using an anti-reflective coating

Industry

CPC
H01L21/0276

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0276using an anti-reflective coating

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Chemical amplification methods and techniques for developable botto...
- Patent number 12,165,870
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Steven Scheer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tuning threshold voltage through meta stable plasma treatment
- Patent number 12,148,620
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating-type composition for forming organic film, patterning proce...
- Patent number 12,105,420
- Issue date Oct 1, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keisuke Niida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of patterning a substrate using a sidewall spacer etch mask
- Patent number 12,099,299
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Jodi Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a device with an extended via semiconductor stru...
- Patent number 12,087,627
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung Hsun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ambient controlled two-step thermal treatment for spin-on coating l...
- Patent number 12,087,592
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Fong Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Eight-transistor static random access memory, layout thereof, and m...
- Patent number 12,082,388
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shau-Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 12,072,629
- Issue date Aug 27, 2024
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Underlayer of multilayer structure and methods of use thereof
- Patent number 12,074,027
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Hong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device and patterning semicondu...
- Patent number 12,062,547
- Issue date Aug 13, 2024
- NANYA TECHNOLOGY CORPORATION
- Hsing Ou Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Amorphous boron nitride film and anti-reflection coating structure...
- Patent number 12,061,312
- Issue date Aug 13, 2024
- Samsung Electronics Co., Ltd.
- Taejin Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an integrated circuit using a patterned mask layer
- Patent number 12,027,370
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench etching process for photoresist line roughness improvement
- Patent number 12,020,933
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Lin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure and method of fabricating the same
- Patent number 12,015,068
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Bo-Wen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate using monolayers
- Patent number 12,015,077
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ju-Li Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming mask pattern, storage medium, and apparatus for...
- Patent number 12,002,676
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Takashi Yamauchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structure and manufacturing method for the same
- Patent number 12,002,709
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsiang-Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Passivation layer for protecting semiconductor structures
- Patent number 11,996,340
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yao-Wen Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate-all-around integrated circuit structures having embedded GeSnB...
- Patent number 11,990,513
- Issue date May 21, 2024
- Intel Corporation
- Cory Bomberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming contact holes with controlled local critical dimension unif...
- Patent number 11,978,631
- Issue date May 7, 2024
- Tokyo Electron Limited
- Junling Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,977,333
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithography method and photolithography system
- Patent number 11,959,864
- Issue date Apr 16, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Chi-Hung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 11,955,336
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing Hong Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making photolithography mask plate
- Patent number 11,947,255
- Issue date Apr 2, 2024
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Embedded memory with improved fill-in window
- Patent number 11,943,921
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 11,935,757
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ambient controlled two-step thermal treatment for spin-on coating l...
- Patent number 11,901,189
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Fong Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor arrangement and method of manufacture
- Patent number 11,894,425
- Issue date Feb 6, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Yun-Chi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,887,814
- Issue date Jan 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Mamoru Yakushiji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing layer-forming composition, and method for produc...
- Patent number 11,881,400
- Issue date Jan 23, 2024
- Central Glass Company, Limited
- Junya Nakatsuji
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT
- Publication number 20240387178
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AMBIENT CONTROLLED TWO-STEP THERMAL TREATMENT FOR SPIN-ON COATING L...
- Publication number 20240387188
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Fong Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE
- Publication number 20240387248
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuan-Wei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF
- Publication number 20240371640
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jing-Hong HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240369929
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing Hong HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EIGHT-TRANSISTOR STATIC RANDOM ACCESS MEMORY, LAYOUT THEREOF, AND M...
- Publication number 20240373615
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shau-Wei LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING SEMICONDUCTOR STRUCTURE
- Publication number 20240363360
- Publication date Oct 31, 2024
- NANYA TECHNOLOGY CORPORATION
- Hsing OU YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVAN...
- Publication number 20240347465
- Publication date Oct 17, 2024
- Intel Corporation
- Atul MADHAVAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist Underlayer Film Material, Pattern Forming Method, And Method...
- Publication number 20240337944
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TRENCH ETCHING PROCESS FOR PHOTORESIST LINE ROUGHNESS IMPROVEMENT
- Publication number 20240332020
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Lin HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING MASK PATTERN, STORAGE MEDIUM, AND APPARATUS FOR...
- Publication number 20240274438
- Publication date Aug 15, 2024
- TOKYO ELECTRON LIMITED
- Takashi YAMAUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, SEMICONDUCTOR MEMORY DEVICE, AND METHOD OF...
- Publication number 20240266170
- Publication date Aug 8, 2024
- Samsung Electronics Co., Ltd.
- Donghwan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ARRANGEMENT AND METHOD OF MANUFACTURE
- Publication number 20240258374
- Publication date Aug 1, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Yun-Chi WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Deposition of Passivating Layer During Spacer Etching
- Publication number 20240258108
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240248404
- Publication date Jul 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240249941
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing Hong HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240241445
- Publication date Jul 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20240231222
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- Kyungoh KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20240231230
- Publication date Jul 11, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL
- Publication number 20240192601
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzu-Yang LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING EMBEDDED GESNB...
- Publication number 20240186378
- Publication date Jun 6, 2024
- Intel Corporation
- Cory BOMBERGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240186148
- Publication date Jun 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Hao CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240134279
- Publication date Apr 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chieh-Hsin HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240116958
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240118618
- Publication date Apr 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chih HO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20240096625
- Publication date Mar 21, 2024
- NANYA TECHNOLOGY CORPORATION
- WEI-CHUAN FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240096623
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chieh-Hsin HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20240096624
- Publication date Mar 21, 2024
- NANYA TECHNOLOGY CORPORATION
- WEI-CHUAN FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel 3D NAND Memory Device And Method of Forming The Same
- Publication number 20240090223
- Publication date Mar 14, 2024
- Yangtze Memory Technologies Co., Ltd.
- Yali SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Double Patterning Method of Patterning a Substrate
- Publication number 20240087892
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS

