Patent Application
20100136712
1. Field of the invention
The present invention relates generally to a dielectric material, and more particularly, the dielectric material is tunable and could be applied to high frequency microwave devices or other target devices such as semiconductor devices.
2. Description of the prior art
Capacitance structure made of dielectric materials has been applied to various kinds of devices such as arithmetic processor, memory element, high frequency communication devices, etc. Plenty of capacitance structures are required for those devices mentioned above. Take dynamic random access memory (DRAM) for example, with the trend of miniaturization, it is necessary to decrease the area of capacitance and increase the dielectric constant of materials more effectively. As for high frequency communication devices, the transmission of signals relies on the electromagnetic wave propagation, and the electromagnetic wave propagation is effected deeply by the characteristics of medium materials. Thus, much research is focusing on exploiting and probing into appropriate materials.
With the rapid development of ferroelectric ceramics in the 1990s, the dielectric constant ε of ferroelectric materials can be modulated by modulating the electric field according to research. The ferroelectric materials have a high dielectric constant, and the dielectric constant changes remarkably under a high electric field (E>100 kV/cm), changes in percentages of dozens.
To achieve better property, materials with both high tunability and low dielectric loss tangent are required. The temperature sensitivity of materials should also be a concern. Presently, ferroelectric materials popularly researched include SrTiO3, BaTiO3, BaSrTiO3, and PbZrTiO3, etc.
Accordingly, an aspect of the present invention is to provide a dielectric material with good tunability, low dielectric loss tangent and low temperature sensitivity.
An embodiment of the invention provides a Ti doped lead barium zirconate dielectric material. The Ti doped lead barium zirconate dielectric material comprises a compound with the chemical formula (PbI-XBaX)(ZrI-YTiY)O3. According to a preferred embodiment, X is greater than 1 and smaller than 0.3; Y is greater than 0 and smaller than 0.5.
Another aspect of the present invention is to provide a method for producing a dielectric film, formed by Ti doped lead barium zirconate dielectric material comprising a compound with the chemical formula (PbI-XBaX)(ZrI-YTiY)O3. Wherein X is greater than 1 and smaller than 0.3; Y is greater than 0 and smaller than 0.5.
According to another embodiment of the invention, the method for producing a dielectric film is comprised of the following steps. Firstly, prepare a Ti doped lead barium zirconate dielectric material by a first process, wherein the first process could be, but not limited to, a solid state process, a coprecipitation process, a sol-gel process, and a hydrothermal process. Secondly, integrate the Ti doped lead barium zirconate dielectric material into a target device using a second process to form the dielectric film, wherein the second process could be, but not limited to, a chemical solution deposition process, a sputtering process, a chemical vapor deposition process, and a pulse laser deposition process.
The objective of the present invention will no doubt become obvious to those of ordinary skill in the art after reading the following detailed description of the preferred embodiment, which is illustrated in the various figures and drawings.
The present invention provides a Ti doped lead barium zirconate dielectric material with good tunability, low dielectric loss tangent and low sensitivity of temperature.
According to an embodiment of the invention, the Ti doped lead barium zirconate dielectric material could be applied to a high frequency device. The Ti doped lead barium zirconate dielectric material comprises a compound with the chemical formula (PbI-XBaX)(ZrI-YTiY)O3. According to a preferred embodiment, X is greater than 1 and smaller than 0.3; Y is greater than 0 and smaller than 0.5.
According to a preferred embodiment, when the Ti doped lead barium zirconate dielectric material is applied to a high frequency device, the thickness of the high frequency device is larger than 100 nm and smaller than 5 μm.
When the Ti doped lead barium zirconate dielectric material is applied to an integrated circuit, the Ti doped lead barium zirconate dielectric material is disposed on a substrate. The substrate could be, but not limited to, a semiconductor substrate such as Si substrate or GaAs substrate, or an oxide substrate such as MgO substrate, SrTiO3 substrate or LaAlO3 substrate.
Please refer to
Initially, the p type of Si substrate with (100) orientation is cleaned by a standard cleaning process. The next, SiO2 is grown on the Si substrate as an insulating layer (the thickness is 150 nm in the embodiment) by a wet thermal oxidation process. Subsequently, Ti is deposited on the SiO2 layer as a buffer layer (the thickness is 50 nm in the embodiment) by a dual E-gun evaporation process. Particularly, the buffer layer is in order to improve the adhesion between the SiO2 layer and the Pt layer which is deposited on the Ti layer later on. The substrate with Pt/Ti/SiO2/Si structure is eventually sintered at 400° C. for 30 minutes under a nitrogen atmosphere.
