The present invention relates to a cleaning member attaching part used in an aspect of supplying cleaning liquid into a cleaning member, a cleaning member assembly using such a cleaning member attaching part, and a substrate cleaning apparatus.
The present application claims the priority of Japanese Patent Application No. 2019-17549 filed on Feb. 4, 2019, the contents of which are entirely incorporated by reference.
It has been conventionally known to supply a rinse liquid (inner rinse liquid) into a cleaning member such as a roll. JP 2000-301079 A discloses having a substrate holding unit that holds a substrate while rotating the substrate, a cleaning tool that scrubs the surface to be cleaned of the substrate, and a cleaning tool holding unit that holds the cleaning tool rotatably around its axis, and supplying inner rinse liquid into the cleaning tool.
Even if the inner rinse liquid is supplied in this manner, the amount of the rinse liquid discharged from a sponge of the cleaning tool may vary in the longitudinal direction of the cleaning tool. For example, even if the inner rinse liquid is supplied at a supply rate of 450 ml/min, the inner rinse liquid may not be discharged from the sponge of the cleaning tool but may flow backward and run out of the cleaning tool without passing through the sponge.
The present invention provides a cleaning member attaching part and the like that suppresses variations in the discharge amount of a supplied cleaning liquid from an inside of the cleaning member and prevents the supplied cleaning liquid from flowing out without passing through the cleaning member.
A cleaning member attaching part, on a surface of which a cleaning member is attached, may comprise:
a main body;
a cleaning liquid introduction part extending inside the main body; and
a plurality of cleaning liquid supply holes communicating with the cleaning liquid introduction part, wherein
the cleaning liquid introduction part may be configured to introduce cleaning liquid from a first end part side, and
an area proportion of the cleaning liquid supply holes in a second region on a second end part side opposite to a first end part to a surface of the main body may be larger than an area proportion of the cleaning liquid supply holes in a first region on the first end part side to the surface of the main body.
Here, the “area proportion” refers to the proportion of the average area of a plurality of openings in a total area of a predetermined region (also referred to as opening proportion). The “average area” means an average cross-sectional area of a flow path when the cleaning liquid flows out from the cleaning liquid introduction part to the cleaning member via the cleaning liquid supply holes.
The cleaning member attaching part according to concept 1, wherein
a cross-sectional area of the cleaning liquid supply holes in the second region is larger than a cross-sectional area of the cleaning liquid supply hole in the first region.
The cleaning member attaching part according to concept 1 or 2, wherein
a third region is provided between the first region and the second region, and
an area proportion of the cleaning liquid supply holes in the third region to the surface of the main body is larger than the area proportion of the cleaning liquid supply holes in the first region to the surface of the main body and is smaller than the area proportion of the cleaning liquid supply holes in the second region to the surface of the main body.
The cleaning member attaching part according to concept 3, wherein
a fourth region is provided between the third region and the first region, and
an area proportion of the cleaning liquid supply holes in the fourth region to the surface of the main body is larger than the area proportion of the cleaning liquid supply holes in the first region to the surface of the main body and is smaller than the area proportion of the cleaning liquid supply holes in the third region to the surface of the main body.
The cleaning member attaching part according to concept 4, wherein
a cross-sectional area of the cleaning liquid supply holes in the fourth region is larger than a cross-sectional area of the cleaning liquid supply hole in the first region, and
a cross-sectional area of the cleaning liquid supply holes in the third region is larger than the cross-sectional area of the cleaning liquid supply holes in the fourth region and is smaller than a cross-sectional area of the cleaning liquid supply holes in the second region.
The cleaning member attaching part according to any one of concepts 1 to 5, wherein
a cross-sectional area of the cleaning liquid introduction part extending inside the main body corresponds to a cross-sectional area of the cleaning liquid supply holes in the second region.
The cleaning member attaching part according to any one of concepts 1 to 6, wherein
a pitch width between the cleaning liquid supply holes along a longitudinal direction in the second region is smaller than a pitch width between the cleaning liquid supply holes along a longitudinal direction in the first region.
The cleaning member attaching part according to any one of concepts 1 to 7, wherein
a plurality of cleaning liquid supply holes are provided at a same position along a longitudinal direction in a second region, and
the number of the cleaning liquid supply holes at the same position along the longitudinal direction in the second region is larger than the number of the cleaning liquid supply holes at a same position along the longitudinal direction in the first region.
The cleaning member attaching part according to concept 8, wherein
the cleaning liquid supply holes at the same position along the longitudinal direction in the second region are arranged at intervals of approximately 90 degrees when viewed along an axial direction, and
the cleaning liquid supply holes at the same position along the longitudinal direction in the first region are arranged at intervals of approximately 180 degrees when viewed along the axial direction.
