Valves

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CPC
H01J2237/186

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/186Valves

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus
- Patent number 12,198,952
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Masahiro Dogome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 12,106,929
- Issue date Oct 1, 2024
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 12,087,561
- Issue date Sep 10, 2024
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for substrate support temperature control
- Patent number 12,062,567
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Zubin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and apparatuses for contamination-free vacuum transfer of s...
- Patent number 12,020,895
- Issue date Jun 25, 2024
- FEI Company
- Jakub Kuba
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus, method of controlling the same, and...
- Patent number 12,001,194
- Issue date Jun 4, 2024
- Semes Co., Ltd.
- Seung Yeon Kim
- G05 - CONTROLLING REGULATING
Information Patent Grant
Ion beam processing apparatus and method for controlling operation...
- Patent number 11,929,238
- Issue date Mar 12, 2024
- Jeol Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 11,710,623
- Issue date Jul 25, 2023
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 11,651,931
- Issue date May 16, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,569,068
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply system, substrate processing apparatus, and control meth...
- Patent number 11,538,665
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method of workpiece
- Patent number 11,538,704
- Issue date Dec 27, 2022
- Disco Corporation
- Yoshio Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,387,083
- Issue date Jul 12, 2022
- Shibaura Mechatronics Corporation
- Hidehito Azumano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 11,322,351
- Issue date May 3, 2022
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching apparatus
- Patent number 11,120,975
- Issue date Sep 14, 2021
- Research & Business Foundation Sungkyunkwan University
- Geun Young Yeom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pump protection against deposition byproduct buildup
- Patent number 11,031,215
- Issue date Jun 8, 2021
- Lam Research Corporation
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 10,546,748
- Issue date Jan 28, 2020
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and evacuation method for same
- Patent number 10,304,655
- Issue date May 28, 2019
- Hitachi High-Technologies Corporation
- Yuuta Ebine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for generating a composition-controlled and intensity-contro...
- Patent number 10,229,809
- Issue date Mar 12, 2019
- Nanotech Analysis S.R.L.
- Gianpiero Mensa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection device
- Patent number 10,157,722
- Issue date Dec 18, 2018
- Ebara Corporation
- Masahiro Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope
- Patent number 9,773,639
- Issue date Sep 26, 2017
- Jeol Ltd.
- Kazuya Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-pressure plasma system with sequential control process
- Patent number 9,741,547
- Issue date Aug 22, 2017
- Christof-Herbert Diener
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for closing an opening in a chamber wall
- Patent number 9,383,037
- Issue date Jul 5, 2016
- VAT Holding AG
- Bernhard Duelli
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Sample observing device and sample observing method
- Patent number 8,884,225
- Issue date Nov 11, 2014
- Ebara Corporation
- Tsutomu Karimata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser ion source
- Patent number 8,742,362
- Issue date Jun 3, 2014
- Kabushiki Kaisha Toshiba
- Kazuo Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam column and methods of using same
- Patent number 8,461,526
- Issue date Jun 11, 2013
- KLA-Tencor Corporation
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for introducing gas for analysis device
- Patent number 8,276,470
- Issue date Oct 2, 2012
- Toyota Jidosha Kabushiki Kaisha
- Keisuke Kishita
- G01 - MEASURING TESTING
Information Patent Grant
Focused ION beam apparatus
- Patent number 7,667,209
- Issue date Feb 23, 2010
- Hitachi High-Technologies Corporation
- Hiroyasu Kaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 7,147,719
- Issue date Dec 12, 2006
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250096020
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Masahiro Dogome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum Processing Device
- Publication number 20250054724
- Publication date Feb 13, 2025
- Hitachi High-Tech Corporation
- Akito TANOKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Center Feed Symmetric Flow Valve for Plasma chambers
- Publication number 20250035215
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Chetan Ramachandra NAIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VALVES FOR CHARGED PARTICLE BEAM MICROSCOPE, VALVE MEMBER AND CHARG...
- Publication number 20250029808
- Publication date Jan 23, 2025
- Carl Zeiss MultiSEM GmbH
- Steffen Balling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-PRESSURE OXIDATION TREATMENT METHOD AND DEVICE FOR SEMICONDUCTO...
- Publication number 20250014892
- Publication date Jan 9, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Jianmin JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT
- Publication number 20240395514
- Publication date Nov 28, 2024
- Prashant AGARWAL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Program, Information Processing Method, Information Processing Devi...
- Publication number 20240355653
- Publication date Oct 24, 2024
- SPP Technologies Co., Ttd.
- Tatsuo Hiramura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDENSATE PRECURSORS AND CONTAMINANT PURGE APPARATUS AND METHODS
- Publication number 20240222068
- Publication date Jul 4, 2024
- FEI Company
- Jing Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRON GUN CHAMBER FOR SCANNING ELECTRON MICROSCOPE, ELECTRON GUN...
- Publication number 20240212971
- Publication date Jun 27, 2024
- National Institute for Materials Science
- Han ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPORIZER, ION SOURCE, ION BEAM IRRADIATION APPARATUS, AND AN OPERA...
- Publication number 20240186101
- Publication date Jun 6, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PRECLEAN SYSTEM FOR CLUSTER TOOL
- Publication number 20230402268
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Songjae LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
- Publication number 20230352275
- Publication date Nov 2, 2023
- SEMES CO., LTD.
- Yoon Jong Ju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP
- Publication number 20230317437
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GATE VALVE APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20230317480
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Masahiro DOGOME
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM
- Publication number 20230260738
- Publication date Aug 17, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND APPARATUSES FOR CONTAMINATION-FREE VACUUM TRANSFER OF S...
- Publication number 20230253176
- Publication date Aug 10, 2023
- FEI Company
- Jakub Kuba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DELIVERY OF HIGH CONCENTRATIONS OF MOLECULAR HYDROGEN AND OTHER GAS...
- Publication number 20230245862
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Anthony John RICCI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION APPARATUS AND METHOD OF CLEANSING THE SAME
- Publication number 20230227971
- Publication date Jul 20, 2023
- SAMSUNG DISPLAY CO., LTD.
- JONGBUN HAN
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230230818
- Publication date Jul 20, 2023
- Kokusai Electric Corporation
- Tetsuaki Inada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERMITTENT STAGNANT FLOW
- Publication number 20230230820
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Douglas L. KEIL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MACHINE SYSTEM AND MANUFACTURING METHOD USING THEREOF
- Publication number 20230229133
- Publication date Jul 20, 2023
- TENGXI TECHNOLOGY CO. LTD.
- WEI-HAN LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20230141911
- Publication date May 11, 2023
- TOKYO ELECTRON LIMITED
- Dai KITAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20230056750
- Publication date Feb 23, 2023
- Tokyo Electron Limited
- Katsutoshi ISHIGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-FREQUENCY GROUNDING DEVICE AND VACUUM VALVE HAVING HIGH-FREQUE...
- Publication number 20220375732
- Publication date Nov 24, 2022
- VAT HOLDING AG
- Arthur Büchel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM
- Publication number 20220285122
- Publication date Sep 8, 2022
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20220270877
- Publication date Aug 25, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Beam Processing Apparatus and Method for Controlling Operation...
- Publication number 20220238310
- Publication date Jul 28, 2022
- JEOL Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20220230898
- Publication date Jul 21, 2022
- TOKYO ELECTRON LIMITED
- Masahiro Dogome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20220165571
- Publication date May 26, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SUBSTRATE SUPPORT TEMPERATURE CONTROL
- Publication number 20210320027
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Zubin Huang
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate processing apparatus

