1. Field of the Invention
This invention relates to light emitting diodes, and to light emitting diodes and packages with high reflectivity contacts, high reflectivity carriers, and methods for forming the same.
2. Description of the Related Art
Light emitting diodes (LED or LEDs) are solid state devices that convert electric energy to light, and generally comprise one or more active layers of semiconductor material sandwiched between oppositely doped n-type and p-type layers. When a bias is applied across the doped layers, holes and electrons are injected into the active layer where they recombine to generate light. Light is emitted from the active layer and from all surfaces of the LED.
For typical LEDs it is desirable to operate at the highest light emission efficiency, and one way that emission efficiency can be measured is by the emission intensity in relation to the input power, or lumens per watt. One way to maximize emission efficiency is by maximizing extraction of light emitted by the active region of LEDs. For conventional LEDs with a single out-coupling surface, the external quantum efficiency can be limited by total internal reflection (TIR) of light from the LED's emission region. TIR can be caused by the large difference in the refractive index between the LED's semiconductor and surrounding ambient. Some LEDs have relatively low light extraction efficiencies because the high index of refraction of the substrate compared to the index of refraction for the surrounding material, such as epoxy. This difference results in a small escape cone from which light rays from the active area can transmit from the substrate into the epoxy and ultimately escape from the LED package. Light that does not escape can be absorbed in the semiconductor material or at surfaces that reflect the light.
Different approaches have been developed to reduce TIR and improve overall light extraction, with one of the more popular being surface texturing. Surface texturing increases the light escape probability by providing a varying surface that allows photons multiple opportunities to find an escape cone. Light that does not find an escape cone continues to experience TIR, and reflects off the textured surface at different angles until it finds an escape cone. The benefits of surface texturing have been discussed in several articles. [See Windisch et al., Impact of Texture-Enhanced Transmission on High-Efficiency Surface Textured Light Emitting Diodes, Appl. Phys. Lett., Vol. 79, No. 15, October 2001, Pgs. 2316-2317; Schnitzer et al. 30% External Quantum Efficiency From Surface Textured, Thin Film Light Emitting Diodes, Appl. Phys. Lett., Vol 64, No. 16, October 1993, Pgs. 2174-2176; Windisch et al. Light Extraction Mechanisms in High-Efficiency Surface Textured Light Emitting Diodes, IEEE Journal on Selected Topics in Quantum Electronics, Vol. 8, No. 2, March/April 2002, Pgs. 248-255; Streubel et al. High Brightness AlGaNInP Light Emitting Diodes, IEEE Journal on Selected Topics in Quantum Electronics, Vol. 8, No. March/April 2002].
U.S. Pat. No. 6,657,236, also assigned to Cree Inc., discloses structures formed on the semiconductor layers for enhancing light extraction in LEDs.
Another way to increase light extraction efficiency is to provide reflective surfaces that reflect light so that it contributes to useful emission from the LED chip or LED package. In a typical LED package 10 illustrated in
The reflectors shown in
It is generally desirable that LEDs and LED packages have the highest light output efficiency possible. Some light rays emitted from the LED chip either directly or indirectly are emitted, reflected, or scattered towards the substrate or packaging. LED packaging is often made of or coated with reflective materials to improve this efficiency by reflecting, in a desired direction, light which is emitted or reflected towards the package or substrate. In some embodiments the submount or substrate itself is reflective or coated with a reflective substance. Poly-crystalline alumina thick-film substrates are widely used for packaging. However, alumina substrates only have a reflectance of approximately 80%. Metal traces on the substrate are often coated with Ag which has a reflectivity of approximately 90%. However, over 60% of the substrate surface area is not covered by metal traces. In other embodiments, a silver coating over the substrate is used for reflectivity. However, even a silver coated surface only has a reflectivity of approximately 90%, causing losses of 5-10% at each reflection or light bounce. It is desirable to find a more efficient way to reflect off of the substrate, submount or packaging. Efficiency can be improved by utilizing a substrate with a surface which is more reflective than alumina, a coating more reflective than silver, or both. This would allow the more efficient use of traditionally poor reflective materials, such as Si, as substrates, submounts, and carriers. Though DBRs are highly reflective, they do not function ideally in LED packages because DBRs function only to reflect well at one angle and one wavelength. In LED packages there are multiple wavelength of light being output, either by multiple LEDs or different wavelengths, or by LEDs and wavelength conversion materials. Therefore, it is desirable to incorporate a layer which is able to reflect a range of angles and wavelengths.
The present invention discloses a higher reflectivity layer for use in or on LED packages and LED chips to increase emission efficiency. One embodiment of a LED package comprises a LED mounted on a substrate with an encapsulant over said LED and a composite high reflectivity layer arranged to reflect light emitted from said LED. The composite layer comprises a plurality of layers such that at least one of said plurality of layers has an index of refraction lower than the encapsulant and a reflective layer on a side of said plurality of layers opposite the LED. In some embodiments, conductive vias can be included through the composite layer to allow an electrical signal to pass through the composite layer to the LED.
One embodiment of a LED chip according to the present invention comprises a submount with an LED mounted to the submount. A composite high reflectivity layer is arranged between the submount and the LED to reflect LED light. The composite layer comprises a plurality of layers and a conductive path through the composite layer through which an electrical signal can pass to the LED.
Another embodiment of an LED chip according to the present invention comprises an LED and a composite high reflectivity layer integral to the LED to reflect light emitted from the active region. The composite layer comprises a first layer, and alternating plurality of second and third layers on the first layer. The second and third layers have a different index of refraction.
One embodiment of a method for fabricating a LED package comprises providing a substrate, followed by providing a composite high reflectivity layer, arranged to reflect light emitted from the LED, on the substrate. Next, providing a LED mounted on the composite layer and providing an encapsulant over the LED.
These and other aspects and advantages of the invention will become apparent from the following detailed description and the accompanying drawings, which illustrate by way of example the features of the invention.
a is a sectional view of one embodiment of an LED chip at a fabrication step in one method according to the present invention;
b is a sectional view of the LED chip in
a is a sectional view of another embodiment of an LED according to the present invention;
b is a sectional view of the LED in
c is a sectional view of the LED in
d is a sectional view of the LED in
a is a sectional view of another embodiment of an LED chip according to the present invention;
b is a sectional view of the LED chip shown in
a is a sectional view of one embodiment of a package utilizing vias for electrical connection according to the present invention;
b is a sectional view of another embodiment of a package utilizing vias for electrical connection according to the present invention;
Embodiments of the present invention are directed to solid-state emitters and methods for fabricating solid-state emitters having one or more composite high reflectivity contacts or layers arranged to increase emission efficiency of the emitters. Embodiments of the present invention are also directed to solid-state emitter packages and methods for fabricating solid-state emitter packages having one or more composite high reflectivity layers arranged to increase emission efficiency of the emitters. The present invention is described herein with reference to light emitting diodes (LED or LEDs) but it is understood that it is equally applicable to other solid-state emitters. The present invention can be used as a reflector in conjunction with one or more contacts, or can be used as a reflector separate from the contacts.
The improved reflectivity of the composite contact/layer (“composite layer”) reduces optical losses that can occur in reflecting light that is emitted from the active region in a direction away from useful light emission, such as toward the substrate or submount, and also to reduce losses that can occur when TIR light is reflecting within the LED. Embodiments of the present invention provide various unique combinations of layers that can comprise a composite layer. In one embodiment according to the present invention, the composite layer can comprise a first relatively thick layer, with second and third layers having different indices of refraction and different thickness, and a reflective layer. The composite layer can be in many different locations such as on an outer surface of the LED, a submount, or internal to the LED.
Different embodiments of the invention also provide composite layers having conductive via or path arrangements that provide conductive paths through the composite layer. This allows an electric signal to pass through the composite layer along the vias. This allows the composite layer be used as an internal layer or with a submount, where an electrical signal passes through the composite layer during operation. This via arrangement can take many different shapes and sizes as described in detail below.
The present invention is described herein with reference to certain embodiments but it is understood that the invention can be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. In particular, the composite layer can comprise many different layers of different material with many different thicknesses beyond those described herein. The composite layer can be in many different locations on different solid-state emitters, submounts, and packages beyond those described herein. Further, the composite layer can be provided with or without conductive structures to allow electrical signals to pass through.
It is also understood that when an element such as a layer, region or substrate is referred to as being “on” another element, it can be directly on the other element or intervening elements may also be present. Furthermore, relative terms such as “inner”, “outer”, “upper”, “above”, “lower”, “beneath”, and “below”, and similar terms, may be used herein to describe a relationship of one layer or another region. It is understood that these terms are intended to encompass different orientations of the device in addition to the orientation depicted in the figures.
Although the terms first, second, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another region, layer or section. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the present invention.
Embodiments of the invention are described herein with reference to cross-sectional view illustrations that are schematic illustrations of embodiments of the invention. As such, the actual thickness of the layers can be different, and variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances are expected. Embodiments of the invention should not be construed as limited to the particular shapes of the regions illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. A region illustrated or described as square or rectangular will typically have rounded or curved features due to normal manufacturing tolerances. Thus, the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the precise shape of a region of a device and are not intended to limit the scope of the invention.
a and 5b show one embodiment of an LED chip 50 according to the present invention, and although the present invention is described with reference to fabrication of a single LED chip it is understood that the present invention can also be applied to wafer level LED fabrication, fabrication of groups of LEDs, or fabrication of packaged LED chips and LED packaging. The wafer or groups of LEDs can then be separated into individual LED chips using known singulation or dicing methods. This embodiment is also described with reference to an LED chip having vertical geometry arrangement and that is flip chip mounted. As further described below the present invention can be used with other LED arrangements, such as lateral geometry LEDs and non flip-chip orientations.
