using mainly spraying means

Industry

CPC
H01L21/67051

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67051using mainly spraying means

Industries

Patents Grantslast 30 patents

Information Patent Grant
Nozzle and liquid ejection system
- Patent number 12,183,598
- Issue date Dec 31, 2024
- ASAHI SUNAC CORPORATION
- Hiroki Akenaga
- B08 - CLEANING
Information Patent Grant
Substrate support assembly for substrate treatment apparatus
- Patent number 12,170,222
- Issue date Dec 17, 2024
- DEVICEENG CO., LTD
- Taek Youb Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,165,886
- Issue date Dec 10, 2024
- Shibaura Mechatronics Corporation
- Kensuke Demura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer wet cleaning system
- Patent number 12,162,045
- Issue date Dec 10, 2024
- Tawain Semiconductor Manufacturing Co., Ltd.
- Chih-Wei Chao
- B08 - CLEANING
Information Patent Grant
Wafer cleaning apparatus and method
- Patent number 12,165,887
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jieh-Chau Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method and carrier
- Patent number 12,159,794
- Issue date Dec 3, 2024
- SCIENTECH CORPORATION
- Chuan-Chang Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,159,793
- Issue date Dec 3, 2024
- Semes Co., Ltd.
- Min Hee Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,154,797
- Issue date Nov 26, 2024
- Ebara Corporation
- Itsuki Kobata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning apparatus and method of controlling the same
- Patent number 12,154,819
- Issue date Nov 26, 2024
- ZEUS CO., LTD.
- Seung Dae Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for integrated decomposition and scanning of a semiconducti...
- Patent number 12,152,966
- Issue date Nov 26, 2024
- Elemental Scientific, Inc.
- Beau A. Marth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer and method of wafer thinning
- Patent number 12,154,783
- Issue date Nov 26, 2024
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Michael J. Seddon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and cleaning method of mist guard
- Patent number 12,148,632
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Yusuke Hashimoto
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 12,142,474
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Gentaro Goshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,142,493
- Issue date Nov 12, 2024
- Semes Co., Ltd.
- Young Jun Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment device
- Patent number 12,138,671
- Issue date Nov 12, 2024
- Shibaura Mechatronics Corporation
- Minami Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating substrate and apparatus for treating substrate
- Patent number 12,142,492
- Issue date Nov 12, 2024
- Semes Co., Ltd.
- Ji-Hwan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing tools and methods thereof
- Patent number 12,142,513
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Jagan Rangarajan
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,138,667
- Issue date Nov 12, 2024
- Semes Co., Ltd.
- Shi Hyun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,142,496
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including nozzle unit and substrate...
- Patent number 12,134,113
- Issue date Nov 5, 2024
- Semes Co., Ltd.
- Ju Hwan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for chemical mechanical polishing process
- Patent number 12,131,897
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-I Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Back nozzle unit and apparatus for processing a substrate including...
- Patent number 12,128,450
- Issue date Oct 29, 2024
- Semes Co., Ltd.
- Junhyun Lim
- B08 - CLEANING
Information Patent Grant
Multifunctional single wafer soaking-spinning-cleaning device and w...
- Patent number 12,128,452
- Issue date Oct 29, 2024
- GRAND PROCESS TECHNOLOGY CORPORATION
- Li-tso Huang
- B08 - CLEANING
Information Patent Grant
Integrated semiconductor die vessel processing workstations
- Patent number 12,125,725
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Sheng Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,125,717
- Issue date Oct 22, 2024
- Semes Co., Ltd.
- Ki Sang Eum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method and substrate treatment apparatus
- Patent number 12,119,217
- Issue date Oct 15, 2024
- Semes Co., Ltd.
- Si Nae Song
- B08 - CLEANING
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Unit for supplying substrate treating liquid and apparatus for trea...
- Patent number 12,119,241
- Issue date Oct 15, 2024
- Semes Co., Ltd.
- Dong Hwa Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Steam-assisted single substrate cleaning process and apparatus
- Patent number 12,106,976
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Jianshe Tang
- B08 - CLEANING
Information Patent Grant
Substrate cleaning method and apparatus
- Patent number 12,100,586
- Issue date Sep 24, 2024
- ACM Research (Shanghai) Inc.
- Wenjun Wang
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD
- Publication number 20250001465
- Publication date Jan 2, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- B08 - CLEANING
Information Patent Application
ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT
- Publication number 20250006519
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Kyle M. Hanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240416390
- Publication date Dec 19, 2024
- EBARA CORPORATION
- Naoki TOYOMURA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240412986
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Byung Woo SIM
- B08 - CLEANING
Information Patent Application
Ramped Spin-Dry on Semiconductor Wafer
- Publication number 20240404843
- Publication date Dec 5, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Christopher Volk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240404850
- Publication date Dec 5, 2024
- ACM RESEARCH (SHANGHAI), INC.
- Hao Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET CLEANING METHOD
- Publication number 20240404844
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu Tung Yen
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHODS FOR CLEANING A PACKAGE
- Publication number 20240395571
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ying-Hao Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DROPLET JET NOZZLE DESIGN
- Publication number 20240395579
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Manikandan JAYARAMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER WET CLEANING SYSTEM
- Publication number 20240390952
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wei CHAO
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHODS FOR DETERMINING FLUID DYNAMICS OF LIQUID FILM...
- Publication number 20240387212
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Pin CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS, SUBSTRATE PROCESSING SYSTEM INCLUDING...
- Publication number 20240379386
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- YONGSUK CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SEMICONDUCTOR DIE VESSEL PROCESSING WORKSTATIONS
- Publication number 20240379393
- Publication date Nov 14, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Tsung-Sheng KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240371661
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Masataka GOSHO
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240363361
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ji CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID DISPENSING SYSTEM AND METHODS
- Publication number 20240359194
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Channing CHAN
- B08 - CLEANING
Information Patent Application
PARTICLE REMOVAL METHOD IN SEMICONDUCTOR FABRICATION PROCESS
- Publication number 20240363329
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIH-MING TSAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240363372
- Publication date Oct 31, 2024
- EBARA CORPORATION
- Mitsuru MIYAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SHUTTERED WAFER CLEANING
- Publication number 20240363377
- Publication date Oct 31, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Tsui-Wei WANG
- B08 - CLEANING
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20240363391
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Kazuya IKEUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLIPPING APPARATUS
- Publication number 20240347361
- Publication date Oct 17, 2024
- ACM RESEARCH (SHANGHAI), INC.
- He Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN LINE WATER SCRUBBER SYSTEM FOR SEMICONDUCTOR PROCESSING
- Publication number 20240347350
- Publication date Oct 17, 2024
- Edwards Vacuum LLC
- Imad Mahawili
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240342672
- Publication date Oct 17, 2024
- SCREEN Holdings Co., Ltd.
- Hajime NISHIDE
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
WAFER EDGE TRIMMING PROCESS AND METHODS THEREOF
- Publication number 20240339326
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Fang-I Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CLEANING EQUIPMENT, WAFER CHUCK, AND WAFER CLEANING METHOD
- Publication number 20240339353
- Publication date Oct 10, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Hongyu ZHAO
- B08 - CLEANING
Information Patent Application
CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND CLEANING ME...
- Publication number 20240321601
- Publication date Sep 26, 2024
- EBARA CORPORATION
- Fumitoshi OIKAWA
- B08 - CLEANING
Information Patent Application
CHEMICAL SUPPLY APPARATUS, SEMICONDUCTOR FABRICATION SYSTEM INCLUDI...
- Publication number 20240321599
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Hoyoung RYU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20240321600
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Takanori Obaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
- Publication number 20240316600
- Publication date Sep 26, 2024
- EBARA CORPORATION
- Kenji KODERA
- B08 - CLEANING
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, CLEANING DEVICE, CLE...
- Publication number 20240321818
- Publication date Sep 26, 2024
- Resonac Corporation
- Toshiaki SHIRASAKA
- H01 - BASIC ELECTRIC ELEMENTS

using mainly spraying means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Nozzle and liquid ejection system

Substrate support assembly for substrate treatment apparatus

Substrate processing apparatus and substrate processing method

Wafer wet cleaning system

Wafer cleaning apparatus and method

Wafer processing method and carrier

Substrate treating apparatus and substrate treating method

Substrate processing method and substrate processing apparatus

Wafer cleaning apparatus and method of controlling the same

Systems for integrated decomposition and scanning of a semiconducti...

Semiconductor wafer and method of wafer thinning

Substrate processing apparatus and cleaning method of mist guard

Substrate processing method and substrate processing system

Substrate processing apparatus and substrate processing method

Substrate treatment device

Method for treating substrate and apparatus for treating substrate

Wafer processing tools and methods thereof

Apparatus for treating substrate

Substrate processing apparatus and substrate processing method

Substrate processing apparatus including nozzle unit and substrate...

Method and system for chemical mechanical polishing process

Back nozzle unit and apparatus for processing a substrate including...

Multifunctional single wafer soaking-spinning-cleaning device and w...

Integrated semiconductor die vessel processing workstations

Apparatus for treating substrate

Substrate treatment method and substrate treatment apparatus

Film processing method

Unit for supplying substrate treating liquid and apparatus for trea...

Steam-assisted single substrate cleaning process and apparatus

Substrate cleaning method and apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND METHOD

ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Ramped Spin-Dry on Semiconductor Wafer

SUBSTRATE PROCESSING APPARATUS

WET CLEANING METHOD

APPARATUS AND METHODS FOR CLEANING A PACKAGE

DROPLET JET NOZZLE DESIGN

WAFER WET CLEANING SYSTEM

APPARATUS AND METHODS FOR DETERMINING FLUID DYNAMICS OF LIQUID FILM...

SUBSTRATE CLEANING APPARATUS, SUBSTRATE PROCESSING SYSTEM INCLUDING...

INTEGRATED SEMICONDUCTOR DIE VESSEL PROCESSING WORKSTATIONS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

LIQUID DISPENSING SYSTEM AND METHODS

PARTICLE REMOVAL METHOD IN SEMICONDUCTOR FABRICATION PROCESS

SUBSTRATE PROCESSING APPARATUS

SYSTEMS AND METHODS FOR SHUTTERED WAFER CLEANING

PROCESSING APPARATUS AND PROCESSING METHOD

FLIPPING APPARATUS

IN LINE WATER SCRUBBER SYSTEM FOR SEMICONDUCTOR PROCESSING

CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE

WAFER EDGE TRIMMING PROCESS AND METHODS THEREOF

WAFER CLEANING EQUIPMENT, WAFER CHUCK, AND WAFER CLEANING METHOD

CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND CLEANING ME...

CHEMICAL SUPPLY APPARATUS, SEMICONDUCTOR FABRICATION SYSTEM INCLUDI...

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, CLEANING DEVICE, CLE...