Retaining rings

Industry

CPC
B24B37/32

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Parent Industries

BPERFORMING OPERATIONS TRANSPORTING B24Grinding technology B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS B24B37/00Lapping machines or devices Accessories

Current Industry

B24B37/32Retaining rings

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Temperature controlled substrate carrier and polishing components
- Patent number 12,217,979
- Issue date Feb 4, 2025
- Axus Technology, LLC
- Daniel Ray Trojan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing head retaining ring tilting moment control
- Patent number 12,214,469
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Andrew Nagengast
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier head membrane with regions of different roughness
- Patent number 12,172,264
- Issue date Dec 24, 2024
- Applied Materials, Inc.
- Young J. Paik
- B24 - GRINDING POLISHING
Information Patent Grant
Membrane for carrier head with segmented substrate chuck
- Patent number 12,128,524
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 12,128,523
- Issue date Oct 29, 2024
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing apparatus and method
- Patent number 12,076,831
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chen Wei
- B24 - GRINDING POLISHING
Information Patent Grant
Retaining ring having inner surfaces with features
- Patent number 12,048,981
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Steven Mark Reedy
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing head with membrane position control
- Patent number 12,042,899
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Grant
Mega-sonic vibration assisted chemical mechanical planarization
- Patent number 12,036,636
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hao Kung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing carrier head with piezoelectric pressure control
- Patent number 12,030,156
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Brian J. Brown
- B24 - GRINDING POLISHING
Information Patent Grant
Retaining ring having inner surfaces with facets
- Patent number 12,033,865
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Jeonghoon Oh
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate carrier head and processing system
- Patent number 12,023,778
- Issue date Jul 2, 2024
- Axus Technology, LLC
- Daniel Ray Trojan
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing method
- Patent number 12,017,322
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Chang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier head having abrasive structure on retainer ring
- Patent number 12,011,803
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chang-Sheng Lin
- B24 - GRINDING POLISHING
Information Patent Grant
Fixing device and detection system
- Patent number 12,005,545
- Issue date Jun 11, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Chao Li
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing head with local wafer pressure
- Patent number 11,986,923
- Issue date May 21, 2024
- Applied Materials, Inc.
- Andrew Nagengast
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus, elastic membrane, polishing apparatus,...
- Patent number 11,958,163
- Issue date Apr 16, 2024
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Stepped retaining ring
- Patent number 11,958,164
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Shaun Van Der Veen
- B24 - GRINDING POLISHING
Information Patent Grant
Dual membrane carrier head for chemical mechanical polishing
- Patent number 11,945,073
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for polishing and method of polishing
- Patent number 11,926,018
- Issue date Mar 12, 2024
- Ebara Corporation
- Masayoshi Ito
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing carrier head with piezoelectric pressure control
- Patent number 11,890,715
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Brian J. Brown
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus
- Patent number 11,883,922
- Issue date Jan 30, 2024
- Ebara Corporation
- Yuki Watanabe
- B24 - GRINDING POLISHING
Information Patent Grant
CMP polishing head design for improving removal rate uniformity
- Patent number 11,865,666
- Issue date Jan 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Chien Hou
- B24 - GRINDING POLISHING
Information Patent Grant
Method of forming retaining ring with shaped surface
- Patent number 11,850,703
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization membrane
- Patent number 11,850,702
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Ping Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing carrier head with multiple angular pressurizable zones
- Patent number 11,780,049
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Grant
Carrier head with segmented substrate chuck
- Patent number 11,759,911
- Issue date Sep 19, 2023
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making carrier head membrane with regions of different ro...
- Patent number 11,738,421
- Issue date Aug 29, 2023
- Applied Materials, Inc.
- Young J. Paik
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 11,731,235
- Issue date Aug 22, 2023
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Method for selecting template assembly, method for polishing workpi...
- Patent number 11,731,236
- Issue date Aug 22, 2023
- Shin-Etsu Handotai Co., Ltd.
- Kazuya Sato
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE HOLDING DEVICE, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE...
- Publication number 20250018532
- Publication date Jan 16, 2025
- EBARA CORPORATION
