using mainly spraying means

Industry

CPC
H01L21/6708

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/6708using mainly spraying means

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,170,209
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Takashi Yabuta
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Wafer processing method and carrier
- Patent number 12,159,794
- Issue date Dec 3, 2024
- SCIENTECH CORPORATION
- Chuan-Chang Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,142,496
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing condition selection method, substrate processing method,...
- Patent number 12,142,502
- Issue date Nov 12, 2024
- SCREEN Holdings Co., Ltd.
- Takashi Ota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 12,119,244
- Issue date Oct 15, 2024
- Mitsubishi Electric Corporation
- Hiroshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etching method and wet etching system
- Patent number 12,119,230
- Issue date Oct 15, 2024
- Disco Corporation
- Kazuma Sekiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coater with automatic cleaning function and coater automatic cleani...
- Patent number 12,111,575
- Issue date Oct 8, 2024
- ACM Research (Shanghai) Inc.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 12,112,953
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wan Hsuan Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and platforms for roughness reduction of materia...
- Patent number 12,112,959
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support assembly and substrate processing device includin...
- Patent number 12,107,000
- Issue date Oct 1, 2024
- ASM IP Holding B.V.
- JaeMin Roh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etching apparatus
- Patent number 12,100,602
- Issue date Sep 24, 2024
- Samsung Electronics Co., Ltd.
- Jin Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for integrated decomposition and scanning of a semiconducti...
- Patent number 12,094,738
- Issue date Sep 17, 2024
- Elemental Scientific, Inc.
- Tyler Yost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etching control system, wet etching machine and wet etching con...
- Patent number 12,094,734
- Issue date Sep 17, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Hsin-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus
- Patent number 12,094,733
- Issue date Sep 17, 2024
- Semes Co., Ltd.
- Young Dae Chung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of plasma etching
- Patent number 12,087,593
- Issue date Sep 10, 2024
- NANYA TECHNOLOGY CORPORATION
- Shih Pin Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate using liquid and method for contro...
- Patent number 12,074,040
- Issue date Aug 27, 2024
- Semes Co., Ltd.
- Ji Ho Kim
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Wet bench structure
- Patent number 12,074,041
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid preparation device, and substrate processing device
- Patent number 12,064,739
- Issue date Aug 20, 2024
- SCREEN Holdings Co., Ltd.
- Hajime Nishide
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Substrate processing apparatus, mixing method, and substrate proces...
- Patent number 12,068,175
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Kouji Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle assembly for use with liquid dispensing system
- Patent number 12,059,692
- Issue date Aug 13, 2024
- TAIWAN SEMICONDUCOTR MANUFACTURING COMPANY, LTD.
- Channing Chan
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus, substrate processing system, and su...
- Patent number 12,062,563
- Issue date Aug 13, 2024
- Ebara Corporation
- Itsuki Kobata
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, estimation method of substrate proc...
- Patent number 12,051,587
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Hiroshi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and substrate treatment method
- Patent number 12,046,487
- Issue date Jul 23, 2024
- Kioxia Corporation
- Yoshinori Kitamura
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Etching tool for demountably etching multiple pieces of silicon car...
- Patent number 12,046,486
- Issue date Jul 23, 2024
- HUNAN SANAN SEMICONDUCTOR CO., LTD.
- Shaozhong Cai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method and substrate treatment apparatus
- Patent number 12,046,465
- Issue date Jul 23, 2024
- SCREEN Holdings Co., Ltd.
- Manabu Okutani
- B08 - CLEANING
Information Patent Grant
Gas tube, gas supply system and manufacturing method of semiconduct...
- Patent number 12,037,687
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Shiung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,033,872
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Keita Hirase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching object and etching device
- Patent number 12,033,869
- Issue date Jul 9, 2024
- FLOSFIA INC.
- Isao Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional semiconductor fabrication
- Patent number 12,031,227
- Issue date Jul 9, 2024
- NIELSON SCIENTIFIC, LLC
- Gregory Nolan Nielson
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20240413022
- Publication date Dec 12, 2024
- TOKYO ELECTRON LIMITED
- Keisuke SAKAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240412986
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Byung Woo SIM
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240404846
- Publication date Dec 5, 2024
- SCREEN Holdings Co., Ltd.
- Shuhei NEMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240404845
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Hiroshi MARUMOTO
- G05 - CONTROLLING REGULATING
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING
- Publication number 20240395559
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan Hsuan Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA ETCHING
- Publication number 20240395560
- Publication date Nov 28, 2024
- NANYA TECHNOLOGY CORPORATION
- Shih Pin KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET ETCH APPARATUS
- Publication number 20240395572
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hong-Ting LU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...
- Publication number 20240387185
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Chyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, MIXING METHOD, AND SUBSTRATE PROCES...
- Publication number 20240379388
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Kouji Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID DISPENSING SYSTEM AND METHODS
- Publication number 20240359194
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Channing CHAN
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240363375
- Publication date Oct 31, 2024
- SCREEN Holdings Co., Ltd.
- Tomohiro UEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, ESTIMATION METHOD OF SUBSTRATE PROC...
- Publication number 20240355617
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Hiroshi Nakamura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240342672
- Publication date Oct 17, 2024
- SCREEN Holdings Co., Ltd.
- Hajime NISHIDE
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
GAS TUBE, GAS SUPPLY SYSTEM AND MANUFACTURING METHOD OF SEMICONDUCT...
- Publication number 20240327985
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Shiung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240332041
- Publication date Oct 3, 2024
- Tokyo Electron Limited
- Kazuhiro AIURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING OBJECT AND ETCHING DEVICE
- Publication number 20240321592
- Publication date Sep 26, 2024
- FLOSFIA INC.
- Isao TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE
- Publication number 20240312803
- Publication date Sep 19, 2024
- KIOXIA Corporation
- Shusaku MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCHING METHOD AND ETCHING ASSEMBLY
- Publication number 20240312790
- Publication date Sep 19, 2024
- ASM IP HOLDING B.V.
- Eva Tois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICON...
- Publication number 20240312802
- Publication date Sep 19, 2024
- KIOXIA Corporation
- Yosuke MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240304452
- Publication date Sep 12, 2024
- Tokyo Electron Limited
- Tsunemoto OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM AND COMPUT...
- Publication number 20240290607
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Takashi UNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240282598
- Publication date Aug 22, 2024
- TOKYO ELECTRON LIMITED
- Hiroshi MARUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID CHEMICAL RECYCLE SYSTEM, LIQUID CHEMICAL SUPPLY SYSTEM, AND...
- Publication number 20240282599
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Jinho Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240253079
- Publication date Aug 1, 2024
- SCREEN Holdings Co., Ltd.
- Yuji TANAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Centering Device, Centering Method and Substrate Processing Apparatus
- Publication number 20240258148
- Publication date Aug 1, 2024
- SCREEN HOLDINGS CO., LTD.
- Itsuki KAJINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER TEMPERATURE MEASUREMENT FOR WET ETCHING BATH APPLICATIONS
- Publication number 20240242987
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Ivan MALEEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID INJECTION DEVICE
- Publication number 20240238823
- Publication date Jul 18, 2024
- SCIENTECH CORPORATION
- Chuan-Chang FENG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240234189
- Publication date Jul 11, 2024
- SCREEN Holdings Co., Ltd.
- Tomohiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240234160
- Publication date Jul 11, 2024
- SCREEN Holdings Co., Ltd.
- Keiji MAGARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240234173
- Publication date Jul 11, 2024
- SHIBAURA MECHATRONICS CORPORATION
- Hiroki KOYAMA
- H01 - BASIC ELECTRIC ELEMENTS

