with silicon- containing groups in the side chains

Industry

CPC
G03F7/0758

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0758with silicon- containing groups in the side chains

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
UV- and heat-curable ladder-like polysilsesquioxane copolymer, insu...
- Patent number 12,276,912
- Issue date Apr 15, 2025
- Korea Institute of Science and Technology
- Seung Sang Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Curable resin composition, thin film, and color conversion panel an...
- Patent number 12,252,587
- Issue date Mar 18, 2025
- Samsung SDI Co., Ltd.
- Seungeun Lee
- G02 - OPTICS
Information Patent Grant
Curable resin composition, thin film, and color conversion panel an...
- Patent number 12,122,879
- Issue date Oct 22, 2024
- Samsung SDI Co., Ltd.
- Seungeun Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,099,298
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,977,333
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor chip, and kit
- Patent number 11,914,300
- Issue date Feb 27, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,842,896
- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition and display device
- Patent number 11,774,852
- Issue date Oct 3, 2023
- Duk San Neolux Co., Ltd
- Jun Bae
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical liquid, chemical liquid storage body, pattern forming meth...
- Patent number 11,747,727
- Issue date Sep 5, 2023
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, method for producing electronic device, and...
- Patent number 11,733,611
- Issue date Aug 22, 2023
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative photoresist used for semiconductor encapsulation process
- Patent number 11,644,750
- Issue date May 9, 2023
- Jiangsu Aisen Semiconductor Material Co., Ltd.
- Wensheng Xiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative type photosensitive composition curable at low temperature
- Patent number 11,630,390
- Issue date Apr 18, 2023
- Merck Patent GmbH
- Motoki Misumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing coating agent for pattern reversal
- Patent number 11,609,499
- Issue date Mar 21, 2023
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative type photosensitive composition comprising black colorant
- Patent number 11,579,527
- Issue date Feb 14, 2023
- Merck Patent GmbH
- Seishi Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative type photosensitive composition
- Patent number 11,579,530
- Issue date Feb 14, 2023
- Merck Patent GmbH
- Daishi Yokoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative type photosensitive composition curable at low temperature
- Patent number 11,506,978
- Issue date Nov 22, 2022
- Merck Patent GmbH
- Motoki Misumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 11,453,734
- Issue date Sep 27, 2022
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photopolymer composition
- Patent number 11,435,664
- Issue date Sep 6, 2022
- LG Chem, Ltd.
- Heon Kim
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 11,150,557
- Issue date Oct 19, 2021
- FUJIFILM Corporation
- Naoya Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photopolymer composition
- Patent number 11,126,082
- Issue date Sep 21, 2021
- LG Chem, Ltd.
- Seokhoon Jang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photopolymer composition
- Patent number 11,079,678
- Issue date Aug 3, 2021
- LG Chem, Ltd.
- Seok Hoon Jang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 11,042,094
- Issue date Jun 22, 2021
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 10,962,884
- Issue date Mar 30, 2021
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor chip, and kit
- Patent number 10,942,455
- Issue date Mar 9, 2021
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,928,727
- Issue date Feb 23, 2021
- FUJIFILM Corporation
- Shuji Hirano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern forming method, method for producing electronic device, and...
- Patent number 10,859,914
- Issue date Dec 8, 2020
- FUJIFILM Corporation
- Naoya Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing precursor
- Patent number 10,850,548
- Issue date Dec 1, 2020
- Toray Industries, Inc.
- Yasunori Kuse
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Cross-linkable fluorinated photopolymer
- Patent number 10,838,302
- Issue date Nov 17, 2020
- Orthogonal, Inc.
- Charles Warren Wright
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tetracarboxylic acid diester compound, polymer of polyimide precurs...
- Patent number 10,816,900
- Issue date Oct 27, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POLYSILOXANE FORMULATION
- Publication number 20250136765
- Publication date May 1, 2025
- Merck Patent GmbH
- Akira YAMASAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20240427245
- Publication date Dec 26, 2024
- TAKOMA TECHNOLOGY CO., LTD.
- Mi Sun Ryu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Composition For Forming Silicon-Containing Resist Underlayer Film A...
- Publication number 20240319598
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takehiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER
- Publication number 20240295814
- Publication date Sep 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT
- Publication number 20240152055
- Publication date May 9, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING
- Publication number 20240079235
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION
- Publication number 20230350290
- Publication date Nov 2, 2023
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND...
- Publication number 20230333478
- Publication date Oct 19, 2023
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
- Publication number 20230109843
- Publication date Apr 13, 2023
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Jong Han YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UV- AND HEAT-CURABLE LADDER-LIKE POLYSILSESQUIOXANE COPOLYMER, INSU...
- Publication number 20220372231
- Publication date Nov 24, 2022
- Korea Institute of Science and Technology
- Seung Sang HWANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Semiconductor Devices and Methods of Manufacturing
- Publication number 20220367177
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CURABLE RESIN COMPOSITION, THIN FILM, AND COLOR CONVERSION PANEL AN...
- Publication number 20220306809
- Publication date Sep 29, 2022
- Samsung SDI Co., Ltd.
- Seungeun LEE
- G02 - OPTICS
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION COMPRISING BLACK COLORANT
- Publication number 20220260913
- Publication date Aug 18, 2022
- Seishi SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION
- Publication number 20220260912
- Publication date Aug 18, 2022
- Merck Patent GmbH
- Daishi YOKOYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPERSION LIQUID, COMPOSITION, CURED FILM, COLOR FILTER, SOLID-STA...
- Publication number 20220213296
- Publication date Jul 7, 2022
- FUJIFILM CORPORATION
- Yushi KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING CURED FILM, PHOTOCURABLE RESIN COMPOSITION,...
- Publication number 20220171285
- Publication date Jun 2, 2022
- FUJIFILM CORPORATION
- Kazuomi INOUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE
- Publication number 20210208503
- Publication date Jul 8, 2021
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Motoki MISUMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20210200097
- Publication date Jul 1, 2021
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photosensitive Resin Composition And Display Device
- Publication number 20210165320
- Publication date Jun 3, 2021
- DUK SAN NEOLUX CO., LTD.
- Jun BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT
- Publication number 20210157241
- Publication date May 27, 2021
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- B24 - GRINDING POLISHING
Information Patent Application
Semiconductor Devices and Methods of Manufacturing
- Publication number 20210035797
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Jui Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOPOLYMER COMPOSITION
- Publication number 20210026239
- Publication date Jan 28, 2021
- LG CHEM, LTD.
- Heon KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CROSS-LINKABLE FLUORINATED PHOTOPOLYMER
- Publication number 20200301276
- Publication date Sep 24, 2020
- Orthogonal, Inc.
- Charles Warren WRIGHT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE
- Publication number 20200301277
- Publication date Sep 24, 2020
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- MOTOKI MISUMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE SILOXANE COMPOSITION
- Publication number 20200201179
- Publication date Jun 25, 2020
- MERCK PERFORMANCE MATERIALS MANUFACTURING G.K.
- MEGUMI TAKAHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOPOLYMER COMPOSITION
- Publication number 20190317404
- Publication date Oct 17, 2019
- LG CHEM, LTD.
- Seok Hoon JANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CROSS-LINKABLE FLUORINATED PHOTOPOLYMER
- Publication number 20190227436
- Publication date Jul 25, 2019
- Orthogonal, Inc.
- Charles Warren WRIGHT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS, INTERMEDIATE PRODUCTS, AND METHODS OF MAN...
- Publication number 20190179227
- Publication date Jun 13, 2019
- Samsung Electronics Co., Ltd.
- JIN PARK
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LITHOGRAPHIC PRINTING PRECURSOR
- Publication number 20190143730
- Publication date May 16, 2019
- TORAY INDUSTRIES, INC.
- Yasunori KUSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
- Publication number 20190137877
- Publication date May 9, 2019
- Rohm and Haas Electronic Materials Korea Ltd.
- Jong Han Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

