with silicon- containing groups in the side chains

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CPC
G03F7/0758

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0758with silicon- containing groups in the side chains

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Curable resin composition, thin film, and color conversion panel an...
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- Samsung SDI Co., Ltd.
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Resist composition and method of forming resist pattern
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- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Semiconductor devices and methods of manufacturing
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- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
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Manufacturing method of semiconductor chip, and kit
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- Issue date Feb 27, 2024
- FUJIFILM Corporation
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Semiconductor devices and methods of manufacturing
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- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
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Photosensitive resin composition and display device
- Patent number 11,774,852
- Issue date Oct 3, 2023
- Duk San Neolux Co., Ltd
- Jun Bae
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Chemical liquid, chemical liquid storage body, pattern forming meth...
- Patent number 11,747,727
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- FUJIFILM Corporation
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- Issue date May 9, 2023
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- Wensheng Xiang
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Information Patent Grant
Negative type photosensitive composition curable at low temperature
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- Issue date Apr 18, 2023
- Merck Patent GmbH
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Information Patent Grant
Silicon-containing coating agent for pattern reversal
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Negative type photosensitive composition comprising black colorant
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Information Patent Grant
Negative type photosensitive composition
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- Issue date Feb 14, 2023
- Merck Patent GmbH
- Daishi Yokoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative type photosensitive composition curable at low temperature
- Patent number 11,506,978
- Issue date Nov 22, 2022
- Merck Patent GmbH
- Motoki Misumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Treatment liquid and pattern forming method
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- Issue date Sep 27, 2022
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photopolymer composition
- Patent number 11,435,664
- Issue date Sep 6, 2022
- LG Chem, Ltd.
- Heon Kim
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Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 11,150,557
- Issue date Oct 19, 2021
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- Naoya Hatakeyama
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Photopolymer composition
- Patent number 11,126,082
- Issue date Sep 21, 2021
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- Seokhoon Jang
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Photopolymer composition
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- Issue date Aug 3, 2021
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Treatment liquid and pattern forming method
- Patent number 11,042,094
- Issue date Jun 22, 2021
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Treatment liquid and pattern forming method
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- Issue date Mar 30, 2021
- FUJIFILM Corporation
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Information Patent Grant
Manufacturing method of semiconductor chip, and kit
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- FUJIFILM Corporation
- Tetsuya Kamimura
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Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
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Information Patent Grant
Pattern forming method, method for producing electronic device, and...
- Patent number 10,859,914
- Issue date Dec 8, 2020
- FUJIFILM Corporation
- Naoya Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing precursor
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- Issue date Dec 1, 2020
- Toray Industries, Inc.
- Yasunori Kuse
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Cross-linkable fluorinated photopolymer
- Patent number 10,838,302
- Issue date Nov 17, 2020
- Orthogonal, Inc.
- Charles Warren Wright
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tetracarboxylic acid diester compound, polymer of polyimide precurs...
- Patent number 10,816,900
- Issue date Oct 27, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition and electronic device including cu...
- Patent number 10,775,698
- Issue date Sep 15, 2020
- Samsung Display Co., Ltd.
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- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 10,761,426
- Issue date Sep 1, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross-linkable fluorinated photopolymer
- Patent number 10,739,680
- Issue date Aug 11, 2020
- Orthogonal, Inc.
- Charles Warren Wright
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

