Information
-
Patent Grant
-
6740170
-
Patent Number
6,740,170
-
Date Filed
Thursday, September 27, 200122 years ago
-
Date Issued
Tuesday, May 25, 200420 years ago
-
Inventors
-
Original Assignees
-
Examiners
Agents
- Parkhurst & Wendel, L.L.P.
-
CPC
-
US Classifications
Field of Search
US
- 015 77
- 015 883
- 015 884
- 015 102
- 015 1035
- 134 6
-
International Classifications
-
Abstract
A cleaning apparatus (9) for cleaning a peripheral part of a substrate holds a peripheral part of a substrate (1) between the elastic porous member (29) of an upper cleaning roller (16) and an elastic porous member (30) of a lower cleaning roller (17). The power of a drive motor (13) is transmitted through a drive pulley (18), a belt (26) and a driven pulley (24) to a rotating shaft (17a) to rotate the lower cleaning roller (17), and is transmitted through a drive pulley (22), a belt (25) and a driven pulley (23) to a rotating shaft (16a) to rotate the upper cleaning roller (16) in a direction opposite the direction in which the lower cleaning roller (17) is rotated. A cleaning liquid is supplied through cleaning liquid supply nozzles (31) and cleaning liquid supply pipes (31a) into core members (27, 28). Then the cleaning liquid flows through connecting holes (35) formed in the circumferential walls of the core members (27, 28) and permeates the elastic porous members (29, 30). In this state, the upper cleaning roller (16) and the lower cleaning roller (17) are rotated, and the upper cleaning roller (16) and the lower cleaning roller (17) are moved relative to the substrate (1) by a base (11) along the peripheral part of the substrate (1) held between the elastic porous members (29, 30) of the upper and the lower cleaning rollers (16, 17). Splashing of the cleaning liquid can be effectively prevented and the quality of a high-definition pattern formed on the substrate (1) can be preserved.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to the manufacture of a substrate provided with a high-definition pattern, such as a substrate provided with a semiconductor circuit, a substrate for a liquid crystal display or a color filter. More particularly, the present invention relates to a cleaning apparatus for cleaning a peripheral part of a substrate, to be employed in a coating process for coating a substrate, such as glass substrate, with a thin film, such as a resist film or a color layer, and a method to be carried out by such a cleaning apparatus.
2. Description of the Related Art
A color filter manufacturing method, for instance, includes a process for forming a chromium film on a substrate, such as a glass substrate, by a vacuum evaporation method or the like; a process for forming a black screening layer of a pattern of stripes or cross stripes by forming a photoresist film on the chromium film, exposing the photoresist film through a photomask to light, subjecting the exposed photoresist film to development, etching the chromium film through the photoresist and removing the photoresist; a process for forming a three-color layer consisting of three color layers, i.e., a R-layer, a G-layer and a B-layer, by coating a first-color photosensitive material on the black screening layer, placing a photomask on the first-color photosensitive material, exposing the first-color photosensitive material through the photomask to light and developing the exposed first-color photosensitive material, and repeating the same process for second-color and third-color layers; and a process for forming a transparent electrode layer by forming an indium tin oxide film (ITO film) on the three-color layer.
In the process for coating a color photosensitive material, the substrate is coated with a coating liquid of a color photosensitive material by a coating method, such as a spin coating method or a slit coating method. Such a coating method drips a coating liquid on a central part of a rotating substrate to spread the coating liquid over the substrate by centrifugal force. As shown in
FIG. 4B
, when a coating layer
2
is formed on the upper surface of a substrate
1
by this coating method, the coating liquid flows via the edge of the substrate
1
to the lower surface of the substrate
1
and a thick peripheral part
2
a
is formed on a peripheral part of the upper surface of the substrate
1
. If the coating layer
2
having the thick peripheral part
2
a
is subjected to a developing process, the coating layer remains on the peripheral part of the substrate
1
.
Thus, a conventional cleaning method uses a pair of cleaning nozzles
3
disposed opposite to each other so as to correspond to the peripheral part of the substrate
1
provided with the coating layer
2
. The cleaning nozzles
3
are moved in the direction of the arrow, spraying a cleaning liquid (developer) on the peripheral part of the substrate
1
to clean the peripheral part of the substrate
1
.
SUMMARY OF THE INVENTION
When the substrate
1
is cleaned by this conventional cleaning method, however, the substrate
1
splashes about the cleaning liquid sprayed through the cleaning nozzles
3
on the substrate
1
or the tips of the cleaning nozzles
3
touch the substrate
1
, so that the cleaning liquid wets the surface of the substrate
1
other than the peripheral part, which is apt to degrade the quality of the high-definition pattern formed on the substrate
1
.
The present invention has been made in view of such problems and it is therefore an object of the present invention to provide an apparatus and method for cleaning a peripheral part of a substrate, capable of effectively preventing the splashing of a cleaning liquid and of preventing the degradation of the quality of a high-definition pattern formed on the substrate.
A cleaning apparatus according to an aspect of the present invention for cleaning a peripheral part of a substrate comprises an upper cleaning roller supported for rotation on a base, and including a core member and an elastic porous member covering the circumference of the core member; a lower cleaning roller supported for rotation on the base, including a core member and an elastic porous member covering the circumference of the core member, and capable of holding a peripheral part of the substrate together with the elastic porus member of the upper cleaning roller; a drive mechanism for driving the upper cleaning roller and the lower cleaning roller for rotation; a moving mechanism for moving the upper cleaning roller and the lower cleaning roller relative to the substrate; and a cleaning liquid supply system for supplying a cleaning liquid to at least either the elastic porous member of the upper cleaning roller or that of the lower cleaning roller.
In the cleaning apparatus of the present invention, it is preferable that the cleaning liquid supply system has a cleaning liquid supply pipe to supply the cleaning liquid to the elastic porous members. It is preferable that the core member is a hollow member having a circumferential wall provided with holes, and the cleaning liquid carried by the cleaning liquid supply pipe is supplied through the interior and the holes of the core member to the elastic porous member.
In the cleaning apparatus of the present invention, it is preferable that at least either the upper cleaning roller or the lower cleaning roller is supported for rotation on the base by a rotating shaft, and the cleaning liquid supply system has a cleaning liquid passage formed in the rotating shaft supporting the upper cleaning roller or the lower cleaning roller to supply the cleaning liquid to the elastic porous member. It is preferable that the core member is provided with a connecting passage connected to the cleaning liquid passage of the rotating shaft and opening into the elastic porous member to supply the cleaning liquid carried by the cleaning liquid passage of the rotating shaft to the elastic porous member. It is preferable that the core member is a hollow member having a circumferential wall provided with holes, and the cleaning liquid supplied through the cleaning liquid passage of the rotating shaft is supplied through the interior and the holes of the core member to the elastic porous member.
Preferably, the upper cleaning roller and the lower cleaning roller are interlocked and the drive mechanism is provided with a single drive motor for driving the upper cleaning roller and the lower cleaning roller.
A cleaning method of cleaning a peripheral part of a substrate according to a second aspect of the present invention comprises the steps of holding a peripheral part of a substrate between respective elastic porous members of upper and lower cleaning rollers; supplying a cleaning liquid to at least either the elastic porous member of the upper cleaning roller or that of the lower cleaning roller; and rotating the upper cleaning roller and the lower cleaning roller, moving the upper cleaning roller and the lower cleaning roller relative to the substrate held between the elastic porous members of the upper cleaning roller and the lower cleaning roller.
According to the present invention, the cleaning liquid is supplied to the elastic porous members of the upper and the lower cleaning rollers with the substrate held between the elastic porous members of the upper and the lower cleaning rollers, and the upper and the lower cleaning roller are rotated and moved relative to the substrate. Thus, the splashing of the cleaning liquid can be effectively prevented when removing a thick part on the peripheral part of the substrate of the film formed on the substrate and, consequently, the quality of the high-definition pattern formed on the substrate can be preserved.
