using plasmas

Industry

CPC
H01L21/32136

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/32136using plasmas

Industries

Patents Grantslast 30 patents

Information Patent Grant
Remote source pulsing with advanced pulse control
- Patent number 12,183,583
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide mandrels in patterning
- Patent number 12,183,589
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor mask reshaping using a sacrificial layer
- Patent number 12,165,878
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating metal gate devices and resulting structures
- Patent number 12,159,916
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Chi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ferroelectric MFM capacitor array and methods of making the same
- Patent number 12,154,938
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Chun-Chieh Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
GaN/two-dimensional AlN heterojunction rectifier on silicon substra...
- Patent number 12,154,990
- Issue date Nov 26, 2024
- South China University of Technology
- Wenliang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,154,790
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 12,154,792
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning threshold voltage through meta stable plasma treatment
- Patent number 12,148,620
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method using potential control of grid and substrate
- Patent number 12,148,626
- Issue date Nov 19, 2024
- Research & Business Foundation Sungkyunkwan University
- Geun Young Yeom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma source to generate pie-shaped treatment
- Patent number 12,142,458
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method and plasma processing method
- Patent number 12,142,489
- Issue date Nov 12, 2024
- HITACHI HIGH-TECH CORPORATION
- Mamoru Yakushiji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Processing systems and platforms for roughness reduction of materia...
- Patent number 12,112,959
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chucking process
- Patent number 12,100,609
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for increasing the surface roughness of a metal layer
- Patent number 12,094,722
- Issue date Sep 17, 2024
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Olivier Pollet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and system
- Patent number 12,087,591
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal deposition and etch in high aspect-ratio features
- Patent number 12,087,595
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch and ion beam etch patterning
- Patent number 12,080,562
- Issue date Sep 3, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor arrangement and method of making
- Patent number 12,074,059
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Hsi-Wen Tien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching oxide semiconductor film and plasma processing a...
- Patent number 12,068,171
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Masahiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parasitic capacitance reduction
- Patent number 12,068,396
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jia-Heng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method for oxide semiconductor film
- Patent number 12,062,548
- Issue date Aug 13, 2024
- SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Akiko Hirata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 12,062,522
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Keiji Kitagaito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having via sidewall adhesion with encapsulant
- Patent number 12,062,603
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Hua Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin-film crystalline structure with surfaces having selected plane...
- Patent number 12,057,147
- Issue date Aug 6, 2024
- Seagate Technology LLC
- Tong Zhao
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
TRANSISTOR WITH CHANNEL-SYMMETRIC GATE
- Publication number 20250006810
- Publication date Jan 2, 2025
- Intel Corporation
- Shao-Ming Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING ELEMENTAL METALS
- Publication number 20240429065
- Publication date Dec 26, 2024
- Samsung Electronics Co., Ltd.
- Jane P. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL ETCHING WITH REDUCED TILT ANGLE
- Publication number 20240429064
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chao-Hsuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20240413012
- Publication date Dec 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzuan-Horng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING METAL GATE DEVICES AND RESULTING STRUCTURES
- Publication number 20240387678
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Chi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT
- Publication number 20240387178
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-Jyun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...
- Publication number 20240387185
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming Chyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERCONNECT STRUCTURE INCLUDING GRAPHITE AND METHOD FORMING SAME
- Publication number 20240379430
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shu-Cheng Chin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20240379436
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cai-Ling Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240379864
- Publication date Nov 14, 2024
- ADRC. CO. KR
- Jin JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON NITRIDE DAMAGE-FREE DRY ETCH METHOD FOR TUNGSTEN REMOVAL IN...
- Publication number 20240371654
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Qihao ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARASITIC CAPACITANCE REDUCTION
- Publication number 20240363733
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jia-Heng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCH SYSTEM AND METHOD
- Publication number 20240355597
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Chih-Yang CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN-FILM CRYSTALLINE STRUCTURE WITH SURFACES HAVING SELECTED PLANE...
- Publication number 20240339125
- Publication date Oct 10, 2024
- SEAGATE TECHNOLOGY LLC
- Tong Zhao
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
MODULATION OF CHIP PERFORMANCE BY CONTROLLING TRANSISTOR GATE PROFILE
- Publication number 20240332088
- Publication date Oct 3, 2024
- Intel Corporation
- Reza Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND RELATED DEVICE FOR REMOVING BY-PRODUCT ON SEMICONDUCTOR...
- Publication number 20240331988
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing-Cheng Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR METAL GATE CUT AND STRUCTURE THEREOF
- Publication number 20240332022
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Pei-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DICING A SEMICONDUCTOR WAFER
- Publication number 20240321639
- Publication date Sep 26, 2024
- STMicroelectronics International N.V.
- Carlos Augusto SUAREZ SEGOVIA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20240304456
- Publication date Sep 12, 2024
- Hitachi High-Tech Corporation
- Koichi TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20240274668
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui Fu HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ENERGY ATOMIC LAYER ETCHING
- Publication number 20240274408
- Publication date Aug 15, 2024
- LAM RESEARCH CORPORATION
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL FOR METAL LINE, METAL LINE IN SEMICONDUCTOR DEVICE AND MET...
- Publication number 20240266291
- Publication date Aug 8, 2024
- Samsung Electronics Co., Ltd.
- Eunyoung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ETCHING METALS IN SEMICONDUCTOR DEVICES
- Publication number 20240258117
- Publication date Aug 1, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Wei-Hao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ARRANGEMENT AND METHOD OF MANUFACTURE
- Publication number 20240258374
- Publication date Aug 1, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Yun-Chi WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER BONDING METHOD
- Publication number 20240250061
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yung-Chi Lin
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
NITROGEN-CONTAINING AROMATIC OR RING STRUCTURE MOLECULES FOR PLASMA...
- Publication number 20240242971
- Publication date Jul 18, 2024
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INHIBITOR FOR SELECTIVELY DEPOSITING THIN FILM AND METHOD FOR SELEC...
- Publication number 20240243010
- Publication date Jul 18, 2024
- ADEKA CORPORATION
- JIHYUN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20240222138
- Publication date Jul 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Thi-Thuy-Nga NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE GATE OXIDE FORMATION ON 2D MATERIAL BASED TRANSISTOR DEVICES
- Publication number 20240222441
- Publication date Jul 4, 2024
- Intel Corporation
- Mahmut Sami Kavrik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20240203751
- Publication date Jun 20, 2024
- Hitachi High-Tech Corporation
- Tatsuya HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS

using plasmas

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Remote source pulsing with advanced pulse control

Tin oxide mandrels in patterning

Methods and systems for advanced ion control for etching processes

Semiconductor mask reshaping using a sacrificial layer

Method for fabricating metal gate devices and resulting structures

Ferroelectric MFM capacitor array and methods of making the same

Etching apparatus and etching method

GaN/two-dimensional AlN heterojunction rectifier on silicon substra...

Etching method and plasma processing apparatus

Plasma etching method

Tuning threshold voltage through meta stable plasma treatment

Dry etching method using potential control of grid and substrate

Symmetric plasma source to generate pie-shaped treatment

Semiconductor device manufacturing method and plasma processing method

Integrated epitaxy and preclean system

Processing systems and platforms for roughness reduction of materia...

Electrostatic chucking process

Method for increasing the surface roughness of a metal layer

Plasma processing apparatus and plasma processing method

Tin oxide films in semiconductor device manufacturing

Plasma processing apparatus and system

Metal deposition and etch in high aspect-ratio features

Atomic layer etch and ion beam etch patterning

Semiconductor arrangement and method of making

Method for etching oxide semiconductor film and plasma processing a...

Parasitic capacitance reduction

Etching method for oxide semiconductor film

Plasma etching method and plasma etching apparatus

Semiconductor device having via sidewall adhesion with encapsulant

Thin-film crystalline structure with surfaces having selected plane...

Patents Applicationslast 30 patents

TRANSISTOR WITH CHANNEL-SYMMETRIC GATE

METHOD OF PATTERNING ELEMENTAL METALS

METAL ETCHING WITH REDUCED TILT ANGLE

Semiconductor Device and Method

METHOD FOR FABRICATING METAL GATE DEVICES AND RESULTING STRUCTURES

TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT

BY-SITE-COMENSATED ETCH BACK FOR LOCAL PLANARIZATION/TOPOGRAPHY ADJ...

INTERCONNECT STRUCTURE INCLUDING GRAPHITE AND METHOD FORMING SAME

SELF-ALIGNED INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME

THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME

SILICON NITRIDE DAMAGE-FREE DRY ETCH METHOD FOR TUNGSTEN REMOVAL IN...

PARASITIC CAPACITANCE REDUCTION

ION BEAM ETCH SYSTEM AND METHOD

THIN-FILM CRYSTALLINE STRUCTURE WITH SURFACES HAVING SELECTED PLANE...

MODULATION OF CHIP PERFORMANCE BY CONTROLLING TRANSISTOR GATE PROFILE

PROCESS AND RELATED DEVICE FOR REMOVING BY-PRODUCT ON SEMICONDUCTOR...

METHOD FOR METAL GATE CUT AND STRUCTURE THEREOF

METHOD FOR DICING A SEMICONDUCTOR WAFER

PLASMA PROCESSING METHOD

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

HIGH ENERGY ATOMIC LAYER ETCHING

MATERIAL FOR METAL LINE, METAL LINE IN SEMICONDUCTOR DEVICE AND MET...

METHODS OF ETCHING METALS IN SEMICONDUCTOR DEVICES

SEMICONDUCTOR ARRANGEMENT AND METHOD OF MANUFACTURE

WAFER BONDING METHOD

NITROGEN-CONTAINING AROMATIC OR RING STRUCTURE MOLECULES FOR PLASMA...

INHIBITOR FOR SELECTIVELY DEPOSITING THIN FILM AND METHOD FOR SELEC...

ETCHING METHOD AND ETCHING APPARATUS

SELECTIVE GATE OXIDE FORMATION ON 2D MATERIAL BASED TRANSISTOR DEVICES

PLASMA PROCESSING METHOD