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H01J37/32119

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32119Windows

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor reaction chamber and atomic layer plasma etching appa...
- Patent number 12,191,114
- Issue date Jan 7, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Xingfei Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with thermal processing systems
- Patent number 12,183,558
- Issue date Dec 31, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus, a method of monitoring a process of man...
- Patent number 12,170,233
- Issue date Dec 17, 2024
- Samsung Electronics Co., Ltd.
- Meehyun Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively-coupled plasma processing apparatus
- Patent number 12,154,760
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Hitoshi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for extracting process control information from...
- Patent number 12,131,886
- Issue date Oct 29, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency and micro...
- Patent number 12,131,887
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating system having t...
- Patent number 12,087,554
- Issue date Sep 10, 2024
- Samsung Electronics Co., Ltd.
- Sungyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density plasma enhanced process chamber
- Patent number 12,080,516
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Active temperature control for RF window in immersed antenna source
- Patent number 12,014,898
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Adam Calkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic coated quartz lid for processing chamber
- Patent number 12,009,178
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Bernard L. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Variable mode plasma chamber utilizing tunable plasma potential
- Patent number 12,002,652
- Issue date Jun 4, 2024
- Mattson Technology, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 11,955,315
- Issue date Apr 9, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency (RF) and...
- Patent number 11,887,815
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 11,887,819
- Issue date Jan 30, 2024
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,881,380
- Issue date Jan 23, 2024
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Toshihiro Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced ignition in inductively coupled plasmas for workpiece proc...
- Patent number 11,848,204
- Issue date Dec 19, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 11,837,447
- Issue date Dec 5, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing coated substrates
- Patent number 11,814,718
- Issue date Nov 14, 2023
- Bühler Alzenau GmbH
- Jürgen Pistner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature control using temperature control element coupled to fa...
- Patent number 11,749,509
- Issue date Sep 5, 2023
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Yorkman Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma processing apparatus
- Patent number 11,735,396
- Issue date Aug 22, 2023
- Samsung Electronics Co., Ltd.
- Seung Bo Shim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber and semiconductor processing apparatus
- Patent number 11,715,632
- Issue date Aug 1, 2023
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Xingcun Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming plasma processing apparatus, related apparatus, a...
- Patent number 11,715,628
- Issue date Aug 1, 2023
- Samsung Electronics Co., Ltd.
- Jeongil Mun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma system and filter device
- Patent number 11,705,307
- Issue date Jul 18, 2023
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Peng Chen
- B08 - CLEANING
Information Patent Grant
Cooling for a plasma-based reactor
- Patent number 11,676,798
- Issue date Jun 13, 2023
- Lam Research Corporation
- John Stephen Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,651,966
- Issue date May 16, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Corrosion-resistant gas delivery assembly, and plasma processing ap...
- Patent number 11,621,149
- Issue date Apr 4, 2023
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yilong Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,600,475
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone cooling of plasma heated window
- Patent number 11,538,666
- Issue date Dec 27, 2022
- Lam Research Corporation
- Yiting Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic coated quartz lid for processing chamber
- Patent number 11,521,830
- Issue date Dec 6, 2022
- Applied Materials, Inc.
- Bernard L. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 11,495,441
- Issue date Nov 8, 2022
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250006467
- Publication date Jan 2, 2025
- PSK INC.
- Paul YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS
- Publication number 20240395501
- Publication date Nov 28, 2024
- Samsung Electronics Co., Ltd.
- Hyojin PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240371612
- Publication date Nov 7, 2024
- JUSUNG ENGINEERING CO., LTD.
- Young Rok KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FOCUS RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
- Publication number 20240371610
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COIL STRUCTURE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT
- Publication number 20240339296
- Publication date Oct 10, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Jinrong ZHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240321562
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential
- Publication number 20240297019
- Publication date Sep 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus with Plasma and Thermal Processing S...
- Publication number 20240212981
- Publication date Jun 27, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
YTTRIUM ALUMINUM PEROVSKITE (YAP) BASED COATINGS FOR SEMICONDUCTOR...
- Publication number 20240212991
- Publication date Jun 27, 2024
- LAM RESEARCH CORPORATION
- Eric A. PAPE
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
ADJUSTABLE DIELECTRIC CONSTANT CERAMIC WINDOW
- Publication number 20240162010
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Chin-Yi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC ANTENNA ARRAYS FOR HIGH DENSITY PLASMA ENHANCED PROCESS C...
- Publication number 20240087847
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...
- Publication number 20240071754
- Publication date Feb 29, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA RESISTANT YTTRIUM ALUMINUM OXIDE CHAMBER COMPONENTS
- Publication number 20240059616
- Publication date Feb 22, 2024
- Heraeus Conamic North America LLC
- Matthew Joseph DONELON
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Workpiece Processing Apparatus with Thermal Processing Systems
- Publication number 20240055242
- Publication date Feb 15, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA MEMBER AND APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20230411117
- Publication date Dec 21, 2023
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature Control Using Temperature Control Element Coupled to Fa...
- Publication number 20230411125
- Publication date Dec 21, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Yorkman Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230369018
- Publication date Nov 16, 2023
- SEMES CO., LTD.
- Sangjeong LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-INVASIVE MEASUREMENT OF PLASMA SYSTEMS
- Publication number 20230335382
- Publication date Oct 19, 2023
- Dublin City University
- Patrick McNally
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...
- Publication number 20230326716
- Publication date Oct 12, 2023
- Tokyo Electron Limited
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Extracting Process Control Information from...
- Publication number 20230298857
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTED PLASMA SOURCE ARRAY
- Publication number 20230290611
- Publication date Sep 14, 2023
- LAM RESEARCH CORPORATION
- Neil M. P. BENJAMIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230282447
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Takahiro YONEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING FOR A PLASMA-BASED REACTOR
- Publication number 20230274912
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- John Stephen Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230260752
- Publication date Aug 17, 2023
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID LIQUID/AIR COOLING SYSTEM FOR TCP WINDOWS
- Publication number 20230245854
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Andrea ALBERTI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR REACTION CHAMBER
- Publication number 20230230803
- Publication date Jul 20, 2023
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Xingfei MAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHED CHEMISTRY COMPONENT BODY AND COATING FOR SEMICONDUCTOR PROC...
- Publication number 20230223240
- Publication date Jul 13, 2023
- LAM RESEARCH CORPORATION
- Eric A. PAPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEM AND FARADAY SHIELDING APPARATUS WHICH CAN BE...
- Publication number 20230207284
- Publication date Jun 29, 2023
- BEIJING LEUVEN SEMICONDUCTOR TECHNOLOGY CO. LTD
- Song GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOELECTRON ASSISTED PLASMA IGNITION
- Publication number 20230207274
- Publication date Jun 29, 2023
- LAM RESEARCH CORPORATION
- Lee CHEN
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor reaction chamber and atomic layer plasma etching appa...