BRIEF DESCRIPTION OF THE DRAWINGS
FIGS. 1A
,
1
B and
1
C are a partly sectional plan view, a sectional view taken on line IB—IB in
FIG. 1A and a
sectional view taken on line IC—IC in
FIG. 1A
, respectively, of a cleaning apparatus in an embodiment according to the present invention for cleaning a peripheral part of a substrate, in which parts behind those shown therein are omitted properly;
FIGS. 2A and 2B
are diagrammatic views of assistance in explaining a cleaning method using the cleaning apparatus shown in
FIGS. 1A
,
1
B and
1
C;
FIG. 3
is a sectional view, similar to
FIG. 1C
, of a cleaning apparatus in another embodiment according to the present invention for cleaning a peripheral part of a substrate; and
FIGS. 4A and 4B
are views of assistance in explaining a conventional cleaning apparatus for cleaning a peripheral part of a substrate.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Preferred embodiments of the present invention will be described with reference to the accompanying drawings.
A cleaning apparatus in an embodiment according to the present invention for cleaning a peripheral part of a substrate will be described with reference to
FIGS. 1A
,
1
B,
1
C and
2
A and
2
B.
Referring to
FIGS. 1A
,
1
B and
1
C, a cleaning apparatus
9
in an embodiment according to the present invention includes a moving base (base)
11
, which is driven for movement in parallel to a surface of a substrate
1
along a rail
10
by a motor, not shown, a drive motor
13
fixedly held on a bracket
12
attached to the moving base
11
, an upper cleaning roller
16
mounted on a shaft
16
a
supported for rotation by a bearing unit
14
on the moving base
11
, and a lower cleaning roller
17
mounted on a shaft
17
a
supported for rotation by a bearing unit
15
on the moving base
11
. The moving base
11
is included in a moving mechanism for moving the upper cleaning roller
16
and the lower cleaning roller
17
relative to the substrate
1
.
A first drive pulley
18
and a drive pinion
19
are fixedly mounted on the output shaft
13
a
of the drive motor
13
. A rotating shaft
20
is supported for rotation in parallel to the output shaft
13
a
of the drive motor
13
in bearings
20
a
on the bracket
12
. A driven gear
21
and a second drive pulley
22
are fixedly mounted on the rotating shaft
20
. The driven gear
21
is engaged with the drive pinion
19
.
The upper cleaning roller
16
and the lower cleaning roller
17
are mounted on end parts of the shafts
16
a
and
17
a
, respectively. Driven pulleys
23
and
24
are fixedly mounted on the other end parts of the rotating shafts
16
a
and
17
a
, respectively. A belt
25
is extended between the second drive pulley
22
and the driven pulley
23
fixed to the rotating shaft
16
a
. A belt
26
is extended between the first drive pulley
18
and the driven pulley
24
fixed to the rotating shaft
17
a
. The drive motor
13
, the drive pulleys
18
and
22
, the drive pinion
19
, the driven gear
21
, the driven pulleys
23
and
24
, the belts
25
and
26
and the rotating shafts
16
a
and
17
a
constitute a rotative drive mechanism for driving the upper cleaning roller
16
and the lower cleaning roller
17
for coordinated rotation.
The upper cleaning roller
16
and the lower cleaning roller
17
have tubular (hollow) core members
27
and
28
, and spongy, elastic porous members
29
and
30
coating the circumferences of the core members
27
and
28
, respectively. A peripheral part of a substrate
1
is held between the elastic porous member
29
of the upper cleaning roller
16
and the elastic porous member
30
of the lower cleaning roller
17
as shown in FIG.
1
C. Each of the core members
27
and
28
is provided in its circumferential wall with one or more connecting holes
35
as shown in FIG.
1
C.
