Patent Application
20130273252
The present invention relates to a coating apparatus and a coating method.
A CIGS solar cell or a CZTS solar cell formed by semiconductor materials including a metal such as Cu, Ge, Sn, Pb, Sb, Bi, Ga, In, Ti, Zn, and a combination thereof, and a chalcogen element such as S, Se, Te, and a combination thereof has been attracting attention as a solar cell having high conversion efficiency (for example, see Patent Documents 1 to 3).
For example, a CIGS solar cell has a structure in which a film including four types of semiconductor materials, namely, Cu, In, Ga, and Se is used as a light absorbing layer (photoelectric conversion layer). Further, for example, a CZTS solar cell has a structure in which a film including four types of semiconductor materials, namely, Cu, Zn, Sn, and Se is used as a light absorbing layer (photoelectric conversion layer). In such solar cells, a configuration is known in which a back electrode made of molybdenum is provided on a substrate such a glass, and the aforementioned light absorbing layer is provided on the back electrode.
In a CIGS solar cell or a CZTS solar cell, since it is possible to reduce the thickness of the light absorbing layer compared to a conventional solar cell, it is easy to install the CIGS solar cell on a curved surface and to transport the CIGS solar cell. For this reason, it is expected that CIGS solar cells can be used in various application fields as a high-performance, flexible solar cell. As a method of forming the light absorbing layer, a method of forming the light absorbing layer through depositing or sputtering is conventionally known (for example, see Patent Documents 2 to 5).
In contrast, as the method of forming the light absorbing layer, the present inventors propose a method of coating the semiconductor materials in the form of a liquid material on a substrate, followed by heating the substrate to form a coating film. In such a method of forming the light absorbing layer, the following problems arise.
For example, the coating film formed on the substrate is likely to have cracks and the like formed on the peripheral portion thereof, which becomes the cause of generation of foreign matters. Such foreign matters sometimes cause deterioration of the quality of the coating film. Therefore, suppression of the generation of foreign matters has been demanded.
The present invention takes the above circumstances into consideration, with an object of providing a coating apparatus and a coating method capable of suppressing generation of foreign matters.
The coating apparatus according to a first aspect of the present invention includes: a coating part which coats a liquid material containing a metal on a substrate; a coating-film forming part which subjects the liquid material coated on the substrate to a predetermined treatment to form a coating film; and a removing part which removes a peripheral portion of the coating film formed along the outer periphery of the substrate.
According to the present invention, by virtue of including a removing part which removes a peripheral portion of the coating film formed along the outer periphery of the substrate, even in the case where cracks and the like are formed on a peripheral portion of the coating film, the peripheral portion can be removed with the crack by using the removing part. As a result, generation of foreign matters can be suppressed.
In the coating apparatus, the coating-film forming part may include a heating part which heats the liquid material as the predetermined treatment.
In this embodiment, since generated cracks can be removed by heating the liquid material with the heating part, generation of foreign matters can be suppressed.
In the coating apparatus, the coating-film forming part may include a drying part which dries the liquid material as the predetermined treatment.
In this embodiment, since generated cracks can be removed by drying the liquid material with the drying part, generation of foreign matters can be suppressed. Herein, drying includes vacuum drying in which the ambient pressure of the liquid material is reduced, and a rotation drying in which the liquid material is rotated by rotating the entire substrate.
In the coating apparatus, the coating-film forming part may include a baking part which bakes the liquid material as the predetermined treatment.
In this embodiment, since generated cracks can be removed by baking the liquid material with the baking part, generation of foreign matters can be suppressed.
The coating apparatus may further include a suction part which suctions the peripheral portion removed by the removing part.
In this embodiment, by virtue of further including a suction part which suctions the peripheral portion removed by the removing part, the removed peripheral portion can be prevented from being retained around the substrate or inside the apparatus. As a result, the environment for forming a coating material on a substrate can be maintained clean, thereby reliably suppressing generation of foreign matters.
The coating apparatus may further include a moving part which moves the removing part along the outer periphery of the substrate.
In this embodiment, by virtue of further including a moving part which moves the removing part along the outer periphery of the substrate, the peripheral portion of the coating film can be efficiently removed.
In the coating apparatus, the removing part and the suction part may be secured to be integrally movable.
In this embodiment, by virtue of the removing part and the suction part being secured to be integrally movable, the portion of the substrate from which the peripheral portion has been removed can be suctioned along the outer periphery of the substrate. In this manner, the removing operation and the suction operation on the peripheral portion can be performed smoothly or simultaneously, thereby preventing retention or scattering of foreign matters.
In the coating apparatus, the removing part may include a brush part which rubs the peripheral portion.
In this embodiment, by virtue of the removing part including a brush part which rubs the peripheral portion, the peripheral portion of the coating film can be efficiently removed by using the brush part to rub the peripheral portion.
In the coating apparatus, the removing part may further include a rotation part which rotates the brush part.
In this embodiment, by virtue of the removing part including a rotation part which rotates the brush part, the peripheral portion of the coating film can be efficiently removed by rotating the brush part.
In the coating apparatus, the removing part may include a squeegee part which scrapes off the peripheral portion.
In this embodiment, by virtue of the removing part including a squeegee part which scrapes off the peripheral portion, the peripheral portion of the coating film can be efficiently removed by using the squeegee part to scrape off the peripheral portion.
In the coating apparatus, the removing part may include a jetting part which jets a gas or a liquid to the peripheral portion.
In this embodiment, by virtue of the removing part including a jetting part which jets a gas or a liquid to the peripheral portion, the peripheral portion of the coating film can be efficiently removed by using the jetting part to jet a gas or a liquid to the peripheral portion.
In the coating apparatus, the removing part may include an irradiation part which irradiates an energy wave to the peripheral portion.
In this embodiment, by virtue of the removing part including an irradiation part which irradiates an energy wave to the peripheral portion, the peripheral portion of the coating film can be efficiently removed by using the irradiation part to irradiate an energy wave to the peripheral portion.
The coating method according to a second aspect of the present invention includes: a coating step in which a liquid material containing a metal is coated on a substrate; a coating-film forming step in which the liquid material coated on the substrate is subjected to a predetermined treatment to form a coating film; and a removing step in which, after the coating-film forming step, a peripheral portion of the coating material formed along the outer periphery of the substrate is removed by using a removing part which is configured to remove the peripheral portion.
