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with ethylenic or acetylenic bands in the side chains of the photopolymer
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G03F7/0388
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PHYSICS
G03
Photography
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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F7/00
Photomechanical
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G03F7/0388
with ethylenic or acetylenic bands in the side chains of the photopolymer
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Patents Grants
last 30 patents
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Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
Patent number
12,135,502
Issue date
Nov 5, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Siao-Shan Wang
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Composition, light shielding film, solid-state imaging element, ima...
Patent number
12,038,688
Issue date
Jul 16, 2024
FUJIFILM Corporation
Yoshinori Taguchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Polymer, chemically amplified resist composition and patterning pro...
Patent number
12,032,289
Issue date
Jul 9, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Coloring composition, color filter, pattern forming method, solid-s...
Patent number
12,019,369
Issue date
Jun 25, 2024
FUJIFILM Corporation
Shoichi Nakamura
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Thermosetting compositions and forming three-dimensionalobjects the...
Patent number
11,999,861
Issue date
Jun 4, 2024
Stratasys, Inc.
Paulus Antonius Maria Steeman
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Low temperature cure photoimageable dielectric compositions and met...
Patent number
11,988,963
Issue date
May 21, 2024
Daniel J Nawrocki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresist composition and method of forming photoresist pattern
Patent number
11,971,659
Issue date
Apr 30, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Chun-Chih Ho
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Thermosetting compositions and forming three-dimensional objects th...
Patent number
11,926,748
Issue date
Mar 12, 2024
Stratasys, Inc.
Paulus Antonius Maria Steeman
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Patent Grant
Photo-patternable organic semiconductor (OSC) polymers for organic...
Patent number
11,917,897
Issue date
Feb 27, 2024
Corning Incorporated
Mingqian He
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Radiatioin-curable mixture containing low-functionalised, partially...
Patent number
11,914,293
Issue date
Feb 27, 2024
Flint Group Germany GmbH
Christian Pietsch
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polyvinyl acetate based photopolymer
Patent number
11,860,539
Issue date
Jan 2, 2024
SHOWA KAKO CORPORATION
Toshifumi Komatsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Photosensitive resin composition, polyimide production method, and...
Patent number
11,809,079
Issue date
Nov 7, 2023
Asahi Kasei Kabushiki Kaisha
Tomohiro Yorisue
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Photoresist and method of formation and use
Patent number
11,650,500
Issue date
May 16, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Keng-Chu Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Photosensitive resin composition and method for producing cured rel...
Patent number
11,640,112
Issue date
May 2, 2023
Asahi Kasei Kabushiki Kaisha
Tomohiro Yorisue
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Laminate, kit, method for producing laminate, and optical sensor
Patent number
11,635,557
Issue date
Apr 25, 2023
FUJIFILM Corporation
Yoshinori Taguchi
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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Patent Grant
Photosensitive resin composition and cured film
Patent number
11,624,982
Issue date
Apr 11, 2023
LG Chem, Ltd.
Seung Yeon Hwang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Photosensitive composition, transfer film, cured film, and manufact...
Patent number
11,604,413
Issue date
Mar 14, 2023
FUJIFILM Corporation
Takashi Aridomi
G06 - COMPUTING CALCULATING COUNTING
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Patent Grant
Negative type photosensitive composition comprising black colorant
Patent number
11,579,527
Issue date
Feb 14, 2023
Merck Patent GmbH
Seishi Shibayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Thermosetting compositions and forming three-dimensional objects th...
Patent number
11,492,505
Issue date
Nov 8, 2022
Covestro (Netherlands) B.V.
Paulus Antonius Maria Steeman
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Patent Grant
Resist material
Patent number
11,487,204
Issue date
Nov 1, 2022
DIC Corporation
Tomoyuki Imada
C07 - ORGANIC CHEMISTRY
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Patent Grant
Thermosetting compositions and forming three-dimensional objects th...
Patent number
11,485,865
Issue date
Nov 1, 2022
Covestro (Netherlands) B.V.
Paulus Antonius Maria Steeman
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Radiation-sensitive resin composition, production method thereof, a...
Patent number
11,319,388
Issue date
May 3, 2022
JSR Corporation
Ken Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Production method for antenna substrate, production method for ante...
Patent number
11,269,254
Issue date
Mar 8, 2022
Toray Industries, Inc.
Junji Wakita
B82 - NANO-TECHNOLOGY
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Patent Grant
Curable composition, cured film, optical filter, laminate, solid im...
Patent number
11,236,215
Issue date
Feb 1, 2022
FUJIFILM Corporation
Daisuke Sasaki
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Composition, film forming method, method of manufacturing near infr...
Patent number
11,169,307
Issue date
Nov 9, 2021
FUJIFILM Corporation
Shunsuke Kitajima
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Photosensitive resin composition and method for producing cured rel...
Patent number
11,163,234
Issue date
Nov 2, 2021
Asahi Kasei Kabushiki Kaisha
Tomohiro Yorisue
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Curable composition, manufacturing method of curable composition, c...
