Vessel

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CPC
H01J37/32458

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32458Vessel

Industries

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Patents Grantslast 30 patents

Information Patent Grant
RF tuning systems including tuning circuits having impedances for s...
- Patent number 12,217,939
- Issue date Feb 4, 2025
- Lam Research Corporation
- David French
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process monitoring apparatus using terahertz waves and monit...
- Patent number 12,198,893
- Issue date Jan 14, 2025
- IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
- Hak Sung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam plasma enhanced chemical vapor deposition system for an...
- Patent number 12,191,156
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- John Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Baffle implementation for improving bottom purge gas flow uniformity
- Patent number 12,183,553
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Nitin Pathak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus, plasma processing apparatus, and plasm...
- Patent number 12,131,889
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,125,682
- Issue date Oct 22, 2024
- Semes Co., Ltd.
- Shant Arakelyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faceplate having a curved surface
- Patent number 12,110,590
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Shailendra Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Prescriptive analytics in highly collinear response space
- Patent number 12,074,073
- Issue date Aug 27, 2024
- Applied Materials, Inc.
- Sidharth Bhatia
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reactor, process processing apparatus including the same and method...
- Patent number 12,068,133
- Issue date Aug 20, 2024
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-stage pumping liner
- Patent number 12,068,144
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system with integrated cooling on a rotating drum
- Patent number 12,057,297
- Issue date Aug 6, 2024
- Richard DeVito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system and reactor system including same
- Patent number 12,024,775
- Issue date Jul 2, 2024
- ASM IP Holding B.V.
- Sonti Sreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,020,909
- Issue date Jun 25, 2024
- Samsung Electronics Co., Ltd.
- Jang-Yeob Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma spray physical vapor deposition deposited in multilayer, mul...
- Patent number 12,006,567
- Issue date Jun 11, 2024
- Rolls-Royce Corporation
- Kang N. Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 11,961,721
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,961,710
- Issue date Apr 16, 2024
- Canon Anelva Corporation
- Tadashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,948,778
- Issue date Apr 2, 2024
- Kokusai Electric Corporation
- Hidehiro Yanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-piece slit valve gate
- Patent number 11,867,307
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Shawn Thanhson Le
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular reactor for microwave plasma-assisted deposition
- Patent number 11,859,279
- Issue date Jan 2, 2024
- DIAM CONCEPT
- Alix Gicquel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for microwave plasma assisted chemical vapor...
- Patent number 11,854,775
- Issue date Dec 26, 2023
- Board of Trustees of Michigan State University
- Timothy A. Grotjohn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Faceplate having a curved surface
- Patent number 11,851,759
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Shailendra Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 11,854,771
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus and method of manufacturing dis...
- Patent number 11,842,883
- Issue date Dec 12, 2023
- Samsung Display Co., Ltd.
- Jong-hoon Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Intake plasma generator systems and methods
- Patent number 11,773,811
- Issue date Oct 3, 2023
- ThrivalTech, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution system and reactor system including same
- Patent number 11,718,913
- Issue date Aug 8, 2023
- ASM IP Holding B.V.
- Sonti Sreeram
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bonding structure and bonding method for bonding first conductive m...
- Patent number 11,721,529
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Junichi Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber and plasma apparatus
- Patent number 11,715,627
- Issue date Aug 1, 2023
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,692,269
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,688,585
- Issue date Jun 27, 2023
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Techniques and apparatus for selective shaping of mask features usi...
- Patent number 11,569,095
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- John Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PROCESS STACK FOR CVD PLASMA TREATMENT
- Publication number 20250037976
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Anirudh K. Alewoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20250037977
- Publication date Jan 30, 2025
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR IMPROVED INJECTION FOR A PLASMA REACTOR
- Publication number 20250022686
- Publication date Jan 16, 2025
- Nox Box Technologies LLC
- Joseph E. Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR INJECTION SYSTEM FOR A PLASMA REACTOR AND METHOD OF USE THEREOF
- Publication number 20250022687
- Publication date Jan 16, 2025
- Nox Box Technologies LLC
- Joseph E. Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240429028
- Publication date Dec 26, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Kensuke WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20240395508
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRESCRIPTIVE ANALYTICS IN HIGHLY COLLINEAR RESPONSE SPACE
- Publication number 20240355687
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Sidharth Bhatia
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA SOURCE
- Publication number 20240331980
- Publication date Oct 3, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Honoka WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS MONITORING APPARATUS USING TERAHERTZ WAVES AND MONIT...
- Publication number 20240297014
- Publication date Sep 5, 2024
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Hak Sung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM AND METHODS TO CO-STRIKE PLASMA TO ENHANCE TUNGST...
- Publication number 20240274407
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Peiqi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR ALIGNING DIELECTRIC...
- Publication number 20240274409
- Publication date Aug 15, 2024
- PSK INC.
- Kwang-Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHEMICAL VAPOR DEPOSITION (CVD) APPARATUS AND FILM FORMING M...
- Publication number 20240242940
- Publication date Jul 18, 2024
- KIOXIA Corporation
- Takuya HIROHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR
- Publication number 20240222100
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Shan HU
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240222086
- Publication date Jul 4, 2024
- Kokusai Electric Corporation
- Kazuyuki TOYODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240212989
- Publication date Jun 27, 2024
- Kokusai Electric Corporation
- Hidehiro YANAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHODS FOR REDUCING FLUOROCARBON-CONTAINING GAS EMISSIONS
- Publication number 20240212988
- Publication date Jun 27, 2024
- WINBOND ELECTRONICS CORP.
- Yuan-Hao SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PASSIVATION EQUIPMENT AND PASSIVATION METHOD FOR SEMICONDUCTOR DEVICE
- Publication number 20240162003
- Publication date May 16, 2024
- Naidun-tech Co., Ltd.
- Chi-Wen CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MANUFACTURING DISPLAY DEVICE
- Publication number 20240145219
- Publication date May 2, 2024
- SAMSUNG DISPLAY CO., LTD.
- Min Gyu PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240112892
- Publication date Apr 4, 2024
- Panasonic Intellectual Property Management Co., Ltd.
- Pei YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
- Publication number 20240105427
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Chien-Teh KAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND SEMICOND...
- Publication number 20240087853
- Publication date Mar 14, 2024
- KIOXIA Corporation
- Kazuhiko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240071727
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Takuma SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240071731
- Publication date Feb 29, 2024
- Linco Technology Co., Ltd.
- Yi-Yuan HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FACEPLATE HAVING A CURVED SURFACE
- Publication number 20240044000
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- Shailendra SRIVASTAVA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240036476
- Publication date Feb 1, 2024
- Samsung Electronics Co., Ltd.
- Sangjine Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PIECE SLIT VALVE GATE
- Publication number 20240035575
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Shawn Thanhson Le
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR HAVING ARRAY OF COAXIAL MULTIPLE PINS AND PROCESSING...
- Publication number 20240006162
- Publication date Jan 4, 2024
- HANGZHOU CITY UNIVERSITY
- QI QIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240006163
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER LINER FOR SEMICONDUCTOR PROCESSING
- Publication number 20240006203
- Publication date Jan 4, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chien-Liang Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240003011
- Publication date Jan 4, 2024
- SEMES CO., LTD.
- Kwang Ryul KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

