using mainly spraying means

Industry

CPC
H01L21/6708

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/6708using mainly spraying means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for etching etch layer
- Patent number 12,362,203
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Manish Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Supercritical fluid processing apparatus and substrate processing s...
- Patent number 12,362,200
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Seohyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing a substrate and method of processing a sub...
- Patent number 12,354,889
- Issue date Jul 8, 2025
- Semes Co., Ltd.
- Muhyeon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet bench process with in-situ pre-treatment operation
- Patent number 12,347,692
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Supply tank, supply device and supply system
- Patent number 12,347,699
- Issue date Jul 1, 2025
- Shibaura Mechatronics Corporation
- Masaaki Furuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,347,720
- Issue date Jul 1, 2025
- Semes Co., Ltd.
- Jin Woo Jung
- B08 - CLEANING
Information Patent Grant
Wet bench and chemical treatment method using the same
- Patent number 12,347,700
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chen Cheng
- B08 - CLEANING
Information Patent Grant
Method and device for producing an edge structure of a semiconducto...
- Patent number 12,342,581
- Issue date Jun 24, 2025
- INFINEON TECHNOLOGIES BIPOLAR GMBH & CO. KG
- Tobias Gamon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid preparation device, and substrate processing device
- Patent number 12,337,289
- Issue date Jun 24, 2025
- SCREEN Holdings Co., Ltd.
- Hajime Nishide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor structure and semiconductor s...
- Patent number 12,341,056
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Kenichi Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exhaust piping for a semiconductor processing tool
- Patent number 12,334,365
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Sheng Lien
- B08 - CLEANING
Information Patent Grant
Method and apparatus for removing particles or photoresist on subst...
- Patent number 12,334,367
- Issue date Jun 17, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Xiaoyan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing liquid supply apparatus and method of removing solids fr...
- Patent number 12,322,610
- Issue date Jun 3, 2025
- Semes Co., Ltd.
- Mu Hyeon Lee
- B08 - CLEANING
Information Patent Grant
Wafer processing apparatus and wafer processing method
- Patent number 12,322,607
- Issue date Jun 3, 2025
- ZEUS CO., LTD.
- Seung Dae Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water replenishment control method for semiconductor process device...
- Patent number 12,314,066
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Kaiyue Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,308,258
- Issue date May 20, 2025
- SCREEN Holdings Co., Ltd.
- Tomohiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped-channel scanning nozzle for scanning of a material surface
- Patent number 12,300,480
- Issue date May 13, 2025
- Elemental Scientific, Inc.
- Beau A. Marth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method
- Patent number 12,300,519
- Issue date May 13, 2025
- Semes Co., Ltd.
- Jung Suk Goh
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus
- Patent number 12,249,533
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Yoshinori Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etch apparatus
- Patent number 12,249,520
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hong-Ting Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus for manufacturing semiconductor device
- Patent number 12,224,187
- Issue date Feb 11, 2025
- Kioxia Corporation
- Makoto Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating objects and apparatus for carrying out the method
- Patent number 12,217,990
- Issue date Feb 4, 2025
- RENA Technologies GmbH
- Benedikt Straub
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching device and etching method using the same
- Patent number 12,217,978
- Issue date Feb 4, 2025
- Samsung Display Co., Ltd.
- Wonje Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist removal method and photoresist removal system
- Patent number 12,210,288
- Issue date Jan 28, 2025
- Tencent Technology (Shenzhen) Company Limited
- Zhongping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,211,708
- Issue date Jan 28, 2025
- SCREEN Holdings Co., Ltd.
- Shuichi Yasuda
- B08 - CLEANING
Information Patent Grant
Substrate processing device and etching liquid
- Patent number 12,203,021
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Koukichi Hiroshiro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Intelligent customizable wet processing system
- Patent number 12,198,946
- Issue date Jan 14, 2025
- Yangtze Memory Technologies Co., Ltd.
- Gonglian Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate
- Patent number 12,198,950
- Issue date Jan 14, 2025
- Semes Co., Ltd.
- Myung A Jeon
- B08 - CLEANING
Information Patent Grant
Semiconductor manufacturing apparatus, failure prediction method fo...
- Patent number 12,191,178
- Issue date Jan 7, 2025
- Ebara Corporation
- Jumpei Fujikata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin coater and semiconductor fabrication method using the same
- Patent number 12,189,295
- Issue date Jan 7, 2025
- Samsung Electronics Co., Ltd.
- Myung-Soo Hwang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20250210391
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Yukiyoshi SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250210373
- Publication date Jun 26, 2025
- SCREEN Holdings Co., Ltd.
- Keisuke TAKAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARRIER LAYER REMOVAL DEVICE AND BARRIER LAYER REMOVAL METHOD
- Publication number 20250210380
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- Tae Oh HA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20250201593
- Publication date Jun 19, 2025
- SCREEN Holdings Co., Ltd.
- Masaki INABA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250183042
- Publication date Jun 5, 2025
- SCREEN Holdings Co., Ltd.
- Tsung Ju LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...
- Publication number 20250183061
- Publication date Jun 5, 2025
- KIOXIA Corporation
- Satoshi NAKAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250174467
- Publication date May 29, 2025
- Semes Co., Ltd.
- Min Jung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WATER REPLENISHMENT CONTROL METHOD FOR SEMICONDUCTOR PROCESS DEVICE...
- Publication number 20250172955
- Publication date May 29, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Kaiyue CAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20250174480
- Publication date May 29, 2025
- SCREEN Holdings Co., Ltd.
- Shinichi TANIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER TREATMENT DEVICE AND WAFER TREATMENT METHOD
- Publication number 20250157838
- Publication date May 15, 2025
- SwaySure Technology Co., Ltd.
- Zhibo Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250149354
- Publication date May 8, 2025
- SCREEN Holdings Co., Ltd.
- Linh Da HO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250140581
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Masami YAMASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE PROCESSING METHOD
- Publication number 20250132162
- Publication date Apr 24, 2025
- National Central University
- Tien-Hsi LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250132164
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Koji Kagawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSINGSYSTEM
- Publication number 20250125162
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Takashi UNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH TOOL WITH SPINEL-BASED COMPOSITE MATERIAL COMPONENTS
- Publication number 20250125161
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Ming LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATABLE ELECTROCHEMICAL ETCHING CELL
- Publication number 20250112059
- Publication date Apr 3, 2025
- THE METHODIST HOSPITAL
- Xuewu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET PROCESSING WITH AUTOMATIC PROCESS CONTROL
- Publication number 20250105036
- Publication date Mar 27, 2025
- Yield Engineering Systems, Inc.
- Venugopal Govindarajulu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND TREATMENT SOLUTION SUPPLY UNIT
- Publication number 20250096013
- Publication date Mar 20, 2025
- SEMES CO., LTD.
- Min Kyoung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20250069897
- Publication date Feb 27, 2025
- SEMES CO., LTD.
- Min Jung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250069908
- Publication date Feb 27, 2025
- SEMES CO., LTD.
- Youngjoon Han
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SE...
- Publication number 20250069909
- Publication date Feb 27, 2025
- KIOXIA Corporation
- Ryutaro OTAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMALLY GUIDED CHEMICAL ETCHING OF A SUBSTRATE AND REAL-TIME MONI...
- Publication number 20250067686
- Publication date Feb 27, 2025
- Momentum Optics LLC
- Jeremy Goeckeritz
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
SYSTEM AND METHOD FOR WAFER WET PROCESS
- Publication number 20250062141
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jie CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250054783
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Tatsuya NAGAMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250029852
- Publication date Jan 23, 2025
- TOKYO ELECTRON LIMITED
- Hiroshi MARUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND WET BENCH FOR THE IN-LINE PROCESSING OF SOLAR-CELL SUBST...
- Publication number 20250015223
- Publication date Jan 9, 2025
- SINGULUS TECHNOLOGIES AG
- Philipp NOACK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250006535
- Publication date Jan 2, 2025
- SCREEN Holdings Co., Ltd.
- Akihiro IWASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATMENT SYSTEM
- Publication number 20250006536
- Publication date Jan 2, 2025
- SCREEN Holdings Co., Ltd.
- Akihiro IWASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING DEVICE AND ETCHING METHOD THEREOF
- Publication number 20240429069
- Publication date Dec 26, 2024
- ZEUS CO., LTD.
- Seung Hoon LEE
- B08 - CLEANING

