with variable aperture

Industry

CPC
H01J2237/0455

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0455with variable aperture

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for real time stereo imaging using multiple ele...
- Patent number 11,942,303
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for charged particle flooding to enhance voltag...
- Patent number 11,929,232
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Frank Nan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable thickness ion source extraction plate
- Patent number 11,810,746
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-leaf collimator
- Patent number 11,771,922
- Issue date Oct 3, 2023
- Shanghai United Imaging Healthcare Co., Ltd.
- Yanfang Liu
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Apparatus of electron beam comprising pinnacle limiting plate and m...
- Patent number 11,664,186
- Issue date May 30, 2023
- BORRIES PTE. LTD.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for etching a substrate
- Patent number 11,581,161
- Issue date Feb 14, 2023
- ASML Netherlands, B.V.
- Jie Fang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Multi-leaf collimator
- Patent number 11,497,936
- Issue date Nov 15, 2022
- Shanghai United Imaging Healthcare Co., Ltd.
- Yanfang Liu
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Multi-leaf collimator and driving system
- Patent number 11,342,093
- Issue date May 24, 2022
- SHANGHAI UNITED IMAGING HEALTHACRE CO., LTD.
- Jian Zhang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,183,359
- Issue date Nov 23, 2021
- HITACHI HIGH-TECH CORPORATION
- Kenichi Nishinaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus having an aperture unit and method for sett...
- Patent number 11,139,140
- Issue date Oct 5, 2021
- Carl Zeiss Microscopy GmbH
- Dirk Preikszas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 10,790,112
- Issue date Sep 29, 2020
- Hitachi High-Tech Science Corporation
- Yoshimi Kawanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for charged particle flooding to enhance voltag...
- Patent number 10,784,077
- Issue date Sep 22, 2020
- ASML Netherlands B.V.
- Frank Nan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with tailored extraction shape
- Patent number 10,714,296
- Issue date Jul 14, 2020
- Axcelis Technologies, Inc.
- Patrick T. Heres
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device for moving an aperture having pluralit...
- Patent number 10,636,621
- Issue date Apr 28, 2020
- Hitachi High-Technologies Corporation
- Akinari Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-leaf collimator and driving system
- Patent number 10,510,456
- Issue date Dec 17, 2019
- Shanghai United Imaging Healthcare Co., Ltd.
- Jian Zhang
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,460,908
- Issue date Oct 29, 2019
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable mass resolving aperture
- Patent number 10,083,815
- Issue date Sep 25, 2018
- Glenn Lane Family Limited Liability Limited Partnership
- Glenn E. Lane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spectroscopy in a transmission charged-particle microscope
- Patent number 9,991,087
- Issue date Jun 5, 2018
- FEI Company
- Erwin Fernand de Jong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High energy ion implanter, beam current adjuster, and beam current...
- Patent number 9,576,771
- Issue date Feb 21, 2017
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kouji Inada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-dimensional mass resolving slit mechanism for semiconductor pro...
- Patent number 9,496,117
- Issue date Nov 15, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Jason M. Schaller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable mass resolving aperture
- Patent number 9,401,260
- Issue date Jul 26, 2016
- Glenn Lane Family Limited Liability Limited Partnership
- Glenn E. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High energy ion implanter, beam current adjuster, and beam current...
- Patent number 9,269,541
- Issue date Feb 23, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kouji Inada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and ion implantation method
- Patent number 9,208,996
- Issue date Dec 8, 2015
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implant method and implanter by using a variable aperture
- Patent number 9,057,129
- Issue date Jun 16, 2015
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,006,654
- Issue date Apr 14, 2015
- Hitachi High-Technologies Corporation
- Soichiro Matsunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope and scanning transmission electron mic...
- Patent number 8,878,130
- Issue date Nov 4, 2014
- Hitachi High-Technologies Corporation
- Hiromi Inada
- G01 - MEASURING TESTING
Information Patent Grant
Ion implantation apparatus
- Patent number 8,742,374
- Issue date Jun 3, 2014
- Nissin Ion Equipment Co., Ltd.
- Masao Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mass analysis variable exit aperture
- Patent number 8,669,517
- Issue date Mar 11, 2014
- Axcelis Technologies, Inc.
- William O. Hamby
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implant method and implanter by using a variable aperture
- Patent number 8,669,539
- Issue date Mar 11, 2014
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming a photolithography reticle
