with scanning beams

Industry

CPC
H01J37/28

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/28with scanning beams

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam system and method for determining observation...
- Patent number 12,191,111
- Issue date Jan 7, 2025
- HITACHI HIGH-TECH CORPORATION
- Fumiya Ishizaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for defect inspection using voltage contrast in a...
- Patent number 12,191,112
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology data correction using image quality metric
- Patent number 12,189,307
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Fuming Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sample pre-charging methods and apparatuses for charged particle be...
- Patent number 12,191,109
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and overlay misalignment measurement m...
- Patent number 12,183,541
- Issue date Dec 31, 2024
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-modal operations for multi-beam inspection system
- Patent number 12,183,543
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Martinus Gerardus Johannes Maria Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of hysteresis compensation
- Patent number 12,183,537
- Issue date Dec 31, 2024
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of determining aberrations in images obtained b...
- Patent number 12,183,540
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Yifeng Shao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission electron microscope and imaging method
- Patent number 12,183,542
- Issue date Dec 31, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroki Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method, device and system for reducing off-axial aberration in elec...
- Patent number 12,176,179
- Issue date Dec 24, 2024
- FEI Company
- Maarten Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern inspecting device
- Patent number 12,176,181
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Wei Sun
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Automated operational control of micro-tooling devices
- Patent number 12,176,182
- Issue date Dec 24, 2024
- Carl Zeiss SMT GmbH
- Ramani Pichumani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method implemented by a data processing apparatus, and charged part...
- Patent number 12,175,648
- Issue date Dec 24, 2024
- FEI Company
- Remco Schoenmakers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Probe tip X-Y location identification using a charged particle beam
- Patent number 12,169,208
- Issue date Dec 17, 2024
- Innovatum Instruments Inc.
- Richard E Stallcup
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle microscope device and method for adjusting field-o...
- Patent number 12,170,183
- Issue date Dec 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Mitsutoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for scanning a sample using multi-beam inspection...
- Patent number 12,165,837
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,165,830
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Shichen Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of image-forming multi-electron beams
- Patent number 12,165,831
- Issue date Dec 10, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Joint electron-optical columns for flood-charging and image-forming...
- Patent number 12,165,838
- Issue date Dec 10, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of profiling charged-particle beams
- Patent number 12,165,836
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Maikel Robert Goosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun and electron beam application apparatus
- Patent number 12,165,828
- Issue date Dec 10, 2024
- HITACHI HIGH-TECH CORPORATION
- Takashi Ohshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for performing sample lift-out for highly react...
- Patent number 12,165,832
- Issue date Dec 10, 2024
- FEI Company
- Adam Stokes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Concurrent laser cleaning and spectroscopic cleanliness monitoring
- Patent number 12,158,372
- Issue date Dec 3, 2024
- FEI Company
- Joseph Christian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Observation method by means of scanning transmission electron micro...
- Patent number 12,154,758
- Issue date Nov 26, 2024
- The University of Tokyo
- Naoya Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam device
- Patent number 12,148,593
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and image acquiring method
- Patent number 12,148,594
- Issue date Nov 19, 2024
- Jeol Ltd.
- Takeshi Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,142,457
- Issue date Nov 12, 2024
- HITACHI HIGH-TECH CORPORATION
- Takahiro Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-differential confocal tilt sensor for measuring level variatio...
- Patent number 12,142,456
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Jinmei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus
- Patent number 12,142,453
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPUTER, PROGRAM, AND CHARGED PARTICLE BEAM PROCESSING SYSTEM
- Publication number 20250014859
- Publication date Jan 9, 2025
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Ayana MURAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Correction Method and Correction Device
- Publication number 20250014858
- Publication date Jan 9, 2025
- Hitachi High-Tech Corporation
- Tomoaki YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20250006454
- Publication date Jan 2, 2025
- HITACHI HIGH-TECH CORPORATION
- Yuta IMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A PARTICLE BEAM MICROSCOPE
- Publication number 20250006455
- Publication date Jan 2, 2025
- CARL ZEISS MICROSCOPY GMBH
- Bjoern Gamm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE...
- Publication number 20250006459
- Publication date Jan 2, 2025
- Carl Zeiss MultiSEM GmbH
- Daniel Weiss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR DEFECT DETECTION AND DEFECT LOCATION IDENTI...
- Publication number 20250005739
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Shengcheng JIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
- Publication number 20250006456
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MAGNETIC LENSES, CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDING THE...
- Publication number 20250006453
- Publication date Jan 2, 2025
- FEI Company
- Jan Stopka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING MEASUREMENT ERRORS IN CRITICAL PATTERN DIMENSIO...
- Publication number 20240429107
- Publication date Dec 26, 2024
- Shanghai Huali Integrated Circuit Corporation
- Guanbo Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS
- Publication number 20240427253
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Henricus Petrus Maria PELLEMANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM POSITION DETECTION AND REPOSITIONING
- Publication number 20240429017
- Publication date Dec 26, 2024
- KLA Corporation
- Henning Stoschus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240420915
- Publication date Dec 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Mihiro TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISCHARGING A REGION OF A SAMPLE
- Publication number 20240420917
- Publication date Dec 19, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Roey Levy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE INSPECTION METHOD
- Publication number 20240412943
- Publication date Dec 12, 2024
- Samsung Electronics Co., LTD
- Jinwoo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-VOLTAGE ELECTRON BEAM CONTROL OF CONDUCTIVE STATE AT A COMPLEX-...
- Publication number 20240412889
- Publication date Dec 12, 2024
- University of Pittsburgh of the Commonwealth System of Higher Education
- Jeremy Levy
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
TECHNIQUES FOR DETECTING PROBE LANDING IN INTEGRATED CIRCUIT TESTIN...
- Publication number 20240410937
- Publication date Dec 12, 2024
- FEI Company
- James S. Vickers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPLICATION DEVICE AND METHOD FOR CREATING DETECTION...
- Publication number 20240412939
- Publication date Dec 12, 2024
- PHOTO ELECTRON SOUL INC.
- Tomohiro NISHITANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICES AND MEMBRANE ASSEMBLIES USEFUL THEREIN
- Publication number 20240412940
- Publication date Dec 12, 2024
- AIRSEM TECHNOLOGIES LTD.
- Jenny SHKLOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPY-BASED TOMOGRAPHY OF SPECIMENS
- Publication number 20240404784
- Publication date Dec 5, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Itamar Shani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INV...
- Publication number 20240404786
- Publication date Dec 5, 2024
- Carl Zeiss SMT GMBH
- Ivo IHRKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIVE-DIMENSIONAL ELECTRON MICROSCOPE AND ANALYSIS METHOD THEREFOR
- Publication number 20240395499
- Publication date Nov 28, 2024
- RINKEN
- Takahiro SHIMOJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOM PROBE TOMOGRAPHY SPECIMEN PREPARATION
- Publication number 20240395636
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Wei HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATION RASTER SCANNING
- Publication number 20240395492
- Publication date Nov 28, 2024
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORIENTATION TOOL FOR ELECTRON BACKSCATTER DIFFRACTION
- Publication number 20240395498
- Publication date Nov 28, 2024
- GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Chelsea Edge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENTROPY BASED IMAGE PROCESSING FOR FOCUSED ION BEAM DELAYER – EDGE...
- Publication number 20240379327
- Publication date Nov 14, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yuval Tsedek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20240379325
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240379318
- Publication date Nov 14, 2024
- HITACHI HIGH-TECH CORPORATION
- Keigo KASUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...
- Publication number 20240379322
- Publication date Nov 14, 2024
- Carl Zeiss MultiSEM GmbH
- Alexander Wertz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATI...
- Publication number 20240371596
- Publication date Nov 7, 2024
- Carl Zeiss MultiSEM GmbH
- Ingo Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RESOLUTION IMAGING APPARATUS AND METHOD
- Publication number 20240371622
- Publication date Nov 7, 2024
- Standard BioTools Canada Inc.
- Paul Corkum
- H01 - BASIC ELECTRIC ELEMENTS

with scanning beams

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam system and method for determining observation...

