using latent image

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CPC
G03F7/70675

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70675using latent image

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Determining pattern ranking based on measurement feedback from prin...
- Patent number 12,038,694
- Issue date Jul 16, 2024
- ASML Netherlands B.V.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining pattern ranking based on measurement feedback from prin...
- Patent number 11,635,699
- Issue date Apr 25, 2023
- ASML Netherlands B.V.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting a target feature in a model of a patterning pr...
- Patent number 11,619,884
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of detecting printing defects on photoresist patterns
- Patent number 11,187,976
- Issue date Nov 30, 2021
- SK hynix Inc.
- Jun Taek Park
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of detecting printing defects on photoresist patterns
- Patent number 10,802,396
- Issue date Oct 13, 2020
- SK hynix Inc.
- Jun Taek Park
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate measurement recipe design of, or for, a target including...
- Patent number 10,578,982
- Issue date Mar 3, 2020
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image log slope (ILS) optimization
- Patent number 10,394,131
- Issue date Aug 27, 2019
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for predicting line width rou...
- Patent number 10,386,730
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Steve Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 10,303,068
- Issue date May 28, 2019
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Pattern forming apparatus and pattern forming method, movable body...
- Patent number 10,139,738
- Issue date Nov 27, 2018
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming apparatus and pattern forming method, movable body...
- Patent number 10,088,759
- Issue date Oct 2, 2018
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming apparatus and pattern forming method, movable body...
- Patent number 10,012,913
- Issue date Jul 3, 2018
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 9,709,902
- Issue date Jul 18, 2017
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming apparatus and pattern forming method, movable body...
- Patent number 9,690,214
- Issue date Jun 27, 2017
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology for measurement of photosensitizer concentration within p...
- Patent number 9,519,227
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Michael A. Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 9,442,393
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic focus and dose measurement using a 2-D target
- Patent number 9,436,099
- Issue date Sep 6, 2016
- ASML Netherlands B.V.
- Christian Marinus Leewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monitoring apparatus and method particularly useful in photolithogr...
- Patent number 9,291,911
- Issue date Mar 22, 2016
- Nova Measuring Instruments Ltd.
- Giora Dishon
- G01 - MEASURING TESTING
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 9,046,792
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Harmonic resist model for use in a lithographic apparatus and a dev...
- Patent number 8,942,463
- Issue date Jan 27, 2015
- ASML Netherlands B.V.
- Yu Cao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern forming apparatus and pattern forming method, movable body...
- Patent number 8,908,145
- Issue date Dec 9, 2014
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic focus and dose measurement using a 2-D target
- Patent number 8,891,061
- Issue date Nov 18, 2014
- ASML Netherlands B.V.
- Christian Marinus Leewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Harmonic resist model for use in a lithographic apparatus and a dev...
- Patent number 8,682,059
- Issue date Mar 25, 2014
- ASML Netherlands B.V.
- Yu Cao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Monitoring apparatus and method particularly useful in photolithogr...
- Patent number 8,482,715
- Issue date Jul 9, 2013
- Nova Measuring Instruments Ltd.
- Giora Dishon
- G01 - MEASURING TESTING
Information Patent Grant
Harmonic resist model for use in a lithographic apparatus and a dev...
- Patent number 8,447,095
- Issue date May 21, 2013
- ASML Netherlands B.V.
- Yu Cao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for performing lithography verification for a dou...
- Patent number 8,132,128
- Issue date Mar 6, 2012
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for generating a calibrated p...
- Patent number 8,120,753
- Issue date Feb 21, 2012
- ASML Masktools B.V.
- Gabriel Berger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for predicting line width rou...
- Patent number 8,050,898
- Issue date Nov 1, 2011
- ASML Masktools B.V.
- Steve Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining a process model that models th...
- Patent number 7,934,176
- Issue date Apr 26, 2011
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for measuring surface potential distribution, met...
- Patent number 7,869,725
- Issue date Jan 11, 2011
- Ricoh Company, Ltd.
- Hiroyuki Suhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMET...
