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G03F7/70666

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/70666using aerial image

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Metrology method and apparatus for of determining a complex-valued...
- Patent number 12,164,233
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Alexander Prasetya Konijnenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 12,092,965
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask inspection of a semiconductor specimen
- Patent number 11,983,867
- Issue date May 14, 2024
- Applied Materials Israel Ltd.
- Ariel Shkalim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for reducing resist model prediction errors
- Patent number 11,966,167
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Marleen Kooiman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology of semiconductor devices in electron micrographs using fa...
- Patent number 11,947,270
- Issue date Apr 2, 2024
- FEI Company
- Umesh Adiga
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model for calculating a stochastic variation in an arbitrary pattern
- Patent number 11,835,862
- Issue date Dec 5, 2023
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
3D structure inspection or metrology using deep learning
- Patent number 11,644,756
- Issue date May 9, 2023
- KLA Corp.
- Scott A. Young
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for the qualification of a mask for microlithography
- Patent number 11,460,785
- Issue date Oct 4, 2022
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window identifier
- Patent number 11,379,648
- Issue date Jul 5, 2022
- ASML Netherlands B.V.
- Frank Gang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask inspection of a semiconductor specimen
- Patent number 11,348,224
- Issue date May 31, 2022
- Applied Materials Israel Ltd.
- Ariel Shkalim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of guiding process models and inspection in a manufacturing...
- Patent number 11,183,434
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Yu Cao
- G05 - CONTROLLING REGULATING
Information Patent Grant
Model for calculating a stochastic variation in an arbitrary pattern
- Patent number 11,126,090
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography model calibration
- Patent number 11,061,318
- Issue date Jul 13, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Hsiang Lo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 11,003,093
- Issue date May 11, 2021
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Wafer holding device and projection microlithography system
- Patent number 10,948,833
- Issue date Mar 16, 2021
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for removing contamination from lithographic...
- Patent number 10,852,649
- Issue date Dec 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zi-Wen Chen
- G01 - MEASURING TESTING
Information Patent Grant
Method for the microlithographic production of microstructured comp...
- Patent number 10,802,403
- Issue date Oct 13, 2020
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for examining photolithographic masks and mask metrology app...
- Patent number 10,775,691
- Issue date Sep 15, 2020
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window identifier
- Patent number 10,755,025
- Issue date Aug 25, 2020
- ASML Netherlands B.V.
- Frank Gang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for determining a focus position of a lithography mask and m...
- Patent number 10,564,551
- Issue date Feb 18, 2020
- Carl Zeiss SMT GmbH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Model for calculating a stochastic variation in an arbitrary pattern
- Patent number 10,545,411
- Issue date Jan 28, 2020
- ASML Netherlands, B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and device for determining an OPC model
- Patent number 10,539,865
- Issue date Jan 21, 2020
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for removing contamination from lithographic...
- Patent number 10,534,279
- Issue date Jan 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zi-Wen Chen
- G01 - MEASURING TESTING
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 10,514,614
- Issue date Dec 24, 2019
- ASML Netherlands B.V.
- Venugopal Vellanki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for removing contamination from lithographic...
- Patent number 10,509,334
- Issue date Dec 17, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zi-Wen Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position detection method, position detection apparatus, lithograph...
- Patent number 10,503,079
- Issue date Dec 10, 2019
- Canon Kabushiki Kaisha
- Tadaki Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Criticality analysis augmented process window qualification sampling
- Patent number 10,503,078
- Issue date Dec 10, 2019
- KLA-Tencor Corporation
- Jagdish Chandra Saraswatula
- G01 - MEASURING TESTING
Information Patent Grant
Method for parameter determination and apparatus thereof
- Patent number 10,444,638
- Issue date Oct 15, 2019
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Estimation of data in metrology
- Patent number 10,429,746
- Issue date Oct 1, 2019
- ASML Netherlands B.V.
- Alexandru Onose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming apparatus, mark detecting apparatus, exposure appar...
- Patent number 10,409,173
- Issue date Sep 10, 2019
- Nikon Corporation
