Liquid processing apparatus involving immersion washing apparatus involving immersion

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Patents Grantslast 30 patents

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User interface for darkroom process timer and film processor
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Substrate treating apparatus
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Method for controlling infrared illuminator and related image-recor...
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- SENGLED CO., LTD.
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Substrate conveyance device and substrate conveyance method, exposu...
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- Nikon Corporation
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Substrate conveyance device and substrate conveyance method, exposu...
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- Issue date Aug 4, 2015
- Nikon Corporation
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Optical element, exposure apparatus based on the use of the same, e...
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- Issue date May 13, 2014
- Nikon Corporation
- Takao Kokubun
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Digital stereo imaging photosensitive device for a grating and a ph...
- Patent number 8,705,011
- Issue date Apr 22, 2014
- Jinchang Gu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Substrate conveyance device and substrate conveyance method, exposu...
- Patent number 8,345,216
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- Nikon Corporation
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Spin-on film processing using acoustic radiation pressure
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- Micron Technology, Inc.
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Dynamic fluid control system for immersion lithography
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- Issue date Jun 5, 2012
- Nikon Corporation
- Michael Sogard
- C07 - ORGANIC CHEMISTRY
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Substrate conveyance device and substrate conveyance method, exposu...
- Patent number 8,107,055
- Issue date Jan 31, 2012
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- Atsushi Ohta
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Apparatus for and method of processing substrate
- Patent number 8,043,468
- Issue date Oct 25, 2011
- Dainippon Screen Mfg. Co., Ltd.
- Atsushi Osawa
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Substrate conveyance device and substrate conveyance method, exposu...
- Patent number 7,995,186
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- Zao Nikon Co., Ltd.
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Processing solution supply system, processing solution supply metho...
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- Issue date Apr 5, 2011
- Tokyo Electron Limited
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Method of developing photosensitive material and method of producin...
- Patent number 7,878,722
- Issue date Feb 1, 2011
- FUJIFILM Corporation
- Toyomi Matsuda
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Reducing contamination in immersion lithography
- Patent number 7,869,002
- Issue date Jan 11, 2011
- International Business Machines Corporation
- Dmitriy Shneyder
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Method of storing (meth)acrylic ester
- Patent number 7,828,021
- Issue date Nov 9, 2010
- Mitsubishi Chemical Corporation
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Optical element, exposure apparatus based on the use of the same, e...
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- Nikon Corporation
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Reducing contamination in immersion lithography
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- Issue date Aug 24, 2010
- International Business Machines Corporation
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Manufacturing method of semiconductor device
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- Issue date Jun 22, 2010
- Kabushiki Kaisha Toshiba
- Shinichi Ito
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Exposure apparatus
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- Issue date Apr 27, 2010
- Canon Kabushiki Kaisha
- Keiji Emoto
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Substrate processing apparatus
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- Issue date Apr 6, 2010
- Sokudo Co., Ltd.
- Tetsuya Hamada
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Bearing structure for a drive mechanism including a crimp
- Patent number 7,623,813
- Issue date Nov 24, 2009
- Ricoh Company, Ltd.
- Takuji Takahashi
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Substrate carrying apparatus, substrate carrying method, and coatin...
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- Issue date Jul 21, 2009
- Tokyo Electron Limited
- Masahiro Nakaharada
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Information Patent Grant
Clean booth and sheet conveyor device
- Patent number 7,536,940
- Issue date May 26, 2009
- FUJIFILM Corporation
- Takehiko Nakayama
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Image forming apparatus
- Patent number 7,450,144
- Issue date Nov 11, 2008
- Noritsu Koki Co., Ltd.
- Yozo Ohki
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Information Patent Grant
Apparatus and method for reducing contamination in immersion lithog...
- Patent number 7,446,859
- Issue date Nov 4, 2008
- International Business Machines Corporation
- Dmitriy Shneyder
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Information Patent Grant
Dynamic fluid control system for immersion lithography
- Patent number 7,426,014
- Issue date Sep 16, 2008
- Nikon Corporation
- Michael Sogard
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Information Patent Grant
Image processing method
- Patent number 7,307,763
- Issue date Dec 11, 2007
- FUJIFILM Corporation
- Hiroyasu Yamamoto