A cleaning member assembly comprising:
the cleaning member attaching part according to any one of concepts 1 to 9; and
a cleaning member provided on a surface of the cleaning member attaching part.
A substrate cleaning apparatus comprising:
a substrate support part to hold a substrate;
a cleaning member assembly having a cleaning member attaching part according to any one of concepts 1 to 9 and a cleaning member provided on a surface of the cleaning member attaching part; and
a cleaning member holding part that holds the cleaning member assembly.
A cleaning member assembly comprising:
a unit main body; and
a plurality of nodules that projects outward from the unit main body, wherein
the unit main body has:
the gap is configured such that the cleaning liquid flows in from a first end part side, and
an area proportion of the cleaning liquid supply holes in a second region on a second end part side opposite to a first end part to a surface of the main body is larger than an area proportion of the cleaning liquid supply holes in a first region on the first end part side to the surface of the main body.
13. The cleaning member assembly according to claim 12, wherein the nodules are formed by being molded on the unit main body.
In the present invention, in a case of adopting an aspect in which the area proportion of the cleaning liquid supply holes to the second region in the surface of the main body is larger than the area proportion of the cleaning liquid supply holes in the first region located near the first end part side to the surface of the main body, it is possible to suppress variations in the discharge amount of the cleaning liquid from the cleaning member. It is also possible to prevent the supplied cleaning liquid such as inner rinse from flowing out to a driven part side.
A first embodiment of a substrate processing apparatus including a substrate cleaning apparatus and the like will be described.
As shown in
Inside the housing 310, a plurality of (in an aspect shown in
In an area surrounded by the load port 312, and the polishing unit 314a and the drying unit 320 that are located on the side of the load port 312, a first transfer robot 322 is placed. Furthermore, a conveyance unit 324 is placed parallel to the polishing units 314a to 314d as well as the cleaning units 316 and 318 and the drying unit 320. The first transfer robot 322 receives a pre-polished substrate W from the load port 312 and transfers the substrate W to the conveyance unit 324, or receives a dried substrate W, which is removed from the drying unit 320, from the conveyance unit 324.
A second transfer robot 326 for transferring a substrate W between the first cleaning unit 316 and the second cleaning unit 318 is placed between the first cleaning unit 316 and the second cleaning unit 318, and a third conveyance unit 328 for transferring the substrate W between the second cleaning unit 318 and the drying unit 320 is placed between the second cleaning unit 318 and the drying unit 320. Furthermore, inside the housing 310, an overall control unit 350, which is included in a control unit, for controlling the operation of each device of the substrate processing apparatus is placed. In the present embodiment, there is described the aspect in which the overall control unit 350 is placed inside the housing 310; however, the placement of the control unit 50 is not limited to this, and the overall control unit 350 may be placed outside the housing 310, and the overall control unit 350 may be provided at a remote place.
A roll cleaning apparatus for scrubbing a surface of a substrate W while rotating around the center axis parallel with the substrate W by bringing the roll cleaning members 90 linearly extending almost along the full diameter of the substrate W into contact with cleaning liquid may be used for the first cleaning unit 316. A pencil cleaning apparatus for scrubbing a surface of a substrate W by bringing the contact faces of the vertically-extending columnar pencil cleaning members 90 into contact with cleaning liquid and moving the pencil cleaning members 90 in one direction while rotating may be used for the second cleaning unit 318. A spin drying unit for drying a substrate W by injecting IPA steam from a moving injection nozzle toward the horizontally-held and rotating substrate W and drying the substrate W by centrifugal force by faster rotating the substrate W may be used for the drying unit 320.
The first cleaning unit 316 may use not a roll cleaning apparatus, but a pencil cleaning apparatus similar to the second cleaning unit 318 or a two-fluid jet cleaning apparatus for cleaning a surface of a substrate W by two-fluid jet. Further, the second cleaning unit 318 may use not a pencil cleaning apparatus, but a roll cleaning apparatus similar to the first cleaning unit 316, or a two-fluid jet cleaning apparatus for cleaning a surface of a substrate W by two-fluid jet.
The cleaning liquid in the present embodiment contains rinse liquid, such as deionized water (DIW), and chemical liquid, such as ammonia hydrogen peroxide (SC1), hydrochloric acid hydrogen peroxide (SC2), sulfuric acid hydrogen peroxide (SPM), sulfuric acid hydrolysate, or hydrofluoric acid. In the present embodiment, unless otherwise specified, cleaning liquid means either rinse liquid, chemical liquid or the both rinse liquid and chemical liquid.
As shown in
Cleaning liquid such as inner rinse liquid may be supplied in a range of 400 ml/mm to 1000 ml/mm. The cleaning member assembly 1 may be rotated by the cleaning member holding part 100 at a rotation speed of 50 rpm to 300 rpm.
As shown in
In one embodiment, the area of the top of each of the nodules 95 can be 5 μcm2 or less.
In one embodiment, the cleaning member attaching part 10 can be PVDF or PTFE.
The cleaning member assembly 1 may have one end held by the cleaning member holding part 100 in a following manner and the other end driven by a driving unit (not shown) with a motor. That is, the cleaning member holding part 100 may have a second cleaning member holding part 100b driven by the driving unit and a first cleaning member holding part 100a held in the following manner (see
As shown in
As shown in
The area proportion of the cleaning liquid supply holes 40 in a second region on a second end part 12 side opposite to the first end part 11 side to the surface of the main body 20 may be larger than the area proportion of the cleaning liquid supply holes 40 in the first region on the first end part 11 to the surface of the main body 20 (see
In the present embodiment, the area proportion of the cleaning liquid supply holes 40 to the surface of the main body 20 is also called “supply hole area proportion”. When the cleaning member attaching part 10 is divided into regions along the longitudinal direction (axial direction) based on the supply hole area proportion, the region located closest to the first end part 11 side and having the same supply hole area proportion will be called first region, and the region located closest to the second end part 12 side and having the same supply hole area proportion will be called second region.
The supply hole area proportion is determined by dividing the area of the cleaning liquid supply holes 40 in the surface of the main body 20 by the surface area of the main body 20 with the assumption that the main body 20 does not have the cleaning liquid supply holes 40. That is, the supply hole area proportion of the first region is calculated as s1/S1 where the surface area of the main body 20 on the assumption that the cleaning liquid supply holes 40 do not exist in the first region is S1 and the total area of the cleaning liquid supply holes 40 in the surface of the main body 20 in the first region is s1, and the supply hole area proportion of the second region is calculated as s2/S2 where the surface area of the main body 20 on the assumption that the cleaning liquid supply holes 40 do not exist in the second region is S2 and the total area of the cleaning liquid supply holes 40 in the surface of the main body 20 in the second region is s2. Then, there is a relationship of s1/S1<s2/S2.
The cross-sectional area of the cleaning liquid supply holes 40 in the second region may be larger than the cross-sectional area of the cleaning liquid supply hole 40 in the first region. The cross-sectional area of the cleaning liquid supply holes 40 means an area in a cross section orthogonal to a direction in which the cleaning liquid supply holes 40 extend (a radial direction of the cleaning member attaching part 10). The cross-sectional area of the cleaning liquid supply holes 40 may have a cylindrical shape with a constant value in the direction in which the cleaning liquid supply holes 40 extend (the radial direction of the cleaning member attaching part 10). Otherwise, the cross-sectional area of the cleaning liquid supply holes 40 may have a truncated cone shape with changes in the direction in which the cleaning liquid supply holes 40 extend, for example. The cross-sectional area on the outer side may be larger than the cross-sectional area on the inner side, or in reverse, the cross-sectional area on the inner side may be larger than the cross-sectional area on the outer side. In a case where the cross-sectional area of the cleaning liquid supply holes 40 changes in the direction in which the cleaning liquid supply holes 40 extend, in the present embodiment, the cross-sectional area of the cleaning liquid supply holes 40 in the second region is larger than the cross-sectional area of the cleaning liquid supply holes 40 in the first region when these cross-sectional areas are compared with each other at the same position in the direction in which the cleaning liquid supply holes 40 extend (the radial direction).
The present embodiment may be in an aspect in which only the first region and the second region are provided. However, the present embodiment is not limited to this but a third region, a fourth region, . . . , and an n-th region (“n” denotes an integer of 3 or more) may be provided. The diameter of the cleaning liquid supply holes 40 in each of the regions may be in a range of 4 mm or more to 11 mm or less, and more specifically, the diameter of the cleaning liquid supply holes 40 in each of the regions may be in a range of 5 mm or more to 10 mm or less. The largest-diameter cleaning liquid supply hole 40 may have a diameter that is 1.5 times or more to 2.5 times or less the diameter of the smallest-diameter cleaning liquid supply hole 40. More specifically, the largest-diameter cleaning liquid supply hole 40 has a diameter that is 1.7 times or more to 2.0 times or less the diameter of the smallest-diameter cleaning liquid supply hole 40. The diameter of the cleaning liquid supply holes 40 in the conventional cleaning member attaching part is about 1 mm. Thus, setting the diameter of the cleaning liquid supply hole 40 to 5 mm or more means a significant increase of the diameter.
The diameter of the cleaning liquid introduction part 30 may be 8 mm or more to 11 mm or less. The diameter of the cleaning liquid introduction part 30 in the conventional cleaning member attaching part is about 7 mm. Thus, setting the diameter of the cleaning liquid introduction part 30 to 8 mm or more means an increase of the diameter.
As an example, as shown in
As another example, as shown in
The cross-sectional area of the cleaning liquid supply holes 40 in the fourth region may be larger than the cross-sectional area of the cleaning liquid supply hole 40 in the first region. In addition, the cross-sectional area of the cleaning liquid supply holes 40 in the third region may be larger than the cross-sectional area of the cleaning liquid supply holes 40 in the fourth region, and may be smaller than the cross-sectional area of the cleaning liquid supply holes 40 in the second region.
When the third region or more are provided, an n-th region with the largest number is provided adjacent to the first region, the third region with the smallest number is provided adjacent to the second region, and the third region to the n-th region are provided in ascending numeric order. As described above, the region is divided along the longitudinal direction of the cleaning member attaching part 10 based on the supply hole area proportion, and thus the supply hole area proportion differs among the regions. In an aspect in which the supply hole area proportion is smaller on the first end part 11 side and the supply hole area proportion is larger on the second end part 12 side, the supply hole area proportion is smallest in the first region, the supply hole area proportion in the n-th region is second smallest, the supply hole area proportion in an n−1-th region is third smallest, . . . , the supply hole area proportion in the fourth region is the third largest, the supply hole area proportion in the third region is the second largest, and the supply hole area proportion in the second region is the largest.
The boundary between the regions is formed along the surface direction with the axial direction as the normal direction (along the radial direction of the cleaning member attaching part 10) at an intermediate point between the cleaning liquid supply holes 40 constituting different supply hole area proportions. When the cross-sectional area of the cleaning liquid supply holes 40 varies as in this aspect, a boundary between the regions is formed at the middle point between the cleaning liquid supply holes 40 having different cross-sectional areas when viewed along the axial direction (the cleaning liquid supply holes 40 located at the ends of the regions). For example, in the aspect shown in
The cross-sectional area of the cleaning liquid introduction part 30 extending inside the main body 20 may correspond to the cross-sectional area of the cleaning liquid supply holes 40 in the second region having the largest cross-sectional area. In the present application, the term “correspond” means that the difference between the two falls within a range of 5% on the basis of a large value, and that, if Sa≤Sb, 0.95×Sb≤Sa≤Sb, and if Sa>Sb, Sa>Sb≥0.95×Sa where Sa represents the cross-sectional area of the cleaning liquid introduction part 30 and Sb represents the cross-sectional area of the cleaning liquid supply holes 40 in the second region.
As shown in
When the cleaning member attaching part 10 is considered as a manifold, the branch flow rate in the manifold is determined by the pressure distribution in the manifold. The static pressure tends to increase for each of the branches (each of the cleaning liquid supply holes 40), and the flow rate tends to increase accordingly. However, the tendency differs depending on the loss ratio (loss ratio=(cross-sectional area of manifold/total branch pipe area)2). In the cleaning member attaching part 10 used in the present embodiment, the loss ratio is typically 1 or less, the flow rate tends to increase with increasing proximity to the second end part 12 side. As shown in the following equation, an increase in the flow rate under the same cross-sectional area condition means that the flow velocity is high=the pressure is high.
Q (flow rate)=C (discharge coefficient)×A (cross-sectional area)×V (flow velocity)=C×A×(2×P (pressure)/ρ (fluid density))0.5
From the above, it is conceivable to adopt the following aspect in order to make the flow rate close to a constant value in the longitudinal direction.
1. Reduce the flow velocity at the second end part 12 side=lower the pressure
2. Expand the diameter of the cleaning member attaching part 10
3. Restrict the cleaning liquid supply holes 40 and change the individual hole diameters according to the pressure distribution
4. Make the cleaning member attaching part 10 as a tapered pipe to uniform the flow rate of the main pipe
Of the aspects “1” to “4”, “1” and “2” are employed in the present embodiment. However, the present invention is not limited to this but the aspects “3” and “4” can be adopted.
In order to prevent backflow at the first cleaning member holding part 100a (root end part), after attachment of the cleaning member attaching part 10 to the first cleaning member holding part 100a, the cleaning member attaching part 10 may be covered with a sealing member 160 to have sealing properties (see
Further, a difference may be provided between a porosity of the cleaning member 90 on the second end part 12 side (tip part) and a porosity of the cleaning member 90 on the first end part 11 side (root end part). Typically, when a sponge is used as the cleaning member 90, the porosity of the cleaning member 90 on the second end part 12 side (tip part) is higher than the porosity of the cleaning member 90 on the first end part 11 side (root end part). For example, the porosity of the cleaning member 90 on the second end part 12 side (tip part) can be 90%, and the porosity of the cleaning member 90 on the first end part 11 side (root end part) can be 80%.
