Claims
- 1) A composition useful as a photoresist remover that comprises an alkylene carbonate and one or more additional components selected from the group consisting of: an organic peroxide, and an N-substituted morpholine.
- 2) A composition according to claim 1 having a water content of less than 1.0% by weight based upon the total weight of said composition.
- 3) A composition according to claim 1 wherein said alkylene carbonate is selected from the group consisting of: ethylene carbonate, propylene carbonate, and butylene carbonate.
- 4) A composition according to claim 1 wherein said organic peroxide is selected from the group consisting of: tertiarybutyl hydroperoxide; di-tertiarybutyl peroxide; tertiary amyl hydroperoxide; cumene hydroperoxide; and ethylbenzene hydroperoxide.
- 5) A composition according to claim 1 wherein said N-substituted morpholine is N-formyl morpholine.
- 6) A composition according to claim 1 wherein said alkylene carbonate is propylene carbonate, and said additional component is tertiary butyl peroxide.
- 7) A composition according to claim 6 wherein propylene carbonate is present in any amount between 0.1% and 85.0% by weight based upon the total weight of said composition
- 8) A composition according to claim 6 wherein tertiary butyl peroxide is present in any amount between 0.1 and 35.0% by weight based upon the total weight of said composition.
- 9) A composition according to claim 1 wherein said alkylene carbonate is propylene carbonate, and said additional component is N-formyl morpholine.
- 10) A composition according to claim 9 wherein propylene carbonate is present in any amount between 0.1% and 70.0% by weight based upon the total weight of said composition
- 11) A composition according to claim 9 wherein N-formyl morpholine is present in any amount between 0.1% and 70.0% by weight based upon the total weight of said composition.
- 12) A composition according to claim 9 having a water content of less than 1.0% by weight based upon the total weight of said composition.
- 13) A composition useful as a photoresist remover that comprises an N-substituted morpholine and at least one other additional component selected from the group consisting of: 2-(2-aminoethoxy) ethanol; propylene glycol monomethyl ether; isopropyl alcohol; and benzyl alcohol.
- 14) A composition according to claim 13 wherein said N-substituted morpholine is N-formyl morpholine.
- 15) A composition according to claim 13 wherein said N-substituted morpholine is present in any amount between 0.1% and 60.0% by weight based upon the total weight of said composition.
- 16) A composition according to claim 13 wherein said other additional component comprises 2-(2-aminoethoxy) ethanol, and wherein said other additional component is present in any amount between 0.1% and 60.0% by weight based upon the total weight of said composition.
- 17) A composition according to claim 13 wherein said other additional component comprises propylene glycol monomethyl ether, and wherein said other additional component is present in any amount between 0.1% and 60.0% by weight based upon the total weight of said composition.
- 18) A composition according to claim 13 wherein said other additional component comprises isopropyl alcohol, and wherein said other additional component is present in any amount between 0.1% and 60.0% by weight based upon the total weight of said composition.
- 19) A composition according to claim 13 wherein said other additional component comprises benzyl alcohol, and wherein said other additional component is present in any amount between 0.1% and 60.0% by weight based upon the total weight of said composition.
- 20) A composition useful as a photoresist remover that comprises an organic peroxide and at least one other additional component selected from the group consisting of: 2-(2-aminoethoxy) ethanol; propylene glycol monomethyl ether; isopropyl alcohol; an N-substituted morpholine; N-methyl pyrrolidone; sulfuric acid; ethyl lactate; and benzyl alcohol, and combinations thereof.
- 21) A composition according to claim 20 further comprising a solvent.
- 22) A composition according to claim 21 wherein said solvent is a hydrocarbon solvent.
- 23) A composition according to claim 21 wherein said solvent is a solvent selected from the group consisting of: limonene and cyclopentanone.
- 24) A composition according to claim 20 wherein said organic peroxide is t-butyl hydroperoxide.
- 25) A composition useful as a photoresist remover that comprises an organic peroxide and at least one other additional component selected from the group consisting of: propylene glycol monomethyl ether; isopropyl alcohol; an N-substituted morpholine; N-methyl pyrrolidone; ethyl lactate; and benzyl alcohol, and combinations thereof, and optionally comprising 2-(2-aminoethoxy) ethanol.
CROSS-REFERENCES TO RELATED APPLICATIONS
[0001] This invention claims priority to, and is a continuation-in-part of application Ser. No. 09/606,465 filed Jun. 29, 2000, the entire contents of which are herein incorporated by reference thereto.
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09606465 |
Jun 2000 |
US |
Child |
09946313 |
Sep 2001 |
US |