using secondary electrons

Industry

CPC
H01J2237/0045

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0045using secondary electrons

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems including pulsed dual-beam charge neutralization
- Patent number 11,915,901
- Issue date Feb 27, 2024
- ULVAC-PHI, INCORPORATED
- Scott R. Bryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for reducing the charging effect in a transmissio...
- Patent number 11,715,618
- Issue date Aug 1, 2023
- FEI Company
- Yuchen Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling charging of sample and scanning electron mic...
- Patent number 8,487,251
- Issue date Jul 16, 2013
- Hitachi High-Technologies Corporation
- Ritsuo Fukaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission electron microscope
- Patent number 8,362,428
- Issue date Jan 29, 2013
- Medical Research Council
- John Berriman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 7,977,632
- Issue date Jul 12, 2011
- Hitachi, Ltd.
- Hideo Todokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for producing secondary electrons, a secondary electrode,...
- Patent number 7,772,572
- Issue date Aug 10, 2010
- Infineon Technologies AG
- Andreas Kyek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for confining secondary electrons in plasma-based ion imp...
- Patent number 7,667,208
- Issue date Feb 23, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern defect inspection method and apparatus thereof
- Patent number 7,547,884
- Issue date Jun 16, 2009
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Method for charging substrate to a potential
- Patent number 7,507,959
- Issue date Mar 24, 2009
- KLA-Tencor Technologies Corporation
- Kirk J. Bertsche
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Scanning electron microscope
- Patent number 7,442,923
- Issue date Oct 28, 2008
- Hitachi, Ltd.
- Hideo Todokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for producing secondary electrons, a secondary electrode,...
- Patent number 7,417,240
- Issue date Aug 26, 2008
- Infineon Technologies AG
- Andreas Kyek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for charging substrate to a potential
- Patent number 7,176,468
- Issue date Feb 13, 2007
- KLA-Tencor Technologies Corporation
- Kirk J. Bertsche
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Controlled charge neutralization of ion-implanted articles
- Patent number 7,038,223
- Issue date May 2, 2006
- Burle Technologies, Inc.
- Ronald Starcher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system
- Patent number 6,979,822
- Issue date Dec 27, 2005
- FEI Company
- Diane K. Stewart
- G01 - MEASURING TESTING
Information Patent Grant
Particle-optical device and detection means
- Patent number 6,972,412
- Issue date Dec 6, 2005
- FEI Company
- Jacob Johannes Scholtz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope with voltage applied to the sample
- Patent number 6,635,873
- Issue date Oct 21, 2003
- Hitachi, Ltd.
- Hideo Todokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle optical apparatus
- Patent number 6,462,332
- Issue date Oct 8, 2002
- Koninklijke Philips Electronics N.V.
- Petrus Hubertus Franciscus Trompenaars
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation with charge neutralization
- Patent number 6,271,529
- Issue date Aug 7, 2001
- Ebara Corporation
- Marvin Farley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting apparatus and ion implanting method
- Patent number 5,587,587
- Issue date Dec 24, 1996
- Canon Kabushiki Kaisha
- Hiroyuki Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for control of surface potential
- Patent number 5,432,345
- Issue date Jul 11, 1995
- Michael A. Kelly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma flood system for the reduction of charging of wafers during...
- Patent number 5,399,871
- Issue date Mar 21, 1995
- Applied Materials, Inc.
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron shower apparatus including filament current control
- Patent number 5,329,129
- Issue date Jul 12, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Kazuhiro Shono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and controlling method therefor
- Patent number 5,293,508
- Issue date Mar 8, 1994
- Mitsubishi Denki Kabushiki Kaisha
- Shigeru Shiratake
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam neutralization means generating diffuse secondary emission...
- Patent number 5,164,599
- Issue date Nov 17, 1992
- Eaton Corporation
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling the rate of emission of electr...
- Patent number 5,126,576
- Issue date Jun 30, 1992
- Applied Materials, Inc.
- Michael T. Wauk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter
- Patent number 5,072,125
- Issue date Dec 10, 1991
- Mitsubishi Denki Kabushiki Kaisha
- Koichiro Nakanishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND SYSTEMS INCLUDING PULSED DUAL-BEAM CHARGE NEUTRALIZATION
- Publication number 20230245848
- Publication date Aug 3, 2023
- ULVAC-PHI, INCORPORATED
- Scott R. Bryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR REDUCING THE CHARGING EFFECT IN A TRANSMISSIO...
- Publication number 20230040558
- Publication date Feb 9, 2023
- FEI Company
- Yuchen Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA BRIDGE NEUTRALIZER FOR ION BEAM ETCHING
- Publication number 20190259559
- Publication date Aug 22, 2019
- VEECO INSTRUMENTS, INC.
- Rustam YEVTUKHOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Controlling Charge-up in an Electron Beam App...
- Publication number 20140151554
- Publication date Jun 5, 2014
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONTROLLING CHARGING OF SAMPLE AND SCANNING ELECTRON MIC...
- Publication number 20110139981
- Publication date Jun 16, 2011
- Ritsuo Fukaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION ELECTRON MICROSCOPE
- Publication number 20100230591
- Publication date Sep 16, 2010
- John Berriman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20090039259
- Publication date Feb 12, 2009
- Hideo Todokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Producing Secondary Electrons, a Secondary Electrode,...
- Publication number 20080185952
- Publication date Aug 7, 2008
- Infineon Technologies AG
- Andreas Kyek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR CONFINING SECONDARY ELECTRONS IN PLASMA-BASED ION IMP...
- Publication number 20080087839
- Publication date Apr 17, 2008
- Varian Semiconductor Equipment Associates
- Rajesh DORAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for charging substrate to a potential
- Publication number 20070158589
- Publication date Jul 12, 2007
- Kirk J. Bertsche
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Pattern defect inspection method and apparatus thereof
- Publication number 20070085005
- Publication date Apr 19, 2007
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
Scanning electron microscope
- Publication number 20060071167
- Publication date Apr 6, 2006
- Hideo Todokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for charging substrate to a potential
- Publication number 20060054815
- Publication date Mar 16, 2006
- Kirk J. Bertsche
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM
- Publication number 20050279934
- Publication date Dec 22, 2005
- FEI Company
- Diane K. Stewart
- G01 - MEASURING TESTING
Information Patent Application
Controlled charge neutralization of ion-implanted articles
- Publication number 20050218344
- Publication date Oct 6, 2005
- Ronald Starcher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particle-optical device and detection means
- Publication number 20040124356
- Publication date Jul 1, 2004
- Jacob Johannes Scholtz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for producing secondary electrons, a secondary electrode,...
- Publication number 20040104657
- Publication date Jun 3, 2004
- Andreas Kyek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning electron microscope
- Publication number 20040036021
- Publication date Feb 26, 2004
- Hitachi, Ltd
- Hideo Todokoro
- H01 - BASIC ELECTRIC ELEMENTS