According to the present invention, by virtue of coating a liquid material containing a metal on a substrate, subjecting the liquid material coated on the substrate to a predetermined treatment to form a coating film and then removing a peripheral portion of the coating material formed along the outer periphery of the substrate using a removing part which is configured to remove the peripheral portion, even in the case where cracks and the like are formed on a peripheral portion of the coating film, the peripheral portion can be removed with the crack by using the removing part. As a result, generation of foreign matters can be suppressed.
In the coating method, the coating-film forming step may include a heating step in which the liquid material is heated as the predetermined treatment.
In this embodiment, since generated cracks can be removed by heating the liquid material, generation of foreign matters can be suppressed.
In the coating method, the coating-film forming step may include a drying step in which the liquid material is dried as the predetermined treatment.
In this embodiment, since generated cracks can be removed by drying the liquid material, generation of foreign matters can be suppressed. Herein, drying includes vacuum drying in which the ambient pressure of the liquid material is reduced, and a rotation drying in which the liquid material is rotated by rotating the entire substrate.
In the coating method, the coating-film forming step may include a baking step in which the liquid material is baked as the predetermined treatment.
In this embodiment, since generated cracks can be removed by baking the liquid material, generation of foreign matters can be suppressed.
The coating method may further include a suction step in which the peripheral portion removed by the removing part is suctioned.
In this embodiment, by virtue of further including a suction step in which the peripheral portion removed by the removing part is suctioned, the removed peripheral portion can be prevented from being retained around the substrate or inside the apparatus. As a result, the environment for forming a coating material on a substrate can be maintained clean, thereby reliably suppressing generation of foreign matters.
The coating method may further include a moving step in which the removing part is moved along the outer periphery of the substrate.
In this embodiment, by virtue of moving the removing part along the outer periphery of the substrate, the peripheral portion of the coating film can be efficiently removed.
The coating method may further include a suction step in which the peripheral portion removed by the removing part is suctioned, wherein the suction step includes suctioning the peripheral portion using a suction part, and the moving step includes integrally moving the removing part and the suction part.
In this embodiment, by virtue of integrally moving the removing part and the suction part, the portion of the substrate from which the peripheral portion has been removed can be suctioned along the outer periphery of the substrate. In this manner, the removing operation and the suction operation on the peripheral portion can be performed smoothly or simultaneously, thereby preventing retention or scattering of foreign matters.
In the coating method, the removing step may include rubbing the peripheral portion.
In this embodiment, by virtue of rubbing the peripheral portion in the removing step, the peripheral portion can be efficiently removed.
In the coating method, the removing step may include rotating a brush part to rub the peripheral portion.
In this embodiment, by virtue of rotating a brush part to rub the peripheral portion in the removing step, the peripheral portion can be efficiently removed.
In the coating method, the removing step may include scraping off the peripheral portion.
In this embodiment, by virtue of scraping off the peripheral portion in the removing step, the peripheral portion can be efficiently removed.
In the coating method, the removing step may include jetting a gas or a liquid to the peripheral portion.
In this embodiment, by virtue of jetting a gas or a liquid to the peripheral portion in the removing step, the peripheral portion can be efficiently removed.
In the coating method, the removing step may include irradiating an energy wave to the peripheral portion.
In this embodiment, by virtue of irradiating an energy wave to the peripheral portion in the removing step, the peripheral portion can be efficiently removed.
In the coating method, the heating step may include a drying step in which the liquid material is dried.
In this embodiment, by virtue of the drying step in which the liquid material is dried, even in the case where cracks and the like are formed on a peripheral portion of the coating film, the peripheral portion can be removed with the crack by using the removing part. As a result, generation of foreign matters can be suppressed.
In the coating method, the heating step may include a baking step in which the liquid material is baked.
In this embodiment, by virtue of the baking step in which the liquid material is baked, even in the case where cracks and the like are formed on a peripheral portion of the coating film, the peripheral portion can be removed with the crack by using the removing part. As a result, generation of foreign matters can be suppressed.
According to the present invention, generation of foreign matters can be suppressed.
Hereinafter, one embodiment of the present invention will be described with reference to the accompanying drawings.
As shown in
The coating apparatus CTR is used, for example, by being disposed on a floor FL in a factory. The coating apparatus may have a configuration in which the coating apparatus is accommodated in one room, or a configuration in which the coating apparatus is divisionally accommodated in a plurality of rooms. In the coating apparatus CTR, the substrate loading/unloading part LU, the coating part CT, the vacuum drying part VD and the baking part BK are arranged in this order in one direction.
With respect to the configuration of the coating apparatus CTR, it is not particularly limited that the substrate loading/unloading part LU, the coating part CT, the vacuum drying part VD and the baking part BK are arranged in this order in one direction. For example, the substrate loading/unloading part LU may be divided into a substrate loading part (not shown) and a substrate unloading part (not shown). Further, the vacuum drying part VD may be omitted. Needless to say, the aforementioned parts may not be arranged in one direction, and a configuration may be employed in which the aforementioned parts are arranged to be stacked in a vertical or horizontal direction with a robot (not shown) disposed at a central position.
In the respective drawings as below, upon describing the configuration of a substrate treating apparatus according to the present embodiment, for the purpose of simple marking, an XYZ coordinate system is used to describe the directions in the drawings. In the XYZ coordinate system, the plane parallel to the floor is regarded as the XY plane. On the XY plane, the direction in which the components of the coating apparatus CTR (the substrate loading/unloading part LU, the coating part CT, the vacuum drying part VD and the baking part BK) are arranged is marked as the X direction, and the direction perpendicular to the X direction on the XY plane is marked as the Y direction. The direction perpendicular to the XY plane is marked as the Z direction. In the X, Y, and Z directions, the arrow direction in the drawing is the +direction, and the opposite direction of the arrow direction is the −direction.
In this embodiment, as the substrate S, for example, a plate-shaped member made of glass, resin, or the like may be used. Further, in this embodiment, molybdenum is sputtered on the substrate S as a back electrode. Needless to say, any other electroconductive material may be used as a back electrode. Explanation will be given below, taking an example of a substrate having a size of 330 mm×330 mm as viewed in the Z direction. The size of the substrate is not limited to 330 mm×330 mm. For example, as the substrate S, a substrate having a size of 125 mm×125 mm may be used, or a substrate having a size of 1 m×1 m may be used. Needless to say, a substrate having a size larger than the aforementioned sizes or a substrate having a size smaller than the aforementioned sizes may be appropriately used.
In this embodiment, as the liquid material to be applied to the substrate S, for example, a liquid composition is used which includes a solvent such as hydrazine and metals such as a combination of copper (Cu), indium (In), gallium (Ga), and selenium (Se) or a combination of copper (Cu), zinc (Zn), tin (Sn) and selenium (Se). The liquid composition includes a metal material for forming a light absorbing layer (photoelectric conversion layer) of a CIGS solar cell or a CZTS solar cell.
In the present embodiment, the liquid composition contains a substance for obtaining the grain size of a light absorbing layer of a CIGS solar cell or a CZTS solar cell. Needless to say, as the liquid material, a liquid material in which another oxidizable metal (such as metal nano particles) is dispersed in the solution may be used.
(Substrate Loading/Unloading Part)
The substrate loading/unloading part LU loads a substrate S prior to being treated on the coating part CT, and unloads the treated substrate S from the coating part CT. The substrate loading/unloading part LU has a chamber 10. The chamber 10 is formed in the shape of a rectangular box. Inside the chamber 10, an accommodation room 10a capable of accommodating the substrate S is formed. The chamber 10 has a first opening 11, a second opening 12 and a lid portion 14. The first opening 11 and the second opening 12 communicates the accommodation room 10a with the outside of the chamber 10.
The first opening 11 is formed on a +Z-side face of the chamber 10. The first opening 11 is formed to have a size larger than the size of the substrate S as viewed in the Z direction. The substrate S to be taken out of the chamber 10 or the substrate S to be accommodated in the accommodation room 10a is place into or taken out of the substrate loading/unloading part LU through the first opening 11.
The second opening 12 is formed on a +X-side face of the chamber 10. The second opening 12 is formed to have a size larger than the size of the substrate S as viewed in the X direction. The substrate S supplied to the coating part CT or the substrate S returned from the coating part CT is place into or taken out of the substrate loading/unloading part LU through the second opening 12.
The lid portion 14 opens or closes the first opening 11. The lid portion 14 is formed in the shape of a rectangular plate. The lid portion 14 is attached to a +X-side edge of the first opening 11 via a hinge portion (not shown). Thus, the lid portion 14 is rotatable around the Y-axis, with the +X-side edge of the first opening 11 as the center. By rotating the lid portion 14 around the Y-axis, the first opening 11 can be opened or closed.
The accommodation room 10a is provided with a substrate transporting part 15. The substrate transporting part 15 includes a plurality of rollers 17. The rollers 17 are arranged in a pair in the Y-direction, and a plurality of the pairs are arranged in the X-direction.
Each of the rollers 17 is adapted to be rotatable about the Y direction serving as the central axis. The plurality of rollers 17 are formed to have the same diameter, and the +Z-side end of the plurality of rollers 17 are arranged on a same plane parallel to the XY plane. Thus, the plurality of rollers 17 are capable of supporting the substrate S in a state where the substrate S is parallel to the XY plane.
The rotation of each of the rollers 17 is controlled, for example, by a roller-rotation control part (not shown). By rotating each of the rollers 17 clockwise or anti-clockwise around the Y-axis in a state where the substrate S is supported by the plurality of rollers 17, the substrate transporting part 15 can transport the substrate S in an X-direction (+X-direction or −X-direction). As the substrate transporting part 15, a float transporting part (not shown) may be used to lift the substrate for transportation.
(First Chamber)
The first chamber CB1 is mounted on the base BC placed on the floor FL. The first chamber CB1 is formed in the shape of a rectangular box. Inside the first chamber CB1, an accommodation room 20a is formed. The coating part CT is provided in the treatment room 20a. The coating part CT performs the coating treatment of the liquid material on the substrate S.
The first chamber CB1 has a first opening 21 and a second opening 22. The first opening 21 and the second opening 22 communicate the treatment 20a with the outside of the first chamber CB1. The first opening 21 is formed on a −X-side face of the first chamber CB1. The second opening 22 is formed on a +X-side face of the first chamber CB1. The first opening 21 and the second opening 22 are formed to have a size which allows the substrate S to pass through. The substrate S is placed in or taken out of the first chamber CB1 through the first opening 21 and the second opening 22.
The coating part CT has an ejection part 31, a maintenance part 32, a liquid material supply part 33, a washing liquid supply part 34, a waste liquid storing part 35, a gas supply/exhaust part 37 and a substrate transporting part 25.
The ejection part 31 has a nozzle NZ, a treatment stage 28 and a nozzle actuator NA.
a) is a diagram showing a configuration of the slit nozzle NZ.
As shown in
b) shows the configuration when the nozzle NZ is viewed from the −Z direction side thereof.
As shown in
The nozzle NZ ejects, for example, a liquid material in which four types of metals, namely, Cu, Zn, Sn, and Se are mixed with a predetermined composition ratio. The nozzle NZ is connected to a liquid supply part 33 via a connection pipe or the like (not shown). The nozzle NZ includes a holding part which holds the liquid material therein. A temperature control part which controls the temperature of the liquid material held by the holding part may be provided.
Returning to
The nozzle actuator NA moves the nozzle NZ in the X direction. The nozzle actuator NA has a stator 40 and a mover 41 which constitutes a linear motor mechanism. As the nozzle actuator NA, any other actuator having another configuration such as a ball screw configuration may be used. The stator 40 is elongated in the Y direction. The stator 40 is supported by a support frame 38. The support frame 38 has a first frame 38a and a second frame 38b. The first frame 38a is provided on a −Y-side end portion of the treatment room 20a. The second frame 38b is provided in the treatment room 20a such that the treatment stage 28 is positioned between the first frame 38a and the second frame 38b.