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RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER
- Publication number 20240295814
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MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT
- Publication number 20240152055
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- FUJIFILM CORPORATION
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SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING
- Publication number 20240079235
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
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PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION
- Publication number 20230350290
- Publication date Nov 2, 2023
- FUJIFILM CORPORATION
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND...
- Publication number 20230333478
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- FUJIFILM CORPORATION
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PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
- Publication number 20230109843
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- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Jong Han YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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UV- AND HEAT-CURABLE LADDER-LIKE POLYSILSESQUIOXANE COPOLYMER, INSU...
- Publication number 20220372231
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- Korea Institute of Science and Technology
- Seung Sang HWANG
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Semiconductor Devices and Methods of Manufacturing
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- Taiwan Semiconductor Manufacturing Co., Ltd.
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CURABLE RESIN COMPOSITION, THIN FILM, AND COLOR CONVERSION PANEL AN...
- Publication number 20220306809
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- Samsung SDI Co., Ltd.
- Seungeun LEE
- G02 - OPTICS
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NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION COMPRISING BLACK COLORANT
- Publication number 20220260913
- Publication date Aug 18, 2022
- Seishi SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION
- Publication number 20220260912
- Publication date Aug 18, 2022
- Merck Patent GmbH
- Daishi YOKOYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPERSION LIQUID, COMPOSITION, CURED FILM, COLOR FILTER, SOLID-STA...
- Publication number 20220213296
- Publication date Jul 7, 2022
- FUJIFILM CORPORATION
- Yushi KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METHOD OF MANUFACTURING CURED FILM, PHOTOCURABLE RESIN COMPOSITION,...
- Publication number 20220171285
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- FUJIFILM CORPORATION
- Kazuomi INOUE
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NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE
- Publication number 20210208503
- Publication date Jul 8, 2021
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Motoki MISUMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20210200097
- Publication date Jul 1, 2021
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photosensitive Resin Composition And Display Device
- Publication number 20210165320
- Publication date Jun 3, 2021
- DUK SAN NEOLUX CO., LTD.
- Jun BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT
- Publication number 20210157241
- Publication date May 27, 2021
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- B24 - GRINDING POLISHING
Information Patent Application
Semiconductor Devices and Methods of Manufacturing
- Publication number 20210035797
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Jui Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOPOLYMER COMPOSITION
- Publication number 20210026239
- Publication date Jan 28, 2021
- LG CHEM, LTD.
- Heon KIM
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Information Patent Application
CROSS-LINKABLE FLUORINATED PHOTOPOLYMER
- Publication number 20200301276
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- Orthogonal, Inc.
- Charles Warren WRIGHT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE
- Publication number 20200301277
- Publication date Sep 24, 2020
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- MOTOKI MISUMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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PHOTOSENSITIVE SILOXANE COMPOSITION
- Publication number 20200201179
- Publication date Jun 25, 2020
- MERCK PERFORMANCE MATERIALS MANUFACTURING G.K.
- MEGUMI TAKAHASHI
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PHOTOPOLYMER COMPOSITION
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- LG CHEM, LTD.
- Seok Hoon JANG
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Information Patent Application
CROSS-LINKABLE FLUORINATED PHOTOPOLYMER
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- Charles Warren WRIGHT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTORESIST COMPOSITIONS, INTERMEDIATE PRODUCTS, AND METHODS OF MAN...
- Publication number 20190179227
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- Samsung Electronics Co., Ltd.
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LITHOGRAPHIC PRINTING PRECURSOR
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- TORAY INDUSTRIES, INC.
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Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
- Publication number 20190137877
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- Rohm and Haas Electronic Materials Korea Ltd.
- Jong Han Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, CURED FILM OF SAME AND METHOD FOR MANUFACTURING...
- Publication number 20190101828
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- TORAY INDUSTRIES, INC.
- Toshiyasu HIBINO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

with silicon- containing groups in the side chains

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Curable resin composition, thin film, and color conversion panel an...

Resist composition and method of forming resist pattern

Semiconductor devices and methods of manufacturing

Manufacturing method of semiconductor chip, and kit

Semiconductor devices and methods of manufacturing

Photosensitive resin composition and display device

Chemical liquid, chemical liquid storage body, pattern forming meth...

Pattern forming method, method for producing electronic device, and...

Negative photoresist used for semiconductor encapsulation process

Negative type photosensitive composition curable at low temperature

Silicon-containing coating agent for pattern reversal

Negative type photosensitive composition comprising black colorant

Negative type photosensitive composition

Negative type photosensitive composition curable at low temperature

Treatment liquid and pattern forming method

Photopolymer composition

Pattern forming method, method for manufacturing electronic device,...

Photopolymer composition

Photopolymer composition

Treatment liquid and pattern forming method

Treatment liquid and pattern forming method

Manufacturing method of semiconductor chip, and kit

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Pattern forming method, method for producing electronic device, and...

Lithographic printing precursor

Cross-linkable fluorinated photopolymer

Tetracarboxylic acid diester compound, polymer of polyimide precurs...

Photosensitive resin composition and electronic device including cu...

Pattern forming method, method for manufacturing electronic device,...

Cross-linkable fluorinated photopolymer

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME

Composition For Forming Silicon-Containing Resist Underlayer Film A...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER

MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING

PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION

PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND...

PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

UV- AND HEAT-CURABLE LADDER-LIKE POLYSILSESQUIOXANE COPOLYMER, INSU...

Semiconductor Devices and Methods of Manufacturing

CURABLE RESIN COMPOSITION, THIN FILM, AND COLOR CONVERSION PANEL AN...

NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION COMPRISING BLACK COLORANT

NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION

DISPERSION LIQUID, COMPOSITION, CURED FILM, COLOR FILTER, SOLID-STA...

METHOD OF MANUFACTURING CURED FILM, PHOTOCURABLE RESIN COMPOSITION,...

NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE

TREATMENT LIQUID AND PATTERN FORMING METHOD

Photosensitive Resin Composition And Display Device

MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT

Semiconductor Devices and Methods of Manufacturing

PHOTOPOLYMER COMPOSITION

CROSS-LINKABLE FLUORINATED PHOTOPOLYMER

NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE

PHOTOSENSITIVE SILOXANE COMPOSITION

PHOTOPOLYMER COMPOSITION

CROSS-LINKABLE FLUORINATED PHOTOPOLYMER

PHOTORESIST COMPOSITIONS, INTERMEDIATE PRODUCTS, AND METHODS OF MAN...

LITHOGRAPHIC PRINTING PRECURSOR

PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

RESIN COMPOSITION, CURED FILM OF SAME AND METHOD FOR MANUFACTURING...