Use of auxiliary reactants other than used for contributing to the composition of the main film

Industry

CPC
C23C16/45534

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/45534Use of auxiliary reactants other than used for contributing to the composition of the main film

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Step coverage using an inhibitor molecule for high aspect ratio str...
- Patent number 12,312,677
- Issue date May 27, 2025
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Wontae Noh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming metal silicon oxide and metal silicon oxynitride...
- Patent number 12,305,281
- Issue date May 20, 2025
- ASM IP Holding B.V.
- Takashi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for the generation of metal- or semimetal-containing films
- Patent number 12,297,534
- Issue date May 13, 2025
- BASF SE
- Sinja Verena Klenk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compounds and methods for selectively forming metal-containing films
- Patent number 12,297,537
- Issue date May 13, 2025
- Merck Patent GmbH
- Charith Nanayakkara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 12,283,479
- Issue date Apr 22, 2025
- ASM IP Holding B.V.
- JaeOk Ko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organometallic precursor compound
- Patent number 12,281,130
- Issue date Apr 22, 2025
- EGTM Co., Ltd.
- Sung Jun Ji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate for forming film containing silicon...
- Patent number 12,281,386
- Issue date Apr 22, 2025
- Kokusai Electric Corporation
- Kimihiko Nakatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method, method of manufacturing semiconductor...
- Patent number 12,278,108
- Issue date Apr 15, 2025
- Kokusai Electric Corporation
- Arito Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate and method of manufacturing semicond...
- Patent number 12,278,103
- Issue date Apr 15, 2025
- Kokusai Electric Corporation
- Takayuki Waseda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing tungsten or molybdenum films
- Patent number 12,252,787
- Issue date Mar 18, 2025
- Entegris, Inc.
- Robert Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming thin film
- Patent number 12,252,788
- Issue date Mar 18, 2025
- Soulbrain Co., Ltd.
- Changbong Yeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming structures including transition metal layers
- Patent number 12,241,158
- Issue date Mar 4, 2025
- ASM IP Holding B.V.
- Paul Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of iodine-containing carbon films
- Patent number 12,188,123
- Issue date Jan 7, 2025
- American Air Liquide, Inc.
- Phong Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrolysis electrode and preparation method therefor, electrolysi...
- Patent number 12,180,095
- Issue date Dec 31, 2024
- WUXI LITTLE SWAN ELECTRIC CO., LTD.
- Qingbo Yang
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Thermal atomic layer deposition of silicon-containing films
- Patent number 12,157,945
- Issue date Dec 3, 2024
- Lam Research Corporation
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective processing with etch residue-based inhibitors
- Patent number 12,131,909
- Issue date Oct 29, 2024
- Lam Research Corporation
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method
- Patent number 12,119,228
- Issue date Oct 15, 2024
- ASM IP Holding B.V.
- Chiyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
- Patent number 12,080,546
- Issue date Sep 3, 2024
- Kokusai Electric Corporation
- Kimihiko Nakatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,040,179
- Issue date Jul 16, 2024
- Kokusai Electric Corporation
- Takaaki Noda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective carbon deposition
- Patent number 12,037,686
- Issue date Jul 16, 2024
- Lam Research Corporation
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reducing agents for atomic layer deposition
- Patent number 12,031,209
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate treatment apparatus and manufacturing method of semicondu...
- Patent number 12,027,367
- Issue date Jul 2, 2024
- Kioxia Corporation
- Masayuki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate
- Patent number 12,024,777
- Issue date Jul 2, 2024
- Wonik IPS Co., Ltd.
- Dae Seong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and cleaning method
- Patent number 12,018,366
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Shingo Hishiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for selectively manufacturing material layer and target pattern
- Patent number 11,976,364
- Issue date May 7, 2024
- Industry-University Cooperation Foundation Hanyang University Erica Campus
- Tae Joo Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Void free low stress fill
- Patent number 11,978,666
- Issue date May 7, 2024
- Lam Research Corporation
- Anand Chandrashekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for nucleation of conductive nitride films
- Patent number 11,965,239
- Issue date Apr 23, 2024
- Entegris, Inc.
- Gavin Richards
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition of lithium boron comprising nanocomposite s...
- Patent number 11,946,139
- Issue date Apr 2, 2024
- UChicago Argonne, LLC
- Anil U. Mane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor structure
- Patent number 11,942,320
- Issue date Mar 26, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Kun Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced spatial ALD of metals through controlled precursor mixing