The mover 41 is movable along the direction where the stator 40 is elonged (Y direction). The mover 41 has a nozzle supporting member 42 and an elevator part 43. The nozzle supporting member 42 is formed in the shape of a gate, and has a holding part 42a which holds the protruding part NZb of the nozzle NZ. The nozzle supporting member 42 integrally moves with the elevator part 43 along the stator 40 between the first frame 38a and the second 38b in the Y direction. Thus, the nozzle NZ held by the nozzle supporting member 42 moves in the Y direction over the treatment stage 28. The nozzle supporting member 42 moves along the elevation guide 43a of the elevator part 43 in the Z direction. The mover 41 has an actuator source (not shown) which moves the nozzle supporting member 42 in the Y direction and the Z direction.
The maintenance part 32 is where the maintenance of the nozzle NZ is performed. The maintenance part 32 has a nozzle standby part 44 and a nozzle-tip control part 45.
The nozzle standby part 44 has a dipping part (not shown) where the tip TP of the nozzle NZ is dipped to prevent it from drying, and a discharge part (not shown) which discharges the liquid material held within the nozzle NZ when the nozzle NZ is changed or the liquid material to be supplied to the nozzle NZ is changed.
The nozzle-tip control part 45 adjusts the conditions of the nozzle tip by washing the tip TP of the nozzle NZ and the vicinity thereof, and conducting preliminary ejection from the ejection opening OP of the nozzle NZ. The nozzle-tip control part 45 has a wiping part 45a which wipes the tip TP of the nozzle NZ and a guide rail 45b which guides the wiping part 45a. The nozzle-tip control part 45 is provided with a waste liquid accommodation part 35a which accommodates the liquid material discharged from the nozzle NZ and the washing liquid used for washing the nozzle NZ.
c) is a diagram showing the cross-sectional shape of the nozzle NZ and the nozzle-tip control part 45. As shown in
The guide rail 45b extends in the X direction to cover the opening OP of the nozzle NZ. The wiping part 45a is adapted to be movable by an actuator source (not shown) along the guide rail 45b in the X direction. By moving the wiping part 45a in the X direction while being in contact with the tip TP of the nozzle NZ, the tip TP can be wiped.
The liquid material supply part 33 has a first liquid material accommodation part 33a and a second liquid material accommodation part 33b. The first liquid material accommodation part 33a and the second liquid material accommodation part 33b accommodate the liquid material to be applied to the substrate S. Further, the first liquid material accommodation part 33a and the second liquid material accommodation part 33b are capable of accommodating a plurality of different types of liquid materials.
The washing liquid supply part 34 accommodates a washing liquid which washes various parts of the coating part, such as the inside of the nozzle NZ and the nozzle-tip control part 45. The washing liquid supply part 34 is connected to the inside of the nozzle NZ and the nozzle-tip control part 45 via a pipe and a pump (which are not shown).
The waste liquid storing part 35 collects the liquid ejected from the nozzle NZ and is not reused. The nozzle-tip control part 45 may have a configuration in which the part which conducts the preliminary ejection and the part which washes the tip TP of the nozzle NZ are individually provided. Alternatively, the preliminary ejection may be conducted at the nozzle standby part 44.
The gas supply/exhaust part 37 has a gas supply part 37a and a gas exhaust part 37b. The gas supply part 37a supplies an inert gas such as a nitrogen gas or an argon gas to the treatment room 20a. The gas exhaust part 37b suctions the treatment room 20a, and discharges the gas in the treatment room 20a outside the first chamber CB1.
The substrate transporting part 25 transports the substrate S inside the treatment room 20a. The substrate transporting part 25 includes a plurality of rollers 27. The rollers 27 are arranged in the X-direction to be intersected into two lines by a central portion of the treatment room 20a in the Y-direction. The rollers 27 arranged in each line support the +Y-side end and −Y-side end of the substrate S.
By rotating each of the rollers 27 clockwise or anti-clockwise around the Y-axis in a state where the substrate S is supported by the plurality of rollers 27, the substrate S supported by each of the rollers 27 is transported in an X-direction (+X-direction or −X-direction). A float transporting part (not shown) may be used to lift the substrate for transportation.
(Connection Part)
The connection part CN connects the first chamber CB1 and the second chamber CB2. The substrate S is moved between the first chamber CB1 and the second chamber CB2 via the connection part CN. The connection part CN has a third chamber CB3. The third chamber CB3 is formed in the shape of a rectangular box. Inside the third chamber CB3, a treatment room 50a is formed. In the present embodiment, the treatment room 50a is provided with a vacuum drying part VD. The vacuum drying part VD dries the liquid material coated on the substrate S. The third chamber CB3 is provided with gate valves V2 and V3.
The third chamber CB3 has a first opening 51 and a second opening 52. The first opening 51 and the second opening 52 communicate the treatment room 50a with the outside of the third chamber CB3. The first opening 51 is formed on a −X-side face of the third chamber CB3. The second opening 52 is formed on a +X-side face of the third chamber CB3. The first opening 51 and the second opening 52 are formed to have a size which allows the substrate S to pass through. The substrate S is placed in or taken out of the third chamber CB3 through the first opening 51 and the second opening 52.
The vacuum drying part VD has a substrate transporting part 55, a gas supply part 58, a gas exhaust part 59 and a heating part 53.
The substrate transporting part 55 includes a plurality of rollers 57. The rollers 57 are arranged in a pair in the Y-direction, and a plurality of the pairs are arranged in the X-direction. The plurality of rollers 57 supports the substrate S which is disposed in the treatment room 50a via the first opening 51.
By rotating each of the rollers 57 clockwise or anti-clockwise around the Y-axis in a state where the substrate S is supported by the plurality of rollers 57, the substrate S supported by each of the rollers 57 is transported in an X-direction (+X-direction or −X-direction). A float transporting part (not shown) may be used to lift the substrate for transportation.
As shown in
The gas exhaust part 59 suctions the treatment room 50a, and discharges the gas in the treatment room 50a outside the third chamber CB3, thereby reducing the pressure inside the treatment room 50a. By reducing the pressure inside the treatment room 50a, evaporation of the solvent contained in the liquid material on the substrate S can be promoted, thereby drying the liquid material. The gas exhaust part 59 has a first suction part 59a and a second suction part 59b. The first suction part 59a and the second suction part 59b are connected to a suction source 59c and 59d such as a pump. Suction from the treatment room 50a is performed mainly by using the first suction part 59a. The second suction part 59b makes a fine control of the amount of suction by the first suction part 59a.