Workpiece processing apparatus with thermal processing systems

Plasma treatment apparatus, a method of monitoring a process of man...

Inductively-coupled plasma processing apparatus

Systems and methods for extracting process control information from...

Plasma processing system and method using radio frequency and micro...

Substrate treating apparatus and substrate treating system having t...

High density plasma enhanced process chamber

Active temperature control for RF window in immersed antenna source

Ceramic coated quartz lid for processing chamber

Variable mode plasma chamber utilizing tunable plasma potential

Workpiece processing apparatus with plasma and thermal processing s...

Plasma processing system and method using radio frequency (RF) and...

Systems for cooling RF heated chamber components

Plasma processing apparatus

Enhanced ignition in inductively coupled plasmas for workpiece proc...

Workpiece processing apparatus with plasma and thermal processing s...

Method for producing coated substrates

Temperature control using temperature control element coupled to fa...

Inductively coupled plasma processing apparatus

Reaction chamber and semiconductor processing apparatus

Method of forming plasma processing apparatus, related apparatus, a...

Plasma system and filter device

Cooling for a plasma-based reactor

Methods and apparatus for processing a substrate

Corrosion-resistant gas delivery assembly, and plasma processing ap...

Plasma processing apparatus and control method

Multi-zone cooling of plasma heated window

Ceramic coated quartz lid for processing chamber

Systems for cooling RF heated chamber components

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

FOCUS RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

COIL STRUCTURE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential

Workpiece Processing Apparatus with Plasma and Thermal Processing S...

YTTRIUM ALUMINUM PEROVSKITE (YAP) BASED COATINGS FOR SEMICONDUCTOR...

ADJUSTABLE DIELECTRIC CONSTANT CERAMIC WINDOW

SYMMETRIC ANTENNA ARRAYS FOR HIGH DENSITY PLASMA ENHANCED PROCESS C...

Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...

PLASMA RESISTANT YTTRIUM ALUMINUM OXIDE CHAMBER COMPONENTS

Workpiece Processing Apparatus with Thermal Processing Systems

ANTENNA MEMBER AND APPARATUS AND METHOD FOR TREATING SUBSTRATE

Temperature Control Using Temperature Control Element Coupled to Fa...

SUBSTRATE PROCESSING APPARATUS

NON-INVASIVE MEASUREMENT OF PLASMA SYSTEMS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...

Systems and Methods for Extracting Process Control Information from...

DISTRIBUTED PLASMA SOURCE ARRAY

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

COOLING FOR A PLASMA-BASED REACTOR

PLASMA PROCESSING APPARATUS

HYBRID LIQUID/AIR COOLING SYSTEM FOR TCP WINDOWS

SEMICONDUCTOR REACTION CHAMBER

MATCHED CHEMISTRY COMPONENT BODY AND COATING FOR SEMICONDUCTOR PROC...

PLASMA ETCHING SYSTEM AND FARADAY SHIELDING APPARATUS WHICH CAN BE...

PHOTOELECTRON ASSISTED PLASMA IGNITION