3793070

Information

• Patent Grant
• 3793070

• References
• Source

• Patent Number

  3,793,070

• Date Filed

  Not available

• Date Issued

  Tuesday, February 19, 1974
  51 years ago

• CPC

  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L31/18 - Processes or apparatus peculiar to the manufacture or treatment of these devices or of parts thereof
  • Y10S148/049 - Equivalence and options
  • Y10S148/063 - Gp II-IV-VI compounds
  • Y10S148/064 - Gp II-VI compounds
  • Y10S148/085 - Isolated-integrated
  • Y10S438/925 - Fluid growth doping control
  • Y10S438/936 - Graded energy gap
  • Y10S438/971 - Stoichiometric control of host substrate composition

• US Classifications

  • 117 - Single-crystal, oriented-crystal, and epitaxy growth processes
  • 118 - Coating apparatus
  • 148 - Metal treatment
  • 257 - Active solid-state devices
  • 438 - Semiconductor device manufacturing: process