The heating part 53 heats the liquid material on the substrate S disposed in the treatment room 50a. As the heating part 53, an infrared device or a hot plate is used. The temperature of the heating part 53 can be controlled, for example, from room temperature to about 100° C. By using the heating part 53, evaporation of the solvent contained in the liquid material on the substrate S can be promoted, thereby supporting the drying treatment under reduced pressure.
The heating part 53 is connected to a lifting mechanism (moving part) 53a. The lifting mechanism 53a moves the heating part 53 in the Z-direction. As the lifting mechanism 53a, for example, a motor mechanism or an air-cylinder mechanism is used. By moving the heating part 53 in the Z-direction using the lifting mechanism 53a, the distance between the heating part 53 and the substrate S can be adjusted. With respect to the heating part 53, the distance to be moved and the timing to be moved by the lifting mechanism 53a can be controlled by the control part CONT.
(Second Chamber)
The second chamber CB2 is mounted on the base BB placed on the floor FL. The second chamber CB2 is formed in the shape of a rectangular box. Inside the second chamber CB2, a treatment room 60a is formed. The baking part BK is provided in the treatment room 60a. The baking part BK bakes the coating film coated on the substrate S.
The second chamber CB2 has an opening 61. The opening 61 communicates the treatment room 60a with the outside of the second chamber CB2. The opening 61 is formed on a −X-side face of the second chamber CB2. The opening 61 is formed to have a size which allows the substrate S to pass through. The substrate S is placed in or taken out of the second chamber CB2 through the opening 61.
The baking part BK has a substrate transporting part 65, a gas supply part 68, a gas exhaust part 69 and a heating part 70.
The substrate transporting part 65 has a plurality of rollers 67 and an arm part 71. The rollers 67 are arranged in a pair in the Y-direction on the substrate guide stage 66, and a plurality of the pairs are arranged in the X-direction. The plurality of rollers 67 supports the substrate S which is disposed in the treatment room 60a via the opening 61.
By rotating each of the rollers 67 clockwise or anti-clockwise around the Y-axis in a state where the substrate S is supported by the plurality of rollers 67, the substrate S supported by each of the rollers 67 is transported in an X-direction (+X-direction or −X-direction). A float transporting part (not shown) may be used to lift the substrate for transportation.
The arm part 71 is disposed on a platform 74, and transfers the substrate S between the plurality of rollers 67 and the heating part 70. The arm part 71 has a transport arm 72 and an arm actuator 73. The transport arm 72 has a substrate supporting part 72a and a moving part 72b. The substrate supporting part 72a supports the +Y-side edge and −Y-side edge of the substrate S. The moving part 72b is attached to the substrate supporting part 72a, and is movable in the X-direction and the θZ-direction.
The arm actuator 73 actuates the moving part 72b in the X-direction or the θZ-direction. When the moving part 72b is moved in the +X-direction by the arm actuator 73, the substrate supporting part 72a is inserted inside the heating part 70, and the substrate S is placed at a central portion of the heating part 70 as viewed in the Z-direction.
As shown in
The first accommodation part 81 is formed in the shape of a rectangular open box as viewed in the Z-direction, and is mounted on the bottom of the second chamber CB2 such that the opening faces the +Z side. The second accommodation part 82 is formed in the shape of a rectangular open box as viewed in the Z-direction, and is disposed such that the opening faces the first accommodation part 81. The second accommodation part 82 is movable in the Z direction by using a lifting mechanism (not shown). By superimposing the edge portion 82a of the second accommodation part 82 on the edge 81a of the first accommodation part 81, the inside of the first accommodation part 81 and the second accommodation part 82 is closed.
The first heating plate 83 is accommodated in the first accommodation part 81. The first heating part 83 heats a substrate S in a state where the substrate S is mounted on the first heating part 83. The first heating plate 83 is formed of, for example, quartz or the like, and is provided with a heating device such as an infrared device or a hot plate inside thereof. The temperature of the first heating plate 83 is adjustable, for example, from about 200 to 800° C. The first heating part 83 has a plurality of through-holes 83a formed thereon. The through-holes 83a allow part of the lifting part 85 to penetrate therethrough.
The second heating plate 84 is accommodated in the second accommodation part 82. The second heating plate 84 is formed of, for example, a metal material, and is provided with a heating device such as an infrared device or a hot plate inside thereof. The temperature of the second heating plate 84 is adjustable, for example, from about 200 to 800° C. The second heating plate 84 is provided to be movable independently from the second accommodation part 82 in the Z direction by a lifting mechanism (not shown). By moving the second heating plate 84 in the Z direction, the interval between the second heating plate 84 and the substrate S can be adjusted.
The lifting part 85 moves the substrate S between the arm part 71 and the first heating plate 83. The lifting part 85 has a plurality of support pins 85a and a moving part 85b which is movable in the Z direction while holding the support pins 85a. For easier discrimination of the drawings, in
The sealing part 86 is formed on the edge portion 81a of the first accommodation part 81. As the sealing part 86, for example, an O-ring formed by a resin material or the like can be used. The sealing part 86 seals the first accommodation part 81 and the second accommodation part 82 in a state where the edge portion 82a of the second accommodation part 82 is superimposed on the first edge 81a of the first accommodation part 81. In this manner, the inside of the first accommodation part 81 and the second accommodation part 82 can be closed.
The gas supply part 87 supplies a nitrogen gas or the like to the treatment room 60a. The gas supply part 87 is connected to the +Z-side face of the second chamber CB2. The gas supply part 87 has a gas supply source 87a such as a gas bomb or a gas pipe, and a connection pipe 87b which connects the gas supply source 87a with the second chamber CB2.
The exhaust part 88 suctions the treatment room 60a, and discharges the gas in the treatment room 60a outside the second chamber CB2. The exhaust part 88 is connected to the −Z-side face of the second chamber CB2. The exhaust part 88 has a suction source 88a such as a pump, and a connection pipe 88b which connects the suction source 88a with the second chamber CB2.