- Patent number 11,887,856
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS
- Publication number 20250179625
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF MOLYBDENUM
- Publication number 20250179635
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Shruti Vivek THOMBARE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE INHIBITION ATOMIC LAYER DEPOSITION
- Publication number 20250179632
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Tao ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AREA SELECTIVE DEPOSITION OF METALS FOR ELECTRONIC DEVICES
- Publication number 20250154643
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Kai-Hung Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF IODINE-CONTAINING CARBON FILMS
- Publication number 20250092518
- Publication date Mar 20, 2025
- American Air Liquide, Inc.
- Phong NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROLYSIS ELECTRODE AND PREPARATION METHOD THEREFOR, ELECTROLYSI...
- Publication number 20250066226
- Publication date Feb 27, 2025
- WUXI LITTLE SWAN ELECTRIC CO., LTD
- Qingbo YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD
- Publication number 20250051911
- Publication date Feb 13, 2025
- AIR WATER INC.
- Fumio KAWASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250043418
- Publication date Feb 6, 2025
- Kokusai Electric Corporation
- Kazuki NONOMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS
- Publication number 20250014904
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALI...
- Publication number 20250003067
- Publication date Jan 2, 2025
- Soulbrain Co., LTD
- Jae Sun JUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Particle Coating Apparatus And Method Of Coating Particle
- Publication number 20250003064
- Publication date Jan 2, 2025
- SEIKO EPSON CORPORATION
- Teruaki NANBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Particle Coating Apparatus And Method Of Coating Particle
- Publication number 20250003063
- Publication date Jan 2, 2025
- SEIKO EPSON CORPORATION
- Teruaki NANBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD
- Publication number 20240429055
- Publication date Dec 26, 2024
- ASM IP HOLDING B.V.
- Chiyu Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE CARBON DEPOSITION
- Publication number 20240368761
- Publication date Nov 7, 2024
- LAM RESEARCH CORPORATION
- Awnish GUPTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTI-DEPOSITION OBJECT FOR USE IN VACUUM ENVIRONMENT
- Publication number 20240337015
- Publication date Oct 10, 2024
- HIGHLIGHT TECH CORP.
- CHIEN-HSUN CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REDUCING INCUBATION PERIOD OF SILICON NITRIDE LAYER DEPO...
- Publication number 20240318311
- Publication date Sep 26, 2024
- ASM IP HOLDING B.V.
- Agung Setiadi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240312777
- Publication date Sep 19, 2024
- Kokusai Electric Corporation
- Shingo NOHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATE...
- Publication number 20240272547
- Publication date Aug 15, 2024
- Intel Corporation
- Charles Cameron Mokhtarzadeh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240254626
- Publication date Aug 1, 2024
- Tokyo Electron Limited
- Hiroki YAMADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240254625
- Publication date Aug 1, 2024
- Kokusai Electric Corporation
- Kimihiko NAKATANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VOID FREE LOW STRESS FILL
- Publication number 20240234208
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Anand Chandrashekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU FILM ANNEALING IN SUBSTRATE PROCESSING
- Publication number 20240167153
- Publication date May 23, 2024
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL THIN-FILM PRECURSOR COMPOSITION, METHOD OF FORMING THIN FILM...
- Publication number 20240145301
- Publication date May 2, 2024
- Soulbrain Co., LTD
- Chang Bong YEON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DEPOSITING VANADIUM METAL, STRUCTURE, DEVICE AND A DEPOSI...
- Publication number 20240093363
- Publication date Mar 21, 2024
- ASM IP HOLDING B.V.
- Charles Dezelah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF SILICON OXIDE ON METAL SURFACES
- Publication number 20240076775
- Publication date Mar 7, 2024
- ASM IP HOLDING B.V.
- Andrea Illiberi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, MET...
- Publication number 20240071752
- Publication date Feb 29, 2024
- Kokusai Electric Corporation
- Takayuki WASEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSORS FOR DEPOSITION OF MOLYBDENUM-CONTAINING FILMS
- Publication number 20240052486
- Publication date Feb 15, 2024
- LAM RESEARCH CORPORATION
- Kyle Jordan Blakeney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS
- Publication number 20240038539
- Publication date Feb 1, 2024
- LAM RESEARCH CORPORATION
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING TUNGSTEN OR MOLYBDENUM FILMS
- Publication number 20240035157
- Publication date Feb 1, 2024
- Entegris, Inc.
- Robert WRIGHT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION APPARATUS
- Publication number 20240011157
- Publication date Jan 11, 2024
- National Cheng Kung University
- Yu Chi CHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Use of auxiliary reactants other than used for contributing to the composition of the main film

