Vessels Containers

Industry

CPC
H01J37/16

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/16Vessels Containers

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Microwave driven plasma ion source
- Patent number 12,207,383
- Issue date Jan 21, 2025
- Tofwerk AG
- Martin Tanner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 12,106,929
- Issue date Oct 1, 2024
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam irradiation apparatus and maintenance method for elec...
- Patent number 12,033,828
- Issue date Jul 9, 2024
- NHV CORPORATION
- Masahiro Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,996,271
- Issue date May 28, 2024
- Tokyo Electron Limited
- Satoshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam irradiation apparatus and maintenance method for elec...
- Patent number 11,984,293
- Issue date May 14, 2024
- NHV CORPORATION
- Masahiro Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum compatible X-ray shield
- Patent number 11,972,920
- Issue date Apr 30, 2024
- FEI Company
- Pleun Dona
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion source cathode
- Patent number 11,961,696
- Issue date Apr 16, 2024
- Ion Technology Solutions, LLC
- Manuel A. Jerez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,830,704
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faraday shield and apparatus for treating substrate
- Patent number 11,817,291
- Issue date Nov 14, 2023
- PSK Inc.
- Mu-Kyeom Mun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for directional processing
- Patent number 11,791,126
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Examining, analyzing and/or processing an object using an object re...
- Patent number 11,721,518
- Issue date Aug 8, 2023
- Carl Zeiss Microscopy GmbH
- Andreas Schertel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,705,308
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Shintaro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
High-frequency power circuit, plasma treatment apparatus, and plasm...
- Patent number 11,665,809
- Issue date May 30, 2023
- ULVAC, INC.
- Kenta Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Refillable ion chamber with automated purging system
- Patent number 11,651,931
- Issue date May 16, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,574,798
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample attachment device
- Patent number 11,521,823
- Issue date Dec 6, 2022
- Jeol Ltd.
- Takahisa Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,495,439
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Kohei Mizota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,380,515
- Issue date Jul 5, 2022
- HITACHI HIGH-TECH CORPORATION
- Keiichiro Hosobuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mass spectrometer
- Patent number 11,270,875
- Issue date Mar 8, 2022
- Shimadzu Corporation
- Takuro Kishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample exchange device and charged particle beam device
- Patent number 11,205,558
- Issue date Dec 21, 2021
- Jeol Ltd.
- Naoki Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Time-of-flight mass spectrometer
- Patent number 11,152,202
- Issue date Oct 19, 2021
- Shimadzu Corporation
- Tomoya Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and plasma etching method
- Patent number 11,145,493
- Issue date Oct 12, 2021
- Tokyo Electron Limited
- Satoshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,145,491
- Issue date Oct 12, 2021
- Kokusai Electric Corporation
- Masaki Murobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed CFE electron source with fast blanker for ultrafast TEM appl...
- Patent number 11,114,272
- Issue date Sep 7, 2021
- FEI Company
- Kun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Vacuum cooling apparatus and ion milling apparatus
- Patent number 11,043,355
- Issue date Jun 22, 2021
- Jeol Ltd.
- Tsutomu Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source, ion implantation apparatus, and ion source operating me...
- Patent number 10,910,192
- Issue date Feb 2, 2021
- ULVAC, Inc.
- Akio Higashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with multiple configurations
- Patent number 10,896,799
- Issue date Jan 19, 2021
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20250079112
- Publication date Mar 6, 2025
- Hitachi High-Tech Corporation
- Hiroshi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL SCAN TYPE ION IMPLANT SYSTEM
- Publication number 20250062100
- Publication date Feb 20, 2025
- Ninebell Co., Ltd
- Moon Soo CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL CONDITIONING ENCLOSURE FOR A CHARGED PARTICLE INSTRUMENT
- Publication number 20250054723
- Publication date Feb 13, 2025
- FEI Company
- Rens van Alebeek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Apparatus and Charged Particle Beam Apparatus
- Publication number 20250046566
- Publication date Feb 6, 2025
- HITACHI HIGH-TECH CORPORATION
- Masao YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electronic Cleaning Device
- Publication number 20250037962
- Publication date Jan 30, 2025
- Hitachi High-Tech Corporation
- Yuto KUBONAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICES AND MEMBRANE ASSEMBLIES USEFUL THEREIN
- Publication number 20240412940
- Publication date Dec 12, 2024
- AIRSEM TECHNOLOGIES LTD.
- Jenny SHKLOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20240371598
- Publication date Nov 7, 2024
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Concentrated Solar Irradiation of Targets in Plasmas
- Publication number 20240363308
- Publication date Oct 31, 2024
- National Technology & Engineering Solutions of Sandia, LLC
- Jeffrey Daniel ENGERER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20240282548
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL SURFACE REFORMING APPARATUS USING ION IMPLANTATION
- Publication number 20240258069
- Publication date Aug 1, 2024
- Radpion Inc.
- Myung Jin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM IRRADIATION DEVICE
- Publication number 20240186099
- Publication date Jun 6, 2024
- NHV CORPORATION
- Tomonori SHIRAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20240170260
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source Cathode
- Publication number 20240145207
- Publication date May 2, 2024
- Ion Technology Solutions, LLC
- Manuel A. Jerez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROLLED ELECTRODE TO LIMIT DEPOSITION RATES AND DIST...
- Publication number 20240145206
- Publication date May 2, 2024
- Applied Materials, Inc.
- James P. Buonodono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHLORINE-CONTAINING PRECURSORS FOR ION IMPLANTATION SYSTEMS AND REL...
- Publication number 20240062987
- Publication date Feb 22, 2024
- Entegris, Inc.
- Joseph R. Despres
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS APPARATUS
- Publication number 20230395353
- Publication date Dec 7, 2023
- V Technology Co., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
DUAL-WALL MULTI-STRUCTURE QUARTZ CYLINDER DEVICE
- Publication number 20230352267
- Publication date Nov 2, 2023
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXAMINING, ANALYZING AND/OR PROCESSING AN OBJECT USING AN OBJECT RE...
- Publication number 20230326707
- Publication date Oct 12, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schertel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS RESERVOIR, GAS SUPPLY DEVICE HAVING A GAS RESERVOIR, AND PARTIC...
- Publication number 20230282442
- Publication date Sep 7, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM
- Publication number 20230260738
- Publication date Aug 17, 2023
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE...
- Publication number 20230238213
- Publication date Jul 27, 2023
- Carl Zeiss SMT GMBH
- Ottmar Hoinkis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM APPARATUS TEMPERATURE SENSOR ASSEMBLY
- Publication number 20230236070
- Publication date Jul 27, 2023
- Edwards Vacuum LLC
- Budd Edward Faulkner
- G01 - MEASURING TESTING
Information Patent Application
Physical Package for Optical Lattice Clock
- Publication number 20230229115
- Publication date Jul 20, 2023
- JEOL Ltd.
- Shigenori Tsuji
- G04 - HOROLOGY
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20230162946
- Publication date May 25, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE DRIVEN PLASMA ION SOURCE
- Publication number 20230164903
- Publication date May 25, 2023
- TOFWERK AG
- Martin TANNER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM COMPATIBLE X-RAY SHIELD
- Publication number 20230162942
- Publication date May 25, 2023
- FEI Company
- Pleun Dona
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20230139507
- Publication date May 4, 2023
- HITACHI HIGH-TECH CORPORATION
- Shiano ONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-FREQUENCY POWER CIRCUIT, PLASMA TREATMENT APPARATUS, AND PLASM...
- Publication number 20220377870
- Publication date Nov 24, 2022
- ULVAC, Inc.
- Kenta Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM
- Publication number 20220285122
- Publication date Sep 8, 2022
- Varian Medical Systems, Inc.
- Amir Shojaei
- H01 - BASIC ELECTRIC ELEMENTS