using secondary electrons

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and systems including pulsed dual-beam charge neutralization

System and method for reducing the charging effect in a transmissio...

Method for controlling charging of sample and scanning electron mic...

Transmission electron microscope

Scanning electron microscope

Apparatus for producing secondary electrons, a secondary electrode,...

Technique for confining secondary electrons in plasma-based ion imp...

Pattern defect inspection method and apparatus thereof

Method for charging substrate to a potential

Scanning electron microscope

Apparatus for producing secondary electrons, a secondary electrode,...

Method for charging substrate to a potential

Controlled charge neutralization of ion-implanted articles

Charged particle beam system

Particle-optical device and detection means

Scanning electron microscope with voltage applied to the sample

Particle optical apparatus

Ion implantation with charge neutralization

Ion implanting apparatus and ion implanting method

Method and apparatus for control of surface potential

Plasma flood system for the reduction of charging of wafers during...

Electron shower apparatus including filament current control

Ion implanter and controlling method therefor

Ion beam neutralization means generating diffuse secondary emission...

Method and apparatus for controlling the rate of emission of electr...

Ion implanter

Patents Applicationslast 30 patents

METHODS AND SYSTEMS INCLUDING PULSED DUAL-BEAM CHARGE NEUTRALIZATION

SYSTEM AND METHOD FOR REDUCING THE CHARGING EFFECT IN A TRANSMISSIO...

PLASMA BRIDGE NEUTRALIZER FOR ION BEAM ETCHING

System and Method for Controlling Charge-up in an Electron Beam App...

METHOD FOR CONTROLLING CHARGING OF SAMPLE AND SCANNING ELECTRON MIC...

TRANSMISSION ELECTRON MICROSCOPE

SCANNING ELECTRON MICROSCOPE

Apparatus for Producing Secondary Electrons, a Secondary Electrode,...

TECHNIQUE FOR CONFINING SECONDARY ELECTRONS IN PLASMA-BASED ION IMP...

Method for charging substrate to a potential

Pattern defect inspection method and apparatus thereof

Scanning electron microscope

Method for charging substrate to a potential

CHARGED PARTICLE BEAM SYSTEM

Controlled charge neutralization of ion-implanted articles

Particle-optical device and detection means

Apparatus for producing secondary electrons, a secondary electrode,...

Scanning electron microscope