with ethylenic or acetylenic bands in the main chain of the photopolymer

Industry

CPC
G03F7/0384

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0384with ethylenic or acetylenic bands in the main chain of the photopolymer

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive composition, negative photosensitive composition, pi...
- Patent number 11,940,729
- Issue date Mar 26, 2024
- Toray Industries, Inc.
- Akihiro Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomers, polymers and photoresist compositions
- Patent number 11,487,203
- Issue date Nov 1, 2022
- Rohm and Haas Electronic Materials Korea Ltd.
- Eui Hyun Ryu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern formation material and pattern formation method
- Patent number 11,378,885
- Issue date Jul 5, 2022
- Kioxia Corporation
- Koji Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,269,253
- Issue date Mar 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aromatic resins for underlayers
- Patent number 11,175,581
- Issue date Nov 16, 2021
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sacrificial pyrolysis method for additively manufactured ceramics
- Patent number 10,889,054
- Issue date Jan 12, 2021
- HRL Laboratories, LLC
- Scott M. Biesboer
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Photocurable resin composition
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- Issue date Dec 15, 2020
- Nissan Chemical Industries, Ltd.
- Takuya Ohashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt and photoresist composition containing the same
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- Issue date Nov 17, 2020
- Sumitomo Chemical Company, Limited
- Hiromu Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive polyimide resin composition and method of manufactur...
- Patent number 10,584,209
- Issue date Mar 10, 2020
- Microcosm Technology Co., Ltd.
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicone skeleton-containing polymer, photo-curable resin compositi...
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- Issue date Oct 22, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photopatternable compositions, patterned high k thin film dielectri...
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- Issue date Sep 10, 2019
- Flexterra, Inc.
- Wei Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive polyimide resin composition and method of manufactur...
- Patent number 10,407,549
- Issue date Sep 10, 2019
- Microcosm Technology Co., Ltd.
- Tang-Chieh Huang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Lithographic printing plate precursor including (ethylene, vinyl ac...
- Patent number 10,232,658
- Issue date Mar 19, 2019
- AGFA NV
- Johan Loccufier
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, method for manufacturing patterne...
- Patent number 10,175,577
- Issue date Jan 8, 2019
- Hitachi Chemical Company, Ltd.
- Shingo Tahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative photoresist composition for KrF laser for forming semicond...
- Patent number 10,162,261
- Issue date Dec 25, 2018
- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method of manufacturing substrate for d...
- Patent number 9,851,635
- Issue date Dec 26, 2017
- Samsung Display Co., Ltd.
- Chadong Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Forming conductive metal patterns using thiosulfate copolymers
- Patent number 9,709,889
- Issue date Jul 18, 2017
- Eastman Kodak Company
- Mark Edward Irving
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopatternable materials and related electronic devices and methods
- Patent number 9,704,997
- Issue date Jul 11, 2017
- Flexterra, Inc.
- Shaofeng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist employing photodimerization chemistry and method for ma...
- Patent number 9,666,802
- Issue date May 30, 2017
- LG Display Co., Ltd.
- Jinkyun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing micro-structure and optically patternable...
- Patent number 9,606,435
- Issue date Mar 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Photosensitive resin composition for screen printing, photosensitiv...
- Patent number 9,588,424
- Issue date Mar 7, 2017
- SUNTYPE CO., LTD.
- Yoshio Umeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing hardened rel...
- Patent number 9,575,410
- Issue date Feb 21, 2017
- Asahi Kasei E-Materials Corporation
- Satoshi Shibui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist with rare-earth sensitizers
- Patent number 9,547,238
- Issue date Jan 17, 2017
- Eugen Pavel
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Line pattern collapse mitigation through gap-fill material application
- Patent number 9,454,081
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Mark H Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Amine treated maleic anhydride polymers, compositions and applicati...
- Patent number 9,422,376
- Issue date Aug 23, 2016
- Sumitomo Bakelite Co., Ltd.
- Pramod Kandanarachchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Sulfonic acid derivative compounds as photoacid generators in resis...
- Patent number 9,383,644
- Issue date Jul 5, 2016
- HERAEUS PRECIOUS METALS NORTH AMERICA DAYCHEM LLC
- Yongqiang Zhang
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Two-step photoresist compositions and methods
- Patent number 9,383,646
- Issue date Jul 5, 2016
- IRRESISTIBLE MATERIALS LTD
- Alex Philip Graham Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-imageable layer forming polymer and compositions thereof
- Patent number 9,366,956
- Issue date Jun 14, 2016
- Promerus, LLC
- Osamu Onishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photopatternable materials and related electronic devices and methods
- Patent number 9,341,948
- Issue date May 17, 2016
- Polyera Corporation
- Chun Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Forming conductive metal patterns using thiosulfate copolymers
- Patent number 9,329,482
- Issue date May 3, 2016
- Eastman Kodak Company
- Mark Edward Irving
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