- Yuichi Shibazaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...
- Publication number 20240377723
- Publication date Nov 14, 2024
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...
- Publication number 20240361704
- Publication date Oct 31, 2024
- Carl Zeiss SMT GMBH
- Klaus Gwosch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MEASUREMENT APPARATUS AND OVERLAY MEASUREMENT METHOD
- Publication number 20240272560
- Publication date Aug 15, 2024
- AUROS Technology, Inc.
- Seong Yun CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN
- Publication number 20240160112
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXTRA TALL TARGET METROLOGY
- Publication number 20230324809
- Publication date Oct 12, 2023
- Yoram Uziel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20230259042
- Publication date Aug 17, 2023
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS
- Publication number 20230143750
- Publication date May 11, 2023
- International Business Machines Corporation
- Daniel Schmidt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT DETECTION
- Publication number 20230046682
- Publication date Feb 16, 2023
- ASML NETHERLANDS B.V.
- Fuming WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD FOR SUBSTRATE HAVING CONDUCTIVE PATTERN, MANUF...
- Publication number 20220400553
- Publication date Dec 15, 2022
- FUJIFILM CORPORATION
- Akio KATAYAMA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS
- Publication number 20220334493
- Publication date Oct 20, 2022
- ASML NETHERLANDS B.V.
- Jingjing LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS FOR OF DETERMINING A COMPLEX-VALUED...
- Publication number 20220299888
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Alexander Prasetya KONIJNENBERG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK INSPECTION OF A SEMICONDUCTOR SPECIMEN
- Publication number 20220254000
- Publication date Aug 11, 2022
- APPLIED MATERIALS ISRAEL LTD.
- Ariel SHKALIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING PATTERN IN A PATTERNING PROCESS
- Publication number 20220179321
- Publication date Jun 9, 2022
- ASML NETHERLANDS B.V.
- Ziyang MA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
3D STRUCTURE INSPECTION OR METROLOGY USING DEEP LEARNING
- Publication number 20220043357
- Publication date Feb 10, 2022
- KLA Corporation
- Scott A. Young
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN
- Publication number 20210405538
- Publication date Dec 30, 2021
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY OF SEMICONDUCTOR DEVICES IN ELECTRON MICROGRAPHS USING FA...
- Publication number 20210263430
- Publication date Aug 26, 2021
- FEI Company
- Umesh ADIGA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS VARIABILITY AWARE ADAPTIVE INSPECTION AND METROLOGY
- Publication number 20210255548
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Venugopal VELLANKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS WINDOW IDENTIFIER
- Publication number 20200372201
- Publication date Nov 26, 2020
- ASML NETHERLANDS B.V.
- Frank Gang CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING RESIST MODEL PREDICTION ERRORS
- Publication number 20200348598
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Marleen KOOIMAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR THE QUALIFICATION OF A MASK FOR MICROLITHOGRAPHY
- Publication number 20200285158
- Publication date Sep 10, 2020
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY MODEL CALIBRATION
- Publication number 20200278604
- Publication date Sep 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Hsiang LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN
- Publication number 20200159125
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUS FOR REMOVING CONTAMINATION FROM LITHOGRAPHIC...
- Publication number 20200150550
- Publication date May 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Zi-Wen CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS VARIABILITY AWARE ADAPTIVE INSPECTION AND METROLOGY
- Publication number 20200096871
- Publication date Mar 26, 2020
- ASML NETHERLANDS B.V.
- Venugopal VELLANKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS OF GUIDING PROCESS MODELS AND INSPECTION IN A MANUFACTURING...
- Publication number 20190348331
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Yu CAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN FORMING APPARATUS, MARK DETECTING APPARATUS, EXPOSURE APPAR...
- Publication number 20190155175
- Publication date May 23, 2019
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ESTIMATION OF DATA IN METROLOGY
- Publication number 20190129313
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Alexandru ONOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR REMOVING CONTAINMINATION FROM LITHOGRAPHI...
- Publication number 20190101838
- Publication date Apr 4, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Zi-Wen Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD HAVING SUBSTRATE AND SENSOR TABLES
- Publication number 20190086815
- Publication date Mar 21, 2019
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EXAMINING PHOTOLITHOGRAPHIC MASKS AND MASK METROLOGY APP...
- Publication number 20190079381
- Publication date Mar 14, 2019
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

using aerial image

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metrology method and apparatus for of determining a complex-valued...

