Claims
- 1. An apparatus, comprising:
- a source that is operable to deposit a film on a substrate; and
- a system for rapidly measuring the resonant frequency of the substrate having the film growing thereon, the system comprising a single electrode and a positioner operable to place the substrate opposite the electrode, an oscillation controller for imposing an oscillating s signal on the electrode, a capacitive detector that measures the distance between the electrode and the substrate in a first feedback loop, and a second feedback loop responsive to the capacitive detector and cooperating with the oscillation controller to maintain the substrate with the film growing thereon at its resonant frequency.
- 2. The apparatus of claim 1 further comprising means for adjusting a deposition process parameter in response to a measurement made by said system for rapidly measuring the resonant frequency of a substrate having a film growing thereon.
- 3. An r.f. sputtering apparatus, comprising:
- a source that is operable to deposit a film on a substrate; and
- a system for rapidly measuring the resonant frequency of the substrate having the film growing thereon, the system comprising a single electrode and a positioner operable to place the substrate opposite the electrode, an oscillation controller for imposing an oscillating signal on the electrode, a capactive detector that measures the distance between the electrode and the substrate in a first feedback loop, and a second feedback loop responsive to the capacitive detector and cooperating with the oscillation controller for oscillating the electrode to maintain the substrate with the film growing thereon at its resonant frequency.
- 4. The r.f. sputtering apparatus of claim 3 further comprising means for adjusting a deposition process parameter in response to a measurement made by said system for rapidly measuring the resonant frequency of a substrate having a film growing thereon.
CROSS-REFERENCE TO RELATED APPLICATION
This is a division of application Ser. No. 08/166,672 filed Dec. 14, 1993, now U.S. Pat. No. 5,382,340, which is a continuation of Ser. No. 07/850,639 filed Mar. 13, 1992 now abandoned.
This application has been filed concurrently with U.S. patent application Ser. No. 07/850,637, pending which is hereby incorporated by reference.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
4893071 |
Miller |
Jan 1990 |
|
Non-Patent Literature Citations (2)
Entry |
Miller, "Feedback . . . Semiconductors", IEEE Transactions on electron devices, vol. Ed 19, No. 10, Oct. 1972, pp. 1103-1108. |
Ku et al., "Use . . . masks", J. Vac. Sci. Technol. B6(6), Nov./Dec. 1988, pp. 2174-2177. |
Divisions (1)
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Number |
Date |
Country |
Parent |
166672 |
Dec 1993 |
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Continuations (1)
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Number |
Date |
Country |
Parent |
850639 |
Mar 1992 |
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