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Information Patent Grant
Processing device of photo-sensitive material
- Patent number 7,275,879
- Issue date Oct 2, 2007
- Mitsubishi Paper Mills Limited
- Akira Kunihiro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
USER INTERFACE FOR DARKROOM PROCESS TIMER AND FILM PROCESSOR
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- Publication date Apr 27, 2023
- Derek Lluisma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20180025921
- Publication date Jan 25, 2018
- SCREEN Holdings Co., Ltd.
- Kota KABUNE
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Instant photography with ordinary shell film
- Publication number 20150023657
- Publication date Jan 22, 2015
- Robert J. Crowley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SUBSTRATE CONVEYANCE DEVICE AND SUBSTRATE CONVEYANCE METHOD, EXPOSU...
- Publication number 20130094006
- Publication date Apr 18, 2013
- Zao Nikon Co., Ltd.
- Atsushi Ohta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS TO CONDUCT SPIN-ON FILM PROCESSING
- Publication number 20130014696
- Publication date Jan 17, 2013
- Micron Technology, Inc.
- Nishant Sinha
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Substrate conveyance device and substrate conveyance method, exposu...
- Publication number 20110261330
- Publication date Oct 27, 2011
- Nikon Corporation
- Atsushi Ohta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Digital stereo imaging photosensitive device for a grating and a ph...
- Publication number 20110249249
- Publication date Oct 13, 2011
- Jinchang Gu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High speed motion picture film processor
- Publication number 20110097074
- Publication date Apr 28, 2011
- Manfred G. Michelson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical element, exposure apparatus based on the use of the same, e...
- Publication number 20110013160
- Publication date Jan 20, 2011
- Nikon Corporation
- Takao Kokubun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING FOAM FORMATION
- Publication number 20100224257
- Publication date Sep 9, 2010
- Kalman Shamir
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN-ON FILM PROCESSING USING ACCOUSTIC RADIATION PRESSURE
- Publication number 20090253271
- Publication date Oct 8, 2009
- Micron Technology, Inc.
- Nishant Sinha
- B08 - CLEANING
Information Patent Application
Sheet humidifying device and image forming apparatus provided there...
- Publication number 20090107530
- Publication date Apr 30, 2009
- Konica Minolta Business Technologies, Inc.
- Masashi Kougami
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Information Patent Application
APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE
- Publication number 20090080879
- Publication date Mar 26, 2009
- Atsushi OSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dynamic fluid control system for immersion lithography
- Publication number 20080309895
- Publication date Dec 18, 2008
- Nikon Corporation
- Michael Sogard
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF DEVELOPING PHOTOSENSITIVE MATERIAL AND METHOD OF PRODUCIN...
- Publication number 20080292997
- Publication date Nov 27, 2008
- FUJIFILM CORPORATION
- Toyomi MATSUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING CONTAMINATION IN IMMERSION LITHOGRAPHY
- Publication number 20080284993
- Publication date Nov 20, 2008
- International Business Machines Corporation
- Dmitriy Shneyder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING CONTAMINATION IN IMMERSION LITHOGRAPHY
- Publication number 20080284994
- Publication date Nov 20, 2008
- International Business Machines Corporation
- Dmitriy Shneyder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method Of Storing (Meth)Acrylic Ester
- Publication number 20080011385
- Publication date Jan 17, 2008
- Kenji Takasaki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Substrate conveyance device and substrate conveyance method, exposu...
- Publication number 20070296940
- Publication date Dec 27, 2007
- Zao Nikon Co., Ltd.
- Atsushi Ohta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Processing solution supply system, processing solution supply metho...
- Publication number 20070269207
- Publication date Nov 22, 2007
- TOKYO ELECTRON LIMITED
- Junya Minamida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20070229787
- Publication date Oct 4, 2007
- Canon Kabushiki Kaisha
- Keiji Emoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive material processor
- Publication number 20070230952
- Publication date Oct 4, 2007
- FUJIFILM Corporation
- Toshihiro Noguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive material processing apparatus
- Publication number 20070217787
- Publication date Sep 20, 2007
- FUJIFILM Corporation
- Koji Itoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical element, exposure apparatus based on the use of the same, e...
- Publication number 20070201011
- Publication date Aug 30, 2007
- Nikon Corporation
- Takao Kokubun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate carrying apparatus, sustrate carrying method, and coating...
- Publication number 20070195297
- Publication date Aug 23, 2007
- Masahiro Nakaharada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20070188733
- Publication date Aug 16, 2007
- Shinichi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR EXPOSURE METHOD AND METHOD OF CONTROLLING SEMICONDUCT...
- Publication number 20070182948
- Publication date Aug 9, 2007
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20070177117
- Publication date Aug 2, 2007
- Keiji Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20070177119
- Publication date Aug 2, 2007
- Keiko Chiba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR REDUCING CONTAMINATION IN IMMERSION LITHOG...
- Publication number 20070177124
- Publication date Aug 2, 2007
- International Business Machines Corporation
- Dmitriy Shneyder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Liquid processing apparatus involving immersion washing apparatus involving immersion