The LED chip 50 comprises an LED 52 that can have many different semiconductor layers arranged in different ways. The fabrication and operation of LEDs is generally known in the art and only briefly discussed herein. The layers of the LED 52 can be fabricated using known processes with a suitable process being fabrication using MOCVD. The layers of the LED 52 generally comprise an active layer/region 54 sandwiched between n-type and p-type oppositely doped epitaxial layers 56, 58, all of which are formed successively on a growth substrate 60. It is understood that additional layers and elements can also be included in the LED 52, including but not limited to buffer, nucleation, contact and current spreading layers as well as light extraction layers and elements. The active region 54 can comprise single quantum well (SQW), multiple quantum well (MQW), double heterostructure or super lattice structures.
The active region 54 and layers 56, 58 can be fabricated from different material systems, with preferred material systems being Group-III nitride based material systems. Group-III nitrides refer to those semiconductor compounds formed between nitrogen and the elements in the Group III of the periodic table, usually aluminum (Al), gallium (Ga), and indium (In). The term also refers to ternary and quaternary compounds such as aluminum gallium nitride (AlGaN) and aluminum indium gallium nitride (AlInGaN). In one embodiment, the n- and p-type layers 56, 58 are gallium nitride (GaN) and the active region 54 comprises InGaN. In alternative embodiments the n- and p-type layers 56, 58 may be AlGaN, aluminum gallium arsenide (AlGaAs) or aluminum gallium indium arsenide phosphide (AlGaInAsP) and related compounds.
The growth substrate 60 can be made of many materials such as sapphire, silicon carbide, aluminum nitride (AlN), GaN, with a suitable substrate being a 4H polytype of silicon carbide, although other silicon carbide polytypes can also be used including 3C, 6H and 15R polytypes. Silicon carbide has certain advantages, such as a closer crystal lattice match to Group III-nitrides than sapphire and results in Group III-nitride films of higher quality. Silicon carbide also has a very high thermal conductivity so that the total output power of Group-III nitride devices on silicon carbide is not limited by the thermal dissipation of the substrate (as may be the case with some devices formed on sapphire). SiC substrates are available from Cree Research, Inc., of Durham, N.C. and methods for producing them are set forth in the scientific literature as well as in U.S. Pat. Nos. Re. 34,861; 4,946,547; and 5,200,022.
Different embodiments of the LED 52 can emit different wavelengths of light depending on the composition of the active region 54 and n- and p-type layer 56, 58. In the embodiment shown, the LED 50 emits a blue light in the wavelength range of approximately 450 to 460 nm. The LED chip 50 can also be covered with one or more conversion materials, such as phosphors, such that at least some of the light from the LED passes through the one or more phosphors and is converted to one or more different wavelengths of light. In one embodiment, the LED chip emits a white light combination of light from the LED's active region and light from the one or more phosphors.
In the case of Group-III nitride devices, current typically does not spread effectively through the p-type layer 58 and it is known that a thin current spreading layer 64 can cover some or the entire p-type layer 58. The current spreading layer helps spread current from the p-type contact across the surface of the p-type layer 58 to provide improved current spreading across the p-type layer with a corresponding improvement in current injection from the p-type layer into the active region. The current spreading layer 64 is typically a metal such as platinum (Pt) or a transparent conductive oxide such as indium tin oxide (ITO), although other materials can also be used. The current spreading layer can have many different thicknesses, with one embodiment of an ITO spreading layer a thickness of approximately 115 nm. The current spreading layer 64 as well as the layers that comprise the composite layer described below can be deposited using known methods. It is understood that in embodiments where current spreading is not a concern, the composite layer can be provided without a current spreading layer.
Referring now to
Referring now to
Referring now to the graph 72 in
Referring again to
For the composite layer embodiment shown that is used in conjunction with a blue emitting LED, the second layers 68a-b can have thicknesses in the range of 100 to 120 nm, and approximately 40 to 60 nm respectively, with one embodiment of the second layers being approximately 108 nm and 53 nm thick. The third TiO2 layers 70a-b can have thicknesses in the range of 55 to 75 nm and 35 to 55 nm, respectively, with one embodiment having thicknesses of approximately 65 nm and 46 nm respectively.
The composite layer 62 can also comprise a reflective layer 71 on the second layer 68b, deposited using known methods such as sputtering. The reflective layer 71 can have many different thicknesses and can comprise many different reflective materials, with suitable materials being Ag, Ti, Al and Au. The choice of material can depend on many factors with one being the wavelength of light being reflected. In the embodiment shown reflecting blue wavelengths of light, the reflective layer can comprise Ag having a thickness of approximately 200 nm. In other embodiments the reflective layer 71 can comprise composite metal layers such as TiAg, NiAg, CuAg or PtAg, and in some embodiments these composite layers can provide improved adhesion to the layer it is formed on, such as the second layer 68b. Alternatively, because some reflective materials do not have good adhesive properties, a thin layer of material such as indium tin oxide (ITO), Ni, Al2O3, Ti or Pt can be included between the second layer 68b and the reflective layer to also improve adhesion. A thin layer of material may also be placed between the reflective layer and any additional layer the reflective layer is in contact with, such as a submount, to improve adhesion.