The porosity can be defined as in the following equation:
Porosity (%)=(apparent volume−true volume)/(apparent volume)×100
Actually, the porosity can be obtained by sufficiently drying a target member with a dryer, measuring a density with a dry automatic densimeter, and calculating the apparent volume and the true volume from the density.
When the porosity is 80% or less, the cleaning member is likely to bend, and when the porosity is 98% or more, the strength required for cleaning the substrate cannot be secured and the cleaning property is lowered unfavorably.
As shown in
In one embodiment, a mold is formed by a cap member constituting the first end part 11, an inner frame 951 having holes 951a, and an outer frame 952 (see
Each of the inner frame 951 and the outer frame 952 is openable and closable. Then, the inner frame 951 and the outer frame 952 are opened to remove the cleaning member attaching part 10 from the mold. Then, the filler (for example, wax) filled in the inside of the cleaning member attaching part 10 is removed by a predetermined method, and the cap member that has capped openings of the cleaning liquid supply holes 40 is removed.
Next, the inside of the cleaning member attaching part 10, the openings of the cleaning liquid supply holes 40, and the roll cleaning member 90 are washed with water. By this series of steps, the cleaning member 90 made of a PVA material can be integrally formed (molded) on the cleaning member attaching part 10 while pressing the occurrence of back contamination during use.
In one embodiment, at the manufacture of the cleaning member 90 made of a PVA material on the cleaning member attaching part 10 by integral molding, it is possible to mold the cleaning member made of a PVA material such that the parts of the cleaning member 90 corresponding to the openings of the cleaning liquid supply holes 40 are recessed. With this cleaning member assembly, it is possible to more effectively prevent the cleaning liquid discharged from the cleaning member attaching part 10 to the cleaning member 90 from flowing back inside.
In one embodiment, the cleaning member assembly 1 can allow the cleaning member attaching part 10 and the roll cleaning member 90 to be firmly stuck together with an adhesive.
In one embodiment, the cleaning member assembly 1 is formed such that the inner diameter of the roll cleaning member 90 is smaller than the outer diameter of the cleaning member attaching part 10, and the roll cleaning member 90 is pressed into the cleaning member attaching part 10 so that the cleaning member attaching part 10 and the roll cleaning member 90 are fixedly supported by the elastic force of the roll cleaning member 90. Further, in one embodiment, a surface active agent is applied to the surface of the cleaning member attaching part 10, then the roll cleaning member 90 is inserted into the cleaning member attaching part 10, and then the cleaning member attaching part 10 and the roll cleaning member 90 can be rinsed with water to remove the surface active agent.
In one embodiment, the average pore diameter of the cleaning member 90 can be set to 50 μm to 250 μm (where the average pore diameter is the average of the diameters of a predetermined number of pores randomly extracted from a plurality of pores in the target area). In one embodiment, an apparent density of the cleaning member 90 can be 0.05 g/cm3 or more, and a percentage of water retention can be set to 500% to 1200%. Further, in one embodiment, a 30% compressive stress of the cleaning member 90 in an appropriate water-containing state can be set to 3 kPa or more to 200 kPa or less. The appropriate water-containing state is a weight percentage in the water-containing state with respect to the dry state, and refers to a water-containing state in which the cleaning member 90 has an appropriate elastic force in a substrate cleaning process or the like. In addition, the 30% compressive stress refers to a load per unit area obtained by applying a load to the cleaning member 90 in an appropriate water-containing state from both end surfaces, measuring a load with which the cleaning member 90 is longitudinally 30% crushed by a digital load measuring device, and dividing the measured value by the area of the end surfaces.
Next, advantageous effects of the thus configured present embodiment, which have not yet been described, will be mainly described. Even if it is not described in the Configuration, any configuration described in the Advantageous effects can be adopted in the present invention.
In a case of adopting an aspect in which the area proportion of the cleaning liquid supply holes 40 to the second region in the surface of the main body 20 is larger than the area proportion of the cleaning liquid supply holes 40 in the first region located near the first end part 11 side (see
Reducing the amount of the cleaning liquid flowing to the driven part side in this manner makes it possible to bring the amount of the cleaning liquid supplied to the substrate W closer to an accurate value, thereby increasing the cleaning accuracy of the substrate W. In addition, suppressing variations in the discharge amount of the cleaning liquid from the cleaning member 90 makes it possible to increase the cleaning efficiency of the substrate W. Further, efficiently providing the cleaning liquid to the substrate W makes it possible to reduce the necessary amount of the cleaning liquid.
It is also conceivable to adopt an aspect in which a dug portion (recess) is provided on the outer surface of the cleaning member attaching part 10 (the outer edges of the cleaning liquid supply holes 40) to facilitate the outflow of the cleaning liquid. However, it is not preferable to adopt this aspect in that dust is likely to accumulate between the outer surface of the cleaning member attaching part 10 and the inner surface of the cleaning member 90.