- Patent number 8,609,305
- Issue date Dec 17, 2013
- Samsung Electronics Co., Ltd.
- Jin Choi
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME
- Publication number 20240412407
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Junghee Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20240379325
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...
- Publication number 20240379322
- Publication date Nov 14, 2024
- Carl Zeiss MultiSEM GmbH
- Alexander Wertz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...
- Publication number 20240371608
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Ryan Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE B...
- Publication number 20230298848
- Publication date Sep 21, 2023
- Kabushiki Kaisha Toshiba
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLIT DIAPHRAGM
- Publication number 20230274922
- Publication date Aug 31, 2023
- SINGULUS TECHNOLOGIES AG
- Peter WEIPERT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR DEPOSITING PIEZOELECTRIC MATERIALS, METHODS FOR USING TH...
- Publication number 20230257869
- Publication date Aug 17, 2023
- QORVO BIOTECHNOLOGIES, LLC
- Derya Deniz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REAL TIME STEREO IMAGING USING MULTIPLE ELE...
- Publication number 20230154723
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Thickness Ion Source Extraction Plate
- Publication number 20230080083
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...
- Publication number 20210142979
- Publication date May 13, 2021
- ASML NETHERLANDS B.V.
- Frank Nan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20210035770
- Publication date Feb 4, 2021
- Hitachi High-Tech Corporation
- Kenichi NISHINAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM SCANNING ELECTRON MICROSCOPE
- Publication number 20200373115
- Publication date Nov 26, 2020
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ETCHING A SUBSTRATE
- Publication number 20200211817
- Publication date Jul 2, 2020
- ASML NETHERLANDS B.V.
- Jie FANG
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ION SOURCE WITH TAILORED EXTRACTION APERTURE SHAPE
- Publication number 20200194219
- Publication date Jun 18, 2020
- Axcelis Technologies Inc.
- Patrick T. Heres
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LEAF COLLIMATOR AND DRIVING SYSTEM
- Publication number 20200118701
- Publication date Apr 16, 2020
- Shanghai United Imaging Healthcare Co., Ltd.
- Jian ZHANG
- G01 - MEASURING TESTING
Information Patent Application
Adjustable Mass Resolving Aperture
- Publication number 20190172679
- Publication date Jun 6, 2019
- Glenn Lane Family Limited Liability Limited Partnership
- Glenn E. LANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20190066975
- Publication date Feb 28, 2019
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20180233319
- Publication date Aug 16, 2018
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yoshimi KAWANAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20150034835
- Publication date Feb 5, 2015
- Hitachi High-Technologies Corporation
- Soichiro Matsunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE MASS RESOLVING APERTURE
- Publication number 20140261173
- Publication date Sep 18, 2014
- GLENN E. LANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPLANT METHOD AND IMPLANTER BY USING A VARIABLE APERTURE
- Publication number 20140161987
- Publication date Jun 12, 2014
- ADVANCED ION BEAM TECHNOLOGY., INC.
- ZHIMIN WAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SCANNING ELECTRON MICROSCOPE AND SCANNING TRANSMISSION ELECTRON MIC...
- Publication number 20140138542
- Publication date May 22, 2014
- Hitachi High-Technologies Corporation
- Hiromi Inada
- G01 - MEASURING TESTING
Information Patent Application
ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD
- Publication number 20140134833
- Publication date May 15, 2014
- SEN Corporation
- Mitsukuni Tsukihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS
- Publication number 20140053778
- Publication date Feb 27, 2014
- NISSIN ION EQUIPMENT CO., LTD.
- Masao Naito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compact High Precision Adjustable Beam Defining Aperture
- Publication number 20130020495
- Publication date Jan 24, 2013
- The Regents of the University of California
- Simon A. Morton
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Mass Analysis Variable Exit Aperture
- Publication number 20120298854
- Publication date Nov 29, 2012
- Axcelis Technologies, Inc.
- William O. Hamby
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE SYSTEMS FOR INTEGRATED CIRCUIT FABRICATION
- Publication number 20120292535
- Publication date Nov 22, 2012
- Jin Choi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Beam Exposure Systems and Methods of Forming a Reticle Using the Same
- Publication number 20120288787
- Publication date Nov 15, 2012
- SAMSUNG ELECTRONICS CO., LTD.
- Jin Choi
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMPLANT METHOD AND IMPLANTER BY USING A VARIABLE APERTURE
- Publication number 20110233431
- Publication date Sep 29, 2011
- Zhimin WAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND SYSTEM FOR CONTROLLING ION RIBBON BEAM UNIFORMITY IN...
- Publication number 20110155929
- Publication date Jun 30, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Neil J. Bassom
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

