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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/0048characterised by the solvents or agents facilitating spreading

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Patents Grantslast 30 patents

Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,360,456
- Issue date Jul 15, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., TLD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable relief precursor having adjustable surface prope...
- Patent number 12,313,970
- Issue date May 27, 2025
- XSYS Germany GmbH
- Matthias Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid chemical, method for producing liquid chemical, and method f...
- Patent number 12,282,259
- Issue date Apr 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,253,800
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,253,801
- Issue date Mar 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive photosensitive resin composition and display device using...
- Patent number 12,216,403
- Issue date Feb 4, 2025
- DONJIN SEMICHEM CO., LTD.
- Kyoungsoon Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for multi-spray RRC process with dynamic control
- Patent number 12,216,407
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hsuan Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and film forming method
- Patent number 12,189,288
- Issue date Jan 7, 2025
- FUJIFILM Corporation
- Takahiro Okawara
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 12,189,292
- Issue date Jan 7, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 12,153,345
- Issue date Nov 26, 2024
- Sumitomo Bakelite Co., Ltd.
- Makoto Horii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist for semiconductor fabrication
- Patent number 12,153,346
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic-inorganic hybrid photoresist processing liquid composition
- Patent number 12,050,403
- Issue date Jul 30, 2024
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and patterning process
- Patent number 12,032,287
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 11,994,799
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical liquid storage body
- Patent number 11,976,001
- Issue date May 7, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist developer and method of developing photoresist
- Patent number 11,971,657
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition and method for forming pattern
- Patent number 11,966,160
- Issue date Apr 23, 2024
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 11,947,257
- Issue date Apr 2, 2024
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition, negative photosensitive composition, pi...
- Patent number 11,940,729
- Issue date Mar 26, 2024
- Toray Industries, Inc.
- Akihiro Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treating method
- Patent number 11,927,886
- Issue date Mar 12, 2024
- Semes Co., Ltd.
- Doo Young Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Binder resin, negative-type photosensitive resin composition, and d...
- Patent number 11,892,772
- Issue date Feb 6, 2024
- LG Chem, Ltd.
- Junhyun An
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, positive photosensitive resin composition and use
- Patent number 11,886,115
- Issue date Jan 30, 2024
- YANTAI SUNERA LLC
- Zhiguo Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ligand-capped main group nanoparticles as high absorption extreme u...
- Patent number 11,874,600
- Issue date Jan 16, 2024
- Intel Corporation
- Marie Krysak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,860,540
- Issue date Jan 2, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, method of forming resist pattern, and semiconductor devic...
- Patent number 11,822,250
- Issue date Nov 21, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Iida
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
- Patent number 11,796,916
- Issue date Oct 24, 2023
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition including quantum dot, manufacturing method quantum dot...
- Patent number 11,762,289
- Issue date Sep 19, 2023
- Samsung SDI Co., Ltd.
- Jinsuop Youn
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...
- Publication number 20250237957
- Publication date Jul 24, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION
- Publication number 20250216784
- Publication date Jul 3, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOCRYSTALLINE COMPLEX, PREPARATION METHOD THEREFOR, AND USE THEREOF
- Publication number 20250208505
- Publication date Jun 26, 2025
- Huawei Technologies Co., Ltd
- Zhe Li
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208506
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20250189887
- Publication date Jun 12, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, METHOD FOR PRODUCING THE COMPOUND, LEVELING AGENT, COATIN...
- Publication number 20250188226
- Publication date Jun 12, 2025
- DIC CORPORATION
- Ryuta Fujiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TIN COMPOUND AND RESIST SOLUTION USING THE SAME, PATTERN FORMING ME...
- Publication number 20250179100
- Publication date Jun 5, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Yuta HIOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PRETREATMENT
- Publication number 20250180989
- Publication date Jun 5, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MAN...
- Publication number 20250172869
- Publication date May 29, 2025
- NISSAN CHEMICAL CORPORATION
- Shunsuke MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...
- Publication number 20250172872
- Publication date May 29, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Ojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20250155812
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20250155806
- Publication date May 15, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Makoto SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTE...
- Publication number 20250155799
- Publication date May 15, 2025
- Samsung SDI Co., Ltd.
- Soobin LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20250155804
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Min-Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20250147416
- Publication date May 8, 2025
- POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
- Myung-Gil KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...
- Publication number 20250147418
- Publication date May 8, 2025
- JSR Corporation
- Naoki NISHIGUCHI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE
- Publication number 20250138420
- Publication date May 1, 2025
- Irresistible Materials LTD
- Alex Phillip Graham Robinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250138425
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING MATERIAL FOR PHOTOLITHOGRAPHY, RESIST COMPOSITION AND PATTE...
- Publication number 20250138419
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20250138421
- Publication date May 1, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuki URAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...
- Publication number 20250130496
- Publication date Apr 24, 2025
- Merck Patent GmbH
- YANO TOMOTSUGU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY
- Publication number 20250130501
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Resist Underlayer Film, Resist Underlayer F...
- Publication number 20250129209
- Publication date Apr 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILOXANE COMPOSITION
- Publication number 20250123567
- Publication date Apr 17, 2025
- Merck Patent GmbH
- Megumi Yano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250115736
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116925
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116926
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...
- Publication number 20250116923
- Publication date Apr 10, 2025
- Inha University Research and Business Foundation
- Jinkyun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIBLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...
- Publication number 20250116933
- Publication date Apr 10, 2025
- DuPont Electronic Materials International, LLC
- Wenxu Zhang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250102912
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

characterised by the solvents or agents facilitating spreading

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

EUV metallic resist performance enhancement via additives

Photopolymerizable relief precursor having adjustable surface prope...

Liquid chemical, method for producing liquid chemical, and method f...

Radiation-sensitive resin composition and method for forming resist...

EUV metallic resist performance enhancement via additives

Solution, solution storage body, actinic ray-sensitive or radiation...

Solution, solution storage body, actinic ray-sensitive or radiation...

Positive photosensitive resin composition and display device using...

Method and apparatus for multi-spray RRC process with dynamic control

Composition and film forming method

Negative resist composition and pattern forming process

Photosensitive resin composition, method for producing resist patte...

Photosensitive resin composition

Photoresist for semiconductor fabrication

Organic-inorganic hybrid photoresist processing liquid composition

Resist material and patterning process

Negative resist composition and pattern forming process

Chemical liquid storage body

Photoresist developer and method of developing photoresist

Radiation-sensitive resin composition and method for forming pattern

Salt, acid generator, resist composition and method for producing r...

Photosensitive composition, negative photosensitive composition, pi...

Substrate treating method

Binder resin, negative-type photosensitive resin composition, and d...

Resin, positive photosensitive resin composition and use

Ligand-capped main group nanoparticles as high absorption extreme u...

Positive resist composition and patterning process

Solution, method of forming resist pattern, and semiconductor devic...

Pattern formation methods and photoresist pattern overcoat composit...

Composition including quantum dot, manufacturing method quantum dot...

Patents Applicationslast 30 patents

LIQUID CHEMICAL, METHOD FOR PRODUCING LIQUID CHEMICAL, AND METHOD F...

IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION

NANOCRYSTALLINE COMPLEX, PREPARATION METHOD THEREFOR, AND USE THEREOF

Compound For Forming Metal-Containing Film, Composition For Forming...

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

COMPOUND, METHOD FOR PRODUCING THE COMPOUND, LEVELING AGENT, COATIN...

TIN COMPOUND AND RESIST SOLUTION USING THE SAME, PATTERN FORMING ME...

COMPOSITION FOR PRETREATMENT

WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MAN...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTE...

PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTE...

ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

COATING MATERIAL FOR PHOTOLITHOGRAPHY, RESIST COMPOSITION AND PATTE...

PHOTOSENSITIVE COMPOSITION

POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...

ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY

Composition For Forming Resist Underlayer Film, Resist Underlayer F...

POLYSILOXANE COMPOSITION

Composition For Forming Metal-Containing Film And Patterning Process

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...

MULTIBLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...

RESIST COMPOSITION AND PATTERN FORMING PROCESS