In a case where the cross-sectional area of the cleaning liquid supply holes 40 in the second region is larger than the cross-sectional area of the cleaning liquid supply holes 40 in the first region, increasing the cross-sectional area of the cleaning liquid supply holes 40 makes it possible to suppress variations in the discharge amount of the cleaning liquid from the cleaning member 90 and decrease the amount of the cleaning liquid flowing to the driven part side. According to this aspect, it is only necessary to adjust the size of the cleaning liquid supply holes 40, which makes it easy to perform the processing.
In a case of adopting an aspect in which the area proportion of the cleaning liquid supply holes 40 in the third region to the surface of the main body 20 is larger than the area proportion of the cleaning liquid supply holes 40 in the first region to the surface of the main body 20 and is smaller than the area proportion of the cleaning liquid supply holes 40 in the second region to the surface of the main body 20 (see
In a case of adopting an aspect in which the area proportion of the cleaning liquid supply holes 40 in the fourth region to the surface of the main body 20 is larger than the area proportion of the cleaning liquid supply holes 40 in the first region to the surface of the main body 20 and is smaller than the area proportion of the cleaning liquid supply holes 40 in the third region to the surface of the main body 20 (see
In a case of adopting an aspect in which the supply hole area proportion is small on the first end part 11 side and the supply hole area proportion is large on the second end part 12 side, the supply hole area proportion in the first region is the smallest, the supply hole area proportion in the n-th region is the second smallest, the supply hole area proportion in the n−1th region is the third smallest, . . . , and in a case of adopting an aspect in which the supply hole area proportion in the third region is the second largest and the supply hole area proportion in the second region is the largest, it is possible to make larger the supply hole area proportion from the first end part 11 to which the cleaning liquid is supplied (the driven part side) toward the second end part 12, accurately suppress variations in the discharge amount of the cleaning liquid from the cleaning member 90, and decrease the amount of the cleaning liquid flowing to the driven part side (eliminate in some cases).
In a case of adopting an aspect in which the cross-sectional area of the cleaning liquid supply holes 40 in the fourth region is larger than the cross-sectional area of the cleaning liquid supply holes 40 in the first region and the cross-sectional area of the cleaning liquid supply holes 40 in the third region is larger than the cross-sectional area of the cleaning liquid supply holes 40 in the fourth region and is smaller than the cross-sectional area of the cleaning liquid supply holes 40 in the second region, adjusting the cross-sectional areas of the cleaning liquid supply holes 40 in the first to fourth regions makes it possible to adjust the supply hole area proportions in these regions.
Setting the cross-sectional area of the cleaning liquid supply holes 40 in the second region located closest to the second end part 12 side corresponding to the cross-sectional area of the cleaning liquid introduction part 30 extending inside the main body 20 makes it possible to more reliably discharge the cleaning liquid having flown into the cleaning liquid introduction part 30 from the cleaning liquid supply holes 40 in the second region, thereby preventing the cleaning liquid from flowing out to the driven part side. That is, setting the cross-sectional area of the cleaning liquid supply holes 40 in the second region corresponding to the cross-sectional area of the cleaning liquid introduction part 30 makes it possible to more reliably discharge the cleaning liquid having flown to the second end part 12 side from the cleaning liquid supply holes 40 in the second region.
The present invention is not limited to the above-described aspect. It is also possible to adopt an aspect in which the supply hole area proportion in a p-th region is not smaller than the supply hole area proportion in a q-th region (“p” and “q” are integers of 2 or larger, and “p” is an integer larger than “q”.) That is, it is possible to adopt an aspect in which the supply hole area proportion in the p-th region the supply hole area proportion in the q-th region, or adopt an aspect in which the cross-sectional area of the cleaning liquid supply holes 40 in the p-th region the cross-sectional area of the cleaning liquid supply holes 40 in the q-th region. As an example, the cross-sectional area of the cleaning liquid supply holes 40 in the fourth region may be equal to or larger than the cross-sectional area of the cleaning liquid supply holes 40 in the third region. In adjusting variations in the discharge amount, this is because it is not necessarily preferable that the supply hole area proportion in the region located near the second end part 12 side is larger than the supply hole area proportion in the second end part 12 side. Therefore, in some cases, an aspect in which the supply hole area proportion in the first region is not the smallest may be adopted so that a region having a supply hole area proportion smaller than the supply hole area proportion in the first region may be provided.
An example according to the present embodiment will be described.
In the example, a tray 500 equally divided into ten parts in the longitudinal direction of the cleaning member 90 made of a sponge (see
In the example, as shown in
Table 1 below shows results of experiment with the example. In each of cases at the supply rates of 450 ml/min and 800 ml/min and at the rotation speeds of 50 rpm, 100 rpm, 150 rpm, and 200 rpm, there was no place with a discharge amount of 10 mm or less, and the discharge amount at the place with the largest discharge amount was about 2.3 times that at the place with the smallest discharge amount.