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Patents Grantslast 30 patents

User interface for darkroom process timer and film processor

Substrate treating apparatus

Method for controlling infrared illuminator and related image-recor...

Substrate conveyance device and substrate conveyance method, exposu...

Substrate conveyance device and substrate conveyance method, exposu...

Optical element, exposure apparatus based on the use of the same, e...

Digital stereo imaging photosensitive device for a grating and a ph...

Substrate conveyance device and substrate conveyance method, exposu...

Spin-on film processing using acoustic radiation pressure

Dynamic fluid control system for immersion lithography

Substrate conveyance device and substrate conveyance method, exposu...

Apparatus for and method of processing substrate

Substrate conveyance device and substrate conveyance method, exposu...

Processing solution supply system, processing solution supply metho...

Method of developing photosensitive material and method of producin...

Reducing contamination in immersion lithography

Method of storing (meth)acrylic ester

Optical element, exposure apparatus based on the use of the same, e...

Reducing contamination in immersion lithography

Manufacturing method of semiconductor device

Exposure apparatus

Substrate processing apparatus

Bearing structure for a drive mechanism including a crimp

Substrate carrying apparatus, substrate carrying method, and coatin...

Clean booth and sheet conveyor device

Image forming apparatus

Apparatus and method for reducing contamination in immersion lithog...

Dynamic fluid control system for immersion lithography

Image processing method

Processing device of photo-sensitive material

Patents Applicationslast 30 patents

USER INTERFACE FOR DARKROOM PROCESS TIMER AND FILM PROCESSOR

SUBSTRATE TREATING APPARATUS

Instant photography with ordinary shell film

SUBSTRATE CONVEYANCE DEVICE AND SUBSTRATE CONVEYANCE METHOD, EXPOSU...

APPARATUS TO CONDUCT SPIN-ON FILM PROCESSING

Substrate conveyance device and substrate conveyance method, exposu...

Digital stereo imaging photosensitive device for a grating and a ph...

High speed motion picture film processor

Optical element, exposure apparatus based on the use of the same, e...

REDUCING FOAM FORMATION

SPIN-ON FILM PROCESSING USING ACCOUSTIC RADIATION PRESSURE

Sheet humidifying device and image forming apparatus provided there...

APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE

Dynamic fluid control system for immersion lithography

METHOD OF DEVELOPING PHOTOSENSITIVE MATERIAL AND METHOD OF PRODUCIN...

REDUCING CONTAMINATION IN IMMERSION LITHOGRAPHY

REDUCING CONTAMINATION IN IMMERSION LITHOGRAPHY

Method Of Storing (Meth)Acrylic Ester

Substrate conveyance device and substrate conveyance method, exposu...

Processing solution supply system, processing solution supply metho...

EXPOSURE APPARATUS

Photosensitive material processor

Photosensitive material processing apparatus

Optical element, exposure apparatus based on the use of the same, e...

Substrate carrying apparatus, sustrate carrying method, and coating...

Manufacturing method of semiconductor device

SEMICONDUCTOR EXPOSURE METHOD AND METHOD OF CONTROLLING SEMICONDUCT...

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

APPARATUS AND METHOD FOR REDUCING CONTAMINATION IN IMMERSION LITHOG...