using electromagnetic radiations

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CPC
H01J2237/0047

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0047using electromagnetic radiations

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Thermal-aided inspection by advanced charge controller module in a...
- Patent number 12,125,669
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Ning Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal-aided inspection by advanced charge controller module in a...
- Patent number 11,728,131
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Ning Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an advanced charged controller for wafer i...
- Patent number 11,482,399
- Issue date Oct 25, 2022
- ASML Netherlands B.V.
- Jian Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam irradiation apparatus, charged particle beam...
- Patent number 10,790,110
- Issue date Sep 29, 2020
- NUFLARE TECHNOLOGY, INC.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for discharging an area that is scanned by an electron beam
- Patent number 10,153,126
- Issue date Dec 11, 2018
- Applied Materials Israel Ltd.
- Alex Goldenshtein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and devices for charge compensation
- Patent number 10,115,558
- Issue date Oct 30, 2018
- Carl Zeiss Microscopy GmbH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral...
- Patent number 10,109,451
- Issue date Oct 23, 2018
- Applied Materials, Inc.
- Georg Jost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint method, chip production process, and imprint apparatus
- Patent number 8,828,307
- Issue date Sep 9, 2014
- Canon Kabushiki Kaisha
- Shingo Okushima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron-beam dimension measuring apparatus and electron-beam dimen...
- Patent number 8,530,836
- Issue date Sep 10, 2013
- Advantest Corp.
- Masayuki Kuribara
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for charged particle beam inspection
- Patent number 8,368,018
- Issue date Feb 5, 2013
- Ebara Corporation
- Masahiro Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam inspection method and electron beam inspection apparatus
- Patent number 8,288,722
- Issue date Oct 16, 2012
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus, method of adjusting astigmatism us...
- Patent number 8,013,315
- Issue date Sep 6, 2011
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection method and electron beam inspection apparatus
- Patent number 7,863,565
- Issue date Jan 4, 2011
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system of fine pattern for process control by charged par...
- Patent number 7,679,056
- Issue date Mar 16, 2010
- Hitachi High-Technologies Corporation
- Hiromasa Yamanashi
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for scanning and measurement by electron beam
- Patent number 7,655,906
- Issue date Feb 2, 2010
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- G01 - MEASURING TESTING
Information Patent Grant
Surface-potential distribution measuring apparatus, image carrier,...
- Patent number 7,612,570
- Issue date Nov 3, 2009
- Ricoh Company, Limited
- Hiroyuki Suhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern defect inspection method and apparatus thereof
- Patent number 7,547,884
- Issue date Jun 16, 2009
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Electron microscope application apparatus and sample inspection method
- Patent number 7,501,625
- Issue date Mar 10, 2009
- Hitachi High-Technologies Corporation
- Hikaru Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system and inspection process for wafer with circuit usi...
- Patent number 6,753,524
- Issue date Jun 22, 2004
- Hitachi, Ltd.
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample processing apparatus and method for removing charge on sampl...
- Patent number 6,507,029
- Issue date Jan 14, 2003
- Hitachi, Ltd.
- Norimasa Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for observing or processing and analyzing usin...
- Patent number 6,476,387
- Issue date Nov 5, 2002
- Hitachi, Ltd.
- Norimasa Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge neutralization of electron beam systems
- Patent number 6,465,795
- Issue date Oct 15, 2002
- Applied Materials, Inc.
- Juan R. Madonado
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting or measuring a sample based on...
- Patent number 6,465,781
- Issue date Oct 15, 2002
- Hitachi, Ltd.
- Norimasa Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for control of surface potential
- Patent number 5,432,345
- Issue date Jul 11, 1995
- Michael A. Kelly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chucking method
- Patent number 5,221,450
- Issue date Jun 22, 1993
- Kabushiki Kaisha Toshiba
- Kei Hattori
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
THERMAL-AIDED INSPECTION BY ADVANCED CHARGE CONTROLLER MODULE IN A...
- Publication number 20230395352
- Publication date Dec 7, 2023
- ASML NETHERLANDS B.V.
- Ning YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM MANIPULATION OF ADVANCED CHARGE CONTROLLER MODULE IN A CHARGED...
- Publication number 20220351932
- Publication date Nov 3, 2022
- ASML NETHERLANDS B.V.
- Jian ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL-AIDED INSPECTION BY ADVANCED CHARGE CONTROLLER MODULE IN A...
- Publication number 20220189733
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Ning YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN ADVANCED CHARGED CONTROLLER FOR WAFER I...
- Publication number 20200273662
- Publication date Aug 27, 2020
- ASML Netherlands B.V.
- Jian ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR OPERATING THE...
- Publication number 20200098595
- Publication date Mar 26, 2020
- NANYA TECHNOLOGY CORPORATION
- Chung-Lin HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Irradiation Apparatus, Charged Particle Beam...
- Publication number 20190304737
- Publication date Oct 3, 2019
- NUFLARE TECHNOLOGY, INC.
- Munehiro OGASAWARA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS CONFIGURED FOR ENHANCED VACUUM ULTRAVIOLET (VUV) SPECTRAL...
- Publication number 20180233317
- Publication date Aug 16, 2018
- Applied Materials, Inc.
- Georg JOST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR DISCHARGING AN AREA THAT IS SCANNED BY AN ELECTRON BEAM
- Publication number 20170250052
- Publication date Aug 31, 2017
- APPLIED MATERIALS ISRAEL LTD.
- Alex GOLDENSHTEIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM INSPECTION
- Publication number 20130119251
- Publication date May 16, 2013
- Kabushiki Kaisha Toshiba
- Masahiro Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam inspection method and electron beam inspection apparatus
- Publication number 20110068267
- Publication date Mar 24, 2011
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM INSPECTION
- Publication number 20100019147
- Publication date Jan 28, 2010
- EBARA CORPORATION
- Masahiro Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR GENERATING CHARGED P...
- Publication number 20100006756
- Publication date Jan 14, 2010
- Norimichi Anazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron-beam dimension measuring apparatus and electron-beam dimen...
- Publication number 20090242800
- Publication date Oct 1, 2009
- Masayuki Kuribara
- G01 - MEASURING TESTING
Information Patent Application
IMPRINT METHOD, CHIP PRODUCTION PROCESS, AND IMPRINT APPARATUS
- Publication number 20090098688
- Publication date Apr 16, 2009
- Canon Kabushiki Kaisha
- Shingo Okushima
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Electron beam inspection method and electron beam inspection apparatus
- Publication number 20080315093
- Publication date Dec 25, 2008
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
Charged particle beam apparatus, method of adjusting astigmatism us...
- Publication number 20080099697
- Publication date May 1, 2008
- EBARA CORPORATION
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE-POTENTIAL DISTRIBUTION MEASURING APPARATUS, IMAGE CARRIER,...
- Publication number 20080056746
- Publication date Mar 6, 2008
- Hiroyuki Suhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology System of Fine pattern for Process Control by Charged Par...
- Publication number 20070221844
- Publication date Sep 27, 2007
- Hiromasa Yamanashi
- G01 - MEASURING TESTING
Information Patent Application
Pattern defect inspection method and apparatus thereof
- Publication number 20070085005
- Publication date Apr 19, 2007
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for scanning and measurement by electron beam
- Publication number 20070040118
- Publication date Feb 22, 2007
- Zhaohui Cheng
- G01 - MEASURING TESTING
Information Patent Application
Electron microscope application apparatus and sample inspection method
- Publication number 20060289755
- Publication date Dec 28, 2006
- Hikaru Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system and inspection process for wafer with circuit usi...
- Publication number 20030094572
- Publication date May 22, 2003
- Hitachi, Ltd.
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomically thin highly resistive barrier layer in a copper via
- Publication number 20020117399
- Publication date Aug 29, 2002
- APPLIED MATERIALS, INC.
- Fusen Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