Further, in the present embodiment, solvent concentration sensors SR3 and SR4 are provided. Like the aforementioned solvent concentration sensors SR1 and SR2, the solvent concentration sensors SR3 and SR4 detects the concentration of the solvent (in the present embodiment, hydrazine) for the liquid material in the ambient atmosphere, and sends the detection results to the control part CONT. The solvent concentration sensor SR3 is provided on the platform 74 on the +Y side of the heating part 70 within the treatment room 60a. The solvent concentration sensor SR3 is provided at a position remote from the heating part 70. The solvent concentration sensor SR4 is provided outside the second chamber CB2. In the present embodiment, for detecting the concentration of hydrazine which has a larger specific gravity than air, like the solvent concentration sensors SR1 and SR2, the solvent concentration sensors SR3 and SR4 are disposed on the lower side of the transport path of the substrate S in the vertical direction. Further, by providing a solvent concentration sensor SR4 outside the second chamber CB2, it becomes possible to detect leakage of hydrazine from the second chamber CB2.
The removing part 90 removes a peripheral portion of the coating film F formed on the substrate S after heating. The peripheral portion refers to a portion of the coating film F formed along the outer periphery of the substrate S.
The frame part 91 is formed to have a U-shaped cross-section by a first plate-shaped part 91a and a second plate-shaped part 91b which are disposed in parallel to the XY-plane, and a third plate-shaped part 91c which is disposed perpendicular to the first plate-shaped part 91a and the second plate-shaped part 91b. The frame part 91 is configured to be movable in the X, Y and Z directions and rotatable in the θZ direction. By such a configuration, the removing part 90 is capable of accessing to or withdrawing from the substrate S. The frame part 91 has a space K surrounded by the first plate-shaped part 91a, the second plate-shaped part 91b and the third plate-shaped part 91c.
The brush part 92 is provided between the first plate-shaped part 91a and the second plate-shaped part 91b. The brush part 92 has a plurality of linear members extending from the first plate-shaped part 91a to the second plate-shaped part 91b. The brush part 92 has a first end part 92a on the first plate-shaped part 91a side and a second end part 92b on the second plate-shaped part 91b side.
The first end part 92a of the brush 92 is bound on a base part 94. The base part 94 is configured to be rotatable in the θZ direction by a rotation part 95. Thus, the brush part 92 is configured to be integrally rotatable with the base part 94 in the θZ direction by actuating the rotation part 95.
The second end part 92b of the brush part 92 is disposed to form a gap between the second end part 92b and the second plate-shaped part 91b in the Z direction. The gap is capable of accommodating the substrate S having a coating film formed thereon and the substrate supporting part 72a which holds the substrate S. The second end part 92b is disposed at a position where the second end part 92b comes into contact with a portion of the coating film F.
On the third plate-shaped part 91c of the frame part 91, an opening 91d is formed. The opening 91d is formed to penetrate through the third plate-shaped part 91c in the X direction. The opening 91d has a suction part 93 connected thereto. The suction part 93 has a pipe 93a and a suction pump 93b.
One end of the pipe 93a is connected to the opening 91d. The suction pump 93b is provided on the pipe 93a. The suction pump 93b suctions the space K via the pipe 93a and the opening 91d. The pipe 93a and the suction pump 93b are integrally provided with the frame part 91 by a securing mechanism (not shown). Thus, by moving the frame part 91, the frame part 91 and the suction part 93 are integrally moved.
(Substrate Transport Path)
The second opening 12 of the substrate loading/unloading part LU, the first opening 21 and the second opening 22 of the coating part CT, the first opening 51 and the second opening 52 of the vacuum drying part VD and the opening 61 of the baking part BK are provided along a line in parallel to the X-direction. Thus, the substrate S is moved along a line in the X-direction. Further, in the path from the substrate loading/unloading part LU to the heating part 70 of the baking part BK, the position in the Z-direction is maintained. Thus, stirring of the gas around the substrate S can be suppressed.
(Anti-Chamber)
As shown in
The anti-chambers AL1 to AL3 are provided to communicate with the inside and outside of the first chamber CB1. Each of the anti-chambers AL1 to AL3 is a path through which a component of the treatment room 20a is taken out of the first chamber CB1 or the component is placed into the treatment room 20a from outside the first chamber CB1.
The anti-chamber AL1 is connected to the ejection part 31. The nozzle NZ provided in the ejection part 31 can be taken out of or placed into the treatment room 20a via the anti-chamber AL1. The anti-chamber AL2 is connected to the liquid material supply part 33. The liquid material supply part 33 can be taken out of or placed into the treatment room 20a via the anti-chamber AL2.
The anti-chamber AL3 is connected to a liquid material preparation part 36. In the liquid material preparation part 36, a liquid can be taken out of or placed into the treatment room 20a via the anti-chamber AL3. The anti-chamber AL3 is formed to have a size which allows the substrate S to pass through. Therefore, for example, when a test coating of the liquid material is to be conducted in the coating part CT, a substrate S prior to treatment can be supplied to the treatment room 20a from the anti-chamber AL3. Further, the substrate S after the test coating can be taken out from the anti-chamber AL3. Moreover, the substrate S can be taken out from the anti-chamber AL3 temporarily in emergency.
The second chamber CB2 has an anti-chamber AL4 connected thereto.
The anti-chamber AL4 is connected to the heating part 70. The anti-chamber AL4 is formed to have a size which allows the substrate S to pass through. Therefore, for example, when heating of the substrate S is to be conducted in the heating part 70, the substrate S can be supplied to the treatment room 60a from the anti-chamber AL4. Further, the substrate S after the heat treatment can be taken out from the anti-chamber AL4.
(Glove Part)
As shown in
The glove parts GX1 and GX2 are parts where an operator accesses the inside of the first chamber CB1 and the second chamber CB2. By inserting the hands inside the glove parts GX1 and GX2, the operator can conduct maintenance inside the first chamber CB1 and the second chamber CB2. The glove parts GX1 and GX2 are formed to have a bag-like shape. The glove parts GX1 and GX2 are respectively provided at a plurality of portions on the first chamber CB1 and the second chamber CB2. A sensor may be provided inside the first chamber CB1 and the second chamber CB2 which detects whether or not an operator has put his hand in the glove part GX1 or GX2.
