3867497

Information

• Patent Grant
• 3867497

• References
• Source

• Patent Number

  3,867,497

• Date Filed

  Not available

• Date Issued

  Tuesday, February 18, 1975
  49 years ago

• CPC

  • C23C16/01 - on temporary substrates
  • C23C16/24 - Deposition of silicon only
  • Y10S148/025 - Deposition multi-step
  • Y10S148/073 - Hollow body
  • Y10S148/122 - Polycrystalline

• US Classifications

  • 264 - Plastic and nonmetallic article shaping or treating: processes
  • 148 - Metal treatment
  • 216 - Etching a substrate: processes
  • 438 - Semiconductor device manufacturing: process