3615944

Information

• Patent Grant
• 3615944

• References
• Source

• Patent Number

  3,615,944

• Date Filed

  Not available

• Date Issued

  Tuesday, October 26, 1971
  53 years ago

• CPC

  • C30B31/106 - Continuous processes
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • Y10S118/90 - Semiconductor vapor doping
  • Y10S148/006 - Apparatus
  • Y10S148/037 - Diffusion-deposition
  • Y10S148/049 - Equivalence and options
  • Y10S438/907 - Continuous processing
  • Y10S438/909 - Controlled atmosphere
  • Y10S438/935 - Gas flow control

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 034 - Drying and gas or vapor contact with solids
  • 118 - Coating apparatus
  • 148 - Metal treatment