System and method for defect inspection using voltage contrast in a...

Metrology data correction using image quality metric

Sample pre-charging methods and apparatuses for charged particle be...

Charged particle beam system and overlay misalignment measurement m...

Multi-modal operations for multi-beam inspection system

Systems and methods of hysteresis compensation

Systems and methods of determining aberrations in images obtained b...

Transmission electron microscope and imaging method

Method, device and system for reducing off-axial aberration in elec...

Pattern inspecting device

Automated operational control of micro-tooling devices

Method implemented by a data processing apparatus, and charged part...

Probe tip X-Y location identification using a charged particle beam

Charged particle microscope device and method for adjusting field-o...

System and method for scanning a sample using multi-beam inspection...

Multiple charged-particle beam apparatus with low crosstalk

Method and system of image-forming multi-electron beams

Joint electron-optical columns for flood-charging and image-forming...

Systems and methods of profiling charged-particle beams

Electron gun and electron beam application apparatus

Systems and methods for performing sample lift-out for highly react...

Concurrent laser cleaning and spectroscopic cleanliness monitoring

Automated ion-beam alignment for dual-beam instrument

Observation method by means of scanning transmission electron micro...

Ion beam device

Charged particle beam apparatus and image acquiring method

Charged particle beam device

Self-differential confocal tilt sensor for measuring level variatio...

Multi-beam inspection apparatus

Patents Applicationslast 30 patents

COMPUTER, PROGRAM, AND CHARGED PARTICLE BEAM PROCESSING SYSTEM

Correction Method and Correction Device

CHARGED PARTICLE BEAM DEVICE

METHOD FOR OPERATING A PARTICLE BEAM MICROSCOPE

METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE...

SYSTEMS AND METHODS FOR DEFECT DETECTION AND DEFECT LOCATION IDENTI...

CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION

MAGNETIC LENSES, CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDING THE...

METHOD FOR REDUCING MEASUREMENT ERRORS IN CRITICAL PATTERN DIMENSIO...

OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS

ELECTRON BEAM POSITION DETECTION AND REPOSITIONING

CHARGED PARTICLE BEAM DEVICE

DISCHARGING A REGION OF A SAMPLE

SUBSTRATE INSPECTION METHOD

LOW-VOLTAGE ELECTRON BEAM CONTROL OF CONDUCTIVE STATE AT A COMPLEX-...

TECHNIQUES FOR DETECTING PROBE LANDING IN INTEGRATED CIRCUIT TESTIN...

ELECTRON BEAM APPLICATION DEVICE AND METHOD FOR CREATING DETECTION...

CHARGED PARTICLE BEAM DEVICES AND MEMBRANE ASSEMBLIES USEFUL THEREIN

SCANNING ELECTRON MICROSCOPY-BASED TOMOGRAPHY OF SPECIMENS

METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INV...

FIVE-DIMENSIONAL ELECTRON MICROSCOPE AND ANALYSIS METHOD THEREFOR

ATOM PROBE TOMOGRAPHY SPECIMEN PREPARATION

COMPENSATION RASTER SCANNING

ORIENTATION TOOL FOR ELECTRON BACKSCATTER DIFFRACTION

ENTROPY BASED IMAGE PROCESSING FOR FOCUSED ION BEAM DELAYER – EDGE...

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

CHARGED PARTICLE BEAM DEVICE

MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...

MULTIPLE CHARGED PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATI...

HIGH RESOLUTION IMAGING APPARATUS AND METHOD