Patent number
11,155,703
Issue date
Oct 26, 2021
FUJIFILM Corporation
Michihiro Ogawa
G02 - OPTICS
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Patent Grant
Polymer of polyimide precursor, positive type photosensitive resin...
Patent number
11,150,556
Issue date
Oct 19, 2021
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Coloring composition, color filter, pattern forming method, solid-s...
Patent number
11,073,760
Issue date
Jul 27, 2021
FUJIFILM Corporation
Shoichi Nakamura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,067,890
Issue date
Jul 20, 2021
FUJIFILM Corporation
Akiyoshi Goto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTIL...
Publication number
20240393686
Publication date
Nov 28, 2024
Resonac Corporation
Hideyuki KATAGI
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
Publication number
20240377739
Publication date
Nov 14, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Siao-Shan WANG
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20240337935
Publication date
Oct 10, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...
Publication number
20240329525
Publication date
Oct 3, 2024
Asahi Kasei Kabushiki Kaisha
Tomohiro YORISUE
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240310727
Publication date
Sep 19, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240310723
Publication date
Sep 19, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Publication number
20240248403
Publication date
Jul 25, 2024
Tokyo Ohka Kogyo Co., Ltd.
Tetsuya Matsushita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RE...
Publication number
20240210827
Publication date
Jun 27, 2024
Asahi Kasei Kabushiki Kaisha
Tomohiro YORISUE
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240176235
Publication date
May 30, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR PREPARING PIXEL DEFINE LAYER
Publication number
20240176241
Publication date
May 30, 2024
DUK SAN NEOLUX CO., LTD.
Hanwook SEO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240160101
Publication date
May 16, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF PREPARING FILM AND COMPOSITION THEREFOR
Publication number
20240085790
Publication date
Mar 14, 2024
Dow Silicones Corporation
Peng-Fei FU
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Resist Material And Patterning Process
Publication number
20240027903
Publication date
Jan 25, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLY...
Publication number
20230416451
Publication date
Dec 28, 2023
JSR Corporation
Shuhei YAMADA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PERMANENT RESIST, METHOD FOR FORM...
Publication number
20230324789
Publication date
Oct 12, 2023
Yu AOKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POLYVINYL ACETATE BASED PHOTOPOLYMER
Publication number
20230288803
Publication date
Sep 14, 2023
SHOWA KAKO CORPORATION
Toshifumi KOMATSU
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Photoresist and Method of Formation and Use
Publication number
20230251571
Publication date
Aug 10, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Keng-Chu Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
COMPOSITION, LIGHT SHIELDING FILM, SOLID-STATE IMAGING ELEMENT, IMA...
Publication number
20230095789
Publication date
Mar 30, 2023
FUJIFILM CORPORATION
Yoshinori TAGUCHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
Publication number
20230028673
Publication date
Jan 26, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Chun-Chih HO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, POLYIMIDE PRODUCTION METHOD, AND...
Publication number
20220269170
Publication date
Aug 25, 2022
Asahi Kasei Kabushiki Kaisha
Tomohiro YORISUE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SURFACE TREATMENT LIQUID AND HYDROPHILIZING TREATMENT METHOD
Publication number
20220269173
Publication date
Aug 25, 2022
Tokyo Ohka Kogyo Co., Ltd.
Takahiro SENZAKI
F28 - HEAT EXCHANGE IN GENERAL
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Patent Application
NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION COMPRISING BLACK COLORANT
Publication number
20220260913
Publication date
Aug 18, 2022
Seishi SHIBAYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL
Publication number
20220221790
Publication date
Jul 14, 2022
SHOWA DENKO K.K.
Yoshikazu ARAI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
LOW TEMPERATURE CURE PHOTOIMAGEABLE DIELECTRIC COMPOSITIONS AND MET...
Publication number
20220146936
Publication date
May 12, 2022
Daniel J. Nawrocki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OXIME ESTER PHOTOINITIATORS HAVING A SPECIAL AROYL CHROMOPHORE
Publication number
20220121113
Publication date
Apr 21, 2022
BASF SE
Kazuhiko KUNIMOTO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COLORING COMPOSITION, COLOR FILTER, PATTERN FORMING METHOD, SOLID-S...
Publication number
20220082937
Publication date
Mar 17, 2022
FUJIFILM CORPORATION
Shoichi NAKAMURA
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED REL...
Publication number
20220011669
Publication date
Jan 13, 2022
Asahi Kasei Kabushiki Kaisha
Tomohiro YORISUE
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTO-PATTERNABLE ORGANIC SEMICONDUCTOR (OSC) POLYMERS FOR ORGANIC...
Publication number
20210367153
Publication date
Nov 25, 2021
Corning Incorporated
Mingqian He
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210286264
Publication date
Sep 16, 2021
FUJIFILM CORPORATION
Akihiro Kaneko
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PRO...
Publication number
20210096465
Publication date
Apr 1, 2021
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...