- Keisuke NAMIKI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE SUCTION MEMBER, ELASTIC SEAL ASSEMBLY, TOP RING, AND SUBS...
- Publication number 20240416480
- Publication date Dec 19, 2024
- EBARA CORPORATION
- Kazuhiro TAJIMA
- B24 - GRINDING POLISHING
Information Patent Application
RETAINING RING FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20240391051
- Publication date Nov 28, 2024
- Mitsubishi Chemical Advanced Materials, Inc.
- David Wilkinson
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING TOOL AND METHOD
- Publication number 20240383092
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Te-Chien Hou
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND A METHOD OF POLISHING A...
- Publication number 20240359286
- Publication date Oct 31, 2024
- Samsung Electronics Co., Ltd.
- Donghoon KWON
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING HEAD WITH MEMBRANE POSITION CONTROL
- Publication number 20240342853
- Publication date Oct 17, 2024
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE TRANSFER APPARATUS, AND APPARATUS FOR PROCESSING SUBSTRAT...
- Publication number 20240335920
- Publication date Oct 10, 2024
- EBARA CORPORATION
- Manato FURUSAWA
- B24 - GRINDING POLISHING
Information Patent Application
RETAINING RING HAVING INNER SURFACES WITH FEATURES
- Publication number 20240316723
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Steven Mark Reedy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOP RING OF POLISHING APPARATUS AND POLISHING APPARATUS
- Publication number 20240316722
- Publication date Sep 26, 2024
- EBARA CORPORATION
- Makoto KASHIWAGI
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING METHOD
- Publication number 20240308021
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Chang CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR MANUFACTURING SUBSTRATE OF NITRIDE CRYSTAL...
- Publication number 20240293912
- Publication date Sep 5, 2024
- KYOCERA CORPORATION
- Mari YOSHIMORI HIGUCHI
- C30 - CRYSTAL GROWTH
Information Patent Application
Wafer Polishing Locating Ring and Chemical Mechanical Polishing Device
- Publication number 20240269799
- Publication date Aug 15, 2024
- Shanghai Huali Integrated Circuit Corporation
- Jian Zhang
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING HEAD WITH LOCAL WAFER PRESSURE
- Publication number 20240253179
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Andrew NAGENGAST
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING DEVICE AND POLISHING METHOD
- Publication number 20240227122
- Publication date Jul 11, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Ming-Hsiang Chen
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD OF CONTROLLING T...
- Publication number 20240217059
- Publication date Jul 4, 2024
- Samsung Electronics Co., Ltd.
- WONKEUN CHO
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING DEVICE AND POLISHING METHOD
- Publication number 20240131655
- Publication date Apr 25, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Ming-Hsiang Chen
- B24 - GRINDING POLISHING
Information Patent Application
RETAINER RING, CHEMICAL MECHANICAL POLISHING APPARATUS, AND SUBSTRA...
- Publication number 20240091902
- Publication date Mar 21, 2024
- Samsung Electronics Co., Ltd.
- Sangyun LEE
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING HEAD, AND POLISHING TREATMENT DEVICE
- Publication number 20240082983
- Publication date Mar 14, 2024
- MICRO ENGINEERING, INC.
- Akio KOMURA
- B24 - GRINDING POLISHING
Information Patent Application
RETAINER FOR CHEMICAL MECHANICAL POLISHING CARRIER HEAD
- Publication number 20240075584
- Publication date Mar 7, 2024
- Applied Materials, Inc.
- Andrew J. Nagengast
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING HEAD SYSTEM AND POLISHING METHOD
- Publication number 20240066658
- Publication date Feb 29, 2024
- EBARA CORPORATION
- Osamu NABEYA
- B24 - GRINDING POLISHING
Information Patent Application
DUAL MEMBRANE CARRIER HEAD FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20240042574
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Application
MEMBRANE FOR CARRIER HEAD WITH SEGMENTED SUBSTRATE CHUCK
- Publication number 20240017373
- Publication date Jan 18, 2024
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Application
RETAINER, TOP RING, AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240001506
- Publication date Jan 4, 2024
- EBARA CORPORATION
- Yu ISHII
- B24 - GRINDING POLISHING
Information Patent Application
HEAD FOR HOLDING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240006204
- Publication date Jan 4, 2024
- EBARA CORPORATION
- Makoto KASHIWAGI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING CARRIER HEAD WITH MULTIPLE ZONES
- Publication number 20230405758
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Application
ACOUSTIC MONITORING OF CMP RETAINING RING
- Publication number 20230390883
- Publication date Dec 7, 2023
- Applied Materials, Inc.
- Haoquan Fang
- B24 - GRINDING POLISHING
Information Patent Application
CLAMPING RETAINER FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20230381917
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Application
Carrier Head Membrane With Regions of Different Roughness
- Publication number 20230356353
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Young J. Paik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPLIANT INNER RING FOR A CHEMICAL MECHANICAL POLISHING SYSTEM
- Publication number 20230356354
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Jeonghoon Oh
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING HEAD WITH LOCAL INNER RING DOWNFORCE CONTROL
- Publication number 20230356355
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Jeonghoon Oh
- B24 - GRINDING POLISHING