using mainly spraying means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for etching etch layer

Supercritical fluid processing apparatus and substrate processing s...

Apparatus for processing a substrate and method of processing a sub...

Wet bench process with in-situ pre-treatment operation

Supply tank, supply device and supply system

Apparatus for treating substrate

Wet bench and chemical treatment method using the same

Method and device for producing an edge structure of a semiconducto...

Chemical liquid preparation device, and substrate processing device

Method of fabricating a semiconductor structure and semiconductor s...

Exhaust piping for a semiconductor processing tool

Method and apparatus for removing particles or photoresist on subst...

Processing liquid supply apparatus and method of removing solids fr...

Wafer processing apparatus and wafer processing method

Water replenishment control method for semiconductor process device...

Substrate processing apparatus and substrate processing method

Shaped-channel scanning nozzle for scanning of a material surface

Surface treatment method

Substrate processing apparatus

Wet etch apparatus

Substrate processing apparatus for manufacturing semiconductor device

Method for treating objects and apparatus for carrying out the method

Etching device and etching method using the same

Photoresist removal method and photoresist removal system

Substrate processing apparatus and substrate processing method

Substrate processing device and etching liquid

Intelligent customizable wet processing system

Apparatus and method for processing substrate

Semiconductor manufacturing apparatus, failure prediction method fo...

Spin coater and semiconductor fabrication method using the same

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

BARRIER LAYER REMOVAL DEVICE AND BARRIER LAYER REMOVAL METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

WATER REPLENISHMENT CONTROL METHOD FOR SEMICONDUCTOR PROCESS DEVICE...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

WAFER TREATMENT DEVICE AND WAFER TREATMENT METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSINGSYSTEM

ETCH TOOL WITH SPINEL-BASED COMPOSITE MATERIAL COMPONENTS

ROTATABLE ELECTROCHEMICAL ETCHING CELL

WET PROCESSING WITH AUTOMATIC PROCESS CONTROL

SUBSTRATE PROCESSING APPARATUS AND TREATMENT SOLUTION SUPPLY UNIT

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SE...

THERMALLY GUIDED CHEMICAL ETCHING OF A SUBSTRATE AND REAL-TIME MONI...

SYSTEM AND METHOD FOR WAFER WET PROCESS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

METHOD AND WET BENCH FOR THE IN-LINE PROCESSING OF SOLAR-CELL SUBST...

SUBSTRATE PROCESSING SYSTEM

SUBSTRATE TREATMENT SYSTEM

ETCHING DEVICE AND ETCHING METHOD THEREOF