- Publication number 20240152060
- Publication date May 9, 2024
- ASML NETHERLANDS B.V.
- Patrick Philipp HELFENSTEIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT...
- Publication number 20230341762
- Publication date Oct 26, 2023
- Canon Kabushiki Kaisha
- KEIJI MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...
- Publication number 20230244151
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING PATTERN RANKING BASED ON MEASUREMENT FEEDBACK FROM PRIN...
- Publication number 20230236512
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Youping ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SIMULTANEOUS IN PROCESS METROLOGY FOR CLUSTER TOOL ARCHITECTURE
- Publication number 20230032146
- Publication date Feb 2, 2023
- Applied Materials, Inc.
- Kirankumar Neelasandra SAVANDAIAH
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMET...
- Publication number 20230004096
- Publication date Jan 5, 2023
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC PATTERNING METHOD AND SYSTEM THEREFORE
- Publication number 20220057720
- Publication date Feb 24, 2022
- NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO
- Diederik Jan MAAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...
- Publication number 20220050387
- Publication date Feb 17, 2022
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING PATTERN RANKING BASED ON MEASUREMENT FEEDBACK FROM PRIN...
- Publication number 20220043356
- Publication date Feb 10, 2022
- ASML NETHERLANDS B.V.
- Youping ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETECTING PRINTING DEFECTS ON PHOTORESIST PATTERNS
- Publication number 20200409256
- Publication date Dec 31, 2020
- SK HYNIX INC.
- Jun Taek PARK
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE MEASUREMENT RECIPE DESIGN OF, OR FOR, A TARGET INCLUDING...
- Publication number 20190171116
- Publication date Jun 6, 2019
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD, MOVABLE BODY...
- Publication number 20180364592
- Publication date Dec 20, 2018
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD, MOVABLE BODY...
- Publication number 20170371252
- Publication date Dec 28, 2017
- Nikon Corporation
- Yuichi Shibazaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...
- Publication number 20170371251
- Publication date Dec 28, 2017
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD, MOVABLE BODY...
- Publication number 20170363971
- Publication date Dec 21, 2017
- Nikon Corporation
- Yuichi Shibazaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD, MOVABLE BODY...
- Publication number 20170261865
- Publication date Sep 14, 2017
- Nikon Corporation
- Yuichi Shibazaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...
- Publication number 20150042975
- Publication date Feb 12, 2015
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGR...
- Publication number 20140320837
- Publication date Oct 30, 2014
- Giora DISHON
- G01 - MEASURING TESTING
Information Patent Application
Lithographic Focus and Dose Measurement Using A 2-D Target
- Publication number 20140247434
- Publication date Sep 4, 2014
- ASML NETHERLANDS B.V.
- Christian Marinus LEEWIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARMONIC RESIST MODEL FOR USE IN A LITHOGRAPHIC APPARATUS AND A DEV...
- Publication number 20140198972
- Publication date Jul 17, 2014
- ASML NETHERLANDS B.V.
- Yu CAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGR...
- Publication number 20130293872
- Publication date Nov 7, 2013
- Giora DISHON
- G01 - MEASURING TESTING
Information Patent Application
HARMONIC RESIST MODEL FOR USE IN A LITHOGRAPHIC APPARATUS AND A DEV...
- Publication number 20130251237
- Publication date Sep 26, 2013
- ASML NETHERLANDS B.V.
- Yu CAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Projection Exposure Tool for Microlithography and Method for Microl...
- Publication number 20130252146
- Publication date Sep 26, 2013
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
Method, Program Product and Apparatus for Predicting Line Width Rou...
- Publication number 20120109607
- Publication date May 3, 2012
- ASML Mask Tools B.V.
- Steve Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Focus and Dose Measurement Using A 2-D Target
- Publication number 20110249244
- Publication date Oct 13, 2011
- ASML NETHERLANDS B.V.
- Christian Marinus Leewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGR...
- Publication number 20110037957
- Publication date Feb 17, 2011
- NOVA MEASURING INSTRUMENTS LTD.
- Giora Dishon
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND SYSTEMS FOR CONTROLLING VARIATION IN DIMENSIONS OF PATT...
- Publication number 20100279213
- Publication date Nov 4, 2010
- KLA-Tencor Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND DEVICE FOR MEASURING SURFACE POTENTIAL DISTRIBUTION, MET...
- Publication number 20100239319
- Publication date Sep 23, 2010
- Hiroyuki Suhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING A PROCESS MODEL THAT MODELS TH...
- Publication number 20100218160
- Publication date Aug 26, 2010
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODELING MASK CORNER ROUNDING EFFECTS USING MULTIPLE MASK LAYERS
- Publication number 20100146476
- Publication date Jun 10, 2010
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