(Gate Valve)
Between the second opening 12 of the substrate loading/unloading part LU and the first opening 21 of the coating part CT, a gate valve V1 is provided. The gate valve V1 is provided to be movable in the Z-direction by an actuator (not shown). By moving the gate valve V1 in the Z-direction, the second opening 12 of the substrate loading/unloading part LU and the first opening 21 of the coating part CT are simultaneously opened or closed. When the second opening 12 and the first opening 21 are simultaneously opened, a substrate S can be moved through the second opening 12 and the first opening 21.
Between the second opening 22 of the first chamber CB1 and the first opening 51 of the third chamber CB3, a gate valve V2 is provided. The gate valve V2 is provided to be movable in the Z-direction by an actuator (not shown). By moving the gate valve V2 in the Z-direction, the second opening 22 of the first chamber CB1 and the first opening 51 of the third chamber CB3 are simultaneously opened or closed. When the second opening 22 and the first opening 51 are simultaneously opened, a substrate S can be moved through the second opening 22 and the first opening 51.
Between the second opening 52 of the third chamber CB3 and the opening 61 of the second chamber CB2, a gate valve V3 is provided. The gate valve V3 is provided to be movable in the Z-direction by an actuator (not shown). By moving the gate valve V3 in the Z-direction, the second opening 52 of the third chamber CB3 and the opening 61 of the second chamber CB2 are simultaneously opened or closed. When the second opening 52 and the opening 61 are simultaneously opened, a substrate S can be moved through the second opening 52 and the opening 61.
(Control Device)
The control part CONT is a part which has the overall control of the coating apparatus CTR. Specifically, the control part CONT controls the operations of the substrate loading/unloading part LU, the coating part CT, the vacuum drying part VD, the baking part BK and the gate valves V1 to V3. As an example of the adjusting operation, the control part CONT controls the amount of gas to be supplied from the gas supply part 37a, based on the detection results of the solvent concentration sensors SR1 to SR4. The control part CONT has a timer or the like (not shown) for measuring the treatment time.
(Coating Method)
Next, a coating method according to one embodiment of the present invention will be described. In this embodiment, a coating film is formed on the substrate S by using the coating apparatus CTR having the above-described configuration. The operations performed by the respective parts of the coating apparatus CTR are controlled by the control part CONT.
Firstly, the control part CONT loads a substrate S on the substrate loading/unloading part LU from the outside. In this case, the control part CONT closes the gate valve V1, opens the lid portion 14 and accommodates the substrate S in the accommodation room 10a of the chamber 10. After the substrate S is accommodated in the accommodation room 10a, the control part CONT closes the lid portion 14.
After the lid portion 14 is closed, the control part CONT opens the gate valve V1, so as to communicate the accommodation room 10a of the chamber 10 with the treatment room 20a of the first chamber CB1 of the coating part CT. After opening the gate valve V1, the control part CONT transports the substrate S in the X-direction using the substrate transporting part 15.
After a portion of the substrate S has been inserted into the treatment room 20a of the first chamber CB1, the control part CONT uses the substrate transporting part 25 to completely load the substrate S into the treatment room 20a. After the substrate S has been loaded, the control part CONT closes the gate valve V1. After closing the gate valve V1, the control part CONT transports the substrate S to the treatment stage 28.
By this operation, the atmosphere and the pressure of the treatment room 20a can be adjusted. After adjusting the atmosphere and the pressure of the treatment room 20a, the control part CONT uses the nozzle actuator NA (not shown in
When the nozzle NZ reaches the nozzle-tip control part 45, as shown in
After wiping the tip TP of the nozzle NZ, the control part CONT moves the nozzle NZ to the treatment stage 28. After the ejection opening OP of the nozzle NZ reaches the −Y-side end of the substrate S, as shown in
After forming a coating film of the liquid material Q on a predetermined region of the substrate S, the control part CONT uses the substrate transporting part 25 to move the substrate S from the treatment stage 28 to the second stage 26B in the +X-direction. Further, the control part CONT moves the nozzle NZ in the −Y-direction, and returns the nozzle NZ to the nozzle standby part 44.
When the substrate S reaches the second opening 22 of the first chamber CB1, as shown in
After closing the gate valve V2, the control part CONT uses the lifting mechanism 53a to adjust the position of the heating part 53 in the Z-direction. Thereafter, as shown in
Further, as shown in
After the vacuum drying treatment, as shown in
As shown in
After withdrawing the substrate supporting part 72a, as shown in
After forming the baking room 80, as shown in
After adjusting the position of the second heating plate 84 in the Z direction, as shown in
In addition, in the baking operation, at least one of the metal components contained in the coating films F is heated to its melting point or higher, so as to dissolve at least a portion of the coating film F. For example, in the case where the coating film F is used for a CZTS solar cell, among the components that constitute the coating film F, Ti, S and Se are heated to their melting points or higher, so as to liquefy these substances and aggregate the coating film F. Thereafter, the coating film F is cooled to a temperature at which the coating film F is solidified. By solidifying the coating films F, the strength of the coating films F can be enhanced.
After the completion of the baking operation, the coating film F on the substrate S may have cracks or the like generated on a peripheral portion for example. In such a case, a portion of the coating film F may be scattered from the crack, thereby causing generation of foreign matters. Such foreign matters sometimes cause deterioration of the quality of the coating film F. Therefore, in the present embodiment, a step in which the peripheral portion is removed by the removing part 90 is conducted (removing step).
Prior to the removing step, the control part CONT hands the substrate from the supporting pins 85a to the substrate supporting part 72a. Needless to say, the removing step may be conducted in a state where the substrate is supported by the supporting pins 85a. Then, the control part CONT allows the removing part 90 to come close to the substrate S. By this operation, the substrate S is sandwiched between the first plate-shaped part 91a and the second plate-shaped part 91b of the removing part 90, and the second end part 92b of the brush part 92 comes into contact with the peripheral portion of the coating film F.