with variable aperture

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods for real time stereo imaging using multiple ele...

Systems and methods for charged particle flooding to enhance voltag...

Variable thickness ion source extraction plate

Multi-leaf collimator

Apparatus of electron beam comprising pinnacle limiting plate and m...

Systems and methods for etching a substrate

Multi-leaf collimator

Multi-leaf collimator and driving system

Charged particle beam apparatus

Particle beam apparatus having an aperture unit and method for sett...

Focused ion beam apparatus

Systems and methods for charged particle flooding to enhance voltag...

Ion source with tailored extraction shape

Charged particle beam device for moving an aperture having pluralit...

Multi-leaf collimator and driving system

Multi charged particle beam writing apparatus and multi charged par...

Adjustable mass resolving aperture

Spectroscopy in a transmission charged-particle microscope

High energy ion implanter, beam current adjuster, and beam current...

Two-dimensional mass resolving slit mechanism for semiconductor pro...

Adjustable mass resolving aperture

High energy ion implanter, beam current adjuster, and beam current...

Ion implantation apparatus and ion implantation method

Implant method and implanter by using a variable aperture

Charged particle beam apparatus

Scanning electron microscope and scanning transmission electron mic...

Ion implantation apparatus

Mass analysis variable exit aperture

Implant method and implanter by using a variable aperture

Methods of forming a photolithography reticle

Patents Applicationslast 30 patents

SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...

SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRI...

CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE B...

SLIT DIAPHRAGM

SYSTEM FOR DEPOSITING PIEZOELECTRIC MATERIALS, METHODS FOR USING TH...

SYSTEMS AND METHODS FOR REAL TIME STEREO IMAGING USING MULTIPLE ELE...

Variable Thickness Ion Source Extraction Plate

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAG...

Charged Particle Beam Apparatus

MULTI-BEAM SCANNING ELECTRON MICROSCOPE

SYSTEMS AND METHODS FOR ETCHING A SUBSTRATE

ION SOURCE WITH TAILORED EXTRACTION APERTURE SHAPE

MULTI-LEAF COLLIMATOR AND DRIVING SYSTEM

Adjustable Mass Resolving Aperture

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

FOCUSED ION BEAM APPARATUS

CHARGED PARTICLE BEAM APPARATUS

ADJUSTABLE MASS RESOLVING APERTURE

IMPLANT METHOD AND IMPLANTER BY USING A VARIABLE APERTURE

SCANNING ELECTRON MICROSCOPE AND SCANNING TRANSMISSION ELECTRON MIC...

ION IMPLANTATION APPARATUS AND ION IMPLANTATION METHOD

ION IMPLANTATION APPARATUS

Compact High Precision Adjustable Beam Defining Aperture

Mass Analysis Variable Exit Aperture

EXPOSURE SYSTEMS FOR INTEGRATED CIRCUIT FABRICATION

Beam Exposure Systems and Methods of Forming a Reticle Using the Same

IMPLANT METHOD AND IMPLANTER BY USING A VARIABLE APERTURE

APPARATUS AND SYSTEM FOR CONTROLLING ION RIBBON BEAM UNIFORMITY IN...