Cleaning liquid supply nozzles
31
are attached to the bearing units
14
and
15
, respectively, and are connected to a cleaning liquid tank, not shown. Cleaning liquid supply pipes
31
a
are connected to the cleaning liquid supply nozzles
31
. Extremities of the cleaning liquid supply pipes
31
a
are inserted in the core members
27
and
28
, respectively, to supply a cleaning liquid into the core members
27
and
28
. The cleaning liquid supplied into the core members
27
and
28
is supplied through the connecting holes
35
to the elastic porous members
29
and
30
. The cleaning liquid tank, not shown, the cleaning liquid supply nozzles
31
and the cleaning liquid supply pipes
31
a
constitute a cleaning liquid supply system for supplying the cleaning liquid to the respective elastic porous members
29
and
30
of the upper cleaning roller
16
and the lower cleaning roller
17
.
The operation of the cleaning apparatus thus constructed will be described hereinafter.
A peripheral part of the substrate
1
is held between the respective elastic porous members
29
and
30
of the upper cleaning roller
16
and the lower cleaning roller
17
. As shown in
FIG. 1C
, the substrate
1
is thus held so that the peripheral part may not project from the elastic porous members
29
and
30
. The width of the peripheral part held between the elastic porous members
29
and
30
, the respective heights and positions of the elastic porous members
29
and
30
are adjusted properly by an adjusting mechanism, not shown.
Then the drive motor
13
is actuated. The rotation of the drive motor
13
is transmitted through the drive pulley
18
, the belt
26
and the driven pulley
24
to the rotating shaft
17
a
to rotate the lower cleaning roller
17
, and is transmitted through the drive pulley
22
, the belt
25
and the driven pulley
23
to the rotating shaft
16
a
to rotate the upper cleaning roller
16
in a direction opposite the direction of rotation of the lower cleaning roller
17
. The cleaning liquid is supplied through the cleaning nozzles
31
and the cleaning liquid supply pipes
31
a
into the core members
27
and
28
. Then the cleaning liquid soaks through the connecting holes
35
formed in the circumferential walls of the core members
27
and
28
into the elastic porous members
29
and
30
.
Thus, the upper cleaning roller
16
and the lower cleaning roller
17
thus rotated is moved along the peripheral part of the substrate
1
held between the elastic porous members
29
and
30
of the upper cleaning roller
16
and the lower cleaning roller
17
relative to the substrate
1
by the moving base
11
. Thus, a thick part (the thick part
2
a
shown in
FIG. 4B
) formed in the peripheral part of the substrate
1
can be cleaned and removed.
FIGS. 2A and 2B
illustrates methods of cleaning peripheral parts extending along the four sides of the substrate
1
by the cleaning apparatus
9
. In
FIGS. 2A and 2B
, indicated at
9
a
,
9
b
,
9
c
and
9
d
are cleaning apparatuses (roller units each provided with an upper cleaning roller
16
and a lower cleaning roller
17
) similar to the cleaning apparatus
9
shown in
FIGS. 1A
,
1
B and
1
C.
FIG. 2A
is a view of assistance in explaining a first cleaning method. The four cleaning apparatuses
9
a
,
9
b
,
9
c
and
9
d
are arranged as shown in
FIG. 2A
to clean the peripheral parts extending along the four edges of the substrate
1
. The peripheral parts extending along the opposite side edges of the substrate
1
are cleaned by the cleaning apparatuses
9
a
and
9
b
, the substrate
1
is turned through an angle of 90°, and then the peripheral parts extending along the opposite end edges of the substrate
1
are cleaned by the cleaning apparatuses
9
c
and
9
d.
FIG. 2B
is a view of assistance in explaining a second cleaning method. The two cleaning apparatuses
9
a
and
9
b
are arranged as shown in
FIG. 2B
to clean the peripheral parts extending along the four edges of the substrate
1
. The peripheral parts extending along the opposite side edges of the substrate
1
are cleaned by the cleaning apparatuses
9
a
and
9
b
, the substrate
1
is turned through an angle of 90°, the cleaning devices
9
a
and
9
b
are moved while the distance between the cleaning devices
9
a
and
9
b
are increased, and then the peripheral parts extending along the opposite end edges of the substrate
1
are cleaned by the cleaning apparatuses
9
a
and
9
b.
The cleaning apparatus in this embodiment supplies the cleaning liquid to the respective elastic porous members
29
and
30
of the upper cleaning roller
16
and the lower cleaning roller
17
holding the peripheral part of the substrate
1
therebetween, rotates the upper cleaning roller
16
and the lower cleaning roller
17
, and moves the upper cleaning roller
16
and the lower cleaning roller
17
relative to the substrate
1
. Thus, the thick part formed on the peripheral part of the substrate
1
can be cleaned and removed, effectively preventing the splashing of the cleaning liquid, so that the quality of the high-definition pattern formed on the substrate
1
can be preserved.
In this embodiment, the substrate
1
is held stationary and the upper cleaning roller
16
and the lower cleaning roller
17
are moved relative to the substrate
1
. Since it is necessary to move the upper cleaning roller
16
and the lower cleaning roller
17
relative to the substrate
1
, the upper cleaning roller
16
and the lower cleaning roller
17
may be kept stationary and the substrate
1
may be moved relative to the upper cleaning roller
16
and the lower cleaning roller
17
.
Although the cleaning liquid is supplied to both the elastic porous members
29
and
30
in this embodiment, the cleaning liquid supply nozzle
31
and the cleaning liquid supply pipe
31
a
may be combined with only either the core member
27
or
28
, and the cleaning liquid may be made to percolate through both the elastic porous members
29
and
30
in contact with each other by the agency of the property of the porous structure of the elastic porous members
29
and
30
.
Another Emodiment
A cleaning apparatus in another embodiment according to the present invention for cleaning a peripheral part of a substrate will be described with reference to FIG.
3
. The cleaning apparatus in another embodiment shown in
FIG. 3
is substantially the same as the cleaning apparatus in the embodiment shown in
FIGS. 1A
,
1
B,
1
C and
2
, except that a cleaning liquid supply system is different from that of the above-mentioned embodiment. Therefore, parts shown in
FIG. 3
like or corresponding to those of the cleaning apparatus in the above-mentioned embodiment are denoted by the same reference characters and the description thereof will be omitted.
Referring to
FIG. 3
, a cleaning apparatus
9
′ in this embodiment has rotating shafts
16
a
and
17
a
respectively supporting an upper cleaning roller
16
and a lower cleaning roller
17
on end parts thereof. Axial cleaning liquid supply passages
32
are formed in the rotating shafts
16
a
and
17
a
, respectively. Rotary joints
33
provided with cleaning liquid passages
36
are connected to the other end parts of the rotating shafts
16
a
and
17
a
. The rotary joints
33
are connected to a cleaning liquid tank, not shown. The cleaning liquid passages
36
of the rotary joints
33
are connected to the cleaning liquid passages
32
of the rotating shafts
16
a
and
17
a
, respectively. Radial passages
34
are formed in core members
27
and
28
so as to extend radially from the rotating shafts
16
a
and
17
a
and to open into porous members
29
and
30
, respectively. A cleaning liquid supplied through the cleaning liquid passages
36
of the rotary joints
33
and the cleaning liquid supply passages
32
of the rotating shafts
16
a
and
17
a
is supplied through the connecting passages
34
to the elastic porous members
29
and
30
. The cleaning liquid passages
36
of the rotary joints
33
, the cleaning liquid supply passages
32
of the rotating shafts
16
a
and
17
a
, and the connecting passages
34
constitute a cleaning liquid supply system for supplying the cleaning liquid to the elastic porous members
29
and
30
of the upper cleaning roller
16
and the lower cleaning roller
17
.
Although the cleaning liquid passages
32
of the rotating shafts
16
a
and
17
a
are connected directly to the circumferential walls of the core members
27
and
28
by the connecting passages
34
in this embodiment, the circumferential walls of the core members
27
and
28
may be provided, similarly to those of the first embodiment shown in
FIGS. 1A
,
1
B and
1
C, connecting holes
35
, and the cleaning liquid supplied through the cleaning liquid passages
32
may be supplied through the interiors of the core members
27
and
28
and the connecting holes
35
to the elastic porous members
29
and
30
.
The present invention is not limited in its practical application to the preferred embodiments specifically described herein and various changes may be made therein.
Claims
- 1. A cleaning method of cleaning four peripheral parts extending along four edges of a rectangular substrate, comprising the steps of:providing at least a pair of first cleaning apparatuses placed on opposite sides of a direction of relative movement of the rectangular substrate at an interval corresponding to a distance between first opposite edges of the rectangular substrate, and at least a pair of second cleaning apparatuses placed on the opposite edges of the direction of relative movement of the rectangular substrate at an interval corresponding to a distance between second opposite edges of the rectangular substrate, each of said first and second cleaning apparatus including an upper cleaning roller and a lower cleaning roller; holding first opposite peripheral parts extending along the first opposite edges of the rectangular substrate by said respective first cleaning apparatuses, with the respective first opposite peripheral parts of the rectangular substrate being held between elastic porous members of the upper and lower cleaning rollers of said respective first cleaning apparatus; supplying a cleaning liquid to at least either the elastic porous member of the upper cleaning roller or that of the lower cleaning roller of said respective first cleaning apparatuses; rotating the upper and lower cleaning rollers of said respective first cleaning apparatuses, while moving the respective upper and lower cleaning rollers relative to the rectangular substrate along the direction of relative movement of the rectangular substrate, with the respective first peripheral parts of the rectangular substrate being held between the elastic porous members of the upper and lower cleaning rollers of said respective first cleaning apparatuses; turning the rectangular substrate in a plane thereof through an angle of 90° so that second opposite edges of the rectangular substrate are placed at said respective second cleaning apparatuses after the first opposite peripheral parts of the rectangular substrate are cleaned by said respective first cleaning apparatuses; and cleaning second opposite peripheral parts extending along the second opposite edges of the rectangular substrate by said cleaning apparatuses by repeatedly conducting said holding step, said supplying step and said rotating step with respect to the second opposite parts of the rectangular substrate.
- 2. The cleaning method according to claim 1, wherein the rectangular substrate to be cleaned is a substrate for a color filter.
- 3. A cleaning method of cleaning four peripheral parts extending along four edges of a rectangular substrate, comprising the steps of:providing at least a pair of cleaning apparatuses placed on opposite sides of a direction of relative movement of the rectangular substrate at an interval corresponding to a distance between first opposite edges of the rectangular substrate, each of said cleaning apparatuses including an upper cleaning roller and a lower cleaning roller; holding first opposite peripheral parts extending along the first opposite edges of the rectangular substrate by said respective cleaning apparatuses, with the respective first opposite peripheral parts of the rectangular substrate being held between elastic porous members of the upper and lower cleaning rollers of said respective cleaning apparatuses; supplying a cleaning liquid to at least either the elastic porous member of the upper cleaning roller or the elastic porous member of the lower cleaning roller of said respective cleaning apparatuses; rotating the upper and lower cleaning rollers of said respective cleaning apparatuses, while moving the respective upper and lower cleaning rollers relative to the rectangular substrate along the direction of relative movement of the rectangular substrate, with the respective first peripheral parts of the rectangular substrate being held between the elastic porous members of the upper and lower cleaning rollers of said respective cleaning apparatuses; turning the rectangular substrate in a plane thereof through an angle of 90° so that second opposite edges of the rectangular substrate are placed at said respective cleaning apparatuses after the first opposite peripheral parts of the rectangular substrate are cleaned by said respective cleaning apparatuses; adjusting a distance between said cleaning apparatuses in accordance with a distance between the second opposite edges of the rectangular substrate; and cleaning second opposite peripheral parts extending along the second opposite edges of the rectangular substrate by said cleaning apparatuses by repeatedly conducting said holding step, said supplying step and said rotating step with respect to the second opposite peripheral parts of the rectangular substrate.
- 4. The cleaning method according to claim 3, wherein the rectangular substrate to be cleaned is a substrate for a color filter.
- 5. A cleaning system comprising:at least a pair of cleaning apparatuses placed on opposite sides of a direction of relative movement of a rectangular substrate at an interval corresponding to a distance between opposite edges of the rectangular substrate; means for turning the rectangular substrate with respect to said cleaning apparatuses in a plane thereof through an angle of 90°; wherein said cleaning apparatuses are placed on opposite sides of a direction of relative movement of the rectangular substrate at an interval corresponding to a distance between the opposite edges of the rectangular substrate, and each of said respective cleaning apparatuses includes: an upper cleaning roller supported for rotation on a base and including a core member and an elastic porous member covering a circumference of the core member; a lower cleaning roller supported for rotation on the base, including a core member and an elastic porous member covering a circumference of the core member and capable of holding a peripheral part of the rectangular substrate together with the elastic porous member of the upper cleaning roller; a drive mechanism for driving the upper cleaning roller and the lower cleaning roller for rotation; a moving mechanism for moving the upper cleaning roller and the lower cleaning roller relative to the rectangular substrate; and a cleaning liquid supply system for supplying a cleaning liquid to at least either the elastic porous member of the upper cleaning roller or the elastic porous member of the lower cleaning roller.
- 6. The cleaning system according to claim 5, wherein a distance between maid cleaning apparatuses is adjusted in accordance with a distance between the opposite edges of the rectangular substrate.
- 7. The cleaning system according to claim 5, wherein each of the cleaning liquid supply systems of said cleaning apparatuses has a cleaning liquid supply pipe to supply the cleaning liquid to the elastic porous member.
- 8. The cleaning system according to claim 7, wherein each of the core members of said cleaning apparatuses is a hollow member having a circumferential wall provided with a hole, and the cleaning liquid carried by the cleaning liquid supply pipe is supplied through an interior and the hole of the core member to the elastic porous member.
- 9. The cleaning system according to claim 5, wherein at least either the upper cleaning roller or the lower cleaning roller of each of said cleaning apparatuses is supported for rotation on the base by a rotating shaft and each of the cleaning liquid supply systems of said cleaning apparatuses has a cleaning liquid passage formed in the rotating shaft supporting the upper cleaning roller or the lower cleaning roller to supply the cleaning liquid to the elastic porous member.
- 10. The cleaning apparatus according to claim 9, wherein each of the core members of said cleaning apparatuses is provided with a connecting passage connected to the cleaning liquid passage of the rotating shaft and opening into the elastic porous member to supply the cleaning liquid carried by the cleaning liquid passage of the rotating shaft to the elastic porous member.
- 11. The cleaning system according to claim 9, wherein each of the core members of said cleaning apparatuses is a hollow member having a circumferential wall provided with a hole, and the cleaning liquid supplied through the cleaning liquid passage of the rotating shaft is supplied through an interior and the hole of the core member to the elastic porous member.
- 12. The cleaning system according to claim 5, wherein the upper cleaning roller and the lower cleaning roller of said cleaning apparatuses are interlocked and each of the drive mechanisms of said cleaning apparatuses is provided with a single drive motor for driving the upper cleaning roller and the lower cleaning roller.
- 13. The cleaning system according to claim 5, wherein the rectangular substrate to be cleaned is a substrate for a color filter.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2000-026547 |
Feb 2000 |
JP |
|
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
PCT/JP01/00800 |
|
WO |
00 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO01/56713 |
8/9/2001 |
WO |
A |
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A |
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A |
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A |
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Number |
Date |
Country |
3-35145 |
Jul 1991 |
JP |
07-051640 |
Feb 1995 |
JP |
2000-011374 |
Jan 2000 |
JP |