3245794

Information

• Patent Grant
• 3245794

• References
• Source

• Patent Number

  3,245,794

• Date Filed

  Not available

• Date Issued

  Tuesday, April 12, 1966
  59 years ago

• CPC

  • G03B27/53 - Automatic registration or positioning of originals with respect to each other or the photosensitive layer
  • C23F1/02 - Local etching
  • H01J3/10 - Arrangements for centering ray or beam
  • Y10S438/948 - Radiation resist

• US Classifications

  • 430 - Radiation imagery chemistry: process, composition, or product thereof
  • 438 - Semiconductor device manufacturing: process