Number | Date | Country | Kind |
---|---|---|---|
98-27663 | Jul 1998 | KR |
Number | Name | Date | Kind |
---|---|---|---|
3464797 | Hagopian | Sep 1969 | A |
5091217 | Hey et al. | Feb 1992 | A |
5872065 | Sivaramakrishnan | Feb 1999 | A |
5902403 | Aitani et al. | May 1999 | A |
6099647 | Yieh et al. | Aug 2000 | A |
Number | Date | Country |
---|---|---|
02296793 | Dec 1990 | JP |
96-15581 | Nov 1996 | KR |
Entry |
---|
Hiroshi Shinriki and Masayuki Nakata: “UV-O3 and Dry-O2: Two-Step Annealed Chemical Vapor Deposited Ta2O5 Films for Storage Dielectrics of 64-Mb DRAM's”, IEEE Transactions On Electron Devices, vol. 38, No. 3, Mar. 1991. |