The structure of the composite layer 62 provides improved AAR compared to standard ¼ wavelength DBRs. Although there may be a number of reasons why this arrangement provides this improvement, it is believed that one reason is that the different thicknesses of the second layers 68a,68b and the third layers 70a,70b present differently to light at various incident angles. That is, light will reach composite layer 62 at many different angles, and at these different angles the second layers 68a, 68b and third layers 70a, 70b can appear as different thicknesses, such as multiples of a ¼ wavelength thickness depending on the angle. It is believed that the different thicknesses provide the best overall AAR across viewing angles of 0-90 degrees. The use of layers comprised of different materials and thicknesses allows for good reflectivity across many angles and wavelengths.
In this embodiment, the composite layer 100 comprises only one second layer 106 sandwiched between two third layers 108a-b, like the embodiment above. That is, there are not an equal number of alternating second layers and third layers as in composite layer 62 described above, and as in conventional DBRs. This results in second and third layers combinations that comprise incomplete pairs or that are asymmetric. In embodiments with incomplete second and third layer pairs can comprise different numbers of each layer such as two second layers and three third layers, three second layers and four third layers, etc.
The second and third layers 106, 108a-b can comprise many different materials and can have many different thicknesses. In the embodiment shown, the second layer 106 can comprise SiO2 and can have a thickness in the range of approximately 100 to 120 nm, with one embodiment having a thickness of 107 nm. The third layers 108a-b can comprise TiO2 and can have thicknesses of in the range of 45 to 65 nm and 65 to 85 nm respectively, with one embodiment having third layer thicknesses of approximately 56 and 75 nm, respectively. The composite layer 100 can also comprise a reflective layer 110 on the third layer 108b that can be deposited using known methods and can comprise the same materials as reflective layer 71 described above.
By having an asymmetric arrangement, the composite layer can have fewer layers with the corresponding reduction in manufacturing steps and costs. This can also provide the additional advantage of better adhesion to subsequent layers, such as a reflective layer 110. In this embodiment the top layer comprises third layer 108b, which is TiO2. This material can provide improved adhesion to reflective metals compared to the second layer 106 comprising SiO2. The composite layer 100, however, can have a reduced AAR compared to a six-layer arrangement shown in
It is understood that composite layers according to the present invention can have many different layers of different materials and thicknesses. In some embodiments the composite layer can comprise layers made of conductive materials such as conductive oxides. The conductive oxide layers can have different indices of refraction and the differing thicknesses to provide the improved reflectivity. The different embodiments can have different arrangements of complete and incomplete pairs of second and third layers. In some embodiments more layers, in complete or incomplete pairs, can increase the reflection efficiency of the composite layer. However, at some point the increase in layers may result in diminishing returns regarding the reflection efficiency. It is also understood that the composite layer can be arranged in different locations on a LED or package and can comprise different features to provide thermal or electrical conduction through the composite layer.
Referring now to the
In different embodiments having a current spreading layer 64, the holes 122 may or may not pass through the current spreading layer 64. The holes 122 can be formed using many known processes such as conventional etching processes or mechanical processes such as microdrilling. The holes 122 can have many different shapes and sizes, with the holes 122 in the embodiment shown having a circular cross-section with a diameter of approximately 20 microns. Adjacent holes 122 can be approximately 100 microns apart. It is understood that the holes 122 (and resulting vias) can have cross-section with different shapes such as square, rectangular, oval, hexagon, pentagon, etc. In other embodiments the holes are not uniform size and shapes and there can be different spaces between adjacent holes.
Referring now to
Referring now to
Referring now to
Referring now to
During operation, an electrical signal is applied to the LED 50 across first and second contacts 134, 136. The signal on the first contact 134 spreads into the n-type layer 56 and to the active region 54. The signal on the second contact 136 spreads into the submount 130, through composite layer 62 along the vias 128, through the current spreading layer 64, into the p-type layer 58 and to the active region 54. This causes the active region 54 to emit light and the composite layer 62 is arranged to reflect light emitted from the active region toward the submount 128, or reflected by TIR toward the submount 130, back toward the top of the LED chip 50. The composite layer 62 encourages emission toward the top of the LED chip 50 and because of its improved reflectivity, reduces losses that occur during reflection.
It is understood that the composite layers can be used in many different ways and in many different locations on LEDs, LED chips, packages, submounts, carriers, and other solid-state emitters. As shown in
Referring now to
In this embodiment, an electrical signal is not applied to the LED through the composite layer 196. Instead, the electrical signal is applied through the p- and n-type contacts 192, 194 where it spreads laterally to the active region 184. As a result, an electrical signal does not need to pass through the composite layer 196 and the composite layer 196 does not need electrically conductive vias. Instead, an uninterrupted composite layer can be included across the substrate bottom surface to reflect light emitted from the active region toward the substrate and TIR light that reflects toward the substrate. It is understood that in different embodiments the composite layer can also cover all or part of the side surfaces of the LED 180, and a composite layer can be used in with the n- and p-type contacts 192, 194 to improve their reflectivity.