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Step coverage using an inhibitor molecule for high aspect ratio str...

Method for forming metal silicon oxide and metal silicon oxynitride...

Process for the generation of metal- or semimetal-containing films

Compounds and methods for selectively forming metal-containing films

Substrate processing method

Organometallic precursor compound

Method of processing substrate for forming film containing silicon...

Substrate processing method, method of manufacturing semiconductor...

Method of processing substrate and method of manufacturing semicond...

Methods for depositing tungsten or molybdenum films

Method for forming thin film

Method for forming structures including transition metal layers

Deposition of iodine-containing carbon films

Electrolysis electrode and preparation method therefor, electrolysi...

Thermal atomic layer deposition of silicon-containing films

Selective processing with etch residue-based inhibitors

Deposition method

Method of processing substrate, method of manufacturing semiconduct...

Method of manufacturing semiconductor device, substrate processing...

Selective carbon deposition

Reducing agents for atomic layer deposition

Substrate treatment apparatus and manufacturing method of semicondu...

Method of processing substrate

Substrate processing apparatus and cleaning method

Method for selectively manufacturing material layer and target pattern

Void free low stress fill

Method for nucleation of conductive nitride films

Atomic layer deposition of lithium boron comprising nanocomposite s...

Method of manufacturing semiconductor structure

Enhanced spatial ALD of metals through controlled precursor mixing

Patents Applicationslast 30 patents

METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS

DEPOSITION OF MOLYBDENUM

SURFACE INHIBITION ATOMIC LAYER DEPOSITION

AREA SELECTIVE DEPOSITION OF METALS FOR ELECTRONIC DEVICES

DEPOSITION OF IODINE-CONTAINING CARBON FILMS

ELECTROLYSIS ELECTRODE AND PREPARATION METHOD THEREFOR, ELECTROLYSI...

FILM FORMING METHOD

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS

FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALI...

Particle Coating Apparatus And Method Of Coating Particle

Particle Coating Apparatus And Method Of Coating Particle

DEPOSITION METHOD

SELECTIVE CARBON DEPOSITION

ANTI-DEPOSITION OBJECT FOR USE IN VACUUM ENVIRONMENT

METHOD FOR REDUCING INCUBATION PERIOD OF SILICON NITRIDE LAYER DEPO...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATE...

FILM FORMING METHOD AND FILM FORMING APPARATUS

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

VOID FREE LOW STRESS FILL

IN-SITU FILM ANNEALING IN SUBSTRATE PROCESSING

METAL THIN-FILM PRECURSOR COMPOSITION, METHOD OF FORMING THIN FILM...

METHOD OF DEPOSITING VANADIUM METAL, STRUCTURE, DEVICE AND A DEPOSI...

SELECTIVE DEPOSITION OF SILICON OXIDE ON METAL SURFACES

METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, MET...

PRECURSORS FOR DEPOSITION OF MOLYBDENUM-CONTAINING FILMS

SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS

METHODS FOR DEPOSITING TUNGSTEN OR MOLYBDENUM FILMS

DEPOSITION APPARATUS