using mainly spraying means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Wafer processing method and carrier

Substrate processing apparatus and substrate processing method

Processing condition selection method, substrate processing method,...

Semiconductor manufacturing apparatus

Film processing method

Wet etching method and wet etching system

Coater with automatic cleaning function and coater automatic cleani...

Semiconductor devices and methods of manufacturing

Processing systems and platforms for roughness reduction of materia...

Substrate support assembly and substrate processing device includin...

Wet etching apparatus

Systems for integrated decomposition and scanning of a semiconducti...

Wet etching control system, wet etching machine and wet etching con...

Substrate treatment apparatus

Method of plasma etching

Apparatus for treating substrate using liquid and method for contro...

Wet bench structure

Chemical liquid preparation device, and substrate processing device

Substrate processing apparatus, mixing method, and substrate proces...

Nozzle assembly for use with liquid dispensing system

Substrate processing apparatus, substrate processing system, and su...

Substrate processing apparatus, estimation method of substrate proc...

Substrate treatment apparatus and substrate treatment method

Etching tool for demountably etching multiple pieces of silicon car...

Substrate treatment method and substrate treatment apparatus

Gas tube, gas supply system and manufacturing method of semiconduct...

Substrate processing apparatus and substrate processing method

Method of etching object and etching device

Three-dimensional semiconductor fabrication

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING

METHOD OF PLASMA ETCHING

WET ETCH APPARATUS

BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...

SUBSTRATE PROCESSING APPARATUS, MIXING METHOD, AND SUBSTRATE PROCES...

LIQUID DISPENSING SYSTEM AND METHODS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, ESTIMATION METHOD OF SUBSTRATE PROC...

CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE

GAS TUBE, GAS SUPPLY SYSTEM AND MANUFACTURING METHOD OF SEMICONDUCT...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD OF ETCHING OBJECT AND ETCHING DEVICE

SUBSTRATE PROCESSING DEVICE

SELECTIVE ETCHING METHOD AND ETCHING ASSEMBLY

SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICON...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM AND COMPUT...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

LIQUID CHEMICAL RECYCLE SYSTEM, LIQUID CHEMICAL SUPPLY SYSTEM, AND...

SUBSTRATE PROCESSING METHOD

Centering Device, Centering Method and Substrate Processing Apparatus

WAFER TEMPERATURE MEASUREMENT FOR WET ETCHING BATH APPLICATIONS

LIQUID INJECTION DEVICE

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD