Claims
- 1. An alkali soluble novolak resin formed by condensation of aldehyde and a phenol where at least 50 mole percent of the aldehyde is aromatic, said novolak resin having a weight average molecular weight in excess of 1500 Daltons and a glass transition temperature in excess of 125.degree. C.
- 2. The novolak resin of claim 1 where the phenol is selected from the group consisting of phenol itself, a cresol, a xylenol, a naphthol, a bisphenol and mixtures thereof.
- 3. The novolak of claim 1 wherein at least 90 mole percent of the aldehyde is romatic.
- 4. The novolak resin of claim 1 where essentially all of the aldehyde is aromatic.
- 5. The novolak resin of claim 4 where the aromatic aldehyde corresponds to the following formula: ##STR2## where R is a member selected from the group consisting of halogen, cyano, nitro, carboxyl, alkoxy and alkyl having from 1 to 5 carbon atoms; m is an integer ranging between 0 and 2 and n is a whole integer ranging between 0 and 3.
- 6. A novolak resin comprising the product resulting from the acid condensation of a phenol and an aromatic aldehyde in the presence of an effective amount of a divalent sulfur compound to increase the molecular weight of the novolak resin formed, said aromatic aldehyde conforming to the formula: ##STR3## where R is a member selected from the group consisting of halogen, cyano, nitro, carboxyl, alkoxy and alkyl having from 1 to 5 carbon atoms; m is an integer ranging between 0 and 2 and n is a whole integer ranging between 0 and 3 and a phenol, said novolak resin having a weight average molecular weight in excess of 1500 Daltons and a glass transition temperature in excess of 125.degree. C.
- 7. The novolak resin of claim 6 where the phenol is a cresol.
- 8. The novolak resin of claim 6 where the phenol is a cresol and the aldehyde is a member selected from the group consisting of benzaldehyde, salicylaldehyde and mixtures thereof.
- 9. The novolak resin of claim 8 where the aldehyde is benzaldehyde.
- 10. The novolak resin of claim 8 where the aldehyde is salicylaldehyde.
- 11. The novolak resin of claim 2 where the phenol is a cresol.
- 12. The novolak resin of claim 5 where the aromatic aldehyde is a mixture of benzaldehyde and salicylaldehyde.
- 13. The novolak resin of claim 6 where the aromatic aldehyde is a mixture of benzaldehyde and salicylaldehyde.
CROSS REFERENCE TO RELATED APPLICATIONS
This is a continuation of application Ser. No. 07/988,854 filed on Dec. 10, 1992, now abandoned, which is a divisional of application Ser. No. 07/600,862 filed on Oct. 22, 1990, now U.S. Pat. No. 5,216,111, which is a continuation-in-part of U.S. patent application Ser. No. 07/411,670 filed Sep. 25, 1989, now abandoned, which application in turn is a continuation of U.S. patent application Ser. No. 07/108,192 filed Oct. 13, 1987 (now abandoned) which latter application is a continuation-in-part of U.S. patent application Ser. No. 002,364 filed Dec. 23, 1986 (now abandoned).
US Referenced Citations (12)
Foreign Referenced Citations (1)
Number |
Date |
Country |
60-143345 |
Jul 1985 |
JPX |
Non-Patent Literature Citations (2)
Entry |
Hiraoka et al. "Functionally Substituted Novolak Resins: Lithographic Applications, Radiation Chemistry, and Photooxidation," Materials for Microlithography, Am. Chem. Soc., Wash. D.C., 1984, pp. 322-323. |
Hiraoka et al., Am Chem Soc., Div Poly. Chem, vol. 25, #1, 1984 pp. 322-323. |
Divisions (1)
|
Number |
Date |
Country |
Parent |
600862 |
Oct 1990 |
|
Continuations (2)
|
Number |
Date |
Country |
Parent |
988854 |
Dec 1992 |
|
Parent |
108192 |
Oct 1987 |
|
Continuation in Parts (2)
|
Number |
Date |
Country |
Parent |
411670 |
Sep 1989 |
|
Parent |
02364 |
Dec 1986 |
|