Retaining rings

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Temperature controlled substrate carrier and polishing components

Polishing head retaining ring tilting moment control

Carrier head membrane with regions of different roughness

Membrane for carrier head with segmented substrate chuck

Polishing apparatus

Chemical mechanical polishing apparatus and method

Retaining ring having inner surfaces with features

Polishing head with membrane position control

Mega-sonic vibration assisted chemical mechanical planarization

Polishing carrier head with piezoelectric pressure control

Retaining ring having inner surfaces with facets

Substrate carrier head and processing system

Chemical mechanical polishing method

Carrier head having abrasive structure on retainer ring

Fixing device and detection system

Polishing head with local wafer pressure

Substrate holding apparatus, elastic membrane, polishing apparatus,...

Stepped retaining ring

Dual membrane carrier head for chemical mechanical polishing

Apparatus for polishing and method of polishing

Polishing carrier head with piezoelectric pressure control

Substrate processing apparatus

CMP polishing head design for improving removal rate uniformity

Method of forming retaining ring with shaped surface

Chemical mechanical planarization membrane

Polishing carrier head with multiple angular pressurizable zones

Carrier head with segmented substrate chuck

Method of making carrier head membrane with regions of different ro...

Polishing apparatus and polishing method

Method for selecting template assembly, method for polishing workpi...

Patents Applicationslast 30 patents

SUBSTRATE HOLDING DEVICE, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE...

SUBSTRATE SUCTION MEMBER, ELASTIC SEAL ASSEMBLY, TOP RING, AND SUBS...

RETAINING RING FOR CHEMICAL MECHANICAL POLISHING

POLISHING TOOL AND METHOD

CHEMICAL MECHANICAL POLISHING APPARATUS AND A METHOD OF POLISHING A...

POLISHING HEAD WITH MEMBRANE POSITION CONTROL

SUBSTRATE TRANSFER APPARATUS, AND APPARATUS FOR PROCESSING SUBSTRAT...

RETAINING RING HAVING INNER SURFACES WITH FEATURES

TOP RING OF POLISHING APPARATUS AND POLISHING APPARATUS

CHEMICAL MECHANICAL POLISHING METHOD

MANUFACTURING METHOD FOR MANUFACTURING SUBSTRATE OF NITRIDE CRYSTAL...

Wafer Polishing Locating Ring and Chemical Mechanical Polishing Device

POLISHING HEAD WITH LOCAL WAFER PRESSURE

CHEMICAL MECHANICAL POLISHING DEVICE AND POLISHING METHOD

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD OF CONTROLLING T...

CHEMICAL MECHANICAL POLISHING DEVICE AND POLISHING METHOD

RETAINER RING, CHEMICAL MECHANICAL POLISHING APPARATUS, AND SUBSTRA...

POLISHING HEAD, AND POLISHING TREATMENT DEVICE

RETAINER FOR CHEMICAL MECHANICAL POLISHING CARRIER HEAD

POLISHING HEAD SYSTEM AND POLISHING METHOD

DUAL MEMBRANE CARRIER HEAD FOR CHEMICAL MECHANICAL POLISHING

MEMBRANE FOR CARRIER HEAD WITH SEGMENTED SUBSTRATE CHUCK

RETAINER, TOP RING, AND SUBSTRATE PROCESSING APPARATUS

HEAD FOR HOLDING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

POLISHING CARRIER HEAD WITH MULTIPLE ZONES

ACOUSTIC MONITORING OF CMP RETAINING RING

CLAMPING RETAINER FOR CHEMICAL MECHANICAL POLISHING

Carrier Head Membrane With Regions of Different Roughness

COMPLIANT INNER RING FOR A CHEMICAL MECHANICAL POLISHING SYSTEM

POLISHING HEAD WITH LOCAL INNER RING DOWNFORCE CONTROL