Refillable ion chamber with automated purging system

Tin oxide films in semiconductor device manufacturing

Vacuum pump protection against deposition byproduct buildup

Systems and methods for substrate support temperature control

Systems and apparatuses for contamination-free vacuum transfer of s...

Substrate processing apparatus, method of controlling the same, and...

Ion beam processing apparatus and method for controlling operation...

Vacuum pump protection against deposition byproduct buildup

Refillable ion chamber with automated purging system

Plasma processing apparatus

Gas supply system, substrate processing apparatus, and control meth...

Processing method of workpiece

Plasma processing apparatus

Tin oxide films in semiconductor device manufacturing

Ion beam etching apparatus

Vacuum pump protection against deposition byproduct buildup

Tin oxide films in semiconductor device manufacturing

Charged particle beam device and evacuation method for same

Device for generating a composition-controlled and intensity-contro...

Inspection device

Electron microscope

Low-pressure plasma system with sequential control process

Device for closing an opening in a chamber wall

Sample observing device and sample observing method

Laser ion source

Electron beam column and methods of using same

Device and method for introducing gas for analysis device

Focused ION beam apparatus

Double slit-valve doors for plasma processing

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS

Vacuum Processing Device

Center Feed Symmetric Flow Valve for Plasma chambers

VALVES FOR CHARGED PARTICLE BEAM MICROSCOPE, VALVE MEMBER AND CHARG...

LOW-PRESSURE OXIDATION TREATMENT METHOD AND DEVICE FOR SEMICONDUCTO...

MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT

Program, Information Processing Method, Information Processing Devi...

CONDENSATE PRECURSORS AND CONTAMINANT PURGE APPARATUS AND METHODS

ELECTRON GUN CHAMBER FOR SCANNING ELECTRON MICROSCOPE, ELECTRON GUN...

VAPORIZER, ION SOURCE, ION BEAM IRRADIATION APPARATUS, AND AN OPERA...

PLASMA PRECLEAN SYSTEM FOR CLUSTER TOOL

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP

GATE VALVE APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS

REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM

SYSTEMS AND APPARATUSES FOR CONTAMINATION-FREE VACUUM TRANSFER OF S...

DELIVERY OF HIGH CONCENTRATIONS OF MOLECULAR HYDROGEN AND OTHER GAS...

DEPOSITION APPARATUS AND METHOD OF CLEANSING THE SAME

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

INTERMITTENT STAGNANT FLOW

SEMICONDUCTOR MACHINE SYSTEM AND MANUFACTURING METHOD USING THEREOF

SUBSTRATE PROCESSING SYSTEM

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

HIGH-FREQUENCY GROUNDING DEVICE AND VACUUM VALVE HAVING HIGH-FREQUE...

REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

Ion Beam Processing Apparatus and Method for Controlling Operation...

SUBSTRATE PROCESSING APPARATUS

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

SYSTEMS AND METHODS FOR SUBSTRATE SUPPORT TEMPERATURE CONTROL