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PHOTOSENSITIVE COMPOSITION FOR PATTERN FORMATION, AND FLEXOGRAPHIC...
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- ZEON CORPORATION
- Atsushi NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTORESIST PROCESS
- Publication number 20240310726
- Publication date Sep 19, 2024
- HELIO DISPLAY MATERIALS LIMITED
- Gerardus Keyzer DE KEYZER
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SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20240272548
- Publication date Aug 15, 2024
- Sumitomo Chemical Company, Limited
- Shohei TERAHIGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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HOLLOW STRUCTURE, ELECTRONIC COMPONENT USING SAME, AND NEGATIVE PHO...
- Publication number 20240126171
- Publication date Apr 18, 2024
- TORAY INDUSTRIES, INC.
- Yutaro KOYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING
- Publication number 20230176478
- Publication date Jun 8, 2023
- Nippon Soda Co., Ltd.
- Shota OSUMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR...
- Publication number 20230152694
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- Samsung Electronics Co., Ltd.
- HONGGU IM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTOSENSITIVE COMPOSITION, NEGATIVE PHOTOSENSITIVE COMPOSITION, PI...
- Publication number 20230127537
- Publication date Apr 27, 2023
- TORAY INDUSTRIES, INC.
- Akihiro ISHIKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20220260908
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- JSR Corporation
- Tetsurou KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20210389671
- Publication date Dec 16, 2021
- JSR Corporation
- Tetsurou KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200285149
- Publication date Sep 10, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...
- Publication number 20200041901
- Publication date Feb 6, 2020
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION AND METHOD OF MANUFACTUR...
- Publication number 20190345289
- Publication date Nov 14, 2019
- Microcosm Technology CO. LTD
- Tang-Chieh Huang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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SACRIFICIAL PYROLYSIS METHOD FOR ADDITIVELY MANUFACTURED CERAMICS
- Publication number 20190160734
- Publication date May 30, 2019
- HRL LABORATORIES, LLC
- Scott M. Biesboer
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
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PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20190146342
- Publication date May 16, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PATTERN FORMATION MATERIAL AND PATTERN FORMATION METHOD
- Publication number 20190086805
- Publication date Mar 21, 2019
- Toshiba Memory Corporation
- Koji Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Fabrication of Electronic Products Using Flexible Substrates
- Publication number 20180348634
- Publication date Dec 6, 2018
- Xerox Corporation
- Jin Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS
- Publication number 20180203352
- Publication date Jul 19, 2018
- Rohm and Haas Electronic Materials Korea Ltd.
- Eui Hyun Ryu
- C07 - ORGANIC CHEMISTRY
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NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER FOR FORMING SEMICOND...
- Publication number 20180203351
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- YOUNG CHANG CHEMICAL CO., LTD
- Seung Hun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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AROMATIC RESINS FOR UNDERLAYERS
- Publication number 20180157175
- Publication date Jun 7, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20180065925
- Publication date Mar 8, 2018
- Sumitomo Chemical Company, Limited
- Hiromu SAKAMOTO
- C07 - ORGANIC CHEMISTRY
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PHOTOPATTERNABLE COMPOSITIONS, PATTERNED HIGH K THIN FILM DIELECTRI...
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- H01 - BASIC ELECTRIC ELEMENTS
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- Publication date Jun 30, 2016
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- GTA ELECTRONICS CO., LTD.
- YUNG-CHI TSAI
- C07 - ORGANIC CHEMISTRY
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- Publication number 20160170300
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- Tatsuro MASUYAMA
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DOUBLE COATED NEGATIVE-WORKING DRY-FILM PHOTORESIST
- Publication number 20150241772
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- Zhuhai Dynamic Technology Optical Industry Co., Ltd.
- Dekai Loo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