Another aspect of the present invention is to provide a method for producing a dielectric film, formed by Ti doped lead barium zirconate dielectric material comprising a compound with the chemical formula (PbI-XBaX)(ZrI-YTiY)O3. Wherein X is greater than 1 and smaller than 0.3; Y is greater than 0 and smaller than 0.5.
According to another embodiment of the invention, the method for producing a dielectric film comprising the following steps. Firstly, prepare a Ti doped lead barium zirconate dielectric material by a first process, wherein the first process could be, but not limited to, a solid state process, a coprecipitation process, a sol-gel process, and a hydrothermal process. Secondly, integrate the Ti doped lead barium zirconate dielectric material into a target device using a second process to form the dielectric film, wherein the second process could be, but not limited to, a chemical solution deposition process, a sputtering process, a chemical vapor deposition process, and a pulse laser deposition process.
Please refer to
Firstly, step S110 is performed to mix lead mono oxide (PbO), barium carbonate (BaCO3), zirconium oxide (ZrO2) and titanium oxide (TiO2) with alcohol and stir the mixed solution by ball-milling for 20 hours. Secondly, step S112 is performed to put the dried mixed powder into Al2O3 crucible, and calcine the powder by a high temperature furnace. The next, step S114 is performed to add polyvinyl butyal (PVB) to the calcined powder and ball-mill the mixture for 20 hours to make the size of the powder uniform. After that, step S116 is performed to screen the powder then put an appropriate amount of powder in a mold and press the powder with high pressure to make it a round spindle shape sample. Finally, step S118 is performed to sinter the sample at 1100˜1300° C. in high temperature furnace then the dense and hardened sample is formed.
In the embodiment, the sample sintered at such temperature range has its phase diffraction peak. The information about the phase diffraction peak is from X-Ray diffraction analysis. Please refer to
Table 1 shows the dielectric property of the samples with different content of Ti. Wherein sample A (PBZ) is lead barium zirconate dielectric material without Ti dopant; sample B (PBZT10) is lead barium zirconate dielectric material doped with 10% of Ti; sample C (PBZT20) is lead barium zirconate dielectric material doped with 20% of Ti; sample D (PBZT30) is lead barium zirconate dielectric material doped with 30% of Ti; sample E (PBZT40) is lead barium zirconate dielectric material doped with 40% of Ti; and sample F (PBZT50) is lead barium zirconate dielectric material doped with 50% of Ti. The relative density of the samples is higher than 95%, and sample A (without Ti) is sintered at 1450° C. while the others are sintered at 1300° C. Namely, those samples doped with Ti can have higher relative density with lower sinter temperature. Moreover, the dielectric constant ε of the samples increases significantly with the increase of Ti content, from 954.74 (sample A without Ti) to 2234.69 (sample F with 50% of Ti). Simultaneously, the dielectric loss tangent of the samples drops considerably then increases slightly with the increase of Ti content.
Please refer to
Initially, step S310 is performed to dissolve lead acetate in propionic acid and step S312 is performed to dissolve barium acetate in propionic acid. Simultaneously, step S314 is performed to dissolve metal alkoxide with Zr in propionic acid. Meanwhile, step S316 is performed to dissolve tetraisopropyl orthotitanate in 2-methoxyethanol (MOE). After that, step S330 is performed to mix all of the solutions above with the ratio of Pb:Ba:Zr:Ti=0.6:0.4:1-Y:Y to produce a precursor, wherein Y could be 0, 1%, 5%, or 10%. Subsequently, step S332 is performed to coat the precursor on a substrate by spin coating with the revolve speed of 150 rpm for 10 seconds and 2500 rpm for 30 seconds. Then, step S334 is performed to pre-sinter the film (the substrate coated with precursor) at 150° C. for 5 minutes and 350° C. for 10 minutes. Finally, step S336 is performed to sinter the film at 650˜750° C. in a high temperature furnace for 10 minute.
For the lead barium zirconate dielectric films doped with Ti, phase-transition temperature can be lowered 50° C. at such sinter temperature range. Besides, the films tend to crystallize with increasing the sinter temperature, wherein the crystal grains tend to distribute randomly without the appearance of orientation. The information about the phase diffraction is from X-Ray diffraction analysis. Please refer to
Please refer to
Please refer to
To summarize, it is easy to see that the lead barium zirconate dielectric material has higher dielectric constant, higher tunability, and lower sensitivity of temperature with Ti dopant.
Although the present invention has been illustrated and described with reference to the preferred embodiment thereof, it should be understood that it is in no way limited to the details of such embodiment, and is capable of numerous modifications within the scope of the appended claims.
