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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/0048characterised by the solvents or agents facilitating spreading

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Patents Grantslast 30 patents

Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive photosensitive resin composition and display device using...
- Patent number 12,216,403
- Issue date Feb 4, 2025
- DONJIN SEMICHEM CO., LTD.
- Kyoungsoon Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for multi-spray RRC process with dynamic control
- Patent number 12,216,407
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hsuan Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and film forming method
- Patent number 12,189,288
- Issue date Jan 7, 2025
- FUJIFILM Corporation
- Takahiro Okawara
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 12,189,292
- Issue date Jan 7, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 12,153,345
- Issue date Nov 26, 2024
- Sumitomo Bakelite Co., Ltd.
- Makoto Horii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist for semiconductor fabrication
- Patent number 12,153,346
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic-inorganic hybrid photoresist processing liquid composition
- Patent number 12,050,403
- Issue date Jul 30, 2024
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and patterning process
- Patent number 12,032,287
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 11,994,799
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical liquid storage body
- Patent number 11,976,001
- Issue date May 7, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist developer and method of developing photoresist
- Patent number 11,971,657
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition and method for forming pattern
- Patent number 11,966,160
- Issue date Apr 23, 2024
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 11,947,257
- Issue date Apr 2, 2024
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition, negative photosensitive composition, pi...
- Patent number 11,940,729
- Issue date Mar 26, 2024
- Toray Industries, Inc.
- Akihiro Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treating method
- Patent number 11,927,886
- Issue date Mar 12, 2024
- Semes Co., Ltd.
- Doo Young Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Binder resin, negative-type photosensitive resin composition, and d...
- Patent number 11,892,772
- Issue date Feb 6, 2024
- LG Chem, Ltd.
- Junhyun An
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, positive photosensitive resin composition and use
- Patent number 11,886,115
- Issue date Jan 30, 2024
- YANTAI SUNERA LLC
- Zhiguo Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ligand-capped main group nanoparticles as high absorption extreme u...
- Patent number 11,874,600
- Issue date Jan 16, 2024
- Intel Corporation
- Marie Krysak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,860,540
- Issue date Jan 2, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, method of forming resist pattern, and semiconductor devic...
- Patent number 11,822,250
- Issue date Nov 21, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Iida
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
- Patent number 11,796,916
- Issue date Oct 24, 2023
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition including quantum dot, manufacturing method quantum dot...
- Patent number 11,762,289
- Issue date Sep 19, 2023
- Samsung SDI Co., Ltd.
- Jinsuop Youn
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoresist composition, method for preparing the same, and pattern...
- Patent number 11,762,290
- Issue date Sep 19, 2023
- Beijing Asahi Electronic Materials Co., Ltd
- Teng Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical liquid, chemical liquid storage body, pattern forming meth...
- Patent number 11,747,727
- Issue date Sep 5, 2023
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer for formation of resist underlayer film, composition for fo...
- Patent number 11,725,076
- Issue date Aug 15, 2023
- SK Innovation Co., Ltd.
- Minho Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist composition and patterning process
- Patent number 11,720,018
- Issue date Aug 8, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,709,425
- Issue date Jul 25, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Takaya Maehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substrate protective film-forming composition and pattern forming p...
- Patent number 11,662,663
- Issue date May 30, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKE...
- Publication number 20250053088
- Publication date Feb 13, 2025
- NISSAN CHEMICAL CORPORATION
- Tomotada HIROHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20250044692
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATT...
- Publication number 20250043046
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Minsang KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING DEVICE, AND FILM D...
- Publication number 20250044699
- Publication date Feb 6, 2025
- Riken
- Harumi Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250036024
- Publication date Jan 30, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...
- Publication number 20250021003
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Cheol KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION
- Publication number 20250021000
- Publication date Jan 16, 2025
- Merck Patent GmbH
- Seishi SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...
- Publication number 20250021002
- Publication date Jan 16, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND...
- Publication number 20250013149
- Publication date Jan 9, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250004367
- Publication date Jan 2, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN ALKOXIDES AS PRECURSORS FOR PATTERNING COMPOSITIONS WITH...
- Publication number 20240427239
- Publication date Dec 26, 2024
- INPRIA CORPORATION
- Robert E. Jilek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240427238
- Publication date Dec 26, 2024
- NISSAN CHEMICAL CORPORATION
- Tetsuya KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...
- Publication number 20240419072
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240419071
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BIODERIVED ORGANIC SOLVENTS
- Publication number 20240408590
- Publication date Dec 12, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Sanjay Malik
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE
- Publication number 20240393685
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsing-Chieh Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUNDS, MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN...
- Publication number 20240393689
- Publication date Nov 28, 2024
- DuPont Electronic Materials International, LLC
- Li Cui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIN, COMPOUND, AND PATTERN...
- Publication number 20240385518
- Publication date Nov 21, 2024
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST FOR SEMICONDUCTOR FABRICATION
- Publication number 20240377732
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES
- Publication number 20240377735
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING...
- Publication number 20240369925
- Publication date Nov 7, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takumi OKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME
- Publication number 20240369924
- Publication date Nov 7, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takumi OKADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES...
- Publication number 20240361693
- Publication date Oct 31, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takumi OKADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20240361689
- Publication date Oct 31, 2024
- Samsung SDI Co., Ltd.
- Heejo MOON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240345477
- Publication date Oct 17, 2024
- Samsung SDI Co., Ltd.
- Dong Wan RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT COMPOUND AND QUENCHER, PHOTORESIST COMPOSITION COMPRISING THE...
- Publication number 20240337930
- Publication date Oct 10, 2024
- DONGJIN SEMICHEM CO., LTD.
- Jaehyun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE...
- Publication number 20240337933
- Publication date Oct 10, 2024
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOMETALLIC METAL CHALCOGENIDE CLUSTERS AND APPLICATION TO LITHO...
- Publication number 20240337925
- Publication date Oct 10, 2024
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATOR, PHOTORESIST COMPOSITION AND METHOD FOR FORMING...
- Publication number 20240337929
- Publication date Oct 10, 2024
- DONGJIN SEMICHEM CO., LTD.
- Jaehyun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20240337932
- Publication date Oct 10, 2024
- Samsung SDI Co., Ltd.
- Heejo MOON
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

characterised by the solvents or agents facilitating spreading

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Solution, solution storage body, actinic ray-sensitive or radiation...

Positive photosensitive resin composition and display device using...

Method and apparatus for multi-spray RRC process with dynamic control

Composition and film forming method

Negative resist composition and pattern forming process

Photosensitive resin composition, method for producing resist patte...

Photosensitive resin composition

Photoresist for semiconductor fabrication

Organic-inorganic hybrid photoresist processing liquid composition

Resist material and patterning process

Negative resist composition and pattern forming process

Chemical liquid storage body

Photoresist developer and method of developing photoresist

Radiation-sensitive resin composition and method for forming pattern

Salt, acid generator, resist composition and method for producing r...

Photosensitive composition, negative photosensitive composition, pi...

Substrate treating method

Binder resin, negative-type photosensitive resin composition, and d...

Resin, positive photosensitive resin composition and use

Ligand-capped main group nanoparticles as high absorption extreme u...

Positive resist composition and patterning process

Solution, method of forming resist pattern, and semiconductor devic...

Pattern formation methods and photoresist pattern overcoat composit...

Composition including quantum dot, manufacturing method quantum dot...

Photoresist composition, method for preparing the same, and pattern...

Chemical liquid, chemical liquid storage body, pattern forming meth...

Polymer for formation of resist underlayer film, composition for fo...

Chemically amplified resist composition and patterning process

Resist composition and method of forming resist pattern

Substrate protective film-forming composition and pattern forming p...

Patents Applicationslast 30 patents

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKE...

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION

POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATT...

FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING DEVICE, AND FILM D...

Compound For Forming Metal-Containing Film, Composition For Forming...

POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...

COMPOSITION

BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...

ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

ORGANOTIN ALKOXIDES AS PRECURSORS FOR PATTERNING COMPOSITIONS WITH...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

BIODERIVED ORGANIC SOLVENTS

SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE

COMPOUNDS, MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIN, COMPOUND, AND PATTERN...

PHOTORESIST FOR SEMICONDUCTOR FABRICATION

EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES

RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING...

RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME

THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SALT COMPOUND AND QUENCHER, PHOTORESIST COMPOSITION COMPRISING THE...

RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE...

ORGANOMETALLIC METAL CHALCOGENIDE CLUSTERS AND APPLICATION TO LITHO...

PHOTOACID GENERATOR, PHOTORESIST COMPOSITION AND METHOD FOR FORMING...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...