using an anti-reflective coating

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Chemical amplification methods and techniques for developable botto...

Tuning threshold voltage through meta stable plasma treatment

Coating-type composition for forming organic film, patterning proce...

Method of patterning a substrate using a sidewall spacer etch mask

Method for forming a device with an extended via semiconductor stru...

Ambient controlled two-step thermal treatment for spin-on coating l...

Eight-transistor static random access memory, layout thereof, and m...

Resist underlayer film-forming composition containing novolac resin...

Underlayer of multilayer structure and methods of use thereof

Method of fabricating semiconductor device and patterning semicondu...

Amorphous boron nitride film and anti-reflection coating structure...

Method of forming an integrated circuit using a patterned mask layer

Trench etching process for photoresist line roughness improvement

Gate structure and method of fabricating the same

Metal gate using monolayers

Method for forming mask pattern, storage medium, and apparatus for...

Interconnect structure and manufacturing method for the same

Passivation layer for protecting semiconductor structures

Gate-all-around integrated circuit structures having embedded GeSnB...

Forming contact holes with controlled local critical dimension unif...

Semiconductor devices and methods of manufacturing

Photolithography method and photolithography system

Method of manufacturing a semiconductor device

Method for making photolithography mask plate

Embedded memory with improved fill-in window

Method of manufacturing a semiconductor device

Ambient controlled two-step thermal treatment for spin-on coating l...

Semiconductor arrangement and method of manufacture

Plasma processing method

Silicon-containing layer-forming composition, and method for produc...

Patents Applicationslast 30 patents

TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT

AMBIENT CONTROLLED TWO-STEP THERMAL TREATMENT FOR SPIN-ON COATING L...

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE

UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF

COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

EIGHT-TRANSISTOR STATIC RANDOM ACCESS MEMORY, LAYOUT THEREOF, AND M...

METHOD OF PATTERNING SEMICONDUCTOR STRUCTURE

CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVAN...

Resist Underlayer Film Material, Pattern Forming Method, And Method...

TRENCH ETCHING PROCESS FOR PHOTORESIST LINE ROUGHNESS IMPROVEMENT

METHOD FOR FORMING MASK PATTERN, STORAGE MEDIUM, AND APPARATUS FOR...

PATTERN FORMING METHOD, SEMICONDUCTOR MEMORY DEVICE, AND METHOD OF...

SEMICONDUCTOR ARRANGEMENT AND METHOD OF MANUFACTURE

Selective Deposition of Passivating Layer During Spacer Etching

Compound For Forming Metal-Containing Film, Composition For Forming...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Compound For Forming Metal-Containing Film, Composition For Forming...

PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL

GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING EMBEDDED GESNB...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Compound For Forming Metal-Containing Film, Composition For Forming...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE

Novel 3D NAND Memory Device And Method of Forming The Same

Double Patterning Method of Patterning a Substrate