Claims
- 1. A method for making a multi-layer printed circuit board, said method comprising the steps of:
- providing a first dielectric layer
- laminating onto a face of said first dielectric layer a first dual layer comprising a first metallic layer and a first Ta or Hf layer such that said first metallic layer is adjacent said first dielectric layer;
- laminating onto another face of said first dielectric layer a second dual layer comprising a second metallic layer and a second Ta or Hf layer such that said second metallic layer is adjacent said first dielectric layer;
- anodizing or oxidizing an exposed face of said first Ta or Hf layer to yield a first Ta.sub.2 O.sub.5 or HfO layer and anodizing or oxidizing an exposed face of said second Ta or Hf layer to yield a second Ta.sub.2 O.sub.5 or HfO layer;
- applying a third metallic layer onto said first Ta.sub.2 O.sub.5 or HfO layer;
- applying a fourth metallic layer onto said second Ta.sub.2 O.sub.5 or HfO layer;
- laminating a second dielectric layer onto said third metallic layer opposite said first Ta.sub.2 O.sub.5 or HfO layer; and
- laminating a third dielectric layer onto said fourth metallic layer opposite said second Ta.sub.2 O.sub.5 or HfO layer.
- 2. The method as set forth in claim 1 further comprising
- forming a first conductive via passing through all of said layers and making an electrical connection to said first and second metallic layers but not to said third or fourth metallic layers; and
- forming a second conductive via passing through all of said layers and making an electrical connection to said third and fourth metallic layers but not to said first or second metallic layers.
- 3. The method as set forth in claim 2 further comprising the steps of:
- applying a fifth metallic layer onto said second dielectric layer opposite said third metallic layer and making an electrical connection between said fifth metallic layer and one of said first or second conductive vias; and
- applying a sixth metallic layer onto said third dielectric layer opposite said fourth metallic layer and making an electrical connection between said sixth metallic layer and the other said conductive via.
- 4. The method as set forth in claim 1 wherein all of said layers are provided as internal layers of said printed circuit board.
- 5. The method as set forth in claim 1 wherein said Ta.sub.2 O.sub.5 or HfO layers are formed having a thickness of about 0.1 to 2.0 microns.
- 6. The method as set forth in claim 1 wherein said Ta or Hf layers are provided having a thickness of about 1 to 20 microns.
- 7. The method as set forth in claim 1 wherein said first metallic layer, said first Ta or Hf layer, said first Ta.sub.2 O.sub.5 or HfO layer, and said third metallic layer form a first capacitor, and said second metallic layer, said second Ta or Hf layer, said second Ta.sub.2 O.sub.5 or HfO layer, and said fourth metallic layer form a second capacitor, and further comprising connecting a conductor between said first or third metallic layer and said second or fourth metallic layer to electrically connect said first and second capacitors in parallel.
- 8. The method as set forth in claim 1 further comprising forming a third Ta.sub.2 O.sub.5 or HfO layer on side edges of said first Ta or Hf layer, respectively, and forming a fourth Ta.sub.2 O.sub.5 or HfO layer on side edges of said second Ta or Hf layer, respectively.
- 9. A method for making a multi-layer printed circuit board, said method comprising:
- providing a first metallic layer;
- applying a Ta or Hf layer on one face of said first metallic layer;
- anodizing or oxidizing said Ta or Hf layer to yield a Ta.sub.2 O.sub.5 or HfO layer, respectively, on said Ta or Hf layer opposite said first metallic layer;
- applying a second metallic layer on said Ta.sub.2 O.sub.5 or HfO layer opposite said Ta or Hf layer;
- laminating a first dielectric layer on said first metallic layer opposite said Ta or Hf layer; and
- laminating a second dielectric layer on said second metallic layer opposite said Ta.sub.2 O.sub.5 or HfO layer.
- 10. The method as set forth in claim 9 further comprising:
- forming a first conductive via which passes through said first or second dielectric layer and makes electrical contact with said first metallic layer but not with said second metallic layer; and
- forming a second conductive via which passes through said first or second dielectric layer and makes electrical contact with said second metallic layer but not with said first metallic layer.
- 11. The method as set forth in claim 10 wherein:
- said first conductive via also passes through said second metallic layer, said Ta or Hf layer and said Ta.sub.2 O.sub.5 or HfO layer; and
- said second conductive via also passes through said first metallic layer, said Ta or Hf layer and said Ta.sub.2 O.sub.5 or HfO layer.
- 12. The method as set forth in claim 9 wherein all of said layers are provided as internal layers of said multi-layer printed circuit board.
- 13. The method as set forth in claim 9 wherein said Ta.sub.2 O.sub.5 or HfO layers are formed having a thickness of about 0.1 to 2.0 microns.
- 14. The method as set forth in claim 9 wherein said Ta or Hf layers are provided having a thickness of about is 1 to 20 microns.
- 15. The method as set forth in claim 9 further comprising forming a Ta.sub.2 O.sub.5 or HfO layer on side edges of said Ta or Hf layer.
- 16. A method for making multi-layer printed circuit board, said method comprising:
- providing first and second metallic layers;
- forming a Ta.sub.2 O.sub.5 or HfO layer between, and in contact with said first and second metallic layers, there being no unoxidized Ta or Hf between said first and second metallic layers;
- laminating a first dielectric layer on said first metallic layer opposite said Ta.sub.2 O.sub.5 or HfO layer; and
- laminating a second dielectric layer on said second metallic layer opposite said Ta.sub.2 O.sub.5 or HfO layer.
- 17. The method as set forth in claim 16 wherein all of said layers are internal to said multi-layer printed circuit board.
Parent Case Info
This Application is a Division of Ser. No. 08/625,423, filed Mar. 25, 1996, U.S. Pat. No. 5,745,334.
US Referenced Citations (9)
Non-Patent Literature Citations (2)
Entry |
Thin Film Materials Research., Giannelis et al, Nov. 1993. |
IBM Technical Disclosure Bulletin vol. 22, No. 6, Nov. 1979, "Raw Card Composite Capacitor". |
Divisions (1)
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Number |
Date |
Country |
Parent |
625423 |
Mar 1996 |
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