It is also understood that a composite layer can also be used on the bottom surface of submounts in flip-chip embodiments where the submounts are transparent. In these embodiments the desired reflectivity can be achieved without having internal composite layers 162 as shown in
In different embodiments of the present invention the vias can serve additional purposes beyond conducting electrical signals. In some embodiments the vias can be thermally conductive to assist in thermal dissipation of heat generated by the LED. Heat can pass away from the LED through the vias where it can dissipate.
In some embodiments the composite layer can also be used at the package level, and in some embodiments the composite layer may be placed on a substrate, submount, or carrier which the LED is mounted on. In yet other embodiments, the composite layer may be disposed anywhere within a package to increase light output efficiency. As described above, the composite layer may comprise a multilayer stack that includes a number of dielectric layers of different materials and thicknesses. In some embodiments, these dielectric layers may function to create an electrically insulating substrate. It may be preferable to have the dielectric materials be as optically smooth as possible to increase efficiency of the reflectivity of these layers. Inclusion of a composite layer in a LED package encourages emission toward the top of the LED package and because of its improved reflectivity, reduces losses that occur during reflection.
When used in a package, one of these dielectric layers should have an index of refraction lower than the encapsulant or other adjacent material to the composite layer on the side of the composite layer closer to the output surface. This would provide a step down in refractive index between the composite layer and the encapsulant increasing output efficiency. This same layer should be thick, to aid in reflection. This thickness could be 0.25 μm or thicker, 0.5 μm or thicker, or 1.0 μm or thicker. A thickness of 0.5 μm or larger is preferable. This layer can be located anywhere within the dielectric layer stack. In addition to various materials which have an index of refraction lower than the encapsulant, this layer may also be comprised of an air gap or a porous material. If this layer is the topmost layer it must be coated with an additional layer to seal the pores because the dielectric layers as a whole must be pin-hole free for electrical insulation. Heated or ion-assisted depositions can be used in embodiments where dense films are desired. As described above, the dielectric material stack may include any number of layers and complete or incomplete layer pairs.
In some embodiments, a layer of reflective material can be included under the dielectric material stack. This material may be any suitable reflective material such as those described above, preferably a highly reflective metal. This layer of reflective material can also comprise any number of layers. The metal layer may be patterned such that it terminates before the dicing or cutting point of a substrate, to maintain reliability. In some embodiments, an adhesion layer may be included on either or both sides of the metal layer. This adhesion layer may be made of any suitable material such as those described previously. An adhesion layer may help adhere the metal or reflective layer to the dielectric layer stack or may also be used to adhere the metal or reflective layer to a substrate, submount, carrier, or other surface. For ease of reference, substrates, submounts, and carriers will be referred to interchangeably. These submount or packaging surfaces may be made of any suitable material. Examples of such materials include ceramics, Alumina, Silicon and AlN. In some embodiments, where the composite layer is placed directly on the substrate, it is preferred that the substrate have an optically smooth surface such that the composite layer is formed to be optically smooth as well. In other embodiments it may be preferred that the substrate have good thermal conductivity for heat dissipation and a heat dissipation path exist away from the LEDs to the substrate.
Different embodiments of the package 306 can emit different wavelengths of light depending on the composition of the LEDs 302 and encapsulant 304. In some embodiments, the LEDs 302 emit a blue light in the wavelength range of approximately 450 to 460 nm. In other embodiments the LEDs 302 may each emit different wavelengths of light. The LED chips 302 can also be covered with one or more conversion materials. As shown in
Referring to
Referring now to
The specific layers 308, 310, of the composite layer 362, may include a variety of materials at varying thicknesses designed to maximize the AAR across the visible spectrum. Though any combination of materials and thicknesses may be used, as discussed above,
These composite reflective layers 362 may be fabricated and placed on the substrates or submounts 300 using any suitable methods such as those described previously in this application. In some embodiments, it is preferable, during fabrication, that the composite layers 362 are not diced or cut as this may cause the layers to deform and thereby impact the optical qualities of the composite layers 362. One method to avoid this is to dispose the composite layers 362 such that they terminate at a point where dicing or cutting of the underlying substrate, submount, or carrier 300 would occur, as shown in
In some embodiments, during fabrication it is also preferred that the layers are disposed such that stress is reduced after the placement of each layer or such that stress compensation between the layers is utilized. This process reduces the overall stress of the composite layer 362 and therefore helps prevent stress related deformations of the composite layer 362. This is desirable because it is preferable to have the composite layer or dielectric layers as optically smooth as possible.
Light emitters mounted over a composite layer 362 may be electrically connected by any suitable method known in the art. Such methods include traces, wire bonds, grids, and vias.
a and 26b show embodiments utilizing vias through the composite layer 362 to provide electrical connectivity to the light emitter 302. In some embodiments, such as in
As described previously, it is preferable in packaging application to include a thick layer which has an RI lower than the encapsulant being used. In some embodiments this may be accomplished by the incorporation of a porous material, such as MgF2 deposited by e-beam evaporation or any other suitable porous material or depositing method. In other embodiments, however, an air gap may be used rather than a layer of some material. As shown in
As shown in
Although the present invention has been described in detail with reference to certain preferred configurations thereof, other versions are possible. Therefore, the spirit and scope of the invention should not be limited to the versions described above.
This application is a continuation in part of, and claims the benefit of, U.S. patent application Ser. No. 13/071,349 to Ibbetson et al., filed on Mar. 24, 2011 and having the same title as the present application.
Number | Name | Date | Kind |
---|---|---|---|
1393573 | Ritter | Oct 1921 | A |
1880399 | Benjamin | Oct 1932 | A |
2214600 | Winkler | Sep 1940 | A |
2981827 | Orsatta | Apr 1961 | A |
3395272 | Nicholl | Jul 1968 | A |
4420800 | Van Horn | Dec 1983 | A |
4946547 | Palmour et al. | Aug 1990 | A |
5200022 | Kong et al. | Apr 1993 | A |
RE34861 | Davis et al. | Feb 1995 | E |
5912915 | Reed et al. | Jun 1999 | A |
6409361 | Ikeda | Jun 2002 | B1 |
6454439 | Camarota | Sep 2002 | B1 |
6558032 | Kondo et al. | May 2003 | B2 |
6585397 | Ebiko | Jul 2003 | B1 |
6657236 | Thibeault et al. | Dec 2003 | B1 |
6720583 | Nunoue et al. | Apr 2004 | B2 |
6758582 | Hsiao et al. | Jul 2004 | B1 |
6793373 | Matsuba et al. | Sep 2004 | B2 |
6812502 | Chien et al. | Nov 2004 | B1 |
6817737 | Romano et al. | Nov 2004 | B2 |
6986594 | Wirth et al. | Jan 2006 | B2 |
7055991 | Lin | Jun 2006 | B2 |
7213940 | Van De Ven et al. | May 2007 | B1 |
7275841 | Kelly | Oct 2007 | B2 |
7573074 | Shum et al. | Aug 2009 | B2 |
7622746 | Lester et al. | Nov 2009 | B1 |
7722220 | Van De Ven | May 2010 | B2 |
7784977 | Moolman et al. | Aug 2010 | B2 |
7795623 | Emerson et al. | Sep 2010 | B2 |
7821023 | Yuan et al. | Oct 2010 | B2 |
7915629 | Li et al. | Mar 2011 | B2 |
7922366 | Li | Apr 2011 | B2 |
8212273 | McKenzie et al. | Jul 2012 | B2 |
8324652 | Lester et al. | Dec 2012 | B1 |
20030025212 | Bhat et al. | Feb 2003 | A1 |
20030128733 | Tan et al. | Jul 2003 | A1 |
20040217362 | Slater et al. | Nov 2004 | A1 |
20050168994 | Jacobson et al. | Aug 2005 | A1 |
20050211993 | Sano et al. | Sep 2005 | A1 |
20050242358 | Tu et al. | Nov 2005 | A1 |
20060060874 | Edmond et al. | Mar 2006 | A1 |
20060157723 | Lambkin et al. | Jul 2006 | A1 |
20060163586 | Denbaars et al. | Jul 2006 | A1 |
20060278885 | Tain et al. | Dec 2006 | A1 |
20070139923 | Negley | Jun 2007 | A1 |
20070145380 | Shum et al. | Jun 2007 | A1 |
20070158668 | Tarsa et al. | Jul 2007 | A1 |
20070217193 | Lin | Sep 2007 | A1 |
20080061304 | Huang et al. | Mar 2008 | A1 |
20080123341 | Chiu et al. | May 2008 | A1 |
20080173884 | Chitnis et al. | Jul 2008 | A1 |
20080179611 | Chitnis et al. | Jul 2008 | A1 |
20080185609 | Kozawa et al. | Aug 2008 | A1 |
20080191233 | Yang et al. | Aug 2008 | A1 |
20080265268 | Braune et al. | Oct 2008 | A1 |
20080310158 | Harbers et al. | Dec 2008 | A1 |
20090050908 | Yuan et al. | Feb 2009 | A1 |
20090121241 | Keller et al. | May 2009 | A1 |
20090152583 | Chen et al. | Jun 2009 | A1 |
20090231856 | Householder | Sep 2009 | A1 |
20090283779 | Negley et al. | Nov 2009 | A1 |
20090283787 | Donofrio et al. | Nov 2009 | A1 |