using electromagnetic radiations

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Thermal-aided inspection by advanced charge controller module in a...

Thermal-aided inspection by advanced charge controller module in a...

Method and apparatus for an advanced charged controller for wafer i...

Charged particle beam irradiation apparatus, charged particle beam...

System for discharging an area that is scanned by an electron beam

Methods and devices for charge compensation

Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral...

Imprint method, chip production process, and imprint apparatus

Electron-beam dimension measuring apparatus and electron-beam dimen...

Method and apparatus for charged particle beam inspection

Electron beam inspection method and electron beam inspection apparatus

Charged particle beam apparatus, method of adjusting astigmatism us...

Electron beam inspection method and electron beam inspection apparatus

Metrology system of fine pattern for process control by charged par...

Method and apparatus for scanning and measurement by electron beam

Surface-potential distribution measuring apparatus, image carrier,...

Pattern defect inspection method and apparatus thereof

Electron microscope application apparatus and sample inspection method

Inspection system and inspection process for wafer with circuit usi...

Sample processing apparatus and method for removing charge on sampl...

Method and apparatus for observing or processing and analyzing usin...

Charge neutralization of electron beam systems

Method and apparatus for inspecting or measuring a sample based on...

Method and apparatus for control of surface potential

Electrostatic chucking method

Patents Applicationslast 30 patents

THERMAL-AIDED INSPECTION BY ADVANCED CHARGE CONTROLLER MODULE IN A...

BEAM MANIPULATION OF ADVANCED CHARGE CONTROLLER MODULE IN A CHARGED...

THERMAL-AIDED INSPECTION BY ADVANCED CHARGE CONTROLLER MODULE IN A...

METHOD AND APPARATUS FOR AN ADVANCED CHARGED CONTROLLER FOR WAFER I...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR OPERATING THE...

Charged Particle Beam Irradiation Apparatus, Charged Particle Beam...

APPARATUS CONFIGURED FOR ENHANCED VACUUM ULTRAVIOLET (VUV) SPECTRAL...

SYSTEM FOR DISCHARGING AN AREA THAT IS SCANNED BY AN ELECTRON BEAM

METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM INSPECTION

Electron beam inspection method and electron beam inspection apparatus

METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM INSPECTION

CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR GENERATING CHARGED P...

Electron-beam dimension measuring apparatus and electron-beam dimen...

IMPRINT METHOD, CHIP PRODUCTION PROCESS, AND IMPRINT APPARATUS

Electron beam inspection method and electron beam inspection apparatus

Charged particle beam apparatus, method of adjusting astigmatism us...

SURFACE-POTENTIAL DISTRIBUTION MEASURING APPARATUS, IMAGE CARRIER,...

Metrology System of Fine pattern for Process Control by Charged Par...

Pattern defect inspection method and apparatus thereof

Method and apparatus for scanning and measurement by electron beam

Electron microscope application apparatus and sample inspection method

Inspection system and inspection process for wafer with circuit usi...

Atomically thin highly resistive barrier layer in a copper via