Vessels Containers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Microwave driven plasma ion source

Refillable ion chamber with automated purging system

Electron-beam irradiation apparatus and maintenance method for elec...

Plasma processing apparatus

Electron-beam irradiation apparatus and maintenance method for elec...

Vacuum compatible X-ray shield

Vacuum chamber arrangement for charged particle beam generator

Ion source cathode

Plasma processing apparatus and control method

Faraday shield and apparatus for treating substrate

Apparatus for directional processing

Examining, analyzing and/or processing an object using an object re...

Plasma processing apparatus

Vacuum chamber arrangement for charged particle beam generator

High-frequency power circuit, plasma treatment apparatus, and plasm...

Refillable ion chamber with automated purging system

Plasma processing apparatus and control method

Sample attachment device

Plasma processing apparatus

Charged particle beam device

Mass spectrometer

Sample exchange device and charged particle beam device

Time-of-flight mass spectrometer

Plasma etching apparatus and plasma etching method

Substrate processing apparatus, method of manufacturing semiconduct...

Pulsed CFE electron source with fast blanker for ultrafast TEM appl...

Vacuum chamber arrangement for charged particle beam generator

Vacuum cooling apparatus and ion milling apparatus

Ion source, ion implantation apparatus, and ion source operating me...

Ion source with multiple configurations

Patents Applicationslast 30 patents

Charged Particle Beam Apparatus

DUAL SCAN TYPE ION IMPLANT SYSTEM

THERMAL CONDITIONING ENCLOSURE FOR A CHARGED PARTICLE INSTRUMENT

Optical Apparatus and Charged Particle Beam Apparatus

Electronic Cleaning Device

CHARGED PARTICLE BEAM DEVICES AND MEMBRANE ASSEMBLIES USEFUL THEREIN

FOCUSED ION BEAM SYSTEM

Concentrated Solar Irradiation of Targets in Plasmas

FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF

MATERIAL SURFACE REFORMING APPARATUS USING ION IMPLANTATION

ELECTRON BEAM IRRADIATION DEVICE

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

Ion Source Cathode

TEMPERATURE CONTROLLED ELECTRODE TO LIMIT DEPOSITION RATES AND DIST...

CHLORINE-CONTAINING PRECURSORS FOR ION IMPLANTATION SYSTEMS AND REL...

PROCESS APPARATUS

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

DUAL-WALL MULTI-STRUCTURE QUARTZ CYLINDER DEVICE

EXAMINING, ANALYZING AND/OR PROCESSING AN OBJECT USING AN OBJECT RE...

GAS RESERVOIR, GAS SUPPLY DEVICE HAVING A GAS RESERVOIR, AND PARTIC...

REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM

APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE...

VACUUM APPARATUS TEMPERATURE SENSOR ASSEMBLY

Physical Package for Optical Lattice Clock

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

MICROWAVE DRIVEN PLASMA ION SOURCE

VACUUM COMPATIBLE X-RAY SHIELD

CHARGED PARTICLE BEAM DEVICE

HIGH-FREQUENCY POWER CIRCUIT, PLASMA TREATMENT APPARATUS, AND PLASM...

REFILLABLE ION CHAMBER WITH AUTOMATED PURGING SYSTEM