using masks

Industry

CPC
H01L21/32

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/32using masks

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Remote capacitively coupled plasma deposition of amorphous silicon
- Patent number 12,365,986
- Issue date Jul 22, 2025
- Applied Materials, Inc.
- Zubin Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor test sample and manufacturing method thereof
- Patent number 12,368,051
- Issue date Jul 22, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Rui Ding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive feature formation
- Patent number 12,369,293
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing solution
- Patent number 12,365,814
- Issue date Jul 22, 2025
- ANJI MICROELCTRONICS (SHANGHAI) CO., LTD
- Shoutian Li
- B24 - GRINDING POLISHING
Information Patent Grant
Plasma processing method
- Patent number 12,368,031
- Issue date Jul 22, 2025
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,368,050
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Masahiko Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus, substrate processing apparatus, subst...
- Patent number 12,368,059
- Issue date Jul 22, 2025
- Ebara Corporation
- Shuji Uozumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating semiconductor device
- Patent number 12,369,314
- Issue date Jul 22, 2025
- Samsung Electronics Co., Ltd.
- Seung-Heon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid thermal processing system with cooling system
- Patent number 12,362,194
- Issue date Jul 15, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Manuel Sohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid dispersion and powder of cerium based core-shell particles,...
- Patent number 12,359,091
- Issue date Jul 15, 2025
- RHODIA OPERATIONS
- Marie Plissonneau
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 12,362,154
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition and method for polishing and integrated circuit
- Patent number 12,359,090
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ji Cui
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods and devices related to radio frequency devices
- Patent number 12,362,191
- Issue date Jul 15, 2025
- Infineon Technologies Dresden GmbH & Co. KG
- Hans Taddiken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Schottky barrier diode with reduced leakage current and method of f...
- Patent number 12,363,925
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated assemblies and methods of forming integrated assemblies
- Patent number 12,363,895
- Issue date Jul 15, 2025
- Micron Technology, Inc.
- Justin B. Dorhout
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for forming the same
- Patent number 12,362,170
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jian-Zhi Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,362,180
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chin-Ta Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing pad and method for preparing semiconductor device using t...
- Patent number 12,362,232
- Issue date Jul 15, 2025
- SK ENPULSE CO., LTD.
- Jong Wook Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Methods of performing chemical-mechanical polishing process in semi...
- Patent number 12,362,233
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Kang Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor structure and semiconductor s...
- Patent number 12,363,882
- Issue date Jul 15, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xinman Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-doped trenches for memory
- Patent number 12,354,912
- Issue date Jul 8, 2025
- Micron Technology, Inc.
- Yiping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Select gate spacer formation to facilitate embedding of split gate...
- Patent number 12,356,673
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching metals in semiconductor devices
- Patent number 12,354,881
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Hao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact structure for semiconductor device
- Patent number 12,354,913
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yu Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing of substrates containing copper and r...
- Patent number 12,351,737
- Issue date Jul 8, 2025
- BASF SE
- Haci Osman Guevenc
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Gate structure passivating species drive-in method and structure fo...
- Patent number 12,354,876
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiao-Kuan Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 12,356,646
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement buried power rail in backside power delivery
- Patent number 12,354,991
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Hoyoung Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,347,683
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing Hong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for controlling contact resistance in cobalt-titanium struc...
- Patent number 12,347,695
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Takashi Kuratomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250241006
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Zheng-Long CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STACK TREATMENT
- Publication number 20250241055
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chandrashekhar Prakash Savant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
- Publication number 20250239451
- Publication date Jul 24, 2025
- Samsung SDI Co., Ltd.
- Yejin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL THIN-FILM TRANSISTOR AND APPLICATION AS BIT-LINE CONNECTOR...
- Publication number 20250240970
- Publication date Jul 24, 2025
- Sunrise Memory Corporation
- Tianhong Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW WARPAGE HIGH DENSITY TRENCH CAPACITOR
- Publication number 20250240981
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Jyun-Ying LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LUBRICANT FOR FILTRATION CONTAINING ONIUM IONS
- Publication number 20250235805
- Publication date Jul 24, 2025
- Tokuyama Corporation
- Tomoaki SATO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...
- Publication number 20250237953
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takashi SAWAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVI...
- Publication number 20250236793
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Min Hyung CHO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250239472
- Publication date Jul 24, 2025
- Kokusai Electric Corporation
- Shinobu SUGIURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE FILM DEPOSITION
- Publication number 20250239484
- Publication date Jul 24, 2025
- ASM IP HOLDING B.V.
- Paul Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PELLICLE FOR EUV APPLICATIONS
- Publication number 20250237941
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Hsun Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE WITH SELF-ALIGNED VIAS
- Publication number 20250239487
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Han Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250241014
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Chung JEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Different Via Configurations for Different Via Interface Requirements
- Publication number 20250239527
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SELECTIVE DEPOSITION OF DIELECTRIC FILMS
- Publication number 20250239445
- Publication date Jul 24, 2025
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GATE RESISTANCE IMPROVEMENT AND METHOD THEREOF
- Publication number 20250241001
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Li Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
- Publication number 20250234614
- Publication date Jul 17, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, METHOD FOR TREATING OBJECT TO BE TREATED, AND METHOD F...
- Publication number 20250230358
- Publication date Jul 17, 2025
- FUJIFILM CORPORATION
- Atsushi Mizutani
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Contact Structures in Semiconductor Devices
- Publication number 20250234629
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Chin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT RESISTANCE BETWEEN VIA AND CONDUCTIVE LINE
- Publication number 20250233018
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Chun-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-RESISTANCE SOURCE/DRAIN FEATURES
- Publication number 20250234610
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Min Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXPOSURE METHOD AND APPARATUS
- Publication number 20250232985
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250223692
- Publication date Jul 10, 2025
- Kokusai Electric Corporation
- Arito OGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Contact Structure For Semiconductor Device
- Publication number 20250226263
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yu HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METALLIZATION STRUCTURE FOR COUPLING BOILING ENHANCED LAYER TO SUBS...
- Publication number 20250226216
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chihting Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250226220
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- TAE-HOI PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE AND TIN CARBIDE MATERIALS FOR SEMICONDUCTOR PATTERNING AP...
- Publication number 20250226235
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Yung-chen LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20250226177
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226228
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Mitsuaki IWASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST AND METHOD OF FORMATION AND USE
- Publication number 20250224673
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Keng-Chu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

using masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Remote capacitively coupled plasma deposition of amorphous silicon

Semiconductor test sample and manufacturing method thereof

Conductive feature formation

Chemical mechanical polishing solution

Plasma processing method

Plasma processing method and plasma processing apparatus

Substrate cleaning apparatus, substrate processing apparatus, subst...

Methods of fabricating semiconductor device

Rapid thermal processing system with cooling system

Liquid dispersion and powder of cerium based core-shell particles,...

Ion beam etching chamber with etching by-product redistributor

Composition and method for polishing and integrated circuit

Methods and devices related to radio frequency devices

Schottky barrier diode with reduced leakage current and method of f...

Integrated assemblies and methods of forming integrated assemblies

Semiconductor device and method for forming the same

Method of manufacturing semiconductor devices

Polishing pad and method for preparing semiconductor device using t...

Methods of performing chemical-mechanical polishing process in semi...

Method of manufacturing semiconductor structure and semiconductor s...

Plasma-doped trenches for memory

Select gate spacer formation to facilitate embedding of split gate...

Methods of etching metals in semiconductor devices

Contact structure for semiconductor device

Chemical mechanical polishing of substrates containing copper and r...

Gate structure passivating species drive-in method and structure fo...

Semiconductor device and method for manufacturing the same

Replacement buried power rail in backside power delivery

Method of manufacturing a semiconductor device

Methods for controlling contact resistance in cobalt-titanium struc...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

GATE STACK TREATMENT

HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS

VERTICAL THIN-FILM TRANSISTOR AND APPLICATION AS BIT-LINE CONNECTOR...

LOW WARPAGE HIGH DENSITY TRENCH CAPACITOR

LUBRICANT FOR FILTRATION CONTAINING ONIUM IONS

SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING...

ETCHING COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVI...

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

SELECTIVE FILM DEPOSITION

PELLICLE FOR EUV APPLICATIONS

SEMICONDUCTOR DEVICE WITH SELF-ALIGNED VIAS

SEMICONDUCTOR DEVICE

Different Via Configurations for Different Via Interface Requirements

METHOD AND APPARATUS FOR SELECTIVE DEPOSITION OF DIELECTRIC FILMS

GATE RESISTANCE IMPROVEMENT AND METHOD THEREOF

SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

COMPOSITION, METHOD FOR TREATING OBJECT TO BE TREATED, AND METHOD F...

Contact Structures in Semiconductor Devices

CONTACT RESISTANCE BETWEEN VIA AND CONDUCTIVE LINE

LOW-RESISTANCE SOURCE/DRAIN FEATURES

ION EXPOSURE METHOD AND APPARATUS

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

Contact Structure For Semiconductor Device

METALLIZATION STRUCTURE FOR COUPLING BOILING ENHANCED LAYER TO SUBS...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

TIN OXIDE AND TIN CARBIDE MATERIALS FOR SEMICONDUCTOR PATTERNING AP...

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

PHOTORESIST AND METHOD OF FORMATION AND USE