using latent image

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Determining pattern ranking based on measurement feedback from prin...

Determining pattern ranking based on measurement feedback from prin...

Method for adjusting a target feature in a model of a patterning pr...

Methods of detecting printing defects on photoresist patterns

Methods of detecting printing defects on photoresist patterns

Substrate measurement recipe design of, or for, a target including...

Image log slope (ILS) optimization

Method, program product and apparatus for predicting line width rou...

Projection exposure tool for microlithography and method for microl...

Pattern forming apparatus and pattern forming method, movable body...

Pattern forming apparatus and pattern forming method, movable body...

Pattern forming apparatus and pattern forming method, movable body...

Projection exposure tool for microlithography and method for microl...

Pattern forming apparatus and pattern forming method, movable body...

Metrology for measurement of photosensitizer concentration within p...

Projection exposure tool for microlithography and method for microl...

Lithographic focus and dose measurement using a 2-D target

Monitoring apparatus and method particularly useful in photolithogr...

Projection exposure tool for microlithography and method for microl...

Harmonic resist model for use in a lithographic apparatus and a dev...

Pattern forming apparatus and pattern forming method, movable body...

Lithographic focus and dose measurement using a 2-D target

Harmonic resist model for use in a lithographic apparatus and a dev...

Monitoring apparatus and method particularly useful in photolithogr...

Harmonic resist model for use in a lithographic apparatus and a dev...

Method and system for performing lithography verification for a dou...

Method, program product and apparatus for generating a calibrated p...

Method, program product and apparatus for predicting line width rou...

Method and apparatus for determining a process model that models th...

Method and device for measuring surface potential distribution, met...

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMET...

PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT...

METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...

DETERMINING PATTERN RANKING BASED ON MEASUREMENT FEEDBACK FROM PRIN...

SIMULTANEOUS IN PROCESS METROLOGY FOR CLUSTER TOOL ARCHITECTURE

METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMET...

LITHOGRAPHIC PATTERNING METHOD AND SYSTEM THEREFORE

METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...

DETERMINING PATTERN RANKING BASED ON MEASUREMENT FEEDBACK FROM PRIN...

METHODS OF DETECTING PRINTING DEFECTS ON PHOTORESIST PATTERNS

SUBSTRATE MEASUREMENT RECIPE DESIGN OF, OR FOR, A TARGET INCLUDING...

PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD, MOVABLE BODY...

PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD, MOVABLE BODY...

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...

PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD, MOVABLE BODY...

PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD, MOVABLE BODY...

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...

MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGR...

Lithographic Focus and Dose Measurement Using A 2-D Target

HARMONIC RESIST MODEL FOR USE IN A LITHOGRAPHIC APPARATUS AND A DEV...

MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGR...

HARMONIC RESIST MODEL FOR USE IN A LITHOGRAPHIC APPARATUS AND A DEV...

Projection Exposure Tool for Microlithography and Method for Microl...

Method, Program Product and Apparatus for Predicting Line Width Rou...

Lithographic Focus and Dose Measurement Using A 2-D Target

MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGR...

METHODS AND SYSTEMS FOR CONTROLLING VARIATION IN DIMENSIONS OF PATT...

METHOD AND DEVICE FOR MEASURING SURFACE POTENTIAL DISTRIBUTION, MET...

METHOD AND APPARATUS FOR DETERMINING A PROCESS MODEL THAT MODELS TH...

MODELING MASK CORNER ROUNDING EFFECTS USING MULTIPLE MASK LAYERS