X-ray radiation

Industry

CPC
G03F7/2039

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2039X-ray radiation

Industries

Patents Grantslast 30 patents

Information Patent Grant
Quantum-limited extreme ultraviolet coherent diffraction imaging
- Patent number 12,085,520
- Issue date Sep 10, 2024
- Regents of the Univ of Colorado
- Henry C. Kapteyn
- G01 - MEASURING TESTING
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition, and resis...
- Patent number 11,926,581
- Issue date Mar 12, 2024
- SAN-APRO LIMITED
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method for forming resist pattern, and polyphen...
- Patent number 11,480,877
- Issue date Oct 25, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing a scattered beam collimator, scattered beam co...
- Patent number 11,443,867
- Issue date Sep 13, 2022
- Siemens Healthcare GmbH
- Thorsten Ergler
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and apparatus for determining a radiation beam intensity pro...
- Patent number 11,353,796
- Issue date Jun 7, 2022
- ASML Netherlands B.V.
- Teis Johan Coenen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
3D/flip/motion photo-substrate, imaging processes, and applications...
- Patent number 11,300,714
- Issue date Apr 12, 2022
- Sun Chemical Corporation
- Bo Sun
- G02 - OPTICS
Information Patent Grant
Female mold and method for manufacturing the same
- Patent number 11,131,930
- Issue date Sep 28, 2021
- BOE Technology Group Co., Ltd.
- Lianjie Qu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Chemical amplification type positive photosensitive resin compositi...
- Patent number 11,061,326
- Issue date Jul 13, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silsesquioxane resin and oxaamine composition
- Patent number 10,990,012
- Issue date Apr 27, 2021
- Dow Silicones Corporation
- Peng-Fei Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition, cured film, pattern forming...
- Patent number 10,921,708
- Issue date Feb 16, 2021
- FUJIFILM Corporation
- Yuki Nara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Optical systems, metrology apparatus and associated method
- Patent number 10,725,381
- Issue date Jul 28, 2020
- ASML Netherlands B.V.
- Sietse Thijmen Van Der Post
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Curable composition, method of manufacturing curable composition, f...
- Patent number 10,719,012
- Issue date Jul 21, 2020
- FUJIFILM Corporation
- Kazuya Oota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-pass patterning using nonreflecting radiation lithography on...
- Patent number 10,678,137
- Issue date Jun 9, 2020
- Intel Corporation
- Manish Chandhok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for patterning a substrate using extreme ultraviolet lithogr...
- Patent number 10,606,176
- Issue date Mar 31, 2020
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography patterning with a gas phase resist
- Patent number 10,514,610
- Issue date Dec 24, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive composition, antistatic film, laminate and production th...
- Patent number 10,488,757
- Issue date Nov 26, 2019
- Mitsubishi Chemical Corporation
- Akira Yamazaki
- B32 - LAYERED PRODUCTS
Information Patent Grant
Exposure focus leveling method using region-differentiated focus sc...
- Patent number 10,209,636
- Issue date Feb 19, 2019
- SanDisk Technologies LLC
- Tohru Toda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process using the same
- Patent number 10,126,649
- Issue date Nov 13, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Reflection mask and pattern formation method
- Patent number 10,036,959
- Issue date Jul 31, 2018
- TOSHIBA MEMORY CORPORATION
- Masaru Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing patterned object, patterned object, and li...
- Patent number 9,939,727
- Issue date Apr 10, 2018
- Ushio Denki Kabushiki Kaisha
- Go Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,632,410
- Issue date Apr 25, 2017
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification resist composition, resist film using the co...
- Patent number 9,625,813
- Issue date Apr 18, 2017
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reagent and composition of resist
- Patent number 9,618,844
- Issue date Apr 11, 2017
- Toyo Gosei Co., Ltd.
- Satoshi Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for synchronous operation of debris-mitigation...
- Patent number 9,609,731
- Issue date Mar 28, 2017
- Media Lario S.r.l.
- Raymond Merrill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, resist film...
- Patent number 9,568,824
- Issue date Feb 14, 2017
- FUJIFILM Corporation
- Toshiya Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection patterning with exposure mask
- Patent number 9,570,301
- Issue date Feb 14, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transport system for an extreme ultraviolet light source
- Patent number 9,557,650
- Issue date Jan 31, 2017
- ASML Netherlands B.V.
- Silvia De Dea
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, electron beam-sensitive or extreme ultravio...
- Patent number 9,470,980
- Issue date Oct 18, 2016
- FUJIFILM Corporation
- Naoki Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pre-patterned hard mask for ultrafast lithographic imaging
- Patent number 9,285,682
- Issue date Mar 15, 2016
- Intel Corporation
- Robert L. Bristol
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, and resis...
- Patent number 9,285,679
- Issue date Mar 15, 2016
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...
- Publication number 20250004370
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Beomseok KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...
- Publication number 20240419072
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL BEAM SENSOR WITH CENTER TRANSMISSIVE CUT-OUT
- Publication number 20240271996
- Publication date Aug 15, 2024
- KLA Corporation
- Matthew Hoffman
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, X-RAY DIFFRACTION DEVICE...
- Publication number 20240231234
- Publication date Jul 11, 2024
- Mitsubishi Electric Corporation
- Yasuhiro MATSUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Quantum-limited Extreme Ultraviolet Coherent Diffraction Imaging
- Publication number 20220100094
- Publication date Mar 31, 2022
- Henry C. Kapteyn
- G01 - MEASURING TESTING
Information Patent Application
3D/FLIP/MOTION PHOTO-SUBSTRATE, IMAGING PROCESSES, AND APPLICATIONS...
- Publication number 20210190997
- Publication date Jun 24, 2021
- SUN CHEMICAL CORPORATION
- Bo SUN
- G02 - OPTICS
Information Patent Application
SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIS...
- Publication number 20210147352
- Publication date May 20, 2021
- SAN-APRO LTD.
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, CURED FILM, PATTERN FORMING...
- Publication number 20210132496
- Publication date May 6, 2021
- FUJIFILM CORPORATION
- Yuki NARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING A SCATTERED BEAM COLLIMATOR, SCATTERED BEAM CO...
- Publication number 20200402682
- Publication date Dec 24, 2020
- Siemens Healthcare GmbH
- Thorsten ERGLER
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WIT...
- Publication number 20200356001
- Publication date Nov 12, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Determining a Radiation Beam Intensity Pro...
- Publication number 20200098486
- Publication date Mar 26, 2020
- ASML NETHERLANDS B.V.
- Teis Johan COENEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D/FLIP/MOTION PHOTO-SUBSTRATE, IMAGING PROCESSES, AND APPLICATIONS...
- Publication number 20190243033
- Publication date Aug 8, 2019
- SUN CHEMICAL CORPORATION
- Bo SUN
- G02 - OPTICS
Information Patent Application
PHOTOSENSITIVE COMPOSITION, CURED FILM, OPTICAL FILTER, LAMINATE, P...
- Publication number 20190196325
- Publication date Jun 27, 2019
- FUJIFILM CORPORATION
- Tetsushi Miyata
- G02 - OPTICS
Information Patent Application
Silsesquioxane Resin and Oxaamine Composition
- Publication number 20190171106
- Publication date Jun 6, 2019
- Dow Silicones Corporation
- Peng-Fei FU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITI...
- Publication number 20190101825
- Publication date Apr 4, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Optical Systems, Metrology Apparatus and Associated Method
- Publication number 20190072853
- Publication date Mar 7, 2019
- ASML NETHERLANDS B.V.
- Sietse Thijmen VAN DER POST
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Lithography Patterning with a Gas Phase Resist
- Publication number 20180314167
- Publication date Nov 1, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Shu-Hao Chang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, CURED FILM, PATTERN FORMING...
- Publication number 20180275514
- Publication date Sep 27, 2018
- FUJIFILM CORPORATION
- Yuki NARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FEMALE MOLD AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20180275520
- Publication date Sep 27, 2018
- BOE TECHNOLOGY GROUP CO., LTD.
- Lianjie Qu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
CURABLE COMPOSITION, METHOD OF MANUFACTURING CURABLE COMPOSITION, F...
- Publication number 20180094118
- Publication date Apr 5, 2018
- FUJIFILM CORPORATION
- Kazuya OOTA
- G02 - OPTICS
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHEN...
- Publication number 20180074402
- Publication date Mar 15, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION TH...
- Publication number 20170261854
- Publication date Sep 14, 2017
- MITSUBISHI CHEMICAL CORPORATION
- Akira YAMAZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CONTROLLING DIMENSIONS OF NANOWIRES
- Publication number 20170191176
- Publication date Jul 6, 2017
- Hewlett-Packard Development Company, L.P.
- Graeme Scott
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERNING METHOD, AND TEMPLATE FOR NANOIMPRINT AND PRODUCING METHO...
- Publication number 20160077436
- Publication date Mar 17, 2016
- Kabushiki Kaisha Toshiba
- Hideaki SAKURAI
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20160048076
- Publication date Feb 18, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20160018732
- Publication date Jan 21, 2016
- FUJIFILM CORPORATION
- SHUHEI YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND...
- Publication number 20160004155
- Publication date Jan 7, 2016
- Shin-Etsu Chemical Co., Ltd.
- Masaki OHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection Patterning With Exposure Mask
- Publication number 20150348775
- Publication date Dec 3, 2015
- National Taiwan University
- Kuen-Yu Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Lithography Patterning
- Publication number 20150241776
- Publication date Aug 27, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shang-Chieh Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL WAVELENGTH DISPERSION DEVICE AND METHOD OF MANUFACTURING TH...
- Publication number 20150153648
- Publication date Jun 4, 2015
- PHOTON CHIP, INC.
- Cheng-Hao Ko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