20100001299 | Chang et al. | Jan 2010 | A1 |
20100012962 | Hong et al. | Jan 2010 | A1 |
20100038659 | Chen et al. | Feb 2010 | A1 |
20100039822 | Bailey | Feb 2010 | A1 |
20100051995 | Katsuno et al. | Mar 2010 | A1 |
20100059785 | Lin et al. | Mar 2010 | A1 |
20100065881 | Kim | Mar 2010 | A1 |
20100103678 | Van de Ven et al. | Apr 2010 | A1 |
20100117099 | Leung | May 2010 | A1 |
20100140635 | Ibbetson et al. | Jun 2010 | A1 |
20100140636 | Donofrio et al. | Jun 2010 | A1 |
20100155746 | Ibbetson et al. | Jun 2010 | A1 |
20100165633 | Moolman et al. | Jul 2010 | A1 |
20100252840 | Ibbetson et al. | Oct 2010 | A1 |
20110049546 | Heikman et al. | Mar 2011 | A1 |
20110075423 | Van De Ven | Mar 2011 | A1 |
Number | Date | Country |
---|---|---|
1841183 | Oct 2006 | CN |
201007449 | Jan 2008 | CN |
102004040277 | Feb 2006 | DE |
102007003282 | Jul 2008 | DE |
102008035900 | Nov 2009 | DE |
1750310 | Feb 2007 | EP |
2259345 | Dec 2010 | EP |
2369650 | Sep 2011 | EP |
06045649 | Feb 1994 | JP |
06268252 | Sep 1994 | JP |
2005197289 | Jul 2005 | JP |
WO 0034709 | Jun 2000 | WO |
WO 2005066539 | Jul 2005 | WO |
WO 2005078338 | Aug 2005 | WO |
WO 2005117152 | Dec 2005 | WO |
WO 2006092697 | Sep 2006 | WO |
WO 2007130536 | Nov 2007 | WO |
WO2008149250 | Dec 2008 | WO |
WO 2009056927 | May 2009 | WO |
WO 2010029475 | Mar 2010 | WO |
WO2011031098 | Mar 2011 | WO |
WO2011071100 | Jun 2011 | WO |
Entry |
---|
Streubel et al., “Fabrication of InP/air-gap distributed Bragg reflectors and micro-cavities”, 1997, Materials Science and Engineering, vol. B44, pp. 364-367 (Feb. 1997). |
Kobayash et al., “Optical Investigation on the Growth Process of GaAs . . . ”, 1989, Japanese Journal of Applied Physics, vol. 28, No. 11 pp. L1880-L1882, Nov. 1989. |
C.H. Lin et al., “Enhancement of InGaN—GaN Indium—Tin—Oxide Flip-Chip Light-Emitting Diodes with TiO2—SiO2 Multilayer Stack Omnidirectional Reflector,” IEEE Photonics Technology Letters, vol. 18, No. 19, Oct. 1, 2006, pp. 2050-2052. |
Windisch et al. “Impact of Texture-Enhanced Transmission on High-Efficiency Surface-Textured Light-Emitting Diodes,” Applied Physics Letters, vol. 79, No. 15, Oct. 2001, pp. 2315-2317. |
Schnitzer et al. “30% External Quantum Efficiency From Surface Textured, Thin-Film Light-Emitting Diodes,” Applied Physics Letters, Oct. 18, 1993, vol. 64, No. 16, pp. 2174-2176. |
Windisch et al. “Light-Extraction Mechanisms in High-Efficiency Surface-Textured Light-Emitting Diodes,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 8, No. 2, Mar./Apr. 2002, pp. 248-255. |
Streubel, et al. “High Brightness AlGaInP Light-Emitting Diodes,” IEEE Journal on Selected Topics in Quantum Electronics, vol. 8, No. 2, Mar./Apr. 2002, pp. 321-332. |
Cree EZ400 LED Data Sheet, 2007 Cree's EZBright LEDs. |
Cree EZ700 LED Data Sheet, 2007 Cree's EZBright LEDs. |
Cree EZ1000 LED Data Sheet, 2007 Cree's EZBright LEDs. |
Cree EZBright290 LED Data Sheet, 2007 Cree's EZBright LEDs. |
International Search Report and Written Opinion for counterpart Application No. PCT/US2009/066938 mailed Aug. 30, 2010. |
High-Performance GaN-Based Vertical-Injection Light-Emitting Diodes with TiO2—SiO2 Omnidirectional Reflector and n-GaN Roughness. H.W. Huang, IEEE Photonics Technology Letters vol. 19 No. 8, Apr. 15, 2007. |
International Search Report and Written Opinion for PCT Application No. PCT/US2010/002827 mailed May 2, 2011 (1). |
International Search Report and Written Opinion for PCT/US2011/001394 mailed Nov. 3, 2011. |
Office Action from U.S. Appl. No. 12/418,796, Dated: Jul. 20, 2011. |
Office Action from U.S. Appl. No. 12/329,722, Dated: Oct. 27, 2010. |
International Preliminary Report on Patentability from Application No. PCT/US09/66938, dated Apr. 3, 2012. |
“High-Performance GaN-Based Vertical-Injection Light-Emitting Diodes With TiO2—SiO2 Omnidirectional Reflector and n-GaN Roughness” by H. W. Huang, et al., IEEE Photonics Technology Letters, vol. 19, No. 8, Apr. 15, 2007, pp. 565-567. |
