using digital signal processors [DSP]

Industry

CPC
H01J2237/30411

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/30411using digital signal processors [DSP]

Industries

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam drawing device and method of controlling char...
- Patent number 11,694,875
- Issue date Jul 4, 2023
- Jeol Ltd.
- Masakazu Iwanaga
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Operating a particle beam device
- Patent number 11,501,948
- Issue date Nov 15, 2022
- Carl Zeiss Microscopy GmbH
- Luyang Han
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ion beam irradiation apparatus and program therefor
- Patent number 11,462,385
- Issue date Oct 4, 2022
- NISSIN ION EQUIPMENT CO., LTD.
- Shinya Takemura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device processing method and device processing apparatus
- Patent number 10,410,826
- Issue date Sep 10, 2019
- Hitachi, Ltd.
- Tetsufumi Kawamura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Charged particle beam drawing apparatus and charged particle beam d...
- Patent number 9,852,883
- Issue date Dec 26, 2017
- NuFlare Technology, Inc.
- Tomoo Motosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and processing device of conditioning electron gun
- Patent number 7,683,551
- Issue date Mar 23, 2010
- Nuflare Technology, Inc.
- Nobuo Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring ion beam position
- Patent number 7,417,242
- Issue date Aug 26, 2008
- Axcelis Technologies, Inc.
- Andrew M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for the automated process of in-situ lift-out
- Patent number 7,414,252
- Issue date Aug 19, 2008
- Omniprobe, Inc.
- Thomas M. Moore
- G01 - MEASURING TESTING
Information Patent Grant
Application of digital frequency and phase synthesis for control of...
- Patent number 7,402,821
- Issue date Jul 22, 2008
- Axcelis Technologies, Inc.
- David K. Bernhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for tuning an ion implanter system
- Patent number 7,397,047
- Issue date Jul 8, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for ion beam angle spread control for advanced applications
- Patent number 7,394,078
- Issue date Jul 1, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus for use in manufacturing of semiconducto...
- Patent number 7,365,347
- Issue date Apr 29, 2008
- Dongbu Electronics Co., Ltd.
- Jin Ha Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for fabricating three-dimensional microstructure
- Patent number 7,267,731
- Issue date Sep 11, 2007
- SII NanoTechnology Inc.
- Kouji Iwasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 7,218,985
- Issue date May 15, 2007
- Hitachi High-Technologies Corporation
- Hidemitsu Naya
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Apparatus, method and program for ion implantation simulation, and...
- Patent number 7,081,633
- Issue date Jul 25, 2006
- Kabushiki Kaisha Toshiba
- Hirotaka Amakawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus for monitoring ion-implantation input parameter in semico...
- Patent number 7,041,990
- Issue date May 9, 2006
- Samsung Electronics Co., Ltd.
- Jong-Pyo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 7,027,888
- Issue date Apr 11, 2006
- Hitachi High-Technologies Corporation
- Hidemitsu Naya
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Electron microscope observation system and observation method
- Patent number 6,956,212
- Issue date Oct 18, 2005
- Hitachi, Ltd.
- Hideo Todokoro
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 6,941,186
- Issue date Sep 6, 2005
- Hitachi High-Technologies Corporation
- Hidemitsu Naya
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Implanter tool process parameter auto pre-setup system
- Patent number 6,797,067
- Issue date Sep 28, 2004
- Macronix International Co., Ltd.
- Fong Yeh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of displaying, inspecting and modifying pattern for exposure
- Patent number 6,546,543
- Issue date Apr 8, 2003
- Fujitsu Limited
- Yasuo Manabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line edge and size definition in e-beam exposure
- Patent number 5,808,892
- Issue date Sep 15, 1998
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrahigh vacuum focused ion beam micromill and articles therefrom
- Patent number 5,721,687
- Issue date Feb 24, 1998
- The Regents of the University of California Office of Technology Transfer
- Bruce C. Lamartine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus and a method for electron beam exp...
- Patent number 5,644,138
- Issue date Jul 1, 1997
- Fujitsu Limited
- Shin-ichi Hamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of failure analysis with CAD layout navigation and FIB/SEM i...
- Patent number 5,561,293
- Issue date Oct 1, 1996
- Advanced Micro Devices, Inc.
- Yeng-Kaung Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-optical imaging system having controllable elements
- Patent number 5,519,216
- Issue date May 21, 1996
- Carl-Zeiss-Stiftung
- Gerd Benner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure method and apparatus
- Patent number 5,276,334
- Issue date Jan 4, 1994
