Claims
- 1. A composition useful as a photoresist remover that comprises N-formyl morpholine and 2-(2-aminoethoxy)ethanol, wherein 2-(2-aminoethoxy)ethanol is present in any amount between 0.1% and 60.0% by weight based upon the total weight of said composition.
CROSS-REFERENCES TO RELATED APPLICATIONS
This invention claims priority to, and is a divisional application of U.S. Ser. No. 09/946,313 filed Sep. 5, 2001, now U.S. Pat. No. 6,475,708, which itself was a continuation-in-part of application Ser. No. 09/606,465 filed Jun. 29, 2000, now abandoned, the entire contents of which applications are herein incorporated fully by reference thereto.
US Referenced Citations (15)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
09/606465 |
Jun 2000 |
US |
Child |
09/946313 |
|
US |