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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/0048characterised by the solvents or agents facilitating spreading

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Patents Grantslast 30 patents

Information Patent Grant
Liquid chemical, method for producing liquid chemical, and method f...
- Patent number 12,282,259
- Issue date Apr 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,253,800
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,253,801
- Issue date Mar 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive photosensitive resin composition and display device using...
- Patent number 12,216,403
- Issue date Feb 4, 2025
- DONJIN SEMICHEM CO., LTD.
- Kyoungsoon Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for multi-spray RRC process with dynamic control
- Patent number 12,216,407
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hsuan Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and film forming method
- Patent number 12,189,288
- Issue date Jan 7, 2025
- FUJIFILM Corporation
- Takahiro Okawara
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 12,189,292
- Issue date Jan 7, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 12,153,345
- Issue date Nov 26, 2024
- Sumitomo Bakelite Co., Ltd.
- Makoto Horii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist for semiconductor fabrication
- Patent number 12,153,346
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic-inorganic hybrid photoresist processing liquid composition
- Patent number 12,050,403
- Issue date Jul 30, 2024
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and patterning process
- Patent number 12,032,287
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 11,994,799
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical liquid storage body
- Patent number 11,976,001
- Issue date May 7, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist developer and method of developing photoresist
- Patent number 11,971,657
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition and method for forming pattern
- Patent number 11,966,160
- Issue date Apr 23, 2024
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 11,947,257
- Issue date Apr 2, 2024
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition, negative photosensitive composition, pi...
- Patent number 11,940,729
- Issue date Mar 26, 2024
- Toray Industries, Inc.
- Akihiro Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treating method
- Patent number 11,927,886
- Issue date Mar 12, 2024
- Semes Co., Ltd.
- Doo Young Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Binder resin, negative-type photosensitive resin composition, and d...
- Patent number 11,892,772
- Issue date Feb 6, 2024
- LG Chem, Ltd.
- Junhyun An
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, positive photosensitive resin composition and use
- Patent number 11,886,115
- Issue date Jan 30, 2024
- YANTAI SUNERA LLC
- Zhiguo Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ligand-capped main group nanoparticles as high absorption extreme u...
- Patent number 11,874,600
- Issue date Jan 16, 2024
- Intel Corporation
- Marie Krysak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,860,540
- Issue date Jan 2, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, method of forming resist pattern, and semiconductor devic...
- Patent number 11,822,250
- Issue date Nov 21, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Iida
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
- Patent number 11,796,916
- Issue date Oct 24, 2023
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition including quantum dot, manufacturing method quantum dot...
- Patent number 11,762,289
- Issue date Sep 19, 2023
- Samsung SDI Co., Ltd.
- Jinsuop Youn
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoresist composition, method for preparing the same, and pattern...
- Patent number 11,762,290
- Issue date Sep 19, 2023
- Beijing Asahi Electronic Materials Co., Ltd
- Teng Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical liquid, chemical liquid storage body, pattern forming meth...
- Patent number 11,747,727
- Issue date Sep 5, 2023
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE
- Publication number 20250138420
- Publication date May 1, 2025
- Irresistible Materials LTD
- Alex Phillip Graham Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250138425
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING MATERIAL FOR PHOTOLITHOGRAPHY, RESIST COMPOSITION AND PATTE...
- Publication number 20250138419
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20250138421
- Publication date May 1, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuki URAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...
- Publication number 20250130496
- Publication date Apr 24, 2025
- Merck Patent GmbH
- YANO TOMOTSUGU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY
- Publication number 20250130501
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Resist Underlayer Film, Resist Underlayer F...
- Publication number 20250129209
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILOXANE COMPOSITION
- Publication number 20250123567
- Publication date Apr 17, 2025
- Merck Patent GmbH
- Megumi Yano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250115736
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116925
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116926
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...
- Publication number 20250116923
- Publication date Apr 10, 2025
- Inha University Research and Business Foundation
- Jinkyun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIBLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...
- Publication number 20250116933
- Publication date Apr 10, 2025
- DuPont Electronic Materials International, LLC
- Wenxu Zhang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250102912
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250093777
- Publication date Mar 20, 2025
- Samsung SDI Co., Ltd.
- Byeonggyu HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THICK FILM RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST F...
- Publication number 20250085633
- Publication date Mar 13, 2025
- Merck Patent GmbH
- Masato SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...
- Publication number 20250085627
- Publication date Mar 13, 2025
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATTERNING
- Publication number 20250076755
- Publication date Mar 6, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS...
- Publication number 20250074930
- Publication date Mar 6, 2025
- INPRIA CORPORATION
- Alexander C. Marwitz
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKE...
- Publication number 20250053088
- Publication date Feb 13, 2025
- NISSAN CHEMICAL CORPORATION
- Tomotada HIROHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20250044692
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATT...
- Publication number 20250043046
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Minsang KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING DEVICE, AND FILM D...
- Publication number 20250044699
- Publication date Feb 6, 2025
- Riken
- Harumi Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250036024
- Publication date Jan 30, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...
- Publication number 20250021003
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Cheol KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION
- Publication number 20250021000
- Publication date Jan 16, 2025
- Merck Patent GmbH
- Seishi SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...
- Publication number 20250021002
- Publication date Jan 16, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND...
- Publication number 20250013149
- Publication date Jan 9, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250004367
- Publication date Jan 2, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN ALKOXIDES AS PRECURSORS FOR PATTERNING COMPOSITIONS WITH...
- Publication number 20240427239
- Publication date Dec 26, 2024
- INPRIA CORPORATION
- Robert E. Jilek
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

characterised by the solvents or agents facilitating spreading

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Liquid chemical, method for producing liquid chemical, and method f...

Radiation-sensitive resin composition and method for forming resist...

EUV metallic resist performance enhancement via additives

Solution, solution storage body, actinic ray-sensitive or radiation...

Solution, solution storage body, actinic ray-sensitive or radiation...

Positive photosensitive resin composition and display device using...

Method and apparatus for multi-spray RRC process with dynamic control

Composition and film forming method

Negative resist composition and pattern forming process

Photosensitive resin composition, method for producing resist patte...

Photosensitive resin composition

Photoresist for semiconductor fabrication

Organic-inorganic hybrid photoresist processing liquid composition

Resist material and patterning process

Negative resist composition and pattern forming process

Chemical liquid storage body

Photoresist developer and method of developing photoresist

Radiation-sensitive resin composition and method for forming pattern

Salt, acid generator, resist composition and method for producing r...

Photosensitive composition, negative photosensitive composition, pi...

Substrate treating method

Binder resin, negative-type photosensitive resin composition, and d...

Resin, positive photosensitive resin composition and use

Ligand-capped main group nanoparticles as high absorption extreme u...

Positive resist composition and patterning process

Solution, method of forming resist pattern, and semiconductor devic...

Pattern formation methods and photoresist pattern overcoat composit...

Composition including quantum dot, manufacturing method quantum dot...

Photoresist composition, method for preparing the same, and pattern...

Chemical liquid, chemical liquid storage body, pattern forming meth...

Patents Applicationslast 30 patents

ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

COATING MATERIAL FOR PHOTOLITHOGRAPHY, RESIST COMPOSITION AND PATTE...

PHOTOSENSITIVE COMPOSITION

POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...

ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY

Composition For Forming Resist Underlayer Film, Resist Underlayer F...

POLYSILOXANE COMPOSITION

Composition For Forming Metal-Containing Film And Patterning Process

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...

MULTIBLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

THICK FILM RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST F...

ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...

ORGANOTIN PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATTERNING

ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKE...

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION

POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATT...

FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING DEVICE, AND FILM D...

Compound For Forming Metal-Containing Film, Composition For Forming...

POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...

COMPOSITION

BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...

ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

ORGANOTIN ALKOXIDES AS PRECURSORS FOR PATTERNING COMPOSITIONS WITH...