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography system and method
- Patent number 5,173,582
- Issue date Dec 22, 1992
- Fujitsu Limited
- Kiichi Sakamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High accuracy, high flexibility, energy beam machining system
- Patent number 5,171,964
- Issue date Dec 15, 1992
- International Business Machines Corporation
- Michael A. Booke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam pattern generation apparatus and method
- Patent number 5,149,976
- Issue date Sep 22, 1992
- Hughes Aircraft Company
- Dale M. Sipma
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM IRRADIATION APPARATUS AND PROGRAM THEREFOR
- Publication number 20200312616
- Publication date Oct 1, 2020
- NISSIN ION EQUIPMENT CO., LTD.
- Shinya TAKEMURA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICE PROCESSING METHOD AND DEVICE PROCESSING APPARATUS
- Publication number 20190013179
- Publication date Jan 10, 2019
- Hitachi, Ltd
- Tetsufumi KAWAMURA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...
- Publication number 20170243718
- Publication date Aug 24, 2017
- NuFlare Technology, Inc.
- Tomoo MOTOSUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PROCESSING DEVICE OF CONDITIONING ELECTRON GUN
- Publication number 20080153376
- Publication date Jun 26, 2008
- NuFlare Technology, Inc.
- Nobuo MIYAMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
Application of digital frequency and phase synthesis for control of...
- Publication number 20070164237
- Publication date Jul 19, 2007
- Axcelis Technologies, Inc.
- David K. Bernhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Implanting a substrate using an ion beam
- Publication number 20060289800
- Publication date Dec 28, 2006
- Adrian John Murrell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricatiing three-dimensional microstructure by fib-cvd...
- Publication number 20060292709
- Publication date Dec 28, 2006
- Japan Science and Technology Agency
- Takayuki Hoshino
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Technique for tuning an ion implanter system
- Publication number 20060249696
- Publication date Nov 9, 2006
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimization of a utilization of an ion beam in a two-dimensional m...
- Publication number 20060243920
- Publication date Nov 2, 2006
- Andrew M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of measuring ion beam position
- Publication number 20060219955
- Publication date Oct 5, 2006
- Axcelis Technologies, Inc.
- Andrew M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for ion beam angle spread control for advanced applications
- Publication number 20060208204
- Publication date Sep 21, 2006
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor manufacturing apparatus
- Publication number 20060155414
- Publication date Jul 13, 2006
- Hitachi High-Technologies Corporation
- Hidemitsu Naya
- G05 - CONTROLLING REGULATING
Information Patent Application
Optimization of beam utilization
- Publication number 20060113489
- Publication date Jun 1, 2006
- Axcelis Technologies, Inc.
- Andrew M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for the automated process of in-situ lift-out
- Publication number 20060091325
- Publication date May 4, 2006
- Thomas M. Moore
- G01 - MEASURING TESTING
Information Patent Application
Multiple gas injection system for charged particle beam instruments
- Publication number 20060022136
- Publication date Feb 2, 2006
- Thomas M. Moore
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Ion implantation apparatus for use in manufacturing of semiconducto...
- Publication number 20050285539
- Publication date Dec 29, 2005
- DongbuAnam Semiconductor Inc.
- Jin Ha Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor manufacturing apparatus
- Publication number 20050270857
- Publication date Dec 8, 2005
- Hitachi High-Technologies Corporation
- Hidemitsu Naya
- G05 - CONTROLLING REGULATING
Information Patent Application
Ion implantation apparatus and method
- Publication number 20050244989
- Publication date Nov 3, 2005
- Takeshi Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus, method and program for ion implantation simulation, and...
- Publication number 20050184255
- Publication date Aug 25, 2005
- Semiconductor Leading Edge Technologies, Inc.
- Hirotaka Amakawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Electron microscope observation system and observation method
- Publication number 20050061975
- Publication date Mar 24, 2005
- Hideo Todokoro
- G01 - MEASURING TESTING
Information Patent Application
Method and system for fabricating three-diemensional microstructure
- Publication number 20040129351
- Publication date Jul 8, 2004
- Kouji Iwasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor manufacturing apparatus
- Publication number 20040125355
- Publication date Jul 1, 2004
- Hitachi High-Technologies Corporation
- Hidemitsu Naya
- G05 - CONTROLLING REGULATING
Information Patent Application
Apparatus for monitoring ion-implantation input parameter in semico...
- Publication number 20030001111
- Publication date Jan 2, 2003
- Samsung Electronics Co., Ltd.
- Jong-Pyo Kim
- H01 - BASIC ELECTRIC ELEMENTS

