T. Cacouris, Preventing Cross-Contamination Caused By Copper Diffusion, Yield Management Solutions, Autumn 1999, pp. C-13-C17. |
K. Devriendt et al., CMP Defect Detection and Process Control using the Surfscan SP1TB , Yield Solutions, Summer 2000, pp. 72-73. |
J. T. Pan et al., Copper CMP and Process Control, Tony Pan, Jan. 1, 1999, pp. 1-7. |
C. C. Garretson et al., New Pad Conditioning Disk Design Delivers Excellent Process Performance White Increasing CMP Productivity, CMP Technology for ULSI Interconnection, SEMICON West 2000, © SEMI 2000, 9 pp. |