DOM LED Downlighting, Lithonia Lighting: an Acuity Brands, Company, www.lithonia.com, © 2009. |
Ecos, Lighting the Next Generation, gothan: a division of Acuity Brands Lighting Inc., © 2008. |
International Search Report and Written Opinion from PCT Application No. PCT/US2013/028684, dated May 28, 2013. |
Jong Kyu kim, et al., “GaInN Light-emitting Diodes with RuO2/SiO2/Ag Omni-directional Reflector”, Applied Physics Letters, AIP, American Institute of Physics, Nelville, NY, US, vol. 84, No. 22, May 31, 2004, pp. 4508-4510, XP012061652. |
Y.S. Zhao, et al., “Efficiency Enhancement of InGaN/GaN Light-Emitting Diodes with a Back-Surface distributed Bragg Reflector”, Journal of Electronic Materials, vol. 32, No. 12, Dec. 1, 2003, pp. 1523-1526, XP055063308. |
Xu Qing-tao, et al., “Enhancing Extraction Efficiency from GaN-based LED by Using an Omni-directional Reflector and Photonic Crystal”, Optoelectronics Letters, vol. 5, No. 6, Nov. 1, 2009, pp. 405-408, XP055063309. |
J.-Q Xi, et al., “Optical Thin-film Materials with Low Refractive Index for Broadband Elimination of Fresnel Reflection”, Nature Photonics, Nature Publishing Group, UK, vol. 1, No. 3, Mar. 1, 2007, pp. 176-179, XP002590687. |
Decision of Patent Grant from Japanese Patent Appl. No. 2011-539526, dated Oct. 22, 2013. |
Notice of Reasons for Rejection from Japanese Patent Appl. No. 2011-539526, dated Jun. 25, 2013. |
First Office Action and Search Report from Chinese Patent Appl. No. 201080023107.8, dated Jul. 12, 2013. |
Office Action from U.S. Appl. No. 12/855,500, dated May 31, 2013. |
Response to OA from U.S. Appl. No. 12/855,500, filed Sep. 3, 2013. |
Office Action from U.S. Appl. No. 13/071,349, dated May 28, 2013. |
Response to OA from U.S. Appl. No. 13/071,349, filed Jul. 18, 2013. |
Office Action from U.S. Appl. No. 13/071,349, dated Jan. 17, 2013. |
Response to OA from U.S. Appl. No. 13/071,349, filed Apr. 10, 2013. |
Office Action from U.S. Appl. No. 12/553,025, dated Jun. 19, 2013. |
Huang et al. High-Performance GaN-Based Vertical-Injection Light-Emitting Diodes with TiO2—Sio2 Ohnidirectional Relfector and n-GaN Roughness, IEEE Photonics Technology Letters, vol. 19, No. 8, Apr. 15, 2007, pp. 565-567. |
Raoufi et al, Surface characterization and microstructure of ITO thin films at different annealing temperatures, Applied Surface Science 253 (2007), pp. 9085-9090. |
Office Action from U.S. Appl. No. 13/168,689, dated Jun. 28, 2013. |
Office Action from U.S. Appl. No. 12/606,377, dated Jul. 9, 2013. |
Office Action from U.S. Appl. No. 12/418,796, dated Aug. 7, 2012. |
Response to OA from U.S. Appl. No. 12/418,796, filed Nov. 7, 2012. |
Office Action from U.S. Appl. No. 12/418,796, dated Feb. 22, 2012. |
Response to OA from U.S. Appl. No. 12/418,796, filed Jun. 22, 2012. |
Office Action from U.S. Appl. No. 13/415,626, dated Sep. 28, 2012. |
Response to OA from U.S. Appl. No. 13/415,626, filed Jan. 23, 2013. |
Office Action from U.S. Appl. No. 12/855,500, dated Oct. 1, 2012. |
Response to OA from U.S. Appl. No. 12/855,500, filed Feb. 25, 2013. |
Office Action from U.S. Appl. No. 12/606,377, dated Nov. 26, 2012. |
Response to OA from U.S. Appl. No. 12/606,377, filed Feb. 22, 2013. |
Office Action from U.S. Appl. No. 12/757,179, dated Dec. 31, 2012. |
Response to OA from U.S. Appl. No. 12/757,179, filed Apr. 23, 2013. |
Office Action from U.S. Appl. No. 13/415,626, dated Feb. 28, 2013. |
Response to OA from U.S. Appl. No. 13/415,626, filed Apr. 17, 2013. |
International Search Report and Written Opinion for Application No. PCT/US2012/034564, dated Sep. 5, 2012. |
Number | Date | Country | |
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20120280263 A1 | Nov 2012 | US |
Number | Date | Country | |
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Parent | 13071349 | Mar 2011 | US |
Child | 13415626 | US |