Process variability aware adaptive inspection and metrology

Mask inspection of a semiconductor specimen

Systems and methods for reducing resist model prediction errors

Metrology of semiconductor devices in electron micrographs using fa...

Model for calculating a stochastic variation in an arbitrary pattern

3D structure inspection or metrology using deep learning

Method for the qualification of a mask for microlithography

Process window identifier

Mask inspection of a semiconductor specimen

Methods of guiding process models and inspection in a manufacturing...

Model for calculating a stochastic variation in an arbitrary pattern

Lithography model calibration

Process variability aware adaptive inspection and metrology

Wafer holding device and projection microlithography system

Methods and apparatus for removing contamination from lithographic...

Method for the microlithographic production of microstructured comp...

Method for examining photolithographic masks and mask metrology app...

Process window identifier

Method for determining a focus position of a lithography mask and m...

Model for calculating a stochastic variation in an arbitrary pattern

Method and device for determining an OPC model

Methods and apparatus for removing contamination from lithographic...

Process variability aware adaptive inspection and metrology

Methods and apparatus for removing contamination from lithographic...

Position detection method, position detection apparatus, lithograph...

Criticality analysis augmented process window qualification sampling

Method for parameter determination and apparatus thereof

Estimation of data in metrology

Pattern forming apparatus, mark detecting apparatus, exposure appar...

Patents Applicationslast 30 patents

COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...

METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...

OVERLAY MEASUREMENT APPARATUS AND OVERLAY MEASUREMENT METHOD

MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN

EXTRA TALL TARGET METROLOGY

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS

MASK DEFECT DETECTION

MANUFACTURING METHOD FOR SUBSTRATE HAVING CONDUCTIVE PATTERN, MANUF...

METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS

METROLOGY METHOD AND APPARATUS FOR OF DETERMINING A COMPLEX-VALUED...

MASK INSPECTION OF A SEMICONDUCTOR SPECIMEN

METHOD FOR DETERMINING PATTERN IN A PATTERNING PROCESS

3D STRUCTURE INSPECTION OR METROLOGY USING DEEP LEARNING

MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN

METROLOGY OF SEMICONDUCTOR DEVICES IN ELECTRON MICROGRAPHS USING FA...

PROCESS VARIABILITY AWARE ADAPTIVE INSPECTION AND METROLOGY

PROCESS WINDOW IDENTIFIER

SYSTEMS AND METHODS FOR REDUCING RESIST MODEL PREDICTION ERRORS

METHOD FOR THE QUALIFICATION OF A MASK FOR MICROLITHOGRAPHY

LITHOGRAPHY MODEL CALIBRATION

MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN

METHODS AND APPARATUS FOR REMOVING CONTAMINATION FROM LITHOGRAPHIC...

PROCESS VARIABILITY AWARE ADAPTIVE INSPECTION AND METROLOGY

METHODS OF GUIDING PROCESS MODELS AND INSPECTION IN A MANUFACTURING...

PATTERN FORMING APPARATUS, MARK DETECTING APPARATUS, EXPOSURE APPAR...

ESTIMATION OF DATA IN METROLOGY

METHODS AND APPARATUS FOR REMOVING CONTAINMINATION FROM LITHOGRAPHI...

LITHOGRAPHIC APPARATUS AND METHOD HAVING SUBSTRATE AND SENSOR TABLES

METHOD FOR EXAMINING PHOTOLITHOGRAPHIC MASKS AND MASK METROLOGY APP...