X-ray radiation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Quantum-limited extreme ultraviolet coherent diffraction imaging

Sulfonium salt, photoacid generator, curable composition, and resis...

Resist composition, method for forming resist pattern, and polyphen...

Method for producing a scattered beam collimator, scattered beam co...

Method and apparatus for determining a radiation beam intensity pro...

3D/flip/motion photo-substrate, imaging processes, and applications...

Female mold and method for manufacturing the same

Chemical amplification type positive photosensitive resin compositi...

Silsesquioxane resin and oxaamine composition

Radiation-sensitive resin composition, cured film, pattern forming...

Optical systems, metrology apparatus and associated method

Curable composition, method of manufacturing curable composition, f...

Multi-pass patterning using nonreflecting radiation lithography on...

Method for patterning a substrate using extreme ultraviolet lithogr...

Lithography patterning with a gas phase resist

Conductive composition, antistatic film, laminate and production th...

Exposure focus leveling method using region-differentiated focus sc...

Resist composition and patterning process using the same

Reflection mask and pattern formation method

Method for manufacturing patterned object, patterned object, and li...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Chemical amplification resist composition, resist film using the co...

Reagent and composition of resist

Systems and methods for synchronous operation of debris-mitigation...

Actinic-ray- or radiation-sensitive resin composition, resist film...

Projection patterning with exposure mask

Transport system for an extreme ultraviolet light source

Pattern-forming method, electron beam-sensitive or extreme ultravio...

Pre-patterned hard mask for ultrafast lithographic imaging

Actinic ray-sensitive or radiation-sensitive composition, and resis...

Patents Applicationslast 30 patents

POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...

ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...

OPTICAL BEAM SENSOR WITH CENTER TRANSMISSIVE CUT-OUT

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, X-RAY DIFFRACTION DEVICE...

Quantum-limited Extreme Ultraviolet Coherent Diffraction Imaging

3D/FLIP/MOTION PHOTO-SUBSTRATE, IMAGING PROCESSES, AND APPLICATIONS...

SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIS...

RADIATION-SENSITIVE RESIN COMPOSITION, CURED FILM, PATTERN FORMING...

METHOD FOR PRODUCING A SCATTERED BEAM COLLIMATOR, SCATTERED BEAM CO...

PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WIT...

Method and Apparatus for Determining a Radiation Beam Intensity Pro...

3D/FLIP/MOTION PHOTO-SUBSTRATE, IMAGING PROCESSES, AND APPLICATIONS...

PHOTOSENSITIVE COMPOSITION, CURED FILM, OPTICAL FILTER, LAMINATE, P...

Silsesquioxane Resin and Oxaamine Composition

CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITI...

Optical Systems, Metrology Apparatus and Associated Method

Lithography Patterning with a Gas Phase Resist

RADIATION-SENSITIVE RESIN COMPOSITION, CURED FILM, PATTERN FORMING...

FEMALE MOLD AND METHOD FOR MANUFACTURING THE SAME

CURABLE COMPOSITION, METHOD OF MANUFACTURING CURABLE COMPOSITION, F...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHEN...

CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION TH...

CONTROLLING DIMENSIONS OF NANOWIRES

PATTERNING METHOD, AND TEMPLATE FOR NANOIMPRINT AND PRODUCING METHO...

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTO ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND...

Projection Patterning With Exposure Mask

Method for Lithography Patterning

OPTICAL WAVELENGTH DISPERSION DEVICE AND METHOD OF MANUFACTURING TH...