Comparative examples were made in the same aspect as that of the example except that the diameters of the cleaning liquid introduction part 30 and the cleaning liquid supply holes 40 were different.
Also in a comparative example 1, the cleaning liquid supply holes 40 were provided at 13 places (the number was 26) along the longitudinal direction of the cleaning member assembly 1 as in the example. In the comparative example 1, each of the cleaning liquid introduction part 30 and the cleaning liquid supply holes 40 located in the main body 20 had a cylindrical shape, the diameter of the cleaning liquid introduction part 30 was 8 mm, and the diameter of the cleaning liquid supply holes 40 was 5 mm. The results of the experiment with the comparative example 1 are as below. There were places with a discharge amount of 10 mm or less, and there also were places with a discharge amount of 60 mm which was the largest and was six times that at the places with the smallest discharge amount.
Also in a comparative example 2, the cleaning liquid supply holes 40 were provided at 13 places (the number was 26) along the longitudinal direction of the cleaning member assembly 1 as in the example. In the comparative example 2, each of the cleaning liquid introduction part 30 and the cleaning liquid supply holes 40 located in the main body 20 had a cylindrical shape, the diameter of the cleaning liquid introduction part 30 was 9 mm, and the diameter of the cleaning liquid supply holes 40 was 5 mm. The results of the experiment with the comparative example 2 are as shown below. The comparative example 2 is improved as compared with the comparative example 1. However, there were places with a discharge amount of 10 mm or less, and there also were places with a discharge amount of 40 mm which was the largest and is four times that at the places with the smallest discharge amount.
It has also been confirmed that, in a case of adopting an aspect in which the diameter of the cleaning liquid supply holes 40 was 1 mm to 1.2 mm, there was a place in the tray 500 where the cleaning liquid did not flow out of the cleaning member 90.
Next, a second embodiment of the present invention will be described.
As shown in
In a case of adjusting the pitch width as in the present embodiment, it is possible to makes the area proportion of the cleaning liquid supply holes 40 in the second region to the surface of the main body 20 larger than the area proportion of the cleaning liquid supply holes 40 in the first region located near the first end part 11 side to the surface of the main body 20 by a simple processing method.
As described that all the aspects described above in relation to the first embodiment can be adopted, three or more regions may be provided in the present embodiment, and the pitch width may be made different among the three or more regions. The longest pitch width may be 1.5 to 2.5 times the shortest pitch width, and more specifically, the longest pitch width may be 1.7 to 2.0 times the shortest pitch width.
The cross-sectional areas of the cleaning liquid supply holes 40 in the present embodiment may have the same size in all the regions. Otherwise, as described above in relation to the first embodiment, the cross-sectional area of the cleaning liquid supply holes 40 may be different in different regions. The cleaning liquid supply holes 40 may have the same cross-sectional area in some of a plurality of different regions (for example, the first region and the fourth region), and the cleaning liquid supply holes 40 may have different cross-sectional areas in the remaining regions (for example, the second region and the third region).
Also in the present embodiment, it is possible to adopt an aspect in which the supply hole area proportion in a p-th region is not smaller than the supply hole area proportion in a q-th region (“p” and “q” are integers of 2 or larger, and “p” is an integer larger than “q”.) That is, it is possible to adopt an aspect in which the supply hole area proportion in the p-th region≥the supply hole area proportion in the q-th region, or adopt an aspect in which the longitudinal pitch width between the cleaning liquid supply holes 40 in the p-th region≤the longitudinal pitch width between the cleaning liquid supply holes 40 in the q-th region.
The supply hole area proportion may be adjusted by combining the pitch width between the cleaning liquid supply holes 40 along the longitudinal direction and the cross-sectional areas of the cleaning liquid supply holes 40. For example, the cross-sectional area of the cleaning liquid supply holes 40 in a r-th region is smaller than the cross-sectional area of the cleaning liquid supply holes 40 in a t-th region, while the pitch width in the r-th region is smaller than the pitch width in the t-th region. As a result, the supply hole area proportion in the r-th region may be larger than the supply hole area proportion in the t-th region (where “r” and “t” are integers).
As a modification example, the pitch width between the cleaning liquid supply holes 40 along the longitudinal direction in the second region is larger than the pitch width between the cleaning liquid supply holes 40 along the longitudinal direction in the first region. In this case, it is possible to adopt an aspect in which the supply hole area proportion in the p-th region≥the supply hole area proportion in the q-th region, or adopt an aspect in which the longitudinal pitch width between the cleaning liquid supply holes 40 in the p-th region≤the longitudinal pitch width between the cleaning liquid supply holes 40 in the q-th region.