RF tuning systems including tuning circuits having impedances for s...

Plasma process monitoring apparatus using terahertz waves and monit...

Ribbon beam plasma enhanced chemical vapor deposition system for an...

Baffle implementation for improving bottom purge gas flow uniformity

Plasma generating apparatus, plasma processing apparatus, and plasm...

Substrate treating apparatus and substrate treating method

Faceplate having a curved surface

Prescriptive analytics in highly collinear response space

Reactor, process processing apparatus including the same and method...

Multi-stage pumping liner

Deposition system with integrated cooling on a rotating drum

Gas distribution system and reactor system including same

Plasma processing apparatus and plasma processing method

Plasma spray physical vapor deposition deposited in multilayer, mul...

Normal-incidence in-situ process monitor sensor

Plasma processing apparatus

Substrate processing apparatus, method of manufacturing semiconduct...

Multi-piece slit valve gate

Modular reactor for microwave plasma-assisted deposition

Methods and apparatus for microwave plasma assisted chemical vapor...

Faceplate having a curved surface

Film stress control for plasma enhanced chemical vapor deposition

Chemical vapor deposition apparatus and method of manufacturing dis...

Intake plasma generator systems and methods

Gas distribution system and reactor system including same

Bonding structure and bonding method for bonding first conductive m...

Reaction chamber and plasma apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Techniques and apparatus for selective shaping of mask features usi...

Patents Applicationslast 30 patents

PROCESS STACK FOR CVD PLASMA TREATMENT

APPARATUS AND METHOD FOR PLASMA PROCESSING

APPARATUS FOR IMPROVED INJECTION FOR A PLASMA REACTOR

VAPOR INJECTION SYSTEM FOR A PLASMA REACTOR AND METHOD OF USE THEREOF

ACTIVE GAS GENERATION APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

PRESCRIPTIVE ANALYTICS IN HIGHLY COLLINEAR RESPONSE SPACE

PLASMA SOURCE

PLASMA PROCESS MONITORING APPARATUS USING TERAHERTZ WAVES AND MONIT...

PROCESSING SYSTEM AND METHODS TO CO-STRIKE PLASMA TO ENHANCE TUNGST...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR ALIGNING DIELECTRIC...

PLASMA CHEMICAL VAPOR DEPOSITION (CVD) APPARATUS AND FILM FORMING M...

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICON...

DRY ETCHING METHODS FOR REDUCING FLUOROCARBON-CONTAINING GAS EMISSIONS

PASSIVATION EQUIPMENT AND PASSIVATION METHOD FOR SEMICONDUCTOR DEVICE

APPARATUS FOR MANUFACTURING DISPLAY DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND SEMICOND...

SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

FACEPLATE HAVING A CURVED SURFACE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

MULTI-PIECE SLIT VALVE GATE

PLASMA REACTOR HAVING ARRAY OF COAXIAL MULTIPLE PINS AND PROCESSING...

MONITORING METHOD AND PLASMA PROCESSING APPARATUS

CHAMBER LINER FOR SEMICONDUCTOR PROCESSING

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD