Number | Name | Date | Kind |
---|---|---|---|
4839311 | Riley et al. | Jun 1989 | A |
5069002 | Sandhu et al. | Dec 1991 | A |
5081421 | Miller et al. | Jan 1992 | A |
5196353 | Sandhu et al. | Mar 1993 | A |
5234868 | Cote | Aug 1993 | A |
5240552 | Yu et al. | Aug 1993 | A |
RE34425 | Schultz | Nov 1993 | E |
5265378 | Rostoker | Nov 1993 | A |
5337015 | Lustig et al. | Aug 1994 | A |
5413941 | Koos et al. | May 1995 | A |
5433650 | Winebarger | Jul 1995 | A |
5433651 | Lustig et al. | Jul 1995 | A |
5461007 | Kobayashi | Oct 1995 | A |
5492594 | Burke et al. | Feb 1996 | A |
5499733 | Litvak | Mar 1996 | A |
5640242 | O'Boyle et al. | Jun 1997 | A |
5733171 | Allen et al. | Mar 1998 | A |
5872633 | Helzapfel et al. | Feb 1999 | A |
5961369 | Bartels et al. | Oct 1999 | A |
Entry |
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Semiconductor International, “Implementing Real-Time Endpoint Control in CMP”, Litvak et al., Jul. 1996, pp. 259-264. |
IBM Technical Disclosure Bulletin, “End-Point Detection of Chemical/Mechanical Polishing of Circuitized Multilayer Substrates”, Chou et al., vol. 34, No. 4B, Sep. 1991, pp. 406-407. |
CMP-MIC Conference 1997 ISMIC, “CMP Oxide Endpoint Detection: a Simplistic Approach to a Complex Problem”, Holzapfel et al., Feb. 13-14, 1997, pp. 44-51. |