Number | Name | Date | Kind |
---|---|---|---|
4774164 | Peavey et al. | Sep 1988 | A |
5783337 | Tzu et al. | Jul 1998 | A |
5853923 | Tzu | Dec 1998 | A |
5888678 | Tzu et al. | Mar 1999 | A |
6093507 | Tzu | Jul 2000 | A |
Entry |
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The paper “The Black Silicon Method:High Aspect Ratio Trench Etching for MEMS Applications,” by Henri Jansen et al., IEEE , 1996, pp. 250-257. |
Proceedings of the Eigth Symposium on Plasma Processing, C. 1990 by the Electrochemical Society, Inc., NY, “Size Dependant Etching of Small Shapes,” by H.C. Jones , et al., pp. 45-49. |