with ethylenic or acetylenic bands in the main chain of the photopolymer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photosensitive composition, negative photosensitive composition, pi...

Monomers, polymers and photoresist compositions

Pattern formation material and pattern formation method

Resist composition and patterning process

Aromatic resins for underlayers

Sacrificial pyrolysis method for additively manufactured ceramics

Photocurable resin composition

Salt and photoresist composition containing the same

Photosensitive polyimide resin composition and method of manufactur...

Silicone skeleton-containing polymer, photo-curable resin compositi...

Photopatternable compositions, patterned high k thin film dielectri...

Photosensitive polyimide resin composition and method of manufactur...

Lithographic printing plate precursor including (ethylene, vinyl ac...

Photosensitive resin composition, method for manufacturing patterne...

Negative photoresist composition for KrF laser for forming semicond...

Photoresist composition and method of manufacturing substrate for d...

Forming conductive metal patterns using thiosulfate copolymers

Photopatternable materials and related electronic devices and methods

Photoresist employing photodimerization chemistry and method for ma...

Method for manufacturing micro-structure and optically patternable...

Photosensitive resin composition for screen printing, photosensitiv...

Photosensitive resin composition, method for producing hardened rel...

Photoresist with rare-earth sensitizers

Line pattern collapse mitigation through gap-fill material application

Amine treated maleic anhydride polymers, compositions and applicati...

Sulfonic acid derivative compounds as photoacid generators in resis...

Two-step photoresist compositions and methods

Self-imageable layer forming polymer and compositions thereof

Photopatternable materials and related electronic devices and methods

Forming conductive metal patterns using thiosulfate copolymers

Patents Applicationslast 30 patents

PHOTOSENSITIVE COMPOSITION FOR PATTERN FORMATION, AND FLEXOGRAPHIC...

PHOTORESIST PROCESS

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

HOLLOW STRUCTURE, ELECTRONIC COMPONENT USING SAME, AND NEGATIVE PHO...

PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING

PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR...

PHOTOSENSITIVE COMPOSITION, NEGATIVE PHOTOSENSITIVE COMPOSITION, PI...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RESIST COMPOSITION AND PATTERNING PROCESS

SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...

PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION AND METHOD OF MANUFACTUR...

SACRIFICIAL PYROLYSIS METHOD FOR ADDITIVELY MANUFACTURED CERAMICS

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

PATTERN FORMATION MATERIAL AND PATTERN FORMATION METHOD

Fabrication of Electronic Products Using Flexible Substrates

MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS

NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER FOR FORMING SEMICOND...

AROMATIC RESINS FOR UNDERLAYERS

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

PHOTOPATTERNABLE COMPOSITIONS, PATTERNED HIGH K THIN FILM DIELECTRI...

Photopatternable Materials and Related Electronic Devices and Methods

COMPOUND FOR SEMICONDUCTOR PACKAGE, PHOTOSENSITIVE RESIN COMPOSITIO...

PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING CIRCUIT PATTERN...

SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIS...

PHOTORESIST COMPOSITION TO REDUCE PHOTORESIST PATTERN COLLAPSE

FORMING CONDUCTIVE METAL PATTERNS USING THIOSULFATE COPOLYMERS

DOUBLE COATED NEGATIVE-WORKING DRY-FILM PHOTORESIST