In this state, as shown in
Further, the control part CONT moves the frame part 91 in the Y direction in a state where the brush part 92 is rotated in the θZ direction and the suction part 93 is operated (moving step). By this operation, as shown in
After conducting such a removing step, the control part CONT transports the substrate S in the −X direction. Specifically, the substrate S is unloaded from the baking part BK via the heating part 70, the arm part 71 and the substrate guide stage 66, and is returned to the substrate loading/unloading part LU via the coating part CT (second transporting step). After the substrate S has been returned to the substrate loading/unloading part LU, the control part CONT opens the lid portion 14 in a state where the gate valve V1 is closed. Thereafter, an operator collects the substrate S in the chamber 10, and accommodates a new substrate S in the accommodation room 10a of the chamber 10.
In the case where, after the substrate S has been returned to the substrate loading/unloading part LU, another coating film is formed to be superimposed on the coating film F formed on the substrate S, the control part CONT transports the substrate S to the coating part CT again, and repeats the coating treatment, the vacuum drying treatment and the baking treatment. In this manner, coating film F is laminated on the substrate S.
As described above, according to the present embodiment, by virtue of including a removing part 90 which removes a peripheral portion of the coating film F formed along the outer periphery of the substrate S, even in the case where cracks and the like are formed on a peripheral portion of the coating film F, the peripheral portion can be removed with the crack by using the removing part 90. As a result, generation of foreign matters can be suppressed.
The technical scope of the present invention is not limited to the above-described embodiment, but may be appropriately modified into various forms without departing from the spirit of the present invention.
In the aforementioned embodiment, the coating part CT has a configuration which uses a slit-type nozzle NZ, but the present invention is not limited thereto. For example, a center-dripping-type coating part or an ink jet coating part may be used. Alternatively, for example, the liquid material disposed on the substrate S may be diffused by using a squeezer or the like so as to be coated thereon.
Further, in the aforementioned embodiment, when a configuration in which the coating apparatus CTR is accommodated in one room is employed, a gas supply/exhaust part which adjusts the atmosphere inside the room may be provided. In such a case, hydrazine present in the atmosphere inside the room may be discharged using the gas supply/exhaust part, thereby more reliably suppressing change in the coating environment.
In the aforementioned embodiment, explanation was given taking example of a configuration in which the baking operation is conducted by the baking part in the second chamber CB2. However, the present invention is not limited thereto. For example, as shown in
In this case, for example, a coating film F is laminated on the substrate S, and then, a heat treatment can be conducted for baking the laminated coating film F by the heating part HT of the fourth chamber CB4. In the second heating step, the heat treatment for heating the coating film F is conducted at a heating temperature higher than that in the heat treatment by the baking part BK. By this heating treatment, the solid contents (metal components) of the laminated coating film F can be crystallized, thereby further enhancing the film quality of the coating film F.
The heating after laminating the coating film F on the substrate S may be performed by the baking part BK of the second chamber CB2. In such a case, in the baking part BK, the heating temperature for baking the laminated coating film F can be controlled to become higher than the heating temperature for baking each layer of the coating film F.
In the aforementioned embodiment, explanation was given taking example of a configuration in which the removing part 90 is provided on the heating part 70. However, the present invention is not limited thereto. For example, as shown in
In the aforementioned embodiment, explanation was given taking example of a configuration in which a lifting mechanism 53a moves the heating part 53 to adjust the distance between the substrate S and the heating part 53 within the third chamber CB3. However, the present invention is not limited thereto. For example, a configuration may be employed in which the lifting mechanism 53a is capable of moving not only the heating part 53, but also the substrate S in the Z direction. Alternatively, a configuration in which the lifting mechanism 53a is capable of moving only the substrate S in the Z direction may be employed.
In the aforementioned embodiment, explanation was given taking example of a configuration in which the heating part 53 is provided on the −Z side (lower side in the vertical direction) of the substrate S in the vacuum drying part VD. However, the present invention is not limited thereto. For example, a configuration in which the heating part 53 is provided on the +Z side of the substrate S may be employed. Alternatively, a configuration may be employed in which the heating part 53 is movable between a position on the −Z side of the substrate S and a position on the +Z side of the substrate S. In this case, the heating part 53 has a shape which enables the heating part 53 to pass through the plurality of rollers 57 constituting the substrate transporting part 55 (e.g., the heating part 53 is provided with openings).
Furthermore, with respect to the configuration of the coating apparatus CTR, as shown in
In
According to this configuration, since the first chamber CB1, the connection part CN and the second chamber CB2 are repeatedly arranged in series in the X-direction, the substrate S can be transported in one direction (+X-direction), and there is no need to transport the substrate S back and forth. Therefore, the step of laminating the coating film on the substrate S can be continuously performed. As a result, coating films can be efficiently formed on the substrate S.
In the aforementioned embodiment, explanation was given taking example of a configuration in which the coating film F is removed by the brush part 92. However, the present invention is not limited thereto.
For example, as shown in
Alternatively, for example, as shown in
Alternatively, as shown in
Further, for example, in the aforementioned embodiment, explanation was given taking example of a configuration in which the frame part 91 is moved (for scanning) in the Y direction, so as to remove the peripheral portion on one edge of the substrate S in the Y direction. However, the present invention is not limited thereto. For example, as shown in
In this configuration, for example, as shown in
Further, as shown in
In the aforementioned embodiment, explanation was given taking example of a configuration in which the removing part 90 is provided on the heating part 70, and the removing step is conducted after the heating step in the heating part 70. However, the present invention is not limited thereto. For example, an embodiment may be employed in which the removing part 90 is provided on the vacuum drying part VD, and the removing step is conducted after the vacuum drying step.
While preferred embodiments of the invention have been described and illustrated above, it should be understood that these are exemplary of the invention and are not to be considered as limiting. Additions, omissions, substitutions, and other modifications can be made without departing from the spirit or scope of the present invention. Accordingly, the invention is not to be considered as being limited by the foregoing description, and is only limited by the scope of the appended claims.
This application claims priority to U.S. Provisional Application No. 61/625,477 filed on Apr. 17, 2012, the content of which is incorporated herein by reference.
| Number | Date | Country | |
|---|---|---|---|
| 61625477 | Apr 2012 | US |
