Claims
- 1. Apparatus for chemical vapor deposition of diamond, comprising:
- at least one filament resistant to temperatures up to about 2500.degree. C.,
- at least one substrate capable of receiving a diamond coating,
- means for holding said substrate with an edge facing said filament at a distance therefrom up to about 1 mm., and for continuously moving said substrate relative to said filament,
- means for heating said filament,
- means for supplying a gas to contact said filament and substrate, and
- an enclosure adapted to maintain said filament and substrate at subatmospheric pressure.
- 2. Apparatus according to claim 1 wherein the distance between said substrate and filament is in the range of about 0.25-1 mm.
- 3. Apparatus according to claim 2 wherein said means for holding said substrate includes substrate cooling means.
- 4. Apparatus according to claim 2 wherein said filament is of tungsten.
- 5. Apparatus according to claim 2 wherein said substrate is of molybdenum.
- 6. Apparatus according to claim 2 wherein the distance between said substrate and filament is in the range of about 0.3-0.7
- 7. Apparatus according to claim 2 wherein said filament is cylindrical.
- 8. Apparatus according to claim 1 comprising at least two filaments in a plane perpendicular to that of said substrate and having said gas supply means on the opposite side of said filaments from said substrate.
- 9. Apparatus according to claim 1 comprising a single filament and a plurality of substrates.
- 10. Apparatus according to claim 1 wherein said edge of said substrate is parallel to said filament.
- 11. Apparatus according to claim 1 wherein said means for holding said substrate is adapted to rotate said substrate between positions in which its edge is perpendicular and parallel to said filament.
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a division of application Ser. No. 08/261,358 filed Jun. 13, 1994, which application is a continuation-in-part of application Ser. No. 08/194,958, filed Feb. 14, 1994, now abandoned.
US Referenced Citations (3)
Non-Patent Literature Citations (1)
Entry |
Aikyo et al., "Diamond Synthesis Suppressing the Thermal Decomposition of Methane in a Hot-Filament CVD", Jpn. J. Appl. Phys. 28(9), Sep. 1989, pp. L1631-L1633. |
Divisions (1)
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Number |
Date |
Country |
Parent |
261358 |
Jun 1994 |
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Continuation in Parts (1)
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Number |
Date |
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194958 |
Feb 1994 |
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