using digital signal processors [DSP]

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam drawing device and method of controlling char...

Operating a particle beam device

Ion beam irradiation apparatus and program therefor

Device processing method and device processing apparatus

Charged particle beam drawing apparatus and charged particle beam d...

Processing method and processing device of conditioning electron gun

Method of measuring ion beam position

Method and apparatus for the automated process of in-situ lift-out

Application of digital frequency and phase synthesis for control of...

Technique for tuning an ion implanter system

Technique for ion beam angle spread control for advanced applications

Ion implantation apparatus for use in manufacturing of semiconducto...

Method and system for fabricating three-dimensional microstructure

Semiconductor manufacturing apparatus

Apparatus, method and program for ion implantation simulation, and...

Apparatus for monitoring ion-implantation input parameter in semico...

Semiconductor manufacturing apparatus

Electron microscope observation system and observation method

Semiconductor manufacturing apparatus

Implanter tool process parameter auto pre-setup system

Method of displaying, inspecting and modifying pattern for exposure

Line edge and size definition in e-beam exposure

Ultrahigh vacuum focused ion beam micromill and articles therefrom

Electron beam exposure apparatus and a method for electron beam exp...

Method of failure analysis with CAD layout navigation and FIB/SEM i...

Electron-optical imaging system having controllable elements

Charged particle beam exposure method and apparatus

Charged particle beam lithography system and method

High accuracy, high flexibility, energy beam machining system

Charged particle beam pattern generation apparatus and method

Patents Applicationslast 30 patents

ION BEAM IRRADIATION APPARATUS AND PROGRAM THEREFOR

DEVICE PROCESSING METHOD AND DEVICE PROCESSING APPARATUS

CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...

PROCESSING METHOD AND PROCESSING DEVICE OF CONDITIONING ELECTRON GUN

Application of digital frequency and phase synthesis for control of...

Implanting a substrate using an ion beam

Method for fabricatiing three-dimensional microstructure by fib-cvd...

Technique for tuning an ion implanter system

Optimization of a utilization of an ion beam in a two-dimensional m...

Method of measuring ion beam position

Technique for ion beam angle spread control for advanced applications

Semiconductor manufacturing apparatus

Optimization of beam utilization

Method and apparatus for the automated process of in-situ lift-out

Multiple gas injection system for charged particle beam instruments

Ion implantation apparatus for use in manufacturing of semiconducto...

Semiconductor manufacturing apparatus

Ion implantation apparatus and method

Apparatus, method and program for ion implantation simulation, and...

Electron microscope observation system and observation method

Method and system for fabricating three-diemensional microstructure

Semiconductor manufacturing apparatus

Apparatus for monitoring ion-implantation input parameter in semico...