with silicon- containing groups in the side chains

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Treatment liquid and pattern forming method

UV- and heat-curable ladder-like polysilsesquioxane copolymer, insu...

Curable resin composition, thin film, and color conversion panel an...

Curable resin composition, thin film, and color conversion panel an...

Resist composition and method of forming resist pattern

Semiconductor devices and methods of manufacturing

Manufacturing method of semiconductor chip, and kit

Semiconductor devices and methods of manufacturing

Photosensitive resin composition and display device

Chemical liquid, chemical liquid storage body, pattern forming meth...

Pattern forming method, method for producing electronic device, and...

Negative photoresist used for semiconductor encapsulation process

Negative type photosensitive composition curable at low temperature

Silicon-containing coating agent for pattern reversal

Negative type photosensitive composition comprising black colorant

Negative type photosensitive composition

Negative type photosensitive composition curable at low temperature

Treatment liquid and pattern forming method

Photopolymer composition

Pattern forming method, method for manufacturing electronic device,...

Photopolymer composition

Photopolymer composition

Treatment liquid and pattern forming method

Treatment liquid and pattern forming method

Manufacturing method of semiconductor chip, and kit

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Pattern forming method, method for producing electronic device, and...

Lithographic printing precursor

Cross-linkable fluorinated photopolymer

Tetracarboxylic acid diester compound, polymer of polyimide precurs...

Patents Applicationslast 30 patents

POLYSILOXANE FORMULATION

PHOTOSENSITIVE RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME

Composition For Forming Silicon-Containing Resist Underlayer Film A...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER

MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING

PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION

PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND...

PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

UV- AND HEAT-CURABLE LADDER-LIKE POLYSILSESQUIOXANE COPOLYMER, INSU...

Semiconductor Devices and Methods of Manufacturing

CURABLE RESIN COMPOSITION, THIN FILM, AND COLOR CONVERSION PANEL AN...

NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION COMPRISING BLACK COLORANT

NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION

DISPERSION LIQUID, COMPOSITION, CURED FILM, COLOR FILTER, SOLID-STA...

METHOD OF MANUFACTURING CURED FILM, PHOTOCURABLE RESIN COMPOSITION,...

NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE

TREATMENT LIQUID AND PATTERN FORMING METHOD

Photosensitive Resin Composition And Display Device

MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT

Semiconductor Devices and Methods of Manufacturing

PHOTOPOLYMER COMPOSITION

CROSS-LINKABLE FLUORINATED PHOTOPOLYMER

NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE

PHOTOSENSITIVE SILOXANE COMPOSITION

PHOTOPOLYMER COMPOSITION

CROSS-LINKABLE FLUORINATED PHOTOPOLYMER

PHOTORESIST COMPOSITIONS, INTERMEDIATE PRODUCTS, AND METHODS OF MAN...

LITHOGRAPHIC PRINTING PRECURSOR

PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM