BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a plan view of a substrate processing apparatus according to the present invention;
FIG. 2 is a front view of a liquid processing part in the substrate processing apparatus;
FIG. 3 is a front view of a thermal processing part in the substrate processing apparatus;
FIG. 4 is a view showing a construction around substrate rest parts;
FIG. 5A is a plan view of a transport robot;
FIG. 5B is a front view of the transport robot;
FIG. 6 is a view for illustrating a construction of a cleaning processing unit;
FIG. 7 is a schematic sectional view showing an example of the structure of a two-fluid nozzle;
FIG. 8A is a side sectional view of a heating part with a temporary substrate rest part;
FIG. 8B is a plan view of the heating part with the temporary substrate rest part;
FIG. 9 is a side view of an interface block;
FIG. 10 is a schematic block diagram showing a control mechanism for the substrate processing apparatus and an exposure unit;
FIG. 11 is a flow chart showing an example of a procedure for substrate stage cleaning;
FIG. 12 is a flow chart showing another example of the procedure for substrate stage cleaning;
FIG. 13 is a flow chart showing an example of a procedure for an alignment process in the exposure unit; and
FIG. 14 shows an immersion exposure process performed on a substrate in the exposure unit.