Next, a third embodiment of the present invention will be described.
In the present embodiment, a plurality of cleaning liquid supply holes 40 is provided at the same position along the longitudinal direction in a second region, and the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the second region is larger than the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the first region (see
In a case of adjusting the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction as in the present embodiment, it is possible to makes the area proportion of the cleaning liquid supply holes 40 in the second region to the surface of the main body 20 larger than the area proportion of the cleaning liquid supply holes 40 in the first region located near the first end part 11 side to the surface of the main body 20 by a simple processing method.
The cleaning liquid supply holes 40 at the same position along the longitudinal direction in the second region may be arranged at intervals of approximately 90 degrees when viewed along the axial direction (see
As described that all the aspects described above in relation to the first embodiment can be adopted, three or more regions may be provided in the present embodiment, and the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction may be made different among the three or more regions. As an example, in the third region, the cleaning liquid supply holes 40 may be arranged at intervals of approximately 120 degrees when viewed along the axial direction. The largest number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction may be 1.5 times or more to 3.0 times or less the smallest number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction. More specifically, the largest number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction may be 1.8 times or more to 2.5 times or less the smallest number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction.
The number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the p-th region may be smaller than the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the q-th region (“p” and “q” are integers of 2 or larger and “p” is an integer greater than “q”). However, the present invention is not limited to this but the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the p-th region may be smaller than the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the q-th region.
The cross-sectional areas of the cleaning liquid supply holes 40 in the present embodiment may have the same size in all the regions. Otherwise, as described above in relation to the first embodiment, the cross-sectional area of the cleaning liquid supply holes 40 may be different in different regions. The cleaning liquid supply holes 40 may have the same cross-sectional area in some of a plurality of different regions (for example, the first region and the fourth region), and the cleaning liquid supply holes 40 may have different cross-sectional areas in the remaining regions (for example, the second region and the third region).
The pitch width between the cleaning liquid supply holes 40 in the present embodiment may have the same length in all the regions. Otherwise, as described above in relation to the second embodiment, the pitch width between the cleaning liquid supply holes 40 may be different in different regions. The cleaning liquid supply holes 40 may have the same pitch width in some of a plurality of different regions (for example, the first region and the fourth region), and the cleaning liquid supply holes 40 may have different pitch widths in the remaining regions (for example, the second region and the third region).
Further, the supply hole area proportion may be adjusted by combining the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction with one or both of the pitch width between the cleaning liquid supply holes 40 along the longitudinal direction and the cross-sectional area of the cleaning liquid supply holes 40. For example, the cross-sectional area of the cleaning liquid supply holes 40 in a r-th region is smaller than the cross-sectional area of the cleaning liquid supply holes 40 in a t-th region, while the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the r-th region is larger than the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the t-th region. As a result, the supply hole area proportion in the r-th region may be larger than the supply hole area proportion in the t-th region (where “r” and “t” are integers). Further, the pitch width in the r-th region is shorter than the pitch width in the t-th region, while the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the r-th region is smaller than the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the t-th region. As a result, the supply hole area proportion in the r-th region may be smaller than the supply hole area proportion in the t-th region.
As a modification example, the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the second region may be smaller than the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the first region. In this case, the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the p-th region may be larger than the number of the cleaning liquid supply holes 40 at the same position along the longitudinal direction in the q-th region.
In another embodiment, for example, as shown in
In one embodiment, the processing object to be cleaned by the cleaning member is not limited to a semiconductor wafer, but may be a silicon wafer, a glass substrate, a printed wiring board, a liquid crystal panel, or a solar panel. Further, the shape of the plane of the processing object may be circular or rectangular, and the thickness of the plane may be a thickness that allows in-plane deflection. Substrates to be processed including a rectangular substrate and a circular substrate include a rectangular substrate and a circular substrate. Further, the rectangular substrate includes a glass substrate, a liquid crystal substrate, a printed circuit board, with a polygonal shape such as a rectangle, and other polygonal plating objects. The circular substrate includes a semiconductor wafer, a glass substrate, and other circular plating objects.
As the cleaning liquid, high-temperature pure water, ammonium hydrogen-peroxide mixture (APM), sulfuric-acid hydrogen peroxide mixture (SPM), carbonated water, and others are applicable.
The description of each embodiments and the disclosure of the drawings described above are merely examples for explaining the invention described in the claims, and the invention described in the claims is not limited by the description of the embodiment or the disclosure of the drawings described above. In addition, the recitation of the claims at the original application is merely an example, and the recitation of the claims can be appropriately changed based on the description of the specification, the drawings, and the like.
Number | Date | Country | Kind |
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2019-017549 | Feb 2019 | JP | national |