUENCY SOURCE

PLASMA PROCESSING IMPROVEMENT

PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...

LOW POWER PLASMA SYSTEM MONITOR METHOD

PLASMA-ASSISTED FILM REMOVAL FOR WAFER FABRICATION

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

STABLE GROUND ANODE FOR THIN FILM PROCESSING

SUBSTRATE PROCESSING APPARATUS

METAL PART AND PROCESS CHAMBER HAVING THE SAME

CHAMBER LINER FOR SUBSTRATE PROCESSING APPARATUS

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

SUBSTRATE PROCESSING METHOD

MEASURING DEVICE AND METHOD FOR MEASURING PARAMETERS OF A PIEZOELEC...

Apparatus and a Method of Controlling Thickness Variation in a Mate...

SUBSTRATE PROCESSING DEVICE

LARGE-AREA HIGH-DENSITY PLASMA PROCESSING CHAMBER FOR FLAT PANEL DI...

METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...

PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...

DEPOSITION METHOD AND DEPOSITION APPARATUS

INCREASING